• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1428-1429
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• 2006

We investigated the diffraction efficiency, erasing property and rewriting property of diffraction grating with each wavelength of recording beam. A (P:P) polarized light was exposed on AsGeSeS and Ag/AsGeSeS thin film to form a diffraction grating by HeNe(635nm) laser and DPSS(532nm) laser. At the maximum efficiency condition, unpolarized HeNe laser beam was irradiated to erase 1ha generated diffraction grating. The HeNe laser showed more higher diffraction efficiency and the DPSS laser showed more faster diffraction grating time. At erasing and rewriting process, AsGeSeS(61%-85%)thin film showed better property than Ag doped Ag/AsGeSeS(53%-63%) double layer structured thin film.

• 한국광학회:학술대회논문집
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• 한국광학회 2009년도 동계학술발표회 논문집
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• pp.255-256
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• 2009

• 한국광학회:학술대회논문집
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• 한국광학회 2007년도 하계학술발표회 논문집
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• pp.279-280
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• 2007

• 한국광학회:학술대회논문집
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• 한국광학회 2007년도 동계학술발표회 논문집
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• pp.21-22
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• 2007

• Journal of the Optical Society of Korea
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• 제9권2호
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• pp.59-63
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• 2005

In this paper, we present a novel apodization technique using three beams to fabricate an apodized grating in photopolymer. An orthogonal-polarization beam used to control the saturated modulation amplitude of the grating is added during recording time. As a result of the experiment, holographic apodized gratings with uniform, inverse Gaussian, and triangular profiles are fabricated successfully in DuPont's HRF-150-38 photopolymer.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1440-1441
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• 2008

In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.447-448
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• 2008

In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 0.5um and diffraction efficiency was obtained from (P:P) polarized He-Ne (632.8nm)laser beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

• Transactions on Electrical and Electronic Materials
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• 제5권6호
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• pp.219-222
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• 2004

This paper discovers that there are some peculiar properties that can remove holography grating, which was made in chacogenide thin film by impressed voltage. The thin films were used are $As_{40}Ge_{10}Se_{15}S_{35}$, and we use He-Ne laser in order to form thin films. I-V curved line in a thin film before a lattice was made has the critical point, about 3.7 V. Moreover, the I-V curved line increased current intensity at over 4 V after it made thin film. In addition, while holography grating is being made, and when it has the highest diffraction efficiency, a lattice can be deleted if put more voltage into it.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.299-302
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• 2000

In this study, we have made the large holographic surface relief gratings on amorphous chalcogenide $As_{40}$$Ge_{10}$$Se_{15}$$S_{35}$ films by two beam interference using a He-Ne laser(632.8nm) light. The film thickness was about 0.6$\mu\textrm{m}$, we could magnify beam size by using beam expander. We made use $90^{\circ}$ holder which was made of reflection mirror and sample. Formed the surface relief structures were investigated using optical microscope. The diffraction efficiency was obtained by measuring +lst order intensity. In addition we investigated grating formation and diffraction efficiency as a function of polarization states which is linear or circular polarization. The results indicate that the grating was formed by linear polarized beam is better clear than that by circular polarized beam.

• 과학교육연구지
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• 제34권2호
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• pp.203-210
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• 2010

본 연구에서는 은염 물질인 Slavich PFG-01을 사용하여 투과형 홀로그래피 회절격자를 제작하고, 고효율의 회절격자 제작을 위한 현상액의 조성 등과 같은 화학적 처리 과정의 조건들을 파악하고, 반전표백과 무정착 은염 재생성 표백에 의한 회절격자의 회절 효율 특성에 대해 알아보았다. 현상액 AAC를 사용하여 반전표백에서 89.0%과 무정착 은염 재생성 표백에서 82.1%의 최대회절효율을 얻었으며, 무정착 은염 재생성 표백의 경우는 반전표백에 비해 높은 노출에너지가 필요함을 알 수 있었다. 기존의 홀로그래피 기록물질인 Agfa 8E75HD나 BB-640로 보고된 회절효율에 비해 더 높은 회절효율 얻을 수 있었으며, 기록물질 특성 차이로 인해 더 높은 노출에너지가 필요함을 알 수 있었다. 한 가지 현상 주약으로 이루어진 현상액에 비해 두가지 현상 주약을 혼합한 경우 더 높은 회절효율을 얻을 수 있었으며, 대체로 반전표백에 비해 무정착 은염 재생성 표백에서 높은 회절효율을 나타내었다.