• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 추계학술대회 논문집 학회본부
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• pp.139-141
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• 1989

The characteristics of the hollow cathode discharge were investigated. Temperature distribution of the hollow cathode was investigated and I-V curves of the hollow cathode discharge were obtained. In this paper variables are chamber pressure, Ar gas flow rate injected through the cathode tube and the gap distance between cathode and anode. The inter electrode electron temperature and density were measured by Langmuir probe.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권11호
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• pp.496-500
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• 2003

A low-cost, large area, random, maskless texturing scheme independent of crystal orientation is expected to significantly impact terrestrial photovoltaic technology. We investigated silicon surface microstructures formed by reactive ion etching (RIE) in Multi-Hollow cathode system. Desirable texturing effect has been achieved when radio-frequency (rf) power of about 20 Watt per one hollow cathode glow is applied for our RF Multi-Hollow cathode system. The black silicon etched surface shows almost zero reflectance in the visible region as well as in near IR region. The etched silicon surface is covered by columnar microstructures with diameters from 50 to 100 nm and depth of about 500 nm. We have successfully achieved 11.7% efficiency of mono-crystalline silicon solar cell and 10.2% multi-crystalline silicon solar cell.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.874-877
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• 2002

The optogalvanic signals were measured using hollow cathode discharge tube with argon as buffer gas at change of discharge currents. A change of ionization rate due to electron collision causes an increase or decrease of the electric conductivity. This change in electric conductivity generates the optogalvanic signal. We conclude that optogalvanic signal has close relation with the lowest metastable atoms density at low current.

• 한국표면공학회지
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• 제34권5호
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• pp.384-390
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• 2001

The hollow cathode discharge is a kind of plasma formation scheme in which plasma is formed inside a hollow structure, the cathode, with current to a nearby anode of arbitrary shape. In this scheme, electrons reflex radially within the hollow cathode, establishing an efficient ionization mechanism for gas within the cavity. An existence condition for the hollow cathode effect is that the electron mean-free-path for ionization is of the order of the cavity radius. Thus the size of this kind of plasma source must decrease as the gas pressure is increased. In fact, the hollow cathode effect can occur even at atmospheric pressure for cathode diameters of order 10-100 $\mu\textrm{m}$. That is, the "natural" operating pressure regime for a "micro hollow cathode discharge" is atmospheric pressure. This kind of plasma source has been the subject of increasing research activity in recent years. A number of geometric variants have been explored, and operational requirements and typical plasma parameters have been determined. Large arrays of individual tiny sources can be used to form large-area, atmospheric-pressure plasma sources. The simplicity of the method and the capability of operation without the need for the usual vacuum system and its associated limitations, provide a highly attractive option for new approaches to many different kinds of plasma applications, including plasma surface modification technologies. Here we review the background work that has been carried out in this new research field.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.539-540
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• 2010

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.785-786
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• 2011

• 전기학회논문지
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• 제57권1호
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• pp.78-81
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• 2008

A hollow cathode which has extremely stable discharge characteristic has been developed. This is composed of the two separated lanthanum hexaboride(LaB6) of a disk type in the tube as the electron emitters. The way of design is of great advantage to extend the surface discharge area of the LaB6, which is also useful for optimal fixing of the LaB6. The hollow cathode is capable of producing 30 kW(100 V, 300 A) of power continuously. Because the generated plasma beam with the high temperature(above $3000^{\circ}C$) from the hollow cathode passes through the center hole of the two intermediate electrodes, it is designed with the high temperature material of the tungsten and the suitable structure of the water cooling. The combinations of the hollow cathode and the two intermediate electrodes are practically useful for the ion plating plasma beam source.

• 열처리공학회지
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• 제25권2호
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• pp.80-84
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• 2012

An apparatus was constructed to nitrify small metallic sintered components by using a hollow-cathode discharge plasma method. A stainless steel basket, which contains a sintered part to be nitrified, is potentially grounded and serves as hollow-cathode electrode. Hollow-cathode plasma was produced by supplying the positive voltage to the anode. In this study sintered carbon iron and stainless steel were used as testing specimens. It was shown that an effective nitrifying took place by controlling the total pressure of nitrogen and hydrogen gas and applied voltage.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2005년도 춘계학술대회 논문집
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• pp.45-47
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• 2005

The Dielectric Barrier micro-hollow cathode structure and it's upper pD limitation are investigated for determining of optimum hollow cathode discharge condition. In experiment, discharge is sustained by AC diriving and investigated gas is pure Xe. From Experiment, Optimum pD range is lower than 0.72 torr.cm at pure Xe and Cu cathode.

• 공업화학
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• 제18권5호
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• pp.438-443
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• 2007

본 연구에서는 티타늄 산화막을 상온에서 HCP (hollow cathode plasma) 반응기에 의하여 증착하였다. HCP 반응기에 대한 시뮬레이션 결과, 전극에서의 열 발생에 관계없이 기판 표면에서의 온도분포는 일정하였다. 그리고 전극과의 거리가 증가하면서 기판 표면에서의 유체는 일정한 것으로 나타났으며, 표면 조도는 거리에 따라 감소하였다. 출력이 증가할수록 산소의 조성은 증가하는 것으로 나타났으며, 출력이 240 watt와 반응 거리가 3 cm에서 Ti와 O의 비율이 1 : 2에 가깝게 결합이 이루어졌다.