Etching Characteristics of Polyimide Film as Interlayer Dielectric Using Inductively Coupled ($O_2/CF_4$ )Plasma
($O_2/CF_4$ 유도결합 플라즈마를 이용한 Polyimide 박막의 식각 특성)
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- Proceedings of the KIEE Conference
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- 2001.07c
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- pp.1509-1511
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- 2001