• Composites Research
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• v.27 no.6
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• pp.254-259
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• 2014

In this study, a device and pressure press process that is able to substitute autoclave process is developed. This process complements disadvantages of autoclave process which are long process-time and high production cost. The developed device provides air pressure as well as the vacuum which are greatest feature of autoclave process. The device is sealed using hydraulic pressure to keep the air pressure inside the mold. The transfer of the heat is designed to be direct. The heating and pressure charging time are decreased by reducing the interior space. Tooling cost is reduced dramatically compared to autoclave process. Spring-back phenomenon is measured and compared. The temperatures of several parts of the mold during molding are measured. The fiber volume fraction of the parts molded by autoclave process and by the developed process are compared.

• Korean Journal of Materials Research
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• v.25 no.2
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• pp.107-112
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• 2015

The oxide films formed on etched aluminum foils play an important role as dielectric layers in aluminum electrolytic capacitors. $Y_2O_3$-doped $ZrO_2$ (YZ) films were coated on the etched aluminum foils by sol-gel dip coating, and the electrical properties of YZ-coated Al foils were characterized. YZ films annealed at $450^{\circ}C$ were crystallized into a cubic phase, and as the $Y_2O_3$ doping content increased, the unit cell of $ZrO_2$ expanded and the grain size decreased. The etch pits of Al foils were filled by YZ sol when it dried at atmospheric pressure after repeating for several times, but this step could essentially be avoided when being dried in a vacuum. YZ-coated foils indicated that the specific capacitance and dissipation factor were $2-2.5{\mu}F/cm^2$ and 2-4 at 1 kHz, respectively, and the leakage current and withstanding voltage of films approximately 200 nm thick were $5{\times}10^{-4}A$ at 21 V and 22 V, respectively. After being anodized at 500 V, the foils exhibited a specific capacitance and dissipation factor of $0.6-0.7{\mu}F/cm^2$ and 0.1-0.2, respectively, at 1 kHz, while the leakage current and withstanding voltage were $2{\times}10^{-4}-3{\times}10^{-5}A$ at 400 V and 420-450 V, respectively. This suggests that YZ film is a promising dielectric that can be used in high voltage Al electrolytic capacitors.

• Korean Journal of Materials Research
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• v.8 no.11
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• pp.1048-1054
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• 1998

The effects of deposition temperature of Pt top electrodes on the electrical properties of Pb(Zr,Ti))$O_3$, (PZT) thin film were investigated. When the Pt top electrodes were deposited at substrate temperatures of $200^{\circ}C$ or above,the ferroelectric properties of the PZT thin film under the Pt electrode were severely degraded. Whereas those of the PZT film where the Pt electrodes were not deposited were not degraded. Water vapors which remained in the vacuum chamber were dissociated into hydrogen atoms by the catalysis of Pt top electrode, and those hydrogen atoms diffused into the PZT film and produced oxygen vacancies at high substrate temperature, resulting in the degradation of the ferroelectric properties of the PZT film located under the Pt electrode. Since the water vapors could not be dissociated into hydrogen atoms without the catalysis of Pt. the degradation of the PZT film did not take place where the Pt electrode were not deposited. The degraded feroelectric properties could be recovered by rapid thermal annealing (RTA) treatment. On the other hand. leakage current characteristics were improved with increasing the deposition temperature of Pt top electrodes.

• Korean Journal of Materials Research
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• v.10 no.7
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• pp.459-463
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• 2000

Direct use of negative ions for modification of materials has opened new research such as charging-free ion implantation and new materials syntheses by pure kinetic bonding reactions. For these purposes, a new solid-state ce-sium ion source has been developed in the laboratory scale. In this paper, diamond like carbon(DLC) films were prepared on silicon wafer by a negative cesium ion gun. This system does not need any gas in the chamber; deposition occurs under high vacuum. The ion source has good control of the C- beam energy(from 80 to 150eV). The result of Raman spectrophotometer shows that the degree of diamond-like character in the films, $sp^3$ fraction, increased as ion beam energy increases. The nanoindentation hardness of the films also increases from 7 to 14 GPa as a function of beam energy. DLC films showed ultra-smooth surface(Ra~1$\AA$)and an impurity-free quality.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.807-810
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• 2002

$GdPO_4$:Tb phosphor particles with spherical shape and high photoluminescence were prepared by spray pyrolysis. The brightness of prepared $GdPO_4$:Tb under the vacuum ultraviolet(VUV) illumination was comparable with that of the commercial $Zn_2SiO_4$:Mn phosphor particles. The photoluminescence spectra of $GdPO_4$:Tb phosphor particles had maximum peak at 547 nm, and the sharp peaks at 480 nm, 580 nm, and 620 nm. The spherical morphology of prepared $GdPO_4$:Tb particles was completely maintained even after the posttreatment up to 1100 $^{\circ}C$. When the posttreatment temperature was over 1100 $^{\circ}C$, the particles did not have the spherical shape anymore. The average particle size of $GdPO_4$:Tb phosphor particles prepared by using $(NH_4)_2HPO_4$ was changed from 0.5 to 1.9 ${\mu}m$ and its effect on the PL intensity was investigated. It was found that the optimized $GdPO_4$:Tb particles have a good excitation spectrum comparable to that of the commercial $Zn_2SiO_4$:Mn phosphor particles under the VUV illumination from 140 to 220 nm. We concluded that the $GdPO_4$:Tb phosphor particles with spherical shape prepared by spray pyrolysis is a promising candidate for a green-emitting PDP phosphor.

• Korean Chemical Engineering Research
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• v.54 no.4
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• pp.527-532
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• 2016

The effects of gas velocity and solid circulation rate on the axial solid holdup distribution have been determined in a 10 mm-I.D. ${\times}$ 800 mm-high circulating fluidized bed plasma reactor under reduced pressure (1torr). Polystyrene polymer powder and nitrogen gas are used as solid and gas materials respectively. The change of solid circulation rate by a large gas flow rate of the riser (40~80 sccm) is also possible by a relatively small gas flow rate of the solid recirculation part (6.6~9.9 sccm). The solid circulation rate in the reactor under reduced pressure increases with increasing aeration velocity in the solid recirculation part. The axial solid holdup in the riser decreases from the dense at the bottom to the dilute phase at the top section of the riser. Solid holdups at the axial positions in the riser increase linearly with increasing solid circulating velocity. From these results, we could determine the position of plasma load for good plasma ignition, maintain and plasma reaction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.309-310
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• 2005

In the fabrication of high performance red organic light emitting diode, 2-TNA TA [4,4',4" -tris (2-naphthylphenyl- phenylamino)-triphenylamine] as hole injection material and N PH [N,N'-bis (1-naphthyl) -N,N' -diphenyl-1, 1'-biphenyl-4,4'- diamine] as hole transport material were deposited on the ITO (indium tin oxide)/glass substrate by vacuum evaporation, And then, red color emission layer was deposited using Alq3 as a host material and Rubrene (5,6,11,12- tetraphenylnaphthacene) and GDI 4234 as dopants. Finally, small molecular weight OLED with the structure of ITO/2-TNATA/ NPB/Alq3+Rubrene+GDI4234/Alq3/LiF/Al was obtained by in-situ deposition of Alq3, LiF and Al as electron transport material, electron injection material and cathode. respectively. Green OLED fabricated in our experiments showed the color coordinate of CIE(0.65,0.35) and the maximum luminescence efficiency of 2.1 lm/W at 7 V with the peak emission wavelength of 632 nm.

• Journal of Powder Materials
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• v.22 no.4
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• pp.283-288
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• 2015

Two sintering methods of a pressureless sintering and a spark-plasma sintering are tested to densify the Fe-TiC composite powders which are fabricated by high-energy ball-milling. A powder mixture of Fe and TiC is prepared in a planetary ball mill at a rotation speed of 500 rpm for 1h. Pressureless sintering is performed at 1100, 1200 and $1300^{\circ}C$ for 1-3 hours in a tube furnace under flowing argon gas atmosphere. Spark-plasma sintering is carried out under the following condition: sintering temperature of $1050^{\circ}C$, soaking time of 10 min, sintering pressure of 50 MPa, heating rate of $50^{\circ}C$, and in a vacuum of 0.1 Pa. The curves of shrinkage and its derivative (shrinkage rate) are obtained from the data stored automatically during sintering process. The densification behaviors are investigated from the observation of fracture surface and cross-section of the sintered compacts. The pressureless-sintered powder compacts show incomplete densification with a relative denstiy of 86.1% after sintering at $1300^{\circ}C$ for 3h. Spark-plasma sintering at $1050^{\circ}C$ for 10 min exhibits nearly complete densification of 98.6% relative density under the sintering pressure of 50 MPa.

• Composites Research
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• v.16 no.3
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• pp.1-8
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• 2003

Densification occurs by the inelastic flow of the matrix materials during the consolidation processes at high temperature for MMCs, and the results depend on many process conditions such as applied pressure, temperature and volume fraction of fiber and matrix materials. This is particularly important in titanium matrix composites since material failure may occur by either the applied conditions or microstructural parameters through the processes, and thus a generic model based on micro-mechanical approaches enabling the evolution of density over time to be predicted has been developed. The mode developed is then implemented into FEM so that practical process simulation has been carried out. Further the experimental investigation of the consolidation behavior of SiC/Ti-6Al-4V composites using vacuum hot pressing has been performed, and the results obtained are compared with the model predictions.

• Tribology and Lubricants
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• v.32 no.4
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• pp.125-131
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• 2016

In recent years, thick ta-C coating has attracted considerable interest owing to its existing and potential commercial importance in applications such as automobile accessories, drills, and gears. The thickness of the ta-C coating is an important parameter in these applications. However, the biggest problems are achieving efficient coating and uniformity over a large area with high-speed deposition. Feasibility is confirmed for the ta-C coating thickness of up to 9.0 µm (coating speed: 3.0 µm/h, fixed substrate) using a single FCVA cathode. The thickness was determined using multiple coating cycles that were controlled using substrate temperature and residual stresses. In the present research, we have designed a coating system using FCVA plasma and produced enhanced thick ta-C coating. The system uses a specialized magnetic field configuration with stabilized DC arc plasma discharge during deposition. To achieve quality that is acceptable for use in automobile accessories, the magnetic field, T-type filters, and 10 pieces of a multi-cathode are used to demonstrate the deposition of the thick ta-C coating. The results of coating performance indicate that uniformity is ±7.6 , deposited area is 400 mm, and the thickness of the ta-C coating is up to 5.0 µm (coating speed: 0.3 µm/h, revolution and rotation). The hardness of the coating ranges from 30 to 59 GPa, and the adhesion strength level (HF1) ranges from 20 to 60 N, depending on the ta-C coating.