• Particle and aerosol research
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• v.11 no.4
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• pp.93-98
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• 2015

Particles which generated from plasma enhanced chemical vapor deposition (PECVD) during thin film deposition process can affect to the process yield. By using light extinction method, ISPM can measure particles in the large-diameter pipe (${\leq}300mm$). In our research, in-situ particle monitor (ISPM) sensor was installed at the 300 mm diameter exhaust-line to count the particles in each size. In-house flange for mounting the transmitting and receiving parts of ISPM was carefully designed and installed at a certain point of exhaust line where no plasma light affect to the light extinction measurement. Measurement results of trend changes on particle count in each size can confirm that ISPM is suitable for real-time monitoring of vacuum process.

• Journal of the Semiconductor & Display Technology
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• v.3 no.2
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• pp.1-4
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• 2004

An experimental study was conducted on the optimal configuration and size of ADFL(Aerodynamic Focusing Lens) which used in modified ISPM(In-Situ Particle Monitoring). The particle counting efficiency has been known as a function of distance and size of ADFL, thus we varied these parameters to find out the optimum values. From a result of experiment, it was found that two lenses and 6mm space between them showed a maximum particle measuring efficiency. To apply this modified ISPM to semiconductor manufacturing field, we need more experiment about the pressure change, flow rate, and input particle size.

• Journal of the Korean Vacuum Society
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• v.22 no.4
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• pp.175-180
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• 2013

We developed the contamination prevention module of an optical window for an In-Situ Particle Monitor (ISPM) system. the core part of the module is the generator of an ultrasonic wave and the module is to remove particles stuck to the window by the transfer of the wave force to the window surface. In order to enhance transfer efficiency of the waves the frequency of the ultrasonic wave was optimized and a low impedance material (plexiglass) and a soft sealing material (Si rubber) were used. The ISPM with the developed module was installed at the exhaust line of a BPSG CVD equipment and the effect of the module was verified.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.24 no.10
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• pp.1359-1367
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• 2000

In-situ particle monitors(ISPMs) are widely used for monitoring contaminant particles in vacuum-based semiconductor manufacturing equipment. In the present research, the performance of a Particle Measuring Systems(PMS) Vaculaz-2 ISPM at low pressures has been studied. We generated the uniform sized methylene blue particle beams using three identical aerodynamic lenses in the center of the vacuum line, and measured the detection efficiency of the ISPM. The effects of particle size, particle concentration, mass flow rate, system pressure, and arrangement of aerodynamic lenses on the detection efficiency of the ISPM were examined. Results show that the detection efficiency of the ISPM greatly depends on the mass flow rate, and the particle Stokes number. We also found that the optimum Stokes number ranges from 0.4 to 1.9 for the experimental conditions.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.22 no.11
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• pp.1564-1570
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• 1998

In-situ particle monitors(ISPMs) are widely used for monitoring contaminant particles in vacuum-based semiconductor manufacturing equipment. In the present research, the performance of a Particle Measuring Systems(PMS) Vaculaz-2 ISPM at subatmospheric pressures has been studied. We created uniform upstream conditions of particle concentration and measured the detection efficiency, the lower detection limit, and the size response of the ISPM using uniform sized methylene blue aerosol particles. The effect of particle size, particle velocity, particle concentration, and system pressure on the detection efficiency was examined. Results show that the detection efficiency of the ISPM decreases with decreasing chamber pressure, and with increasing mass flow rate. The lower detection limit of the ISPM, determined at 50 % of the measured maximum detection efficiency, was found to be about $0.15{\sim}0.2{\mu}m$, which is similar to the minimum detectable size of $0.17{\mu}$ given by the manufacturer.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2003.05a
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• pp.59-63
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• 2003

본 연구에서는 저압 상태인 반도체 제조장비의 입자오염을 측정하는데 많이 사용되고 있는 ISPM 의 성능 특성을 실험적 기법으로 조사하였다. 2 개의 공기역학적 렌즈를 사용하여 주입된 219.41 nm 크기의 PSL 실험 입자 빔을 생성시켰다 또한 기존에 보고된 실험조건에 따라 chamber 압력, 유입유량을 각각 1 torr와 32 sccm 으로 맞추었으며, 입자 농도를 두 가지로 변화시켜 실험하였다. 연구에 사용된 본 연구센터의 ISPM 장비는 250 nm 근처의 입자 크기에 대하여 비교적 정확한 특성을 나타냄을 알 수 있었다. 앞으로 본 실험에서는 사용된 ISPM 장비의 측정 환경에 맞는 렌즈 수, 렌즈 간격 , 적정 압력, 적정 입자 크기 등 조건들을 결정하여 실제 반도체 제조장비 공정 chamber 에 직접 부착하여 반도체 공정에 활용할 계획이다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.338-338
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• 2010

공정 중 발생하는 입자는 반도체 생산 수율에 가장 큰 영향을 끼치는 원인으로 파악되며, 생산 수율을 저하시키는 원인 중 70% 가량이 이와 관련된 것으로 알려져 있다. 현재 반도체 공정에서 입자를 계측하는데 사용하는 PWP (Particle per Wafer Pass) 방법은 표준 측정방법으로 널리 쓰이고 있으나, 실시간으로 입자의 양을 측정할 수 없고, Test wafer 사용에 따른 비용증가의 단점이 있어 공정 중에 입자를 실시간으로 측정할 수 있는 대안기술이 필요한 실정이다. ISPM (In-Situ Particle Monitoring)은 레이저 산란방식을 이용한 실시간 입자측정 장비로서 오염원 발생에 대한 즉각적인 대처와 조치가 가능하고 부가적인 추가 비용이 발생하지 않기 때문에 실시간 모니터링 장비가 없는 현재의 반도체 공정에 충분히 적용될 가능성이 있다. 특히 CVD 공정은 반도체 공정의 약 30%를 차지할 만큼 중요한 단계로 생성되는 오염입자 모니터링을 통해 공정 불량 유무를 판단할 수 있을 것으로 기대된다. 본 연구에서는 Silane 가스를 이용한 PECVD (Plasma Enhanced Chemical Vapor Deposition) 공정 중 발생되는 오염입자를 ISPM을 이용하여 실시간으로 측정하였다. 챔버 배기구에 두 가지 타입의 ISPM을 설치하고 공정압력, 유량, 플라즈마 파워를 공정변수로 하여 각각의 조건에서 발생되는 오염입자의 분포 변화를 실시간으로 측정하였으며 결과를 비교 분석하였다.

• Journal of the Korean Wood Science and Technology
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• v.46 no.3
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• pp.285-296
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• 2018

As a study for the verification of heat treated wood according to ISPM No. 15, the spectroscopic characteristics of the heat treated wood surface were analyzed. Various functional groups were observed on the IR spectrum, but it was difficult to find any particular difference between wood species, heat treatment time and storage period. HBI (hydrogen-bonding intensity) shows the change of the heat treated wood according to the storage time, but the change of wood with the heat treatment time was hard to be observed. On the PCA score plot, however, it was possible to sort the wood according to the heat treatment time of 60 minutes or 90 minutes in the species. The standards for classification of heat-treated wood in PCA were aromatic rings in lignin and C-H bending in cellulose, and these components were able to classify heat-treated wood by ISPM No. 15.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.253-253
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• 2013

본 실험에서는 전구체(Precursor)로 TMA (Tris methyl Aluminum)를 사용한 ALD (Atomic Layer Deposition)와 PEALD (Plasma Enhanced Atomic Layer Deposition) 공정 중 발생하는 입자(particle)를 ISPM (In-Situ Particle Mornitor)로 관찰하였다. ALD과 PEALD 공정에서 Al2O3 박막을 형성하기 위해서 반응가스(Reactant)로 각 각 H2O와 O2 plasma를 사용하였다. 이러한 차이로 인해서 진공 챔버(Vacuum Chamber) 안에서의 각기 다른 매커니즘에 의해서 Al2O3의 박막이 형성된다. 또한 공정 중 발생할 수 있는 파티클(Particle) 생성 매커니즘의 차이점을 가진다. ALD의 경우 전구체와 반응가스 사이에 충분한 purge가 이루어지지 않거나 dead zone이 존재할 경우 라인과 챔버 상에 잔류한 전구체와 반응가스에 의해서 불완전한 반응물로 파티클이 생성될 수 있다. 반면 PEALD 경우는 반응가스(Reactant)로 O2 plasma를 극부(localization)적으로 형성하여 박막을 형성하므로 반응가스의 잔류의 영향은 없으나 고에너지의 플라즈마에 의해서 물리적 영향에 의한 파티클이 생성될 수 있다. 공정 중 발생하는 입자(Particle)은 수율 감소와 박막의 물성에 영향을 미칠 수 있다. 그러므로 두 공정 중 발생하는 파티클을 ISPM으로 관찰하였고, 각 공정에서 형성된 박막의 두께 균일도, 표면의 형상(morphology), 화학적 조성 및 전기적 특성을 측정하였다. 이를 통해서 ALD와 PEALD의 파티클과 박막특성을 비교하였다.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.23 no.10
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• pp.1320-1326
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• 1999

Since it is not possible to generate spatially uniform particle distribution at low pressures in which in-situ particle monitors(ISPMs) are normally operated, it is of interest to investigate the response of an ISPM to particle beams at low pressures. The purpose of this study is to develop technique that can control the size of particle beams. In this study, particle beams were generated at low pressures by using identical aerodynamic lenses, and their shape and size were visualized by collecting uniform sized methylene blue aerosol particles on a filter media. It was found that the size of particle beams depends on the number of lens, the distance between lenses, and the downstream distance from the final lens. The size of particle beams decreases with increasing distance between lenses, and increases with increasing downstream distance from the final lens. The experimental results obtained in this work will be used to investigate performance of an ISPM at low pressures.