• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2007년도 제32회 학술대회 초록집
• /
• pp.104-104
• /
• 2007

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.146-147
• /
• 2012

InP 기판위에 자발성장법으로 성장된 InAs 양자점은 $1.55{\mu}m$ 영역에서 발진하는 양자점 반도체 레이저 다이오드 및 광 증폭기를 제작할 수 있기 때문에 많은 관심을 받고 있다. 광통신 대역의 $1.55{\mu}m$ 반도체 레이저 다이오드 및 광 증폭기 분야에서 InAs/InP 양자점이 많은 관심을 받고 있으나, InAs/GaAs 양자점에 비해 제작이 어려운 단점을 가지고 있다. InAs/InP 양자점은 InAs/GaAs 양자점에 비해 격자 불일치가 작아 양자점의 크기가 크고 특히 As 계 박막과 P 계박막의 계면에서 V 족 원소 교환 반응으로 계면 특성 저하가 발생하여 성장이 까다롭다. As 과 P 간의 교환반응은 성장온도와 V/III 에 의해 크게 영향을 받는 것으로 보고되었다. 그러나, P계 InGaAsP 박막 위에 InAs 성장 시 발생하는 As/P 교환반응에 대한 연구는 매우 적다. 본 연구에서는 InGaAsP 박막 위에 InAs 양자점 성장 시 GI (growth interruption)에 의한 As/P 교환반응이 InAs 양자점의 형상 및 광학적 특성에 미치는 영향을 연구하였다. 시료는 수직형 저압 Metal Organic Chemical Vapor Deposition (MOCVD)를 이용하여 $520^{\circ}C$의 온도에서 성장하였다. 그림1(a) 구조의 양자점은 InP (100) 기판위에 InP buffer layer를 성장한 후 InP와 격자상수가 일치하는 $1.1{\mu}m$ 파장의 InGaAsP barrier를 50 nm 성장하였다. 그 후 As 분위기 하에서 다양한 GI 시간을 주었고 그 위에 InAs 양자점을 성장하였다. 양자점 성장 후 InGaAsP barrier를 50 nm, InP capping layer를 50 nm 성장하였다. AFM측정을 위해 InP capping layer 위에 동일한 GI 조건의 InAs/InGaAsP 양자점을 성장하였고 양자점 성장 후 As분위기 하에 온도를 내려주었다. 그림1(b) 구조의 양자점은 그림1(a) 와 모든 조건은 동일하나 InAs 양자점과 InGaAsP barrier 사이에 GaAs 2ML를 삽입한 구조이다. 양자점 형상 특성 평가는 Atomic force microscopy를 이용하였으며, 광특성 분석은 Photoluminescence를 이용하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2010년도 제39회 하계학술대회 초록집
• /
• pp.297-297
• /
• 2010

Precise control of the position and density of doping elements at the nanoscale is becoming a central issue for realizing state-of-the-art silicon-based optoelectronic devices. As dimensions are scaled down to take benefits from the quantum confinement effect, however, the presence of interfaces and the nature of materials adjacent to silicon turn out to be important and govern the physical properties. Utilization of visible light is a promising method to overcome the efficiency limit of the crystalline Si solar cells. Si quantum dots (QDs) have been proposed as an emission source of visible light, which is based on the quantum confinement effect. Light emission in the visible wavelength has been reported by controlling the size and density of Si QDs embedded within various types of insulating matrix. For the realization of all-Si QD solar cells with homojunctions, it is prerequisite not only to optimize the impurity doping for both p- and n-type Si QDs, but also to construct p-n homojunctions between them. In this study, XPS and SIMS were used for the development of p-type and n-type Si quantum dot solar cells. The stoichiometry of SiOx layers were controlled by in-situ XPS analysis and the concentration of B and P by SIMS for the activated doping in Si nano structures. Especially, it has been experimentally evidenced that boron atoms in silicon nanostructures confined in SiO2 matrix can segregate into the Si/$SiO_2$ interfaces and the Si bulk forming a distinct bimodal spatial distribution. By performing quantitative analysis and theoretical modelling, it has been found that boron incorporated into the four-fold Si crystal lattice can have electrical activity. Based on these findings, p-type Si quantum dot solar cell with the energy-conversion efficiency of 10.2% was realized from a [B-doped $SiO_{1.2}$(2 nm)/$SiO_2(2\;nm)]^{25}$ superlattice film with a B doping level of $4.0{\times}10^{20}\;atoms/cm^2$.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.154-154
• /
• 2011

자발형성법(Self-assembled)을 이용한 InAs 양자점(Quantum dots)은 성장법의 고유한 물리적 한계로 길이방향에 대한 수직방향 비율(Aspect ratio, AR)이 상대적으로 작은 값을 갖는다. 기존에 보고된 바에 따르면 GaAs 기판에 형성한 InAs 양자점은 일반적으로 AR이 0.3 정도를 보인다. 이러한 높이가 상대적으로 낮은 InAs 양자점은 수직방향으로 운반자(Carrier)의 파동함수 (Wave-function) 구속이 작게 되어 나노 양자점 구조의 0차원적 특성이 저하되게 된다. 본 논문에서는 Arsenic 차단법(Interruption technique)을 이용한 수정자발형성법(Modified self-assembled method, MSAM)으로 InAs 양자점(MSAM-InAs 양자점)을 형성하고 성장 변수에 따라 광 및 구조적 특성을 평가하여 0차원 순도를 분석하였다. MSAM InAs 양자점을 성장하고 12 nm 두께의 GaAs spacer 층을 증착한 후 $600^{\circ}C$에서 30초 동안 Arsenic 분위기에서 열처리(Annealing)를 수행 한 후 다시 InAs을 증착 하였다. 이러한 과정을 5번 반복하여 높이 방향으로 형상을 개선시킨 InAs 양자점을(Vetically-controlled MSAM, VCMSAM) 성장하였다. 기존 자발형성법을 이용한 InAs 양자점과 MSAM-InAs 양자점 단일층 구조를 기준시료로 성장하였다. 상온 포토루미네슨스(Photoluminescence, PL) 실험에서 단일 MSAM InAs 양자점 및 VCMSAM 양자점 시료의 발광에너지는 각각 1.10 eV와 1.13 eV를 나타내었다. VCMSAM InAs 양자점 시료의 PL세기는 단일 MSAM 양자점보다 3.4배 증가되어, 확연히 높게 나타나는 결과를 보였다. 이러한 결과는 높이 방향으로 운반자의 파동함수 구속력이 증가하여 구속준위 (Localized states)의 전자-정공의 파동함수중첩(Overlap integral)이 개선된 것으로 설명할 수 있다. 투과전자현미경(Transmission electron microscopy) 및 원자력간 현미경(Atomic force microscopy)을 이용하여 구조적 특성을 평가하고 이를 비교 분석한 결과를 보고한다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.311-311
• /
• 2013

The resistance switching memory devices have several advantages to take breakthrough for the limitation of operation speed, retention, and device scale. Especially, the metal-oxide materials such as ZnO are able to fabricate on the flexible and visible transparent plastic substrate. Also, the quantum dots (QDs) embedded in dielectric layer could be improve the ratio between the low and the high resistance becauseof their Coulomb blockade, carrier trap and induced filament path formation. In this study, we irradiated 0.2-MeV-electron beam on the ZnO/QDs/ZnO structure to control the defect and oxygen vacancy of ZnO layer. The metal-oxide QDs embedded in ZnO layer on Pt/glass substrate were fabricated for a memory device and evaluated electrical properties after 0.2-MeV-electron beam irradiations. To formation bottom electrode, the Pt layer (200 nm) was deposited on the glass substrate by direct current sputter. The ZnO layer (100 nm) was deposited by ultra-high vacuum radio frequency sputter at base pressure $1{\times}10^{-10}$ Torr. And then, the metal-oxide QDs on the ZnO layer were created by thermal annealing. Finally, the ZnO layer (100 nm) also was deposited by ultra-high vacuum sputter. Before the formation top electrode, 0.2 MeV liner accelerated electron beams with flux of $1{\times}10^{13}$ and $10^{14}$ electrons/$cm^2$ were irradiated. We will discuss the electrical properties and the physical relationships among the irradiation condition, the dislocation density and mechanism of resistive switching in the hybrid memory device.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.289.1-289.1
• /
• 2014

In this study, we made a organic thin film device in MIS(Metal-Insulator-Semiconductor) structure by using PVP (Poly vinyl phenol) as a insulating layer, and CdSe/ZnS nano particles which have a core/shell structure inside. We dissolved PVP and PMF in PGMEA, organic solvent, then formed a thin film through a spin coating. After that, it was cross-linked by annealing for 1 hour in a vacuum oven at $185^{\circ}C$. We operated FTIR measurement to check this, and discovered the amount of absorption reduced in the wave-length region near 3400 cm-1, so could observe decrease of -OH. Boonton7200 was used to measure a C-V relationship to confirm a properties of the nano particles, and as a result, the width of the memory window increased when device including nano particles. Additionally, we used HP4145B in order to make sure the electrical characteristics of the organic thin film device and analyzed a conduction mechanism of the device by measuring I-V relationship. When the voltage was low, FNT occurred chiefly, but as the voltage increased, Schottky Emission occurred mainly. We synthesized CdSe/ZnS and to confirm this, took a picture of Si substrate including nano particles with SEM. Spherical quantum dots were properly made. Due to this study, we realized there is high possibility of application of next generation memory device using organic thin film device and nano particles, and we expect more researches about this issue would be done.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.97-97
• /
• 2010

We demonstrate the hybrid polymer-quantum dot based multi-functional device (Organic bistable devices, Light-emitting diode, and Photovoltaic cell) with a single active-layer structure consisting of CdSe/ZnS semiconductor quantum-dots (QDs) dispersed in a poly N-vinylcarbazole (PVK) and 1,3,5-tirs- (N-phenylbenzimidazol-2-yl) benzene (TPBi) fabricated on indium-tin-oxide (ITO)/glass substrate by using a simple spin coating technique. The multi-functionality of the device as Organic bistable device (OBD), Light Emitting Diode (LED), and Photovoltaic cell can be successfully achieved by adding an electron transport layer (ETL) TPBi to OBD for attaining the functions of LED and Photovoltaic cell in which the lowest unoccupied molecular orbital (LUMO) level of TPBi is positioned at the energy level between the conduction band of CdSe/ZnS and LiF/Al electrode (band-gap engineering). Through transmission electron microscopy (TEM) study, the active layer of the device has a p-i-n structure of a consolidated core-shell structure in which semiconductor QDs are uniformly and isotropically adsorbed on the surface of a p-type polymer core and the n-type small molecular organic materials surround the semiconductor QDs.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
• /
• pp.293-294
• /
• 2011

It is known that semiconductor quantum-dot (QD) heterostructures have superior zero-dimensional quantum confinement, and they have been successfully applied to semiconductor laser diodes (QDLDs) for optical communication and infrared photodetectors (QDIPs) for thermal images [1]. The self-assembled QDs are normally formed at Stranski-Krastanov (S-K) growth mode utilizing the accumulated strain due to lattice-mismatch existing at heterointerfaces between QDs and cap layers. In order to increase the areal density and the number of stacks of QDs, recently, sub-monolayer (SML)-thick QDs (SQDs) with reduced strain were tried by equivalent thicknesses thinner than a wetting layer (WL) existing in conventional QDs (CQDs) by S-K mode. Despite that it is very different from CQDs with a well-defined WL, the SQD structure has been successfully applied to QDIP[2]. In this study, optical characteristics are investigated by using photoluminescence (PL) spectra taken from self-assembled InAs/GaAs QDs whose coverage are changing from submonolayer to a few monolayers. The QD structures were grown by using molecular beam epitaxy (MBE) on semi-insulating GaAs (100) substrates, and formed at a substrate temperature of 480$^{\circ}C$ followed by covering GaAs cap layer at 590$^{\circ}C$. We prepared six 10-period-stacked QD samples with different InAs coverages and thicknesses of GaAs spacer layers. In the QD coverage below WL thickness (~1.7 ML), the majority of SQDs with no WL coexisted with a small amount of CQDs with a WL, and multi-peak spectra changed to a single peak profile. A transition from SQDs to CQDs was found before and after a WL formation, and the sublevel of SQDs peaking at (1.32${\pm}$0.1) eV was much closer to the GaAs bandedge than that of CQDs (~1.2 eV). These revealed that QDs with no WL could be formed by near-ML coverage in InAs/GaAs system, and single-mode SQDs could be achieved by 1.5 ML just below WL that a strain field was entirely uniform.

• International Journal of Computer Science & Network Security
• /
• 제22권6호
• /
• pp.91-96
• /
• 2022

The photocatalytic degradation of salicylic acid takes place in several stages involving coupled phenomena, such as the transport of molecules and the chemical reaction. The systems of transport equations and the photocatalytic reaction are numerically solved using COMSOL Mutiphysics (CM) simulation software. CM will make it possible to couple the phenomena of flow, the transport of pollutants (salicylic acid) by convection and diffusion, and the chemical reaction to the catalytic area (bauxite or TiO2 doped by nanoparticles). The simulation of the conversion rate allows to correctly fit the experimental results. The temporal simulation shows that the reaction reaches equilibrium after a transitional stage lasting over one minute. The outcomes of the study highlight the importance of diffusion in the boundary layer and the usefulness of injecting micro-agitation into the microchannel flow. Under such conditions, salicylic acid degrades completely.

• 한국진공학회지
• /
• 제22권1호
• /
• pp.37-44
• /
• 2013

본 연구에서는 양자점(quantum dot, QD)에서의 전하트랩이 태양전지의 특성에 미치는 영향을 조사하기 위하여, GaAs 모체 태양전지(MSC)의 활성층에 InAs/GaAs QD을 삽입한 $p^+-QD-n/n^+$ 태양전지(QSC)를 제작하여 그 특성을 비교 조사하였다. Stranski-Krastanow (SK)와 준단층(quasi-monolayer, QML)의 2종류 QD를 도입하였으며, 표준 태양광(AM1.5)에서 얻은 전류-전압 곡선으로부터 태양전지의 특성인자(개방전압($V_{OC}$), 단락전류($I_{SC}$), 충만도(FF), 변환효율(CE))를 결정하였다. SK-QSC의 FF값은 80.0%로 MSC의 값(80.3%)과 비슷한 반면, $V_{OC}$와 $J_{SC}$는 각각 0.03 V와 $2.6mA/cm^2$만큼 감소하였다. $V_{OC}$ 및 $J_{SC}$ 감소 결과로 CE는 2.6% 저하되었는데, QD에 의한 전하트랩이 주요 원인으로 지적되었다. 전하트랩을 완화시키기 위한 구조로서 QML-QD 기반 태양전지를 본 연구에서 처음 시도하였으나, 예측과는 달리 부정적 결과를 보였다.