• Title/Summary/Keyword: High doping

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Effect of Al and Nb Doping on the Electrochemical Characteristics of Garnet-type Li7La3Zr2O12 Solid Electrolytes

  • Ahmed Tarif;Chan-Jin Park
    • Corrosion Science and Technology
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    • v.22 no.6
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    • pp.408-418
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    • 2023
  • In this study, we synthesized and characterized garnet-type Li7-xAlxLa3Zr2-(5/4)yNbyO12 (LALZN) solid electrolytes for all-solid-state battery applications. Our novel approach focused on enhancing ionic conductivity, which is crucial for battery efficiency. A systematic examination found that co-doping with Al and Nb significantly improved this conductivity. Al3+ and Nb5+ ions were incorporated at Li+ and Zr4+ sites, respectively. This doping resulted in LALZN electrolytes with optimized properties, most notably enhanced ionic conductivity. An optimized mixture with 0.25 mol each of Al and Nb dopants achieved a peak conductivity of 1.32 × 10-4 S cm-1. We fabricated symmetric cells using these electrolytes and observed excellent charge-discharge profiles and remarkable cycling longevity, demonstrating the potential for long-term application in battery systems. The garnet-type LALZN solid electrolytes, with their high ionic conductivity and stability, show great potential for enhancing the performance of all-solid-state batteries. This study not only advances the understanding of effective doping strategies but also underscores the practical applicability of the LALZN system in modern energy storage solutions.

Na Doping Properties of Cu(In,Ga)Se2 Absorber Layer Using NaF Interlayer on Mo Substrate (Mo 기판위의 NaF 중간층을 이용한 Cu(In,Ga)Se2 광흡수층의 Na 도핑특성에 관한 연구)

  • Park, Tae-Jung;Shin, Dong-Hyeop;Ahn, Byung-Tae;Yun, Jae-Ho
    • Korean Journal of Materials Research
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    • v.19 no.8
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    • pp.452-456
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    • 2009
  • In high-efficiency Cu(In,Ga)$Se_2$ solar cells, Na is doped into a Cu(In,Ga)$Se_2$ light-absorbing layer from sodalime-glass substrate through Mo back-contact layer, resulting in an increase of device performance. However, this supply of sodium is limited when the process temperature is too low or when a substrate does not supply Na. This limitation can be overcome by supplying Na through external doping. For Na doping, an NaF interlayer was deposited on Mo/glass substrate. A Cu(In,Ga)$Se_2$ absorber layer was deposited on the NaF interlayer by a three-stage co-evaporation process As the thickness of NaF interlayer increased, smaller grain sizes were obtained. The resistivity of the NaF-doped CIGS film was of the order of $10^3{\Omega}{\cdot}cm$ indicating that doping was not very effective. However, highest conversion efficiency of 14.2% was obtained when the NaF thickness was 25 nm, suggesting that Na doping using an NaF interlayer is one of the possible methods for external doping.

Threshold Voltage Movement for Channel Doping Concentration of Asymmetric Double Gate MOSFET (도핑농도에 따른 비대칭 이중게이트 MOSFET의 문턱전압이동현상)

  • Jung, Hakkee;Lee, jongin;Jeong, Dongsoo
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.748-751
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    • 2014
  • This paper has analyzed threshold voltage movement for channel doping concentration of asymmetric double gate(DG) MOSFET. The asymmetric DGMOSFET is generally fabricated with low doping channel and fully depleted under operation. Since impurity scattering is lessened, asymmetric DGMOSFET has the adventage that high speed operation is possible. The threshold voltage movement, one of short channel effects necessarily occurred in fine devices, is investigated for the change of channel doping concentration in asymmetric DGMOSFET. The analytical potential distribution of series form is derived from Possion's equation to obtain threshold voltage. The movement of threshold voltage is investigated for channel doping concentration with parameters of channel length, channel thickness, oxide thickness, and doping profiles. As a result, threshold voltage increases with increase of doping concentration, and that decreases with decrease of channel length. Threshold voltage increases with decrease of channel thickness and bottom gate voltage. Lastly threshold voltage increases with decrease of oxide thickness.

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Research Trends in Doping Methods on TiO2 Nanotube Arrays Prepared by Electrochemical Anodization (양극산화 기법으로 제조한 TiO2 나노튜브의 촉매 도핑 연구 동향)

  • Yoo, Hyeonseok;Choi, Jinsub
    • Applied Chemistry for Engineering
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    • v.26 no.2
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    • pp.121-127
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    • 2015
  • Nanotubular $TiO_2$ prepared by electrochemical anodization has been significantly used for various applications due to high aspect ratio structures showing a high chemical stability. Morphological properties of nanotubular titanium oxide are easily tailored by adjusting types and compositions of electrolyte, pH value, applied voltage, temperature and anodization time. Since their catalytic properties can be enhanced by doping foreign elements into $TiO_2$, metal as well as non-metal elements are doped into $TiO_2$ nanotubes using different methods. For example, single anodization, thermal annealing, precipitation, and electrochemical deposition have been applied to simplify the doping process. In this review, anodization of Ti to produce $TiO_2$ and doping methods will be discussed in detail.

Effects of Polyacrylic Acid Doping on Microstructure and Critical Current Density of $MgB_2$ Bulk ($MgB_2$ bulk의 미세구조와 임계전류밀도에 미치는 polyacrylic acid doping 효과)

  • Lee, S.M.;Hwang, S.M.;Lee, C.M.;Joo, J.;Kim, C.J.
    • Progress in Superconductivity
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    • v.11 no.2
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    • pp.87-91
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    • 2010
  • We fabricated the polyacrylic acid (PAA)-doped $MgB_2$ bulks and characterized their lattice parameters, actual C substitutions, microstructures, and critical properties. The boron (B) powder was mixed with PAA using N,N-dimethylformamide as solvent and then the solution was dried out at $200^{\circ}C$ and crushed. The C treated B powder and magnesium powder were mixed and compacted by uniaxial pressing at 500 MPa, followed by sintering at $900^{\circ}C$ for 1 h in high purity Ar atmosphere. We observed that the PAA doping increased the MgO amount but decreased the grain size, a-axis lattice constant, and critical temperature ($T_c$), which is indicative of the C substitution for B sites in $MgB_2$. In addition, the critical current density ($J_c$) at high magnetic field was significantly improved with increasing PAA addition: at 5 K and 6.6 T, the $J_c$ of 7 wt% PAA-doped sample was $6.39\;{\times}\;10^3\;A/cm^2$ which was approximately 6-fold higher than that of the pure sample ($1.04\;{\times}\;10^3\;A/cm^2$). This improvement was probably due to the C substitution and the refinement of grain size by PAA doping, suggesting that PAA is an effective dopant in improving $J_c$(B) performance of $MgB_2$.

P-Type Doping of Graphene Films by Hybridization with Nickel Nanoparticles

  • Lee, Su Il;Song, Wooseok;Kim, Yooseok;song, Inkyung;Park, Sangeun;Cha, Myung-Jun;Jung, Dae Sung;Jung, Min Wook;An, Ki-Seok;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.208-208
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    • 2013
  • Graphene has emerged as a fascinating material for next-generation nanoelectronics due to its outstanding electronic properties. In particular, graphene-based field effect transistors (GFETs) have been a promising research subject due to their superior response times, which are due to extremely high electron mobility at room temperature. The biggest challenges in GFET applications are control of carrier concentration and opening the bandgap of graphene. To overcome these problems, three approaches to doping graphene have been developed. Here we demonstrate the decoration of Ni nanoparticles (NPs) on graphene films by simple annealing for p-type doping of graphene. Ni NPs/graphene films were fabricated by coating a $NiCl2{\cdot}6H2O$ solution onto graphene followedby annealing. Scanning electron microscopy and atomic force microscopy revealed that high-density, uniformly sized Ni NPs were formed on the graphene films and the density of the Ni NPs increased gradually with increasing $NiCl2{\cdot}6H2O$ concentration. The formation of Ni NPs on graphene films was explained by heat-driven dechlorination and subsequent particlization, as investigated by X-ray photoelectron spectroscopy. The doping effect of Ni NPs onto graphene films was verified by Raman spectroscopy and electrical transport measurements.

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Effect of Anatase TiO2 Doping Power on Electrical, Optical and Structural Properties of Multicomponent TiO2-Doped ITO Electrodes (아나타세 TiO2 도핑파워가 다성분계 TiO2-ITO 투명 전극의 전기적, 광학적, 구조적 특성에 미치는 효과)

  • Lim, Jong-Wook;Choi, Yoon-Young;Cho, Chung-Ki;Choi, Kwang-Hyuk;Kim, Han-Ki
    • Korean Journal of Materials Research
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    • v.21 no.7
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    • pp.371-376
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    • 2011
  • We report on the effects of $TiO_2$ doping power on the characteristics of multicomponent $TiO_2$-ITO (TITO) electrodes prepared by a multi-target sputtering system with tilted cathode guns. Both as-deposited and annealed TITO electrodes showed linearly increased sheet resistance and resistivity with increasing $TiO_2$ doping power. However, the TITO electrodes exhibited a fairly high optical transmittance regardless of the $TiO_2$ doping power due to the high transparency of the $TiO_2$. Although the annealed TITO showed much lower sheet resistance and resistivity relative to the as-deposited samples, the electrical properties of the annealed samples exhibited similar dependence on the $TiO_2$ power to the as-deposited samples. In addition, it was found that doping of an anatase $TiO_2$ in the ITO electrode prevented the preferred (222) orientation of the TITO electrodes. Although the TITO electrode showed higher sheet resistance and resistivity than that of the pure ITO electrode, it offers a very smooth surface and usage of a low-cost Ti element. It is thus considered a promising multicomponent transparent conducting electrode for cost-efficient flat panel displays and photovoltatics.

Two Dimensional Boron Doping Properties in SiGe Semiconductor Epitaxial Layers Grown by Reduced Pressure Chemical Vapor Deposition (감압화학증착법으로 성장된 실리콘-게르마늄 반도체 에피층에서 붕소의 이차원 도핑 특성)

  • Shim, Kyu-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.12
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    • pp.1301-1307
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    • 2004
  • Reduced pressure chemical vapor deposition(RPCYD) technology has been investigated for the growth of SiGe epitaxial films with two dimensional in-situ doped boron impurities. The two dimensional $\delta$-doped impurities can supply high mobility carriers into the channel of SiGe heterostructure MOSFETs(HMOS). Process parameters including substrate temperature, flow rate of dopant gas, and structure of epitaxial layers presented significant influence on the shape of two dimensional dopant distribution. Weak bonds of germanium hydrides could promote high incorporation efficiency of boron atoms on film surface. Meanwhile the negligible diffusion coefficient in SiGe prohibits the dispersion of boron atoms: that is, very sharp, well defined two-dimensional doping could be obtained within a few atomic layers. Peak concentration and full-width-at-half-maximum of boron profiles in SiGe could be achieved in the range of 10$^{18}$ -10$^{20}$ cm$^{-3}$ and below 5 nm, respectively. These experimental results suggest that the present method is particularly suitable for HMOS devices requiring a high-precision channel for superior performance in terms of operation speed and noise levels to the present conventional CMOS technology.

Temperature-dependent Characteristics of Discharge in AC-PDP (교류형 PDP의 온도에 따른 방전특성)

  • Kim, Gun-Su;Lee, Seok-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.3
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    • pp.239-247
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    • 2009
  • In AC-PDP, it is necessary to achieve high luminance efficacy, high luminance and high resolution by adopting technologies such as high Xenon concentration, MgO doping, and long gap. However, it is very difficult to apply above technologies because they reduce driving voltage margin. For example, doping of MgO reduces driving voltage but introduces new problems such as increased temperature dependency of discharge, which result in larger variations in driving margin at different temperatures. In this paper, we present the experimental results of the characteristics of temperature-dependent discharges. In addition, we suggest the mechanism of bright noise, black noise, and high temperature mis-discharge, which depend on temperature-dependent characteristics of MgO.

A Study on Ion Exchange Method for Effective Ag Doping of Sputtering-Deposited CdTe Thin Film (스퍼터링 증착한 CdTe 박막의 효과적인 Ag 도핑을 위한 이온 교환법 연구)

  • Kim, Cheol-Joan;Park, Ju-Sun;Lee, Woo-Sun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.6
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    • pp.1169-1174
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    • 2011
  • CdTe thin-film solar cell technology is well known that it can theoretically improve its conversion efficiency and manufacturing costs compared to the conventional silicon solar cell technology, due to its optical band gap energy (about 1.45eV) for solar energy absorption, high light absorption capability and low cost requirements for producing solar cells. Although the prior studies obtained the high light absorption, CdTe thin film solar cell has not been come up to the sufficient efficiency yet. So, doping method was selected for the improvement of the electrical characteristics in CdTe solar cells. Some elements including Cu, Ag, Cd and Te were generally used for the p-dopant as substitutional acceptors in CdTe thin film. In this study, the sputtering-deposited CdTe thin film was immersed in $AgNO_3$ solution for ion exchange method to dope Ag ions. The effects of immersion temperature and Ag-concentration were investigated on the optical properties and electrical characteristics of CdTe thin film by using Auger electron spectroscopy depth-profile, UV-visible spectrophotometer, and a Hall effect measurement system. The best optical and electrical characteristics were sucessfully obtained by Ag doping at high temperature and concentration. The larger and more uniform diffusion of Ag ions made increase of the Ag ion density in CdTe thin film to decrease the series resistance as well as mede the faster diffusion of light by the metal ions to enhance the light absorption.