• Title/Summary/Keyword: High Speed AFM

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An XY scanner with minimized coupling motions for the high speed AFM (상호 간섭이 최소화된 고속 원자현미경용 XY 스캐너 제작)

  • Park J.;Moon W.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.653-656
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    • 2005
  • This paper introduces design, fabrication and experiment process of a novel scanner for the high speed AFM(Atomic Force Microscope). A proper design modification is proposed through analyses on the dynamic characteristics of the existing linear motion stages using a dynamic analysis program, Recurdyn. Since the scanning speed of each direction is allowed to be different, the linear motion stage for the high-speed scanner of AFM can be so designed to have different resonance frequencies for the modes with one dominant displacement in the desired directions. One way to achieve this objective is to use one-direction flexure mechanism for each direction and to mount one stage for fast motion on the other stage for slow motion. This unsymmetrical configuration separates the frequencies of the two vibration modes with one dominant displacement in each desired direction, hence, the coupling between the motions in the two directions. In addition, a pair of actuators is used for each axis to decrease the cross talks in the two motions and gives a force large enough to actuate the slow motion stage, which carries the fast motion stage. After these design modifications, a novel scanner with scanning speed higher than 10 Hz can be achieved to realize undistorted images in the high speed AFM.

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A High-Speed Single Crystal Silicon AFM Probe Integrated with PZT Actuator for High-Speed Imaging Applications

  • Cho, Il-Joo;Yun, Kwang-Seok;Nam, Hyo-Jin
    • Journal of Electrical Engineering and Technology
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    • v.6 no.1
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    • pp.119-122
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    • 2011
  • A new high speed AFM probe has been proposed and fabricated. The probe is integrated with PZT actuated cantilever realized in bulk silicon wafer using heavily boron doped silicon as an etch stop layer. The cantilever thickness can be accurately controlled by the boron diffusion process. Thick SCS cantilever and integrated PZT actuator make it possible to be operated at high speed for fast imaging. The resonant frequency of the fabricated probe is 92.9 kHz and the maximum deflection is 5.3 ${\mu}m$ at 3 V. The fabricated probe successfully measured the surface of standard sample in an AFM system at the scan speed of 600${\mu}m$/sec.

A High-speed Atomic Force Microscope for Precision Measurement of Microstructured Surfaces

  • Cui, Yuguo;Arai, Yoshikazu;Asai, Takemi;Ju, BinFeng;Gao, Wei
    • International Journal of Precision Engineering and Manufacturing
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    • v.9 no.3
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    • pp.27-32
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    • 2008
  • This paper describes a contact atomic force microscope (AFM) that can be used for high-speed precision measurements of microstructured surfaces. The AFM is composed of an air-bearing X stage, an air-bearing spindle with the axis of rotation in the Z direction, and an AFM probe unit. The traversing distance and maximum speed of the X stage are 300 mm and 400 mm/s, respectively. The spindle has the ability to hold a sample in a vacuum chuck with a maximum diameter of 130 mm and has a maximum rotation speed of 300 rpm. The bandwidth of the AFM probe unit in an open loop control circuit is more than 40 kHz. To achieve precision measurements of microstructured surfaces with slopes, a scanning strategy combining constant height measurements with a slope compensation technique is proposed. In this scanning strategy, the Z direction PZT actuator of the AFM probe unit is employed to compensate for the slope of the sample surface while the microstructures are scanned by the AFM probe at a constant height. The precision of such a scanning strategy is demonstrated by obtaining profile measurements of a microstructure surface at a series of scanning speeds ranging from 0.1 to 20.0 mm/s.

A Study on Characteristics of the Precision Machined Surfaces by AFM Measurement (AFM 측정법에 의한 초정밀 가공면의 특성 평가 연구)

  • Kim, Jong-Kwan;Lee, Gab-Jo;Jung, Jong-Soo
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.1
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    • pp.80-85
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    • 2007
  • High speed cutting is a machining process which cuts materials with the fast movement and rotation of a spindle in a machine tool. High speed cutting leaves a plastically deformed layer on the machined surface. This deformed layer affects in various forms to the surface roughness of machined parts such as the dimensional instability, the micro crack. The surface roughness is called surface integrity which is very important in precision cutting. This paper aims to study on the machined surfaces characteristics of aluminum alloy and brass by AFM(Atomic force microscope) measurement. The objective is contribution to ultra- precision cutting by exhibit foundation data of surface roughness and tool wear when parts are cutting with diamond tool at the factory.

Non-contact type AFM using frequency separation scheme (주파수응답 분리방법을 이용한 비접촉식 AFM)

  • 이성규;염우섭;박기환;송기봉;김준호;김은경;박강호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.10a
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    • pp.375-378
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    • 2002
  • In this paper, the frequency response separation scheme is proposed for high scanning speed and simple structure of non-contact type of AFM. A self-sensing cantilever is attached on the actuator for detect the atomic force between tip and the media surface. VCM or PZT are used for actuator. This paper presents the method to simplify the actuator structure and the performance of each actuator for non-contact type AFM. Based on the frequency response separation scheme, the only one actuator plays roles 1311owing low frequency surface and modulating self-sensing cantilever tip in contrast with convention non-contact type AFM. 10 ${\mu}{\textrm}{m}$ standard grid sample imaged to verify proposed scheme. This result shows the possibility simplifying the actuator structure and reducing cost of non-contact type AFM.

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Fabrication of silicon nano-ribbon and nano-FETs by using AFM anodic oxidation

  • Hwang, Min-Yeong;Choe, Chang-Yong;Jeong, Ji-Cheol;An, Jeong-Jun;Gu, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.54-54
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    • 2009
  • AFM anodic oxidation has the capability of patterning complex nano-patterns under relatively high speeds and low voltage. We report the fabrication using a atomic force microscopy (AFM) of silicon nano-ribbon and nano-field effect transistors (FETs). The fabricated nano-patterns have great potential characteristics in various fields due to their interesting electronic, optical and other profiles. The results shows that oxide width and the separation between the oxide patterns can be optimally controlled. The subsequently fabricated silicon nano-ribbon and nano-FET working devices were controled by various tip-sample bias-voltages and scan speed of AFM anodic oxidation. The results may be applied for highly integration circuits and sensitive optical sensor applications.

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Multi-Functional Probe Recording: Field-Induced Recording and Near-Field Optical Readout

  • Park, Kang-Ho;Kim, Jeong-Yong;Song, Ki-Bong;Lee, Sung-Q;Kim, Jun-Ho;Kim, Eun-Kyoung
    • ETRI Journal
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    • v.26 no.3
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    • pp.189-194
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    • 2004
  • We demonstrate a high-speed recording based on field-induced manipulation in combination with an optical reading of recorded bits on Au cluster films using the atomic force microscope (AFM) and the near-field scanning optical microscope (NSOM). We reproduced 50 nm-sized mounds by applying short electrical pulses to conducting tips in a non-contact mode as a writing process. The recorded marks were then optically read using bent fiber probes in a transmission mode. A strong enhancement of light transmission is attributed to the local surface plasmon excitation on the protruded dots.

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The design of XYZ 3-axis stage for AFM system (AFM 시스템을 위한 XYZ 3축 스테이지의 설계)

  • 김동민;김기현;심종엽;권대갑;엄천일
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.36-36
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    • 2002
  • To Establish of standard technique of length measurent in 2D plane, we develope AFM system. The XY scanner scans the sample only in XY plane, while the Z scanner scans the specimen only in Z-direction. Cantilever tip is controlled to has constant height relative to speciman surface by feedback of PSPD signal. To acquire high accuracy, Z-axis measuring sensor will be added.(COXI or others). In this paper we design XYZ stage suitable for this AEM system. For XY stage, single module parallel-kinnematic flexure stage is used which has high orthogonality and minimum out-of-plane motion. To obtain best performance optimal design is performed. For XY stage, to be robust about parasitic motion optimal design of maximizing Z and tilt stiffness is performed under the constraint of motion range and stage size. And for Z stage, optimal design of maximizing 1st resonant frequency is performed. Because if resonant frequency is get higher, scan speed is improved. So it makes reduce the error by sensor drift. Resultly XYZ stage each have 1st natural frequency of 115㎐, 201㎐, 2.66㎑ and range 109㎛, 110㎛, 12㎛.

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Nanotribology of PMMA Thin Films Using an AFM (AFM을 이용한 PMMA (Poly Methyl Methacrylate) 박막의 나노트라이볼로지 연구)

  • 김승현;김용석
    • Transactions of Materials Processing
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    • v.13 no.1
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    • pp.59-64
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    • 2004
  • Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging form 10nN to 100nN. At low loads, a ridge pattern was formed on the PMMA thin film surface. No wear particles were observed during the pattern-forming mild wear. At high loads, severe wear by plowing occurred, accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the scratching was measured, which was closely related with surface deformation of the film. A simple empirical equation to deduce scratch hardness of the film from a linear fixed-distance scratch test was proposed, and scratching-speed dependency of the scratch hardness was displayed.

Investigation on the Effect of Contact Load on Fine Pattern Fabrication by AFM (AFM을 이용한 미세 패턴 가공 시 접촉 하중에 따른 선폭 변화에 대한 연구)

  • Jo S.B.;Kim D.E.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.502-505
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    • 2005
  • To overcome some of the limitations in the conventional photolithography technique, MC-SPL which has advantages such as flexibility and high speed was developed in the past. To make a fine pattern using MC-SPL, there are many variables to control, for example, applied load, scribing speed, chemical etching condition, and etc. In this work, the effect of contact load on the width of the pattern was investigated. The load not only influences the width of the pattern but it also affects the wear of the probe tip. It was found that it is beneficial to load the tip in two stages. Futhermore, the experimental results showed that the pattern width was more sensitive to the initial contact force.

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