• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 춘계학술대회 및 기술 세미나 논문집 디스플레이 광소자
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• pp.67-68
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• 2008

A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

• 한국재료학회지
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• 제13권3호
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• pp.191-194
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• 2003

The influence of on ion beam irradiation to the indium tin oxide (ITO) substrate on the performance of the organic light-emitting diodes (OLEDs) was studied. ITO films were used as the transparent anode of OLEDs with poly(2-methoxy-5-(2'-ethylhexyloxy)-1,4-phenylenevinylene) (MEH-PPV) as a hole-injection/transport layer. Oxygen and argon plasma treatment of ITO resulted in a change in the work function and the chemical composition. For plasma treated ITO anodes, the device efficiency clearly correlated with the value of the work function. We also discussed the implications of our experimental study in relation to the modification of the ITO surface composition, transmittance, reflectance, and water contact angle (WCA).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.325-326
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• 2009

We studied the effect of ITO surface treatment by using $O_2$ plasma to enhance the emission efficiency of the Organic Light Emitting Diodes (OLEDs). The luminance efficiency and the operational stability were improved with an ITO anode treated at the optimized conditions.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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• pp.137-140
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• 2004

We treated $O_2$ plasma on ITO thin film using RIE (Reactive Ion Etching) system, and analyzed the ingredient of ITO thin film according to change of processing conditions. The ingredient analysis of ITO thin film was used by EDS (Energy Dispersive Spectroscopy) and XPS (X-ray Photoelectron Spectroscopy) to compare and analyze the ingredient of bulk and surface. We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by using AFM (Atomic Force Microscope). Finally, we fabricated OLEDs (Organic Light-Emitting Diodes) device using substrate that was treated optimum ITO surface. The result of the study for electrical and optical properties using I V L System (Flat Panel Display Analysis System), we confirmed that electrical properties (I-V) and optical properties (L-V) were improved.

• 한국표면공학회지
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• 제37권3호
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• pp.146-151
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• 2004

Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputtering. A two-turn rf coil was inserted in the process chamber between the substrate and magnetron for the generation of ICP. The substrates were not heated intentionally. Subsequent post-annealing treatment for as-deposited ITO films was not performed. Low-temperature deposition technique is required for ITO films to be used with heat sensitive plastic substrates, such as the polycarbonate and acrylic substrates used in LCD devices. The surface roughness of the ITO films is also an important feature in the application of OLEDs along with the use of a low temperature deposition technique. In order to obtain optimum ITO thin film properties at low temperature, the depositions were carried out at different condition in changing of Ar and $O_2$ gas mixtures, ICP power. The electrical, optical and structural properties of the deposited films were characterized by four-point probe, UV/VIS spectrophotometer, atomic force microscopy(AFM) and x-ray diffraction (XRD). The electrical resistivity of the films was -l0$^{-4}$ $\Omega$cm and the optical transmittance in the visible range was ＞85%. The surface roughness ( $R_{rms}$) was -20$\AA$.>.

• 조명전기설비학회논문지
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• 제26권11호
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• pp.104-108
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• 2012

Flexible organic thin film solar cell device with Bulk Hetero-Junction (BHJ) structure was fabricated with blended conjugated polymer of PCDTBT : $PC_{71}BM$ as active layer. Surface of ITO anode for the organic solar cell device was treated with ozone. The organic solar cell device with bare ITO showed short circuit current density ($J_{sc}$) of $8.2mA/cm^2$, open-circuit voltage ($V_{oc}$) of 0.73V, fill factor (FF) of 0.36, and power conversion efficiency (PCE) of 2.16%, respectively. The organic solar cell device with ozone treated ITO anode revealed distinctively improved performance parameters:$J_{sc}$ of $9.8mA/cm^2$, $V_{oc}$ of 0.82V, FF of 0.43, PCE(${\eta}$) of 3.42%.

• Journal of Electrochemical Science and Technology
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• 제3권1호
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• pp.24-28
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• 2012

The electrocatalytic activities and surface roughness of indium-tin-oxide (ITO) electrodes have been investigated after thermal treatment at 100, 150, or $200^{\circ}C$ for 30 min, 2 h, or 8 h. To check electrocatalytic activities, the electrochemical behavior of four electroactive species (p-hydroquinone, $Ru(NH_3){_6}^{3+}$, ferrocenemethanol, and $Fe(CN){_6}^{4-}$) has been measured. The electron transfer rate for p-hydroquinone oxidation and ferrocenemethanol oxidation increases with increasing the incubation temperature and the incubation period of time, but the rate for $Ru(NH_3){_6}^{3+}$ is similar irrespective of the incubation temperature and period because $Ru(NH_3){_6}^{3+}$ undergoes a fast outer-sphere reaction. Overall, the electrocatalytic activities of ITO electrodes increase with increasing the incubation temperature and period. The surface roughness of ITO electrodes increases with increasing the incubation temperature, and the thermal treatment generates many towering pillars as high as several tens of nanometer.

• 한국표면공학회지
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• 제33권5호
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• pp.349-355
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• 2000

Indium tin oxide (ITO) thin films have been deposited on PET (polyethylene terephthalate) and glass substrates by a do magnetron sputter method of powder target without heat treatments such as substrate heater and post heat treatment. During the sputtering deposition, sputtering parameters such as sputtering power, working pressure, oxygen gas mixture, film thickness and substrate-target distance are important factors for the high quality of ITO thin films. The structural, electrical and optical properties of as-deposited ITO oxide films are investigated by sputtering power, oxygen partial pressure and films thickness among the several sputtering conditions. XRD patterns of ITO films are affected by sputtering power and pressure. As the power and pressure are increased, (411) and (422) peaks of ITO films are grown strongly. Electrical resistivity is also increased, as the sputtering power and pressure are increased. Transmittance of ITO thin films in the visible light ranges is lowered with an increase of sputtering power and film thickness. Reflectance of ITO films in infra-red region is decreased, as the power and pressure is increased.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1292-1294
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• 2007

In this report, the effects of chemical surface treatments of ITO gate electrodes of OTFTs have been studied by using acid and base solutions. As a result, it is observed that the threshold voltage of OTFTs could be influenced and modified by the surface treatments. The device with an ITO gate electrode surface-treated by a base solution shows the lowest threshold voltage of -7.66 V, while the threshold voltages are about -13.51 V and -15.3 V for the devices without a surface treatment and with the acid solution treatment, respectively. It is thought that the work function of ITO electrode surface might be affected by the surface treatments, thereby influencing the threshold voltage.

• 전기학회논문지
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• 제60권12호
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• pp.2276-2280
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• 2011

An indium-tin-oxide (ITO) is normally used as a substrate in organic photovoltaic cells. We examined the effects of an oxygen ($O_2$) plasma treatment on the electrical properties of an organic photovoltaic cell. Experiments with four-point probe method and atomic force microscope revealed the lowest surface resistance of 17.64 ${\Omega}$/sq and the lowest average surface roughness of 1.39 nm at the plasma treatment power of 250 W. A device structure of ITO/CuPc/$C_{60}$/BCP/$Cs_2CO_3$/Al was fabricated by thermal evaporation with and without the plasma treated ITO substrate. It was found that the power conversion efficiency of the cell with the plasma treated ITO is 65 % higher than the one without the plasma treated ITO.