• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1509-1511
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• 2001

In this study, etching characteristics of polyimide(Pl) film with $O_2/CF_4$ gas mixing ratio was studied using inductively coupled plasma (ICP). The etch rate and selectivity were evaluated to chamber pressure and gas mixing ratio. High etch rate (over 8000$\AA$/min) and vertical profile were acquired in $CF_4$/($CF_4+O_2$) of 0.2. The selectivities of polyimide to PR and polyimide to $SiO_2$ were 1.15, 5.85, respectively. The profiles of polyimide film etched in $CF_4/O_2$ were measured by a scanning electron microscope (SEM) with using an aluminum hard mask pattern. The chemical states on the polyimide film surface were measured by x-ray photoelectron spectroscopy (XPS).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.123-123
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• 2008

In this work, amorphous carbon thin films were deposited for hard mask applications by a reactive particle beam (RPB) assisted sputtering system at room temperature. The depositing characteristics of the films were investigated as functions of operating parameters such as reflector bias voltage and RF plasma power. It was confirmed that the deposition rate increased with increasing the reflector bias voltage and RF plasma power. By an atomic force microscope (AFM), it was revealed that the surface roughness was also increased. The total stress in films was determined by the use of the substrate curvature and its result will be discussed.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1069-1072
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.199-202
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a 5$\times$5$\times$0.09 in. quartz stamp whose critical dimension is 377 nm was fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply tile fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer Experiments have shown that the multi-dispensing method can enable UV-NIL rising a large-area stamp.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.195-198
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• 2003

본 연구에서는 MILC 및 FALC를 도핑 타입에 따른 온도별 패턴별 인가 전압별로 진행하여 현미경 및 FESEM 관찰을 함으로써 그 메커니즘을 규명하고자 하였다. LPCVD를 이용하여 $1000\;{\AA}$ a-Si 을 glass에 입힌 후 photolithography법 또는 Hard Mask법으로 Ni $200\;{\AA}$ 을 선택적으로 증착하였으며 Pt 전극을 Sputtering법으로 제작하였다. $33\;{\sim}\;200\;V/cm$의 전기장 하에서 MILC 속도가 2배 정도 증가되는 현상이 관찰되었으며 또한 인접패턴에 의해 FALC 속도가 영향을 받는 현상이 관찰되었다. 또한 전자가 움직이는 방향으로 MILC 선단영역 전후에 Void가 발생하는 영역이 존재함을 발견하였다. FESEM 분석을 통하여 FALC 영역 및 Void 영역을 관찰한 결과 도핑 종류에 따라 결정화 양상이 다른 것이 관찰되었으며 Void 분석결과 Charged vacancy가 어닐링시 결집되어 나타나는 것으로 분석할 수 있었다.

• Current Photovoltaic Research
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• v.5 no.3
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• pp.75-82
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• 2017

High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.

• Journal of Sensor Science and Technology
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• v.14 no.5
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• pp.357-361
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• 2005

Low-stress silicon nitride (LSN) thin films with embedded metal line have been developed as free standing structures to keep microspheres in proper locations and localized heat source for application to a chip-based sensor array for the simultaneous and near-real-time detection of multiple analytes in solution. The LSN film has been utilized as a structural material as well as a hard mask layer for wet anisotropic etching of silicon. The LSN was deposited by LPCVD (Low Pressure Chemical Vapor Deposition) process by varing the ratio of source gas flows. The residual stress of the LSN film was measured by laser curvature method. The residual stress of the LSN film is 6 times lower than that of the stoichiometric silicon nitride film. The test results showed that not only the LSN film but also the stack of LSN layers with embedded metal line could stand without notable deflection.

• Journal of the Korea Fashion and Costume Design Association
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• v.3 no.2
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• pp.75-86
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• 2001

The article is alms to investigate the characteristics, the originality, and the interest of fashion design of costume play, which is recently specifically popularized among young fashion mania. The influence of commercialization power of the Disneyland and the animation characters of Japanese caricatures makes the costume play to be one of the main new generation culture. Since the costume play just begins at this moment, the full understanding of the costume play is hard because of the small amount of the materials and happenings of the phenomena. However it reveals the design trends and creativity of the new generation. As the investigation of costume play fashion and the types of costume play, the following results are obtained. 1. The originality of the costume play is thought to be induced from the mask which is used against the ghost in primitive ages, the fancy parade of halloween festival, commercial advertisements of Disneyland, the Japanese caricatures, and the animation games. 2. The distinctive characteristics of Korean costume play shows the massive behaviour, which is different from the individualized costume play in Japan. This facts show the parts of the interest culture of the persons who has the equal interest. The costume play is applied as the sound showing culture, in which the young generation express and enjoy themselves by"kki" - the passion of young energy. 3. The boom of costume play introduce the increased number of costume play shop, pro model, and designer. It also introduce the interest of the new fashion design for the young generations. Thus it is expected the new fashion infra structure in near future.ar future.

• Journal of Intelligence and Information Systems
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• v.9 no.3
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• pp.65-79
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• 2003

In general, the extraction and recognition of identifier is very hard work, because the scale or location of identifier is not fixed-form. And, because the provided image is contained by camera, it has some noises. In this paper, we propose methods for automatic detecting edge using canny edge mask. After detecting edges, we extract regions of identifier by detected edge information's. In regions of identifier, we extract each identifier using contour tracking algorithm. The self-generation supervised learning algorithm is proposed for recognizing them, which has the algorithm of combining the enhanced ART1 and the supervised teaming method. The proposed method has applied to the container images. The extraction rate of identifier obtained by using contour tracking algorithm showed better results than that from the histogram method. Furthermore, the recognition rate of the self-generation supervised teaming method based on enhanced ART1 was improved much more than that of the self-generation supervised learning method based conventional ART1.

• Journal of the korean academy of Pediatric Dentistry
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• v.25 no.3
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• pp.539-544
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• 1998

Thermoformed appliance, which has been recently introduced for dental usage, is an appliance made of thermoformed sheets and formed with positive or negative pressure under heat. Thermoplastic material is a kind of plastics and can be repeatedly softened by heat. It is classified into hard elastic foil, hard/soft compound foil and soft elastic foil, including BIOPLAST, BIOCRYL, IMPRELON, etc. It has been developed in 1969 and is available in various thickness, shape and color. There are two types of Vacuum former for thermoplastic materials; the pressure type and suction type. The former is much better than the latter for fabrication of various appliances due to its higher pressure. The authors have applied these appliances to some cases - chin cap, active retainer, individual Fluoride tray, mouth protector, bracket transfer mask, bruxism splint(night guard), Essix appliance - by pressure type Vacuum former($Biostar^{(R)}$). The thermoplastic appliances have numerous advantages such as simple procedure, short working time, clean and transparent product, less objectionable taste. But its outstanding advantage would be its excellent biocompatibility bacause it has no monomer and hence no tissue irritation. Although there is some limitations in its usage, it can be used widely for various purposes especaily for pediatric dentistry.