• Title/Summary/Keyword: InGaP/GaAs

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Fabrication and application performance of the GaInAs/InP PIN photodiode for the light-wave communication (고속 장파장 광통신을 위한 GaInAs/InP PIN 광검출기의 제작 및 응용특성)

  • 남은수
    • Proceedings of the Optical Society of Korea Conference
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    • 1989.02a
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    • pp.196-200
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    • 1989
  • The physical properties related to the GaInAs/InP crystal grown by LPE are discussed in terms of both the design and operation characteristics of the GaInAs/InP Pin photodiode has cutoff frequency of 358 MHz and responsivity, 0.53 A/W (λ=1.3${\mu}{\textrm}{m}$), with dark current density as low as 4$\times$10-4/$\textrm{cm}^2$ under reverse bias voltage of 5V.

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Fabrication of InP-Based Microstructures for 111- V Compound Semiconductor Micromachining (III-V 화합물 반도체 마이크로머시닝을 위한 InP를 기반으로 한 미세구조의 제조에 관한 연구)

  • 노기영;이종현;김정호;황상구;홍창희;심준환
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2000.05a
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    • pp.447-450
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    • 2000
  • In this paper, we report a fabrication of InP-based microstructurs for III-V compound semiconductor micromachining. Vertical liquid phase epitaxy(LPE) system was used in order to grow the Inp/InGaAsP/InP layers. The thicknesses of InP top-layer and InGaAsP were 1$\mu\textrm{m}$ and 0.4$\mu\textrm{m}$ respectively. The fabrication of InGaAsP microstructures involves front side bulk micromachining. The experimental result showed the beams must be carefully aligned in the <110> direction since the lateral etching of the beam in the <110> direction is more faster than that of the beam in the <100> direction.

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열처리 온도에 의한 디지털 합금 InGaAlAs 다중양자우물의 발광특성 변화

  • Jo, Il-Uk;Byeon, Hye-Ryeong;Ryu, Mi-Lee;Song, Jin-Dong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.414-414
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    • 2013
  • InGaAlAs/InP은 $1.3{\sim}1.55{\mu}m$ 레이저 다이오드 응용을 위한 InGaAsP/InP를 대체하기 위한 물질로 많은 관심을 받아왔다. 디지털 합금 InGaAlAs 다중양자우물(multiple quantum wells: MQWs) 시료는 MBE (molecular beam epitaxy) 장비를 이용하여 n-InP 기판 위에 성장하였다. 양자우물과 장벽은 각각 (InGaAs)0.8(InAlAs)0.2와 (InGaAs)0.4(InAlAs)0.6 SPSs (short-period superlattices)로 $510^{\circ}C$에서 성장하였다. 발광특성을 향상시키기 위하여 질소분위기에서 $700^{\circ}C$ $750^{\circ}C$ 또는 $800^{\circ}C$에서 30초간 열처리(rapid thermal annealing: RTA)하였다. RTA 온도에 따른 디지털 합금 InGaAlAs MQWs의 발광특성을 분석하기 위해 PL (photoluminescence)과 TRPL(time-resolved PL)을 이용하였다. RTA 온도에 따른 InGaAlAs MQWs 시료의 발광 메카니즘 및 운반자 동력학을 연구하기 위하여 발광파장 및 온도에 따른 TRPL을 측정하였다. 저온(10 K)에서 PL 피크는 RTA 온도를 $700^{\circ}C$에서 $750^{\circ}C$로 증가하였을 때 1,242 nm에서 1,245 nm로 장파장 영역으로 이동하였다가 $800^{\circ}C$에서 열처리하였을 때 단파장 영역으로 이동하여 1,239 nm에서 나타났다. 또한 PL 세기는 RTA 온도를 증가함에 따라 증가함을 보이다가 RTA 온도를 $800^{\circ}C$로 증가하였을 때 PL 세기는 감소하였다. 발광소자 개발을 위한 InAlGaAs MQWs 시료의 최적의 열처리 조건을 이러한 PL과 TRPL 결과로부터 결정할 수 있다.

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Role of Crystallographic Tilt Angle of GaAs Substrate Surface on Elastic Characteristics and Crystal Quality of InGaP Epilayers (GaAs 기판표면의 Tilt각도가 InGaP 에피막의 탄성특성 및 결정질에 미치는 영향)

  • 이종원;이철로;김창수;오명석;임성욱
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.1
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    • pp.1-10
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    • 1999
  • InGaP epilayers were grown on the flat, $2^{\circ}$off, $6^{\circ}$ off, and $10^{\circ}$off GaAs substrates by organo-metallic vapor phase epitaxy, and influences of crystallographic misorientation of the substrate on the structural and optical properties such as lattice mismatch, elastic strain, lattice curvature, misfit stress, and PL intensity /line-width were investigated in this study. Material characterizations were carried out by TXRD( tripple-axis x-ray diffractometer) and low temperature (11K) PL (photoluminescence). With increase of the substrate misorientation angle (S.M.A.), the relative incorporation of Ga atoms on the substrate surface was found to be enhanced. Also, with increase of the S. M. A., the x-ray line-width of the InGaP epilayer was reduced, indicating that the crystal quality of the epilayer could be improved tilth a misoriented substrate. It was also found that the elastic accommodation of the strain-free lattice misfit was more remarkable in a misoriented sample. PL intensity increased, and PL line-width and emission wavelength decreased with the increase of S. M. A. The results conclude that the elastic characteristics and the crystal quality of the InGaP epilayer could be remarkably enhanced when the misoriented substrates were employed.

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Isolation of Gibberellin-producing Penicillium spp. from the Root of Lindera obtusiloba and Vaccinium koreanum (생강나무와 산앵두나무의 뿌리에서 분리한 Penicillium spp.의 지베렐린 생산성)

  • Choi, Wha-Youl;Lee, Jin-Hyung;Shin, Kee-Sun;Lee, In-Jung;Rhee, In-Koo;Kim, Jong-Guk
    • The Korean Journal of Mycology
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    • v.32 no.1
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    • pp.16-22
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    • 2004
  • The gibberellins (GAs) play important roles in plant growth and development. Twenty three fungi were isolated from the roots of Lindera obtusiloba and Vaccinium koreanum. The numbers of GA-producing fungi were six strains from Lindera obtusiloba and four strains from Vaccinium koreanum. The fungi with GAs-producing activity were incubated for seven days in 40 ml of Czapek's liquid medium at $25^{\circ}C$, 120 rpm, and the amount of each GA in the medium was measured by gas chromatography-mass spectrometer (GC-MS) to determine the productivity of GAs. Penicillium griseofulvum KNU5379 produced more GA in case of $GA_{3}$ than Neurospora crassa known as a GAs-producing fungus. P. griseofulvum KNU5379 was shown to produce $GA_1\;9.79\;ng,\;GA_3\;133.58\;ng,\;GA_4\;2.64\;ng,\;GA_7\;7.80\;ng\;and\;GA_{53}\;0.73\;ng$ in 25 ml of liquid medium. Bioassay using culture fluid of GAs-production fungi was performed on rice sprout.

InAs/GaAs 양자점 태양전지의 광학적 특성 평가: 접합계면전기장 및 AlGaAs 포텐셜 장벽효과

  • Kim, Jong-Su;Han, Im-Sik;Lee, Seung-Hyeon;Son, Chang-Won;Lee, Sang-Jo;Smith, Ryan P.;Ha, Jae-Du;Kim, Jin-Su;No, Sam-Gyu;Lee, Sang-Jun;Choe, Hyeon-Gwang;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.107-107
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    • 2012
  • 본 연구에서는 GaAs p-i-n 태양전지구조에 InAs 양자점을 삽입하여 계면의 전기장 변화를 Photoreflectance (PR) 방법으로 연구하였다. InAs/GaAs 양자점 태양전지구조는 n-GaAs 기판위에 p-i-n 구조의 태양전지를 분자선박막성장 장치를 이용하여 제작하였다. GaAs p-i-n 태양전지와 p-QD(i)-n 양자점 태양전지를 제작하여 계면전기장의 변화를 PR 신호에 나타난 Franz-Keldysh oscillation (FKO)으로부터 측정하였다. 기본적인 p-i-n 구조에서 두 가지 전기장성분을 검출 하였고 양자점 태양전지구조에서는 39 kV/cm 이상의 내부전기장이 존재함을 관측하였다. 이러한 내부전기장은 양자점 주변에 형성된 국소전기장의 효과로 추측하였다. 아울러 양자점을 AlGaAs 양자우물 구조에 삽입하여 케리어의 구속에 의한 FKO의 변화를 관측하였으며 양자점 태양전지의 구조적 변화에 따른 효율을 측정하여 비교 분석하였다.

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Purification and Characterization of Gibberellin $3Beta$-Hydroxylase from Immature Seeds of Phaseolus vulgaris (강낭콩미숙종자로부터 Gibberellin $3Beta$-Hydroxylase 정제 및 성질)

  • 곽상수
    • Proceedings of the Botanical Society of Korea Conference
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    • 1987.07a
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    • pp.133-148
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    • 1987
  • Gibberellin(GA) 3-$\beta$ hydroxylation is very important for the shoot elogation in the higher plants, since only 3$\beta$-hydryoxylated GAs promote shoot elogation in several plants. Fluctuation of 3$\beta$-hydryoxylase activity was examined during seed maturation using two cultivars of , P. vulgaris, Kentucky Wonder (normal) and Masterpiece (dwarf). Very immature seeds of both cultivars contain high level of 3$\beta$-hydroxylase activity (per mg protein). Both cultivars showed maximum of enzyme activity (per seed) in the middle of their maturation process. Gibberellin 3$\beta$-hydroxylase catalyzing the hydroxylation of GA20 to GA1 was purified 313-fold from very early immature seeds of P. vulgaris. Crude soluble enzyme extracts were purified by 15% methanol precipitation, hydrophobic interaction chromatogrphy, DEAE ion exchange column chromatography and gel filtration HPLC. The 3$\beta$-hydroxylase activity was unstable and lost much of its activity duting the purification. The molecular weight of purified enzyme was extimated to be 42, 000 by gel filtration HPLC and SDS-PAGE. The enzyme exhibited maximum activity at pH 7.7. The Km values for [2.3-3H] GA20 and [2.3-3H]GA9 were 0.29 $\mu$M and 0.33 $\mu$M, respectively. The enzyme requires 2-oxoglutarate as a cosubstrate; the Km value for 2-oxoglutarate was 250 $\mu$M using 3H GA20 as a substrate. Fe2+ and ascorbate significantly activated the enzyme at all purification steps, while catalase and BSA activated the purified enzyme only. The enzyme was inhibited by divalent cations Mn2+, Co2+, Ni2+, Cu2+, Zn2+, Cd2+ and Hg2+. Effects of several GAs and GA anaogues on the putrified 3$\beta$-hydroxylase were examined using [3H]GA9 and GA20 as a substrates. Among them, GA5, GA9, GA15, GA20 and GA44 inhibited the enzyme activity. [13C, 3H] GA20 was converted by the partially purified enzyme preparation to [13C, 3H]GA1, GA5 and GA6, which were identified by GC-MS, GA9 was converted only GA4, GA15 and GA44 were converted to GA37 and GA38, respectively. GA5 was epoxidized to GA6 by the preparation. This suggests that 3$\beta$-hydroxylation of GA20 and epoxidation of GA5 are catalyzed by the same enzyme in P, vulgaris.

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Analytic breakdown voltage as a function of temperature for GaAs $p^+n$ junction (온도를 고려한 GaAs $p^+n$접합의 해석적 항복 전압)

  • Chung, Yong-Sung
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.4
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    • pp.226-231
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    • 1999
  • Temperature dependence of effective ionization coefficients in GaAs is formulated as a single polynomial function of temperature, which allows analytical expressions for breakdown voltage of GaAs $p^+n$ junctions as a function of temperature. At 300 K, extracted effective ionization coefficient of GaAs $p^+n$ junction especially agrees well with the published result of <111> oriented GaAs. The analytic results agree with the simulation as well as the experimental ones reported within 10% in error for the doping concentrations in the range of $10_{14}cm_{-3}~10_{17}cm_{-3}$ at 100 K, 300 K and 500 K.

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Design of high speed InAlGaAs/InGaAs HBT structure by Hybrid Monte Carlo Simulation (Hybrid Monte Carlo 시뮬레이션에 의한 고속 InAlGaAs/InGaAs HBT의 구조 설계)

  • 황성범;김용규;송정근;홍창희
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.3
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    • pp.66-74
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    • 1999
  • InAlGaAs/InGaAs HBTs with the various emitter junction gradings(xf=0.0-1.0) and the modified collector structures (collector- I;n-p-n, collector-II;i-p-n) are simulated and analyzed by HMC (Hybrid Monte Carlo) method in order to find an optimum structure for the shortest transit time. A minimum base transit time($ au$b) of 0.21ps was obtainsed for HBT with the grading layer, which is parabolically graded from $x_f$=1.0 and xf=0.5 at the emitter-base interface. The minimum collector transit time($\tau$c) of 0.31ps was found when the collector was modified by inserting p-p-n layers, because p layer makes it possible to relax the electric field in the i-type collector layer, confining the electrons in the $\Gamma$-valley during transporting across the collector. Thus InAlGaAs/InGaAs HBT in combination with the emitter grading($x_f$=0.5) and the modified collector-III showed the transit times of 0.87 psec and the cut-off frequency (f$\tau$) of 183 GHz.

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Sturctural Studies of InGaAs/InGaAsP Multi-quantum well Structure Grown on Corrugated InP by MOVPE (MOVPE 성장방법으로 corrugated InP 기판위에 성장된 InGaAs/InGaAsP 다층박막의 구조연구)

  • Nahm, Sahn;Jang, Dong-Hoon;Suh, Kyoung-Soo;Cho, Kyoung-Ik
    • Korean Journal of Materials Research
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    • v.6 no.6
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    • pp.651-656
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    • 1996
  • InGaAs/InGaAsP 다층박막을 corrugation이 형성된 InP 기판위에 MOVPE 방법을 이용하여 성장 시킨 후 성장조건에 따른 corrugation 높이의 변화와 석출상에 대하여 투과전자현미경을 이용하여 시킨 후 성장조건에 따른 corrugation 높이의 변화와 석출상에 대하여 투과전자현미경을 이용하여 연구하였다. Corrugation이 형성된 InP 기판을 PH3 및 AsH3가스를 동시에 공급해 주었는데 AsH3 가스의 압력이 높으면(1.8x10-2torr)많은 양의 As를 포함한 In1-xAsxP(x=0.3)석출상이 격자결함과 더불어 형성되었다. 반면에 AsH3 가스의 압력이 낮을때는 (1.0x10-3torr) corrugation의 높이가 30nm이었고, 적은 양의 As를 포함한 In1-xAsxP(x<0.1)석출상이 격자결함이 없이 형성되었다.

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