• Transactions of the Korean Society of Mechanical Engineers A
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• v.31 no.12
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• pp.1139-1143
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• 2007

A simple method for the fabrication of 3D micro-nano hybrid patterns was presented. In conventional fabrication methods of the micro-nano hybrid patterns, micro-patterns were firstly fabricated and then nano-patterns were formatted on the micro-patterns. Moreover, these micro-nano hybrid patterns could be fabricated on the flat substrate. In this paper, we suggested the fabrication method of 3D micro-nano hybrid patterns using micro-indentation on the anodized aluminum substrate. Since diameter of the hemispherical nano-pattern can be controlled by electrolyte and applied voltage in the anodizing process, we can easily fabricated nano-patterns of diameter of loom to 300nm. Nano-patterns were firstly formatted on the aluminum substrate, and then micro-patterns were fabricated by deforming the nano-patterned aluminum substrate. Hemispherical nano-patterns of diameter of 150nm were fabricated by anodizing process, and then micro-pyramid patterns of the side-length of $50{\mu}m$ were formatted on the nano-patterns using micro-indentation. Finally we successfully replicated 3D micro-nano hybrid patterns by hot-embossing process. 3D micro-nano hybrid patterns can be applied to nano-photonic device and nano-biochip application.

• 한국신재생에너지학회:학술대회논문집
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• 2011.05a
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• pp.75.1-75.1
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• 2011

화석연료의 고갈과 온실가스 배출의 증가로 지속 가능한 친환경 에너지 생산이 요구되는 가운데, 태양광 발전은 이러한 조건을 만족시키는 에너지 생산 방안으로 주목받고 있다. 태양광 발전은 태양 직사광을 이용한 발전 방법 때문에 실외에 설치되어야 하며 이에 따라 외부의 충격이나 오염물질로부터 태양전지 패널을 보호하기 위한 보호층이 필수적이다. 그러나 보호층에 의한 입사광의 반사 및 먼지나 황사에 의한 보호층의 오염 등은 태양전지의 발전 효율을 감소시키는 요인으로 작용하여 이에 대한 대응이 필요하다. 본 연구에서는 PET 필름에 나노 임프린트 리소그래피 및 핫 엠보싱 공정을 이용하여 moth-eye 반사방지 패턴을 형성함으로써 보호층에서의 입사광 반사를 억제하였다. 또한, 이러한 반사방지 패턴에 초소수성 자기조립단분자막을 코팅하여 표면 에너지를 낮춤으로써 먼지 및 황사에 의해 오염되었을 경우에도 빗물에 의해 오염 물질이 쉽게 씻겨 내릴 수 있는 자정기능을 부여하였다. 이러한 반사방지를 통한 입사광 투과량의 향상 및 초소수성 표면에 의한 자정작용에 의하여 태양전지의 발전 효율이 증가되었다.

• Design & Manufacturing
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• v.2 no.1
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• pp.45-50
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• 2008

Micro channel is to fabricate desired pattern on the polymer substrate by pressing the patterned mold against the substrate which is heated above the glass transition temperature, and it is a high throughput fabrication method for bio chip, optical microstructure, etc. due to the simultaneous large area patterning. However, the bad pattern fidelity in large area patterning is one of the obstacles to applying the hot embossing technology for mass production. In the present study, stamper of cross channel with width $100{\mu}m$ and height $50{\mu}m$ was manufactured using UV-LiGA process. Micro channel was manufactured using stamper manufactured in this study. Also replicability appliance was evaluated for micro channel and factors affected replicability were investigated using Taguchi method.

• Journal of the Semiconductor & Display Technology
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• v.19 no.3
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• pp.30-35
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• 2020

A microlens has been fabricated by various methods such as a thermal reflow, hot embossing, diamond milling, etc. However, these methods require a relatively complex process to control the microlens shape. In this work, we report on a simple and cost-effective method to fabricate a cylindrical microlens (CML), which can diffuse light widely. We have employed a slot-die head with the dual plate (a meniscus guide with a protruded μ-tip and a shim with a slit channel) for coating of a narrow stripe using poly(methyl methacrylate) (PMMA). We have shown that the higher the coating gap, the lower the maximum coating speed, which causes an increase in the stripe width and thickness. The coated PMMA stripe has the concave shape. To make it in the shape of a convex microlens, we have applied the thermal reflow method. When the stripe thickness is small, however, its effect is negligible. To increase the stripe thickness, we have increased the number of repeated coating. With this scheme, we have fabricated the CML with the width of 223 ㎛ and the thickness of 7.3 ㎛. Finally, we have demonstrated experimentally that the CML can diffuse light widely, a feature demanded for light extraction efficiency of organic light-emitting diodes (OLEDs) and suppression of moiré patterns in displays.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2007.10a
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• pp.100-103
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• 2007

A microlens array has been required to improve light conversion efficiency in image sensors. A microlens array can be usually fabricated by photoresist reflow, hot-embossing, micro injection molding, and UV-imprinting. Among these processes, a UV-imprinting, which is operated at room temperature with relatively low applied pressure, can be a desirable process to integrate microlens array on image sensors, because this process provides the components with low thermal expansion, enhanced stability, and low birefringence, furthermore, it is more suitable for mass production of high quality microlens array. In this study, to analyze the optical properties of the wafer scale microlens array integrated image sensor, another wafer scale simulated image sensor chip array was designed and fabricated. An aspherical square microlens was designed and integrated on a simulated image sensor chip array using a UV-imprinting process. Finally, the optical performances were measured and analyzed.

• Journal of the Korean institute of surface engineering
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• v.49 no.2
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• pp.178-185
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• 2016

In this study, we have fabricated light guide plates (LGPs) in thin film form for edge type back light unit (BLU) by using UV imprint lithography. In the LGPs, the pattern of functional resins on PC and PMMA substrates were successfully transferred from original master mold through PVC stamp. Optimized pattern arrays with slowly-sloped density were designed to obtain high brightness and uniformity. We could obtain a relatively improved brightness of $950cd/m^2$ and a uniformity of 87.3% by using the NP-S20 functional resins at an input power of 1.3 W because NP-S20 resin could show high formability after UV hardening process. The LGP prepared on polymethylmethacrylate (PMMA) substrate exhibited higher brightness than that on polycarbonate (PC) substrate because PMMA has lower refractive index resulting in more refraction toward the vertical direction.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.498-501
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• 2005

Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for manipulation of light. The existence of a photonic bandgap, a frequency range in which propagation of light is prevented in all direction, makes photonic crystal very useful in application where spatial localization of light is required for waveguide, beam splitter, and cavity. But fabrication of 3 dimensional photonic crystal is still difficult process. a concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air, and perforated with 2 dimensional lattice of hole. We show that the polymer slabs suspended in air with triangular lattice of air hole can exhibit the in-plane photonic bandgap for TE-like modes. The fabrication of Si master with pillar structure using hot embossing process was investigated for 2 dimensional low-index-contrast photonic crystal waveguide.

• Journal of Industrial Technology
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• v.39 no.1
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• pp.33-39
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• 2019

This paper addresses effects of nanoscale structures on structural colors of micropatterned transparent substrate by light diffraction. Structural colors is widely investigated because they present colors without any chemical pigments. Typically structural colors is presented by diffraction of light on a micropatterned surface or by multiple interference of light on a surface containing a periodic or quasi-periodic nano-structures. In this paper, each structural colors induced by quasi-periodic nano-structures, periodic micro-structures, and nano/micro dual structures is measured in order to investigate effects of nanoscale and microscale structures on structural colors in the transparent substrate. Using pre-fabricated pattern mold and hot-embossing process, nanoscale and microscale structures are replicated on the transparent PMMA(Poly methyl methacrylate) substrate. Nanoscale and microscale pattern molds are prepared by anodic oxidation process of aluminum sheet and by reactive ion etching process of silicon wafer, respectively. Structural colors are captured by digital camera, and their optical transmittance spectrum are measured by UV/visible spectrometer. From experimental results, we found that nano-structures provide monotonic colors by multiple interference, and micro-structures induce iridescent colors by diffraction of light. Structural colors is permanent and unchangeable, thus it can be used in various application field such as security, color filter and so on.

• Design & Manufacturing
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• v.15 no.4
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• pp.57-64
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• 2021

In recent materials industry, researches on the technology to manufacture super hydrophobic surface by effectively controlling the wettability of solid surface are expanding. Research on the fabrication of super hydrophobic surface has been studied not only for basic research but also for self-cleaning, anti-icing, anti-friction, flow resistance reduction in construction, textile, communication, military and aviation fields. A super hydrophobic surface is defined as a surface having a water droplet contact angle of 150 ° or more. The contact angle is determined by the surface energy and is influenced not only by the chemical properties of the surface but also by the rough structure. In this paper, maskless lithography using DMD, electro etching, anodizing and hot embossing are used to make the polymer resin PMMA surface super hydrophobic. In the fabrication of microstructure, DMDs are limited by the spacing of microstructure due to the structural limitations of the mirrors. In order to overcome this, maskless lithography using a transfer mechanism was used in this paper. In this paper, a super hydrophobic surface with micro and nano composite structure was fabricated. And the wettability characteristics of the micro pattern surface were analyzed.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.4
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• pp.175-183
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• 2002

In this paper, the surface modification effect of self-assembled monolayer(SAM) of 1-dodecanethiol [$CH_3$($CH_2$)$_{11}$SH] used as an anti-adhesive film in micromolding process was studied. Monolayers of 1-dodecanethiol[$CH_3$(CH$_2$)$_{11}$SH] were obtained by immersing a metal place in pure 1-dodecanethiol. SAM film on the nickel plate has been examined by using X-ray photoelectron spectroscopy(XPS). The focus has been placed on S-Ni bonding. From the XPS analysis, sulfur atoms were detected from the SAM film as a chemical composition of S-Ni. In order to measure an adhesion force of the SAM-coated nickel surface, atomic force microscopy(AFM) was used in force-distance mode, which whows the micro-adhesive force on solid surface. It was shown that adhesion forces measured from the SAM-coated nickel surface and the Ni surface without SAM coating were 3.52nN and 5.32nN, respectively. In order to investigate the effect of SAM coating on the surface foughness the replica in demolding process, hot embossing experiments were performed using a SAM-coated nickel master and a nickel master without SAM coating. Surface roughness of replica from the SAM-coated master showed 25nm and that of replica from master without SAM coating was 35nm. The smoother surface roughness of the replica from the SAM-coated, master is believed to result from reduction in the adhesion forces.ces.