• Title/Summary/Keyword: Hong Jong Woon

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Electrical Properties of OLEDs depending on Thickness variation of Electron Injection Layer (전자 주입층의 두께 변화에 따른 OLEDs의 전기적 특성)

  • Cha, Ki-Ho;Lee, Young-Hwan;Lee, Jong-Yong;Chung, Dong-Hoe;Shin, Jong-Yeol;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.69-70
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    • 2006
  • We studied increasement of efficiency of Organic Light-emitting Diodes depending on thickness variation of LiF, Material of Electron Injection Layer in structure of ITO/Hole Injection Layer (PTFE)/Hole Transportion Later (TPD)/Emitting Layer (Alq3)/Electron Injection Layer (LiF)/Al. TPD and $Alq_3$ is deposited as rate of 1.3~1.5 [${\AA}/s$] in high vacuum ($5{\times}10^{-6}$ [torr]). In result of these studies, we can know maximum efficiency in 0.7 [nm], thickness of LiF. And samples with electron injection material are increased about 5-fold in maximum efficiency in compare with sample without electron injection material.

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Electrical characteristic of insulator in tunnel-harrier memory using high-k (High-k를 이용한 터널베리어 메모리의 절연막 특성 평가)

  • Oh, Se-Man;Jung, Myung-Ho;Park, Gun-Ho;Kim, Kwan-Su;Jo, Young-Hun;Jung, Jong-Wan;Jung, Hong-Bea;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.262-263
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    • 2008
  • The Metal-Insulator-Silicon (MIS) capacitors with $SiO_2$ and high-k dielectric were investigated. The high-k dielectrics were obtained by atomic layer deposit (ALD) system. The electrical characteristics were investigated by measuring the current-voltage (I-V) characteristics. The conduction mechanisms were analyzed by using the Fowler-Nordheim (FN) plot and Direct Tunneling (DT) plot. As a result, the MIS capacitors with high-k dielectrics have lower leakage current densities than conventional tunnel-barrier with $SiO_2$ dielectrics.

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Dielecric properties depending on applied voltage of OLEDs with Hole Injection Layer (유기발광소자에서 정공주입층의 인가전압에 따른 유전특성)

  • Cha, Ki-Ho;Lee, Young-Hwan;Kim, Won-Jong;Lee, Jong-Yong;Kim, Gwi-Yeol;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.309-310
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    • 2006
  • We studied dielectric properties of OLEDs(Organic Light-emitting Diodes) depending on applied voltage (AC) of PTFE(Polytetrafluoroethylene), material of hole injection layer in structure of ITO/hole injection layer (PTFE)/emitting layer, Alq3(Tris(8-hydroxyquinolibe) Alumin)/Al. PTFE is deposited 2 [nm] as rate of 0.2~03 [${\AA}/s$] and $Alq_3$ is deposited 100 [nm] as rate of 1.3~1.5 [${\AA}/s$] m high vacuum ($5{\times}10^{-6}$[torr]). In result of these studies, we can know dielectric properties of OLEDs. Impedance is decreased depending on applied voltage variation, dielectric loss showed peak in specified voltage and showed cole-cole plot of a specimen.

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The Characteristics of Photoresist using Inorganic $a-Se_{75}Ge_{25}$ (무기질 $a-Se_{75}Ge_{25}$ 을 이용한 포토레지스트의 특성)

  • Chung, Hong-Bay;Huh, Hun;Kim, Tae-Wan;Hoon, Hyuk;Song, Joon-Suk;Kim, Jong-Been
    • Proceedings of the KIEE Conference
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    • 1987.11a
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    • pp.197-199
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    • 1987
  • This paper is investigated on characteristics of photoresist using inorganic a-$Se_{75}Ge_{25}$. The sensitivity of negative photoresist showing insolubility against alkalie solution, with Ag-photodoped, is more prominent than that of positive photoresist used with only a-$Se_{75}Ge_{25}$. It is also showed that the contrast of negative photoresist, ${\gamma}=2.9$, is more prominent than that of positive photoresist, ${\gamma}=1.4$.

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Degradation and hole formation of the Te-based thin films (Te을 기본으로 한 박막에서의 열화와 미세구멍형성에 관한 연구)

  • Lee, Hyun-Young;Park, Tae-Sung;Um, Jeong-Ho;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 1987.11a
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    • pp.207-209
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    • 1987
  • This paper reports the effect of additive elements such as Bi, Sb on degradation and hole formation of the Te-Se thin films. Changes in light transmission were used to monitor the degradation rate of thin Te films in an accelerated temperature-humidity environment. In thin accelerated temperature-humidity environment, $(Te_{86}Se_{14})_{70}Bi_{30}$ thin film was stable and $(Te_{86}Se_{14})_{50}Sb_{50}$ thin film was unstable in comparison with the other films that used in this experiment. The hole formation was carried out in the Te-based thin films.

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A Bibliographical Study on Gimyo sama tongnyung kyechub made by Hong Jong Woon (덕곡(德谷) 홍종운(洪鐘韻)의 "기묘사마동년계첩(己卯司馬同年契帖)"에 관한 연구(硏究))

  • Roh, Ki-Chun
    • Journal of Korean Library and Information Science Society
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    • v.43 no.1
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    • pp.399-415
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    • 2012
  • Gimyo sama tongnyung kyechub(己卯司馬同年契帖) was made in 1639 to commemorate the meeting for successful candidates who had passed Samasi(司馬試). This study analyzes the physical characteristics of Gimyo sama tongnyung kyechub(己卯司馬同年契帖), which includes kyehoe-do(契會圖), list of identification(座目), preface(序文), poem of meeting(契會詩) and try to find out who is in the illustration, what happened in the meeting, and why they made this book comprehensively. According to the research, this book has different physical characteristics from others made earlier. It is revealed that the three men - Choi Sang Ho(崔尙虎), Kim Jeong Hwa(金鼎華), Hong Jong Woon(洪鐘韻) - out of four who passed the exam in 1639 held a meeting at the Mount. Wolchul in YoungAm in the fall of 1656. After that, they ordered the painter who belonged to Jeonla government in Gangjin, Jeonla province to make four copies of this book for the purpose to continue their relationship cross the generations.

Effects of $O_2$ Plasma Treatment on the Electrical Properties of Organic Photovoltaic Cell (유기 광기전 소자의 전기적 특성에 미치는 산소 플라즈마 처리의 영향)

  • Oh, Dong-Hoon;Lee, Young-Sang;Park, Hee-Doo;Shin, Jong-Yeol;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1463-1464
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    • 2011
  • An indium thin oxide(ITO) is used as a substrate material for organic light-emitting diodes(OLEDs) and organic photovoltaic cells. This study examined the effects of an $O_2$ plasma treatment on the electrical properties of an organic photovoltaic cell. The four probe method and Atomic force microscope(AFM) revealed the lowest surface resistance at the plasma treatment intensity of 250 [W] and the lowest average surface roughness of 2.0 [nm] at 250 [W]. The lowest average resistance of 17 [${\Omega}$/sq] was also observed at 250 [W] 40 [sec]. The $O_2$ plasma treatment device and a basic device in a structure of CuPc/C60/BCP/Al on ITO glass were fabricated by thermal evaporation, respectively. When the $O_2$ plasma treatment was used to the ITO, The experimental results revealed that the power conversion efficiency(PCE) indicated 65 [%] higher in the PCE than that without the plasma treatment.

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Electrical Characteristics on the Variation of Deposition Rate in Organic Layer of OLEDS (정공수송층 및 발광층의 증착속도에 따른 OLEDS의 전기적 특성에 관한 연구)

  • Yang, Jae-Hoon;Lee, Young-Hwan;Kim, Weong-Jong;Kim, Keui-Yeul;Yeon, Kyu-Ho;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.275-276
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    • 2005
  • Organic Light Emitting Diodes(OLEDs) are attractive as alternative display components because of their relative merits of being self-emitting, having large intrinsic viewing angle and fast switching speed. But because of their relatively short history of development, much remains to be studied in terms of their basic device physics and design, manufacturing techniques, stability and so on. We invested electrical properties of N,N-diphenyl-N,N bis (3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD) and tris-8-hydroxyquinoline aluminum($Alq_3$) when their thicknesses were changed variedly from 3:7 to 7:3 of their thickness ratios. And we also studied properties of OLEDs depend on their deposition rate between 0.05$\sim$0.2 [nm/s].

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OLEDs's Voltage-Current Characteristics with a Thickness Variation of Hole Transport Layer and Emission Layer (OLEDs의 정공 수송층 및 발광층의 두께 변화에 따른 전압-전류 특성)

  • Yang, Jae-Hoon;Lee, Young-Hwan;Kim, Weong-Jong;Kim, Tae-Wan;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.74-75
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    • 2005
  • Organic Light Emitting Diodes are attractive as alternative display components because of their relative merits of being self-emitting, having large intrinsic viewing angle and fast switching speed. But because of their relatively short history of development, much remains to be studied in terms of their basic device physics and design, manufacturing techniques, stability and so on. We invested electrical properties of N, N-diphenyl-N, N bis (3-methyphenyl)-1, 1'-biphenyl-4, 4'-diamine and tris-8-hydroxyquinoline aluminum when their thickness were changed variedly from 3:7 to 7:3 of their thickness ratios. And we also studied their optimal thickness respectively.

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Antireflection Structures and Optical Recording Properties of Te-based Alloy Thin Films (Te계 합금 박막의 Antireflection 구조와 광기록 특성)

  • Lee, Hyun-Yong;Choi, Dae-Young;Lee, Young-Jong;Chung, Hong-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1988.05a
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    • pp.74-77
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    • 1988
  • This paper reports the properties of antireflection structure and hole formation of Te-based systems. The optical-recording characteristics of metallic recording media are enhanced significantly by incorporating the metal(Al) layer into an antreflection trilayer structure. Due to the interface condition inherent in the design of the trilayer structure, reflectivity from holes is ranked low fraction (<10%). The hole formation is carried by $Ar^+$ Laser(488nm). For 20nsec pulse duration, hole opening power(threschold) of $(Te_{86}Se_{14})_{50}Bi_{50}$ trilayer is lower than that of monolayer that used in this experiment. Hole shapes of the whole sample were clean.

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