• KIEE International Transactions on Electrophysics and Applications
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• v.5C no.5
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• pp.214-216
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• 2005

Photoreflectance (PR) has been measured to investigate the characterization of the $Al_{0.20}Ga_{0.80}As$/GaAs heterostructures. In the PR spectrum, the 'C' peak is confirmed as the carbon defect with residual impurity originating from the growth process. After annealing, binding energy is relatively weak with As evaporation being done to increase Ga. Also obtained is the electric field value according to annealing temperature ($300{\sim}800^{\circ}C$).

• Journal of the Korean Institute of Telematics and Electronics
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• v.27 no.3
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• pp.79-85
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• 1990

Monte Carlo simulation of hot-electron transport in $Al_{0.48}In_{0.52}As/Ga_{0.47}In_{0.53}$ As modulation-doped structure has been performed in which the nonparabolicity in $\Gamma$ valley is taken into account. The calculated results show that the inclusion of the nonparabolicty effect results in a huge decrease in drift velocity.

• Journal of the Korean Vacuum Society
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• v.17 no.4
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• pp.353-358
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• 2008

In order to increase extraction efficiency of AlGaInP-based vertical RED LEDs, chemical wet etching technique was produced by using a roughened surface with triangle-like morphology. A commonly used $H_3PO_4$-based solution was applied for chemical wet etching. The light extraction of AlGaInP LED was related to the n-side roughed surface morphology. The morphology of roughed surface is analyzed by the atomic force microscope (AFM). As a result, the roughed surface AlGaInP LED has a root-mean-square (RMS) roughness of 44 nm. The brightness shows 41% increase after roughening n-side surface, as compared to the ordinary flat surface LED.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.28A no.11
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• pp.902-909
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• 1991

A reproducible selective dry etch process of GaAs/AlGaAs Heterostructures for High Electron Mobility Transistor(HEMT) Device fabrication is developed. Using RIE mode with $CCl_{2}F_{2}$ as the basic process gas, the observed etch selectivity of GaAs layer with respect to GaAs/$Al_{0.3}Ga_{0.7}$As is about 610:1. Severe polymer deposition problem, parialy generated from the use of $CCl_{2}F_{2}$ gas only, has been significantly reduced by adding a small amount of He gas or by $O_{2}$ plasma ashing after etch process. In order to obtain an optimized etch process for HEMT device fabrication, we com pared the properties of the wet etched Schottky contact with those of the dry etched one, and set dry etch condition to approach the characteristics of Schottky diode on wet etched surface. By applying the optimized etch process, the fabricated HEMT devices have the maximum transconductance $g_{mext}$ of 224 mS/mm, and have relatively uniform distribution across the 2inch wafer in the value of 200$\pm$20mS/mm.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.103-103
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• 2010

저밀도 양자점은 단일 광자 소자의 활성층으로 주목받고 있다. 단일 광자 소자의 연구를 위 해서는 단일광자를 측정하는 것이 필수적이며, 실리콘을 이용한 측정장비를 사용하는 것이 효율적이고 가격면에서 유리하다. 따라서, 일반적으로 적외선 영역에서 발광파장을 가지는 In(Ga)As/GaAs 양자점보다는 800nm보다 짧은 파장영역에서 발광특성을 가지는 양자점을 사용하는 것이 필수적이다. 본 연구에서는 AlGaAs 물질 위에 S-K 성장방법을 이용하여 InAs 양자점을 성장하였고, 그 발광특성을 분석하였다. 저온에서 측정한 PL 결과, InAs 양자점이 없는 시료의 경우 GaAs 기판에 의한 발광특성만 보이는데 비해, 양자점이 있는 시료는 740nm와 788nm에서 추가적인 발광특성을 보이는 것을 알 수 있다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.4
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• pp.354-358
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• 2004

In this thesis, an analytical model for Ⅰ-Ⅴ characteristics of an n-AlGaAs/GaAs Delta doped HEMT is proposed. 2-dimensional electron gas density, and conduction band edge profile are calculated from a self-consistent iterative solution of the Poisson equation. Parameters, e.g., the saturation velocity, 2-dimensional electron gas concentration, thickness of the doped and undoped layer(AlGaAs, GaAs, spacer etc.,) are in good agreement with the independent calculations.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.840-843
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• 2001

In this study, temperature dependency of current gain for AlGaAs/GaAs/GaAs HBT is analytically proposed over the temperature range between 300K and 600K. Energy bandgap, effective mass, intrinsic carrier concentration are considered as temperature dependent parameters. Collector current which is numerically calculated is then analytically expressed to enhance the speed of calculation for current gain. From the results, current gain decreases as the temperature increases. These results will be used to expect the unity current gain frequency f$_{T}$ in conjunction with emitter-base and collector- base capacitances.s.

• Journal of the Korean Institute of Telematics and Electronics
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• v.21 no.3
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• pp.60-65
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• 1984

In this paper, we have used symmetrical GaAs/(Ga, Al) As DH-LED as a model for the optimization of frequency response which is the most important design parameter of the optical communication-LED. And optimum design parameters have been chosen to improve performance factors of the DH-LED by computer simulation. This is for the purpose of systematic consideration of the interrelation of the physical parameters such as impurity concentration of the active layer, thickness of the active layer, minority carrier lifetime, space charge capacitance and injected current density.

• New & Renewable Energy
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• v.5 no.4
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• pp.34-37
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• 2009

Using six SMD(surface mount device) type AlGaAs/GaAs single junction solar cells connected in series, a power source was fabricated for a white GaN LED. The electrical properties of the power source was measured and analyzed under one sun (100mW/$cm^2$) and various indoor light (300 - 900 lux) conditions. Under 600 lux indoor light condition, output power was 17.06 ${\mu}W$ and it was 30.75 ${\mu}W$ under 900 lux indoor light condition. Using the fabricated solar cell power supply, we have turned on the white GaN LED. It was worked well under 15 ${\mu}W$(at 480 lux) power supplied from solar cell array. This kind of solar cell power supply can be used as a power source for ubiquitous sensor network (USN).

• Proceedings of the IEEK Conference
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• 2000.06b
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• pp.12-15
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• 2000

In this paper, we have fabricated the PHEMT's with AlGaAs/InGaAs/GaAs and measured characteristics of DC and frequencies. The PHEMT's has a 0.35$\mu\textrm{m}$ gate length, gate width of 60$\mu\textrm{m}$ and 80$\mu\textrm{m}$, and fingers of 2 and 4. From the measurements results for the 60$\mu\textrm{m}$ ${\times}$ 2 PHEMT's, we obtained 1.2V of Vk, -3.5V of Vp, 46mA of Idss, 221mS/mmof gm, and 3.6dB of S$\sub$21/ gain, 45GHz of f$\sub$T,/ 100GHz of fmax. And, in case of 80$\mu\textrm{m}$ ${\times}$ 4 PHEMT's, we obtained 1.2V of Vk, -4.5V of Vp, 125mA of Idss, 198mS/mm of gm, and 2.0dB of S$\sub$21/ gain. 44GHz of f$\sub$T/, 70GHz of fmax at 35GHz frequency. Also, MAG are decreased as a number of finger are Increased.