• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.863-866
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• 2008

For the cost reduction in the fabrication of display panels, a reverse moving system was equipped to a compacted in-line wet etch/cleaning system. For the effect of the alternating movement of substrate on the wet etch process, ITO layers were etched in various moving modes of substrates and the results were compared and analyzed.

• Journal of the Korean institute of surface engineering
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• v.42 no.6
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• pp.267-271
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• 2009

Multicomponent transparent conducting oxide films were deposited on glass substrates at 150 by dual magnetron sputtering of AZO and ITO targets. In the case of mixing a limited amount of ITO (10W), resistivity of TCO films was significantly increased compared to the AZO film; from $3.5{\times}10^{-3}$ to $9.7{\times}10^{-3}{\Omega}{\cdot}cm$. Deterioration of the electrical conductivity is attributed to the decreases in carrier concentration and Hall mobility. Improvement of the conductivity could be obtained for the films prepared with ITO powers larger than 40 W. The lowest resistivity ($\rho$) of $7.3{\times}10^{-4}{\Omega}{\cdot}cm$ was achieved when ITO power was 100 W. Effects of $H_2$ incorporation on the electrical and optical properties of AZO-ITO films were investigated in this work. Addition of small amount of hydrogen resulted in the increase of carrier concentration and the improvement of electrical conductivity. It is apparent that the roughness of AZO-ITO films decreases dramatically after the transition of microstructure from polycrystalline to amorphous phase, which gives practical advantages such as an excellent uniformity of surface and a high etching rate. AZO-ITO films grown at sputtering ambient with hydrogen gas are expected to be applicable to optoelectronic devices such as organic light emitting diodes and flexible displays due to their sufficient electrical and structural properties.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.818-821
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• 2003

Sn-doped $In_{2}O_{3}$ (ITO) thin film is one of the materials widely on research not only in the academic fields but also in industrial fields because of their transparency, high conductivity and good adhesion characteristics on substrate. ITO thin films are usually preferred oriented to one of the (222), (400), and (440) planes during crystallization process, which is dependent on processing variables. The preferred orientation affects electrical, optical and etching properties of the films. In this study, thin films of preferred oriented in different orientation were fabricated by controlling processing variables. The crystallization behavior, grain size, surface roughness, transparency and electrical properties of the thin films in different orientation were examined.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.477-477
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• 2010

태양전지용 TCO(Transfer Conductivity Oxide)는 가시광선 영역에서 높은 광 투과도(optical transmittance), 낮은 저항(resistivity), 우수한 박막 표면 거칠기(roughness) 등의 특성이 요구된다. 현재 가장 많이 사용되는 투명전극은 ITO(Indium Tin Oxide)가 보편적이다. 하지만 ITO에 사용되는 원료 재료인 In이 상대적으로 열적 안정성이 낮아 제조과정에서 필수적으로 수반되는 열처리가 제한적이며, 높은 원료 단가로 인하여 경제적인 측면에서 약점으로 지적되고 있다. 이러한 ITO 투명전극의 대체 재료로서 최근 ZnO 박막의 연구가 활발히 이루어지고 있다. MOCVD(Metal-Organic chemical vapor deposition)로 Soda lime glass 기판위에 약 900nm의 두께로 증착한 BZO(Boron-zinc-oxide)박막을 수소 플라즈마 처리공정을 한 뒤 산소 플라즈마를 이용하여 재처리 하였다. 산소 플라즈마 처리 공정은 RIE(Reactive Ion Etching)방식의 플라즈마 처리 장치를 사용하였고 공정 조건은 13.56 MHz의 RF주파수를 사용하여 RF 전력, 압력, 기판 온도 등을 변화시켜 BZO 박막의 전기적 특성을 측정 및 분석하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.250.2-250.2
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2006.08a
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• pp.123-123
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• 2006

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1530-1533
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• 2005

We investigated under-gate type carbon nanotube field emitter arrays (FEAs) for back light unit (BLU) in liquid crystal display (LCD). Gate oxide was formed by wet etching of ITO coated glass substrate instead of depositing $SiO_2$ on the glass substrate. Wet etching is easer and simpler than depositing and etching of thick gate oxide to isolate the gate metal from cathode electrode in triode. Field emission characteristic s of triode structure were measured. The maximum current density of 92.5 ${\mu}A/cm^2$ was when the gate and anode voltage was 95 and 2500 V, respectively at the anode-cathode spacing of 1500 ${\mu}m$.

• Transactions on Electrical and Electronic Materials
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• v.10 no.1
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• pp.1-4
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• 2009

Dry etching characteristics of indium tin oxide films and etch selectivities over photoresist films were investigated using $Cl_2/HBr$ inductively coupled plasma. From a Langmuir probe diagnostic system, it was observed that while the plasma temperature was kept nearly constant in spite of the change of the HBr mixing ratio, the positive ion density decreases rapidly with increasing the mixing ratio. On the other hand, a quadrupole mass spectrometer showed that the neutral HBr and Br species increased. The etching mechanism in the $HBr/Cl_2$ plasma was analyzed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.3
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• pp.146-150
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• 2014

As a method of simple patterning of transparent conductive oxide (TCO) films deposited on flexible substrates, laser direct etching was carried out on TCO films sputtered on polycarbonate (PC) substrates. As a result of different binding energies in TCO films, indium tin oxide (ITO) and indium gallium zinc oxide (IGZO) were more easily etched than zinc oxide with different $Nd:YVO_4$ laser beam conditions.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2010.05a
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• pp.795-797
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• 2010

습식 식각은 식각용액으로서 화학용액을 사용하는 공정으로 반응물이 기판표면에서 화학반응을 일으켜 표면을 식각하는 과정이며, 표면결합의 제거를 위한 식각연마와 폴리싱을 위한 식각, 그리고 구조적 형상 패턴등이 있다. 여기서 화학용액은 산화제 또는 환원제 역할을 하는 혼합용액으로 구성된다. 습식 식각 시 수${\mu}m$의 해상도를 얻기 위해서는 그 부식액의 조성이나, 에칭시간, 부식액의 온도 등을 고려하여야 한다. 또한 습식 식각 후 포토 레지스트를 제거하는 과정에서 포토 레지스트를 깨끗이 제거해야 하며, 제거공정 자체가 a-Si:H 박막을 부식 하지 않을 조건으로 행하여야 한다. 포토레지스트 제거 후 잔류 포토 레지스트를 제거하기 위해서 본 실험에서는 RCA-I 세척 기법을 사용한 후 D.I 로 린스 하였다. 본 실험에서 사용한 금속은 Cr, Al, ITO 로 모두 DC sputter 방법을 사용해서 증착하여 사용하였다. Cr박막은 $1300\AA$ 정도의 두께를 사용하였고, ITO (Indium Tin Oxide) 박막은 가시광 영역에서 투명하고 (80% 이상의 transmittance), 저저항 (Sheet Resistance : $50{\Omega}/sq$ 이하) 인 박막을 사용하였으며, 신호선으로 주로 사용되는 Al등의 증착조건에 따른 wet etching 특성을 조사하였다.