• 제목/요약/키워드: Hydrogen Chloride

검색결과 290건 처리시간 0.028초

Nature of the Hydrogen Chloride Induced Isomers of $\alpha$-Spinasterol

  • Woo, Won-Sick;Kang, Sam-Sik
    • 약학회지
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    • 제18권3호
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    • pp.217-227
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    • 1974
  • It was established that .alpha.-spinasterol (I) was isomerized by hydrogen chloride to a mixture of two isomers. These isomers were separated into each of components and identified as .DLETA.$^{8(14),22}$ -stigmastadienol (III) and ${\delta}$$^{14,22}$ -stigmastadienol (IV), respectively. The mass spectra of these compounds were found to be particularly suitable to idetify the position of nuclear double bond of sterols possessing 22 : 23 -double bond in side chain.

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Electrochemical behavior of dissolved hydrogen at Pt electrode surface in a high temperature LiOH-H3BO3 solution: Effect of chloride ion on the transient current of the dissolved hydrogen

  • Myung-Hee Yun;Jei-Won Yeon
    • Nuclear Engineering and Technology
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    • 제55권10호
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    • pp.3659-3664
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    • 2023
  • The electrochemical behavior of dissolved hydrogen (H2) was investigated at a Pt electrode in a high temperature LiOH-H3BO3 solution. The diffusion current of the H2 oxidation was proportional to the concentration of the dissolved H2 as well as the reciprocal of the temperature. In the polarization curve, a potential region in which the oxidation current decreases despite an increase in the applied potential between the H2 oxidation and the water oxidation regions was observed. This potential region was interpreted as being caused by the formation of a Pt oxide layer. Using the properties of the Cl- ion that reduces the growth rate of the Pt oxide layer, it was confirmed that there is a correlation between the Cl- ion concentration and the transient current of the H2 oxidation.

제올라이트 수지 및 ZnO, AgMnO3 등의 무기흡착제를 이용한 반도체 공정에서 사용되는 염산가스의 처리 및 측정에 관한 연구 (Study on the Treatment of Hydrogen Chloride Gas used in Semiconductor Process by using Gas Adsorption Agents such as Zeolite Resins, ZnO, and AgMnO3)

  • 박정준;임흥빈;황청수
    • 분석과학
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    • 제16권3호
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    • pp.218-225
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    • 2003
  • 반도체 공정에서는 많은 종류의 가스를 사용하는데 그들 중 염산 가스는 독성으로 인해 많은 환경오염 문제들을 야기 시키고 있다. 본 논문에서는 염산 가스를 기존의 제거 방식이 아닌 제올라이트수지 등의 흡착제들을 이용한 제거 방법 및 측정을 하는 연구를 수행하였다. 실험 장치는 실험조건을 고려하여 직접 설계 및 제작을 하였다. 그리고 각종 수지를 이용한 흡착제거정도를 비교하기 위하여 제올라이트 A, $Ag^+$ 이온으로 치환된 AgA 제올라이트, ZnO, $AgMnO_3$ 등의 수지를 이용하여 실험하였다. 가스의 분석은 적외선 분광기 (FT-IR)를 이용하여 정성 및 정량분석을 하여 각 각의 수지에 의한 염산 가스의 제거량을 계산함으로써 각 수지의 제거 효율을 확인, 비교하였다. 본 실험에서 사용된 수지들 중에서 ZnO 가 수지 1 g에 대해 0.067 g 의 HCl 가스를 제거하는 가장 좋은 결과를 나타내었다.

GIS를 활용한 고속도로 염화수소 가스 누출 시나리오 기반 리스크 평가 (Risk Assessment Based on Highway Hydrogen Chloride Gas Leakage Scenario Using GIS)

  • 김구윤;이재준;윤홍식
    • 대한원격탐사학회지
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    • 제37권3호
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    • pp.591-601
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    • 2021
  • 국내의 화학 산업이 지속적으로 발전이 이루어짐에 따라 화학물질의 취급량과 운송량은 매년 증가하고 있다. 우리나라 도로 화물운송은 90%이상을 차지하고 있으며, 화학물질 운송도 대부분 도로를 통해 이루어지고 있다. 이러한 화학물질 운송차량들은 사고가 발생하게 되면 대형사고로 이어질 수 있다. 운송차량은 1차 피해인 교통사고뿐만 아니라 2차 피해인 환경 피해 요인들인 수질오염, 토양오염 등을 발생시킬 가능성이 높다. 본 연구는 반포IC와 서초IC 구간을 연구지역으로 설정하여 염화수소 가스 누출에 대한 시나리오를 작성하여, ALOHA 프로그램을 사용하여 예측거리를 측정하고 거리에 따라 염화수소 가스가 도달한 시간을 분석하였다. 또한 GIS를 이용해 시간별로 발생한 피해 영역에 대해서 인구밀도를 이용한 리스크 평가를 수행하였다. 이를 통해 피해 영역에 대해서 예방·대응 방안의 필요성을 제시하였다.

Synthesis of Tris(silyl)methanes by Modified Direct Process

  • 이창엽;한준수;유복렬;정일남
    • Bulletin of the Korean Chemical Society
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    • 제21권10호
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    • pp.959-968
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    • 2000
  • Direct reaction of elemental silicon with a mixture of (dichloromethyl)silanes 1 $[Cl_3-nMenSiCHCl_2:$ n = 0 (a), n = 1(b), n = 2(c), n = 3(d)] and hydrogen chloride has been studied in the presence of copper catalyst using a stirred bed reactor equ ipped with a spiral band agitator at various temperatures from $240^{\circ}C$ to $340^{\circ}C.$ Tris(si-lyl) methanes with Si-H bonds, 3a-d $[Cl_3-nMenSiCH(SiHCl_2)_2]$, and 4a-d $[Cl_3-nMenSiCH(SiHCl_2)(SiCl_3)]$, were obtained as the major products and tris(silyl)methanes having no Si-H bond, 5a-d $[Cl_3-nMenSiCH(SiCl_3)_2]$, as the minor product along with byproducts of bis(chlorosilyl)methanes, derived from the reaction of silicon with chloromethylsilane formed by the decomposition of 1. In addition to those products, trichlorosilane and tetra-chlorosilane were produced by the reaction of elemental silicon with hydrogen chloride. The decomposition of 1 was suppressed and the production of polymeric carbosilanes reduced by adding hydrogen chloride to 1. Cad-mium was a good promoter for and the optimum temperature for this direct synthesis was $280^{\circ}C$.

무기산류에 대한 국내 작업환경측정 현황 분석 (Analysis of Exposure Levels for Inorganic Acids in Korea)

  • 박해동;박승현;정기효
    • 한국산업보건학회지
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    • 제31권3호
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    • pp.255-265
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    • 2021
  • Objectives: The purpose of this study is to analyze the exposure characteristics of inorganic acids. Methods: We analyzed exposure data (n = 363,146) for six inorganic acids (hydrogen fluoride, hydrogen bromide, hydrogen chloride, phosphoric acid, nitric acid, and sulfuric acid) collected between 2017 and 2019 in South Korea. Measurement characteristics and exposure levels (ELs) were analyzed by inorganic acid, industry category, enterprise size, and measurement year. Results: Measurement percentage dominated in time-weighted average (TWA, 91%) compared to short term exposure limit (STEL) and Ceiling. Most of the measurements (79.7%) were collected from the manufacturing category of industry. Medians of ELs were mostly low (≤3% of the threshold limit), with the exception of sulfuric acid (4.6% of TWA and 10.5% of STEL). The percentages of exceeding 1% of the occupational exposure limits (OELs) in TWA were relatively high for sulfuric acid (35.8%) and hydrogen chloride (16.5%) compared to the other acids (4.2%-6.6%). In addition, the percentages of exceeding 1% of OELs in STEL or Ceiling were higher for sulfuric acid (22.9%), hydrogen chloride (12.3%), and nitric acid (8.2%) compared to the other acids (1.2%-1.9%). The small-sized enterprises showed higher ELs in TWA; contrarily, the large-sized enterprises had higher ELs in STEL or Ceiling. Conclusions: The measurement characteristics and ELs identified in this study could be useful for establishing safety and health policies for inorganic acids.

염소(鹽素) 및 염화수소(鹽化水素)가스가 수도(水稻)와 대두(大豆)에 미치는 영향(影響) (Effects of Chlorine and Hydrogen Chloride Gas Fumigation on Rice and Soybean Plants)

  • 김복영;김규식;한기학
    • 한국환경농학회지
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    • 제1권1호
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    • pp.53-58
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    • 1982
  • 수도(水稻) 및 대두(大豆)를 pot재배(栽培)하여 가스접촉실내(接觸室內)에서 $Cl_2$가스 및 HCl가스를 0.1, 0.25, 0.50, $1.0g/m^3$의 농도(濃度)로 1시간(時間)씩 접촉(接觸)시켜 가스접촉후(接觸後)에 나타나는 피해증상(被害症狀), 피해엽률(被害葉率), 수풍(收豊) 및 chlorophyll함양등(含量等)을 조사(調査)한 결과(結果)는 다음과 같다. 1) 염소(鹽素)가스는 수도(水稻), 대두(大豆) 모두 엽전면(葉全面)에 회백색(灰白色)의 미세(微細)한 반점(斑點)이 나타나며 심(甚)할 경우(境遇)는 백색(白色)으로 고사(枯死)하나, 염화수소(鹽化水素)가스는 엽(葉)의 가장자리에서부터 회백색(灰白色)으로 고사(枯死)한다. 2) 가스농도(濃度) 증가(增加)에 따라서 감수(減收)가 컸으며 수도(水稻)는 염화수소(鹽化水素)가스에서 대두(大豆)는 염소(鹽素)가스에서 피해(被害)가 컸다. 3) 동일농도(同一濃度)에서의 피해엽률(被害葉率)은 염소(鹽素)가스에서는 대두(大豆)가, 염화수소(鹽化水素)가스에서는 수도(水稻)가 크게 나타났다. 4) 수도엽(水稻葉)의 chlorophyll함량(含量)은염소(鹽素)가스접촉(接觸)이 염화수소(鹽化水素)가스 접촉(接觸)보다 피해(被害)가 적었다. 5) 수도엽(水稻葉)의 chlorophyll함양(含量)과 피해엽률(被害葉率)과는 고도(高度)의 유의성(有意性)있는 부(否)의 상관(相關)을 나타내었다.

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사염화규소 누출사고지점 주변 식물에 대한 노출지표 평가 (Evaluation of Exposure Indicators for Plants by Silicon Tetrachloride Release)

  • 박재선;김지영;김명옥;박현우;정현미;최종우
    • 한국환경농학회지
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    • 제36권4호
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    • pp.288-292
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    • 2017
  • BACKGROUND: Silicon tetrachloride reacts with moisture in the atmosphere to generate hydrogen chloride, which affects the environment. Since silicon tetrachloride and its by-products are dispersed in the atmosphere in a short time after the silicon tetrachloride release into the atmosphere, it is difficult to directly assess the extent of environmental impact. In the present study, the exposure test of silicon tetrachloride or hydrogen chloride was examined in order to establish the criterion of the range affected by the silicon tetrachloride release, and the actual crops in the area exposed to silicon tetrachloride leakage were analyzed. METHODS AND RESULTS: For the experiment of exposure to silicon tetrachloride or hydrogen chloride, the leaves of red-pepper and corn were used in glass sealed containers. In the actual accident area, 59 samples from 10 different kinds of crops were collected. The pretreatment of the sample was performed by freezing and grinding, and then extracted using distilled water. The pH and concentration of chloride ($Cl^-$) ion of the extracted solution were measured using pH meter and ion chromatograph, respectively. CONCLUSION: Exposure to silicon tetrachloride caused visible damage, increasing the concentration of chloride ion, and decreasing the pH as well as hydrochloric acid. In the actual crops of the affected area, the tendency was the same as the result of the laboratory test, and the range of influence could be estimated through the concentration of $Cl^-$ ion over 2,000 mg/kg, and the correlation evaluation between the concentration of $Cl^-$ and pH. Therefore, the concentration of $Cl^-$ ion and the correlation between $Cl^-$ and pH would be considered as the factors to estimate the influence range of silicon tetrachloride release.