• 제목/요약/키워드: Inclined Exposure

검색결과 19건 처리시간 0.029초

선택적 경사 노광과 후면 노광에 의한 3차원 구조물의 제작 (Fabrication of 3-D Structures by Inclined and Rear-side Exposures)

  • 이준섭;신현준;문성욱;송석호;김태엽
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권1호
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    • pp.47-52
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    • 2004
  • 3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.

레이저 빛의 경사노광 시 광 경화성 수지의 경화형상 예측 (Prediction of Photopolymer Solidification for Inclined Laser Beam Exposure)

  • 김영현;임종선;유규상;이인환;고태조
    • 한국정밀공학회지
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    • 제27권8호
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    • pp.98-104
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    • 2010
  • It has been reported that the photopolymer solidification in the stereolithogrpahy process is mainly depend on the laser exposure conditions such as laser power and scanning speed. However, these researches were focused on the vertical laser exposure onto the surface of the photopolymer. In this research, we developed a mathematical model for the photopolymer solidification under the inclined laser beam exposure. Using the developed mathematical model, the photopolymer solidifications were simulated varying inclined laser exposure conditions. Developed mathematical model was in good agreement with the experimental result. This research can be applied to improve the surface roughness in the stereolithogrpahy process.

UV 경사노광에 의한 미세광학패턴 LCD-도광판 (Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process)

  • 황철진;김종선;고영배;허영무
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 춘계학술대회 논문집
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    • pp.51-54
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    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

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하이브리드 자외선 노광법을 이용한 3차원 고종횡비 미소구조물 제작 (Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures)

  • 박성민;남경목;김종훈;윤상희
    • 대한기계학회논문집A
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    • 제40권8호
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    • pp.731-736
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    • 2016
  • 본 연구에서는 의용생체공학에 널리 사용되는 미소바늘과 같은 3차원 고종횡비 미소구조물을 용이하게 제작할 수 있는 하이브리드 자외선 노광법에 대해 기술한다. 하이브리드 자외선 노광법은 기존에 사용되고 있는 경사노광, 회전노광 및 역노광을 혼합한 방법으로, 경사 및 회전노광은 경사진 축대칭 형상을 가지는 3차원 미소구조물의 제작이 가능하도록 하고 역노광은 자외선 노광공정 중 필연적으로 발생하는 하부기판에서의 자외선 반사를 최소화 시킨다. 자체 개발한 자외선 노광시스템과 SU-8 음성감광제를 이용하여 하이브리드 자외선 노광법의 다양한 공정조건이 최종 제작된 3차원 고종횡비 미소구조물 형상(종횡비, 선단의 곡률반경 등)에 미치는 효과를 확인한다. 또한 SU-8의 소프트 베이킹(soft baking) 조건과 미소구조물 선단 형상 사이의 관계에 대해서도 논의한다.

외래 관광객의 한류 공연 관람의도와 행동 간 불일치 요인 탐색 (Exploring the Factors Affecting Intention Behavior Gap in K-entertainment Tourism)

  • 이민재;김진영;서원석
    • 한국콘텐츠학회논문지
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    • 제15권1호
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    • pp.105-113
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    • 2015
  • 본 연구는 외래 관광객의 한류 공연 관람 행동에 대하여 의도-행동 이론을 적용하여 고찰하였다. 서울을 방문한 외래 방문객을 표본으로 공연을 관람한 '관람군', 관심은 있었으나 공연을 관람하지 않은 '잠재군', 그리고 공연에 관심이 없으며 관람하지 않은 '무관심군'으로 나누어, 의도와 행동 간에 차이를 나타내는 요인을 분석했다. 분석 결과, 관람군과 잠재군 간에 한류를 접한 기간이나 과거 한류 공연을 관람한 횟수에는 유의한 차이가 나타나지 않은 반면, 한국에서의 한류 공연 관람과 관련된 지식, 능력, 협조에서는 차이점이 확인되었다. 또한, 외국에서의 한류 공연과 국내 한류 공연이 보완적 성격이 아닌 대체재로 인식되는 성향이 나타났다. 이러한 결과는 단순히 한류와 한국에 대한 관심만으로는 한류가 강력한 관광 유인으로 작용하거나 한국 방문 시 공연 소비를 할 것이라고 기대하기는 어려우며, 공연 관람 의도가 실제 행동으로 실행될 수 있도록 공연과 결합한 관광 상품을 효과적으로 기획할 필요성을 시사한다.

Monitoring of Initial Stages of Atmospheric Zinc Corrosion in Simulated Acid Rain Solution under Wet-dry Cyclic Conditions

  • EL-Mahdy, Gamal A.;Kim, Kwang B.
    • Corrosion Science and Technology
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    • 제3권6호
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    • pp.251-256
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    • 2004
  • Exposure of zinc samples in simulated acid rain solution (SARS) was investigated under a periodic wet-dry conditions using an AC impedance technique. The periodic wet and dry exposure consisted of the immersion of zinc samples in SARS for one hour followed by exposure to 7 hours drying at 60% RH. Phases of the corrosion products were indentified by X-ray diffraction (XRD). The influence of relative humdiity (RH), temperature, and surface inclination on the atmospheric corrosion of zinc is described. The reciprocal of polarization resistance (1/Rp) decreases rapidly during the initial stages then slowly and eventually attains a steady state as exposure time progresses. The average of reciprocal of polarization resistance per cycle, (ARPR) was calculated and found to decrease as number of exposure cycle increases. An increase of temperature enhances the corrsion rate of zinc. The values of ARPR, of a sample inclined at 30 o are lower than those for a sample oriented horizontally. The experiment result shows a pronounced dependence of reciprocal of polarization resistance on RH. Exposure in the presence of carbonate anions gives rise to more protective corrosion products than in nitrate anion solution. The corrosion mechanism during the initial stages of atmospheric zinc corrosion under wet-dry cyclic conditions is suggested.

PDP용 수직형 구조의 근접 노광장치 개발 (Development of Proximity Exposure System with Vertical Structure for Plasama Display Panel)

  • 박정규;정수화;이항부
    • 대한기계학회논문집A
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    • 제24권9호
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    • pp.2371-2380
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    • 2000
  • In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

변형 DEEP X-ray를 이용한 마이크로 렌즈 및 V-groove 제작 (Microlens Micro V-groove Fabrication by the Modified LIGA Process)

  • 이정아;이승섭;전병희
    • 소성∙가공
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    • 제13권3호
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    • pp.290-295
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    • 2004
  • Mircolens and microlens V-groove are realized using a novel fabrication technology based on the exposure of a resist, usually PMMA, to deep X-rays and subsequent thermal treatment and inclined deep X-ray lithography, respectively. The fabrication technology is very simple and produces microlenses and microlens V-groove with good surface roughness of several nm. The molecular weight and glass transition temperature of PMMA is reduced when it is irradiated with deep X-rays. The microlenses were produced through the effects of volume change, surface tension, and reflow during thermal treatment of irradiated PMMA. Microlenses were produced with diameters ranging from 30 to $1500\mu\textrm{m}$. The surface X-ray mask is also fabricated to realize microlens arrays on PMMA sheet with a large area. The size of the micro V-groove is fabricated in the range of 12~$60\mu\textrm{m}$.