• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2005년도 ICCAS
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• pp.2301-2306
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• 2005

Even if there are lots of researches on localization using 2D range finder in static environment, very few researches have been reported for robust real-time localization of mobile robot in uncertain and dynamic environment. In this paper, we present a new localization method based on ICP(Iterative Closest Point) algorithm for navigation of mobile robot under dynamic or uncertain environment. The ICP method is widely used for geometric alignment of three-dimensional models when an initial estimate of the relative pose is known. We use the method to align global map with 2D scanned data from range finder. The proposed algorithm accelerates the processing time by uniformly sampling the line fitted data from world map of mobile robot. A data filtering method is also used for threshold of occluded data from the range finder sensor. The effectiveness of the proposed method has been demonstrated through computer simulation and experiment in an office environment.

• 전기학회논문지
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• 제65권5호
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• pp.888-894
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• 2016

In this paper, we describe a method for precisely measuring the abrasion of the railway using an image processing technique. To calculate the wear of the rails, we provided a method for accurately matching the standard rail profile data and the profile data acquired by the rail inspection vehicle. After the lens distortion correction and the perspective transformation of the measured profile data, we used ICP Algorithm for accurate profile data matching with the reference profile extracted from the standard rail drawing. We constructed the prototype of the Rail Profile Measurement System for High-speed Railway and the experimental result on the three type of the standard rail used in Korea showed the excellent profile matching accuracy within 0.1mm.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권2호
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• pp.79-82
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• 2004

The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technicology. Although most practical ICP operate at 13.56 [MHz]and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65[MHz]was discussed as functions of the ferrite thickness and distance by using the electromagnetic simulation software (Maxwell 2D).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.161-162
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• 2006

Scaling rules for TFT application devices have led to the necessity of ultra thin dielectric films and high-k dielectric layers. In this paper, The advantages of high concentration of nitrogen in silicon oxide layer deposited by using $N_2O$ in Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) reported about Ellipsometric measurement, Capacitance-Voltage characterization and processing conditions.

• 정보처리학회논문지:소프트웨어 및 데이터공학
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• 제5권9호
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• pp.401-410
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• 2016

3차원 정합이란 다시점에서 획득한 3차원 점군들을 정렬하는 기술로써 지난 수십 년간 많은 연구가 진행되고 있는 분야이다. 이러한 3차원 정합은 ICP(Iterative Closest Point) 알고리즘을 시작으로 많은 변형 ICP가 소개되고 있다. 하지만 ICP 계열의 알고리즘들은 최근접점을 대응점으로 간주하여 알고리즘을 수행한다. 그렇기 때문에 3차원 점군의 초기 오차가 큰 경우 정확한 대응점 탐색에 실패할 수 있다. 이런 문제점을 해결하기 위해 본 논문에서는 색상과 3차원 거리가 융합된 6차원 거리와 색상분포 유사도를 이용한다. 더 나아가 색상 분할 기반 적응형 샘플링을 이용하여 알고리즘 연산 속도를 감소시키고 성능을 향상시키는 것을 목표로 한다. 마지막으로 실험을 통해 기존의 방법과 본 논문에서 제안하는 방법의 성능을 비교한다.

• Journal of Information Display
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• 제3권2호
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• pp.26-30
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• 2002

Large area plasma source has been built for LCD etcher by an array of $2{\times}2$ ICP sources. Since only one RF power supply and one impedance matching network is used in this configuration, any difference in impedances of unit RF antennas causes unbalanced power delivery to the unit ICP. In order to solve this unavoidable unbalance, unit antenna is designed to have a movable tap, with which the inductance of each unit can be adjusted individually. The plasma density becomes symmetric and etch rate becomes more uniform with the impedance adjustment. The concept of adding axial time-varying magnetic field to the single ICP source is applied to the array ICP source, and is found to be effective in terms of etch rate and uniformity.

• 전기학회논문지
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• 제57권5호
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• pp.816-820
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• 2008

The RF inductive discharge of inductively couples plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. Although most practical ICPs operate at 13.56 [MHz] and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of RF matching systems and RF generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, We discussed simulation and experimental results when changing ferrite position in antenna.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.544-547
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• 2006

In this study, the characteristics of large area internal linear ICP sources of $1,020mm{\times}920mm$ (substrate area is $880mm{\times}660mm$) were investigated using a multiple linear antennas with U-type parallel connection. Using the multiple linear antennas with U-type parallel connection, a high plasma density of $2{\times}10^{11}/cm^3$ and a high power transfer efficiency of about 88% could be obtained at 5kW of RF power and with 20mTorr Ar. A low plasma potential of less than 26V and a low electron temperature of $2.6{\sim}3.2eV$ could be also obtained. The measured plasma uniformity on the substrate size of 4th generation $(880mm{\times}660mm)$ was about 4%, therefore, it is believed that the multiple linear antennas with U-type parallel connection can be successfully applicable to the large area flat panel display processing.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.1147-1150
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• 2003

The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology Although most practical ICPs operate at 13.56 (MHz) and 2.65 (MHz), the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65 (MHz) will be discussed, by using the electromagnetic simulation (Maxwell 2D).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 방전 플라즈마 유기절연재료 초전도 자성체연구회
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• pp.61-64
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• 2004

Recently, the RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. To the point of lighting sources, the electrodeless fluorescent lamps utilizing an inductively coupled plasma (ICP) have been objects of interest and research during the last decades, mainly because of their potential for extremely long life, high lamp efficacies, rapid power switching response. The electrodeless fluorescent lamp that is dealt with in this work comprises a bulb filled with rare gas and amalgam of vaporizable metal and has a coil provided with a winding around the ferrite. Current through a coil produces a magnetic field in the discharge space. The changing magnetic flux then produces an azimuthal electric field E around the coil, according to Faraday's laws of magnetic induction.