Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2006.08a
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- Pages.123-123
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- 2006
Infinitely high etch selectivity of indium tin oxide (ITO) layer to photoresist during $CH_4/H_2/Ar$ inductively coupled plasma (ICP) etching
- Kim D.Y. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Ko J.H. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Park M.S. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Lee N.E. (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
- Published : 2006.08.01
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