• Title/Summary/Keyword: HF2V

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The effects of different surface treatments on the shear bond strengths of two dual-cure resin cements to CAD/CAM restorative materials

  • Turker, Nurullah;Buyukkaplan, Ulviye Sebnem;Basar, Ebru Kaya;Ozarslan, Mehmet Mustafa
    • The Journal of Advanced Prosthodontics
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    • v.12 no.4
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    • pp.189-196
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    • 2020
  • PURPOSE. The aim of the present study was to investigate the effects of surface treatments on the bond strengths between polymer-containing restorative materials and two dual-cure resin cements. MATERIALS AND METHODS. In the present study, rectangular samples prepared from Lava Ultimate (LU) and Vita Enamic (VE) blocks were used. The specimen surfaces were treated using CoJet sandblasting, 50 ㎛ Al2O3 sandblasting, % 9 HF (hydrofluoric) acid, ER,Cr:YSGG laser treatment, and Z-Prime. Dual-cure resin cements (TheraCem and 3M RelyX U 200) were applied on each specimen's treated surface. A micro-tensile device was used to evaluate shear bond strength. Statistical analysis was performed using the SAS 9.4v3. RESULTS. While the bond strength using TheraCem with LU or VE was not statistically significant (P=.164), the bond strength using U200 with VE was statistically significant (P=.006). In the TheraCem applied VE groups, Z-Prime and HF acid were statistically different from CoJet, Laser, and Sandblast groups. In comparison of TheraCem used LU group, there was a statistically significant difference between HF acid and other surface treatments. CONCLUSION. The bonding performance between the restorative materials and cements were material type-dependent and surface treatment had a large effect on the bond strength. Within the limitations of the study, the use of both U200 and TheraCem may be suggested if Z-prime was applied to intaglio surfaces of VE. The cementation of LU using TheraCem is suitable after HF acid conditioning of the restoration surfaces.

용액 공정을 이용한 High-k 게이트 절연막을 갖는 고성능 InGaZnO Thin Film Transistors의 전기적 특성 평가

  • So, Jun-Hwan;Park, Seong-Pyo;Lee, In-Gyu;Lee, Gi-Hun;Sin, Geon-Jo;Lee, Se-Won;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.339-339
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    • 2012
  • 지난 몇 년 동안, 투명 비정질 산화물 반도체는 유기 발광 다이오드, 플렉서블 전자 소자, 솔라 셀, 바이오 센서 등 많은 응용분야에 연구되고 있다. 투명 비정질 산화물 반도체 그룹들 중, 특히 비정질 IGZO 박막 트랜지스터는 비정질 상태임에도 불구하고 높은 이동도와 낮은 동작 전압으로 훌륭한 소자 특성을 보인다. 이러한 고성능의 IGZO 박막 트랜지스터는 RF 마그네트론 스퍼터링이나 pulsed laser deposition과 같은 고진공 장비를 이용하여 이미 여러 그룹에서 제작되고 발표되었다. 하지만 진공 증착 시스템은 제조 비용의 절감이나 디스플레이 패널의 대면적화에 큰 걸림돌이 되고 있고, 이러한 문제점을 극복하기 위해서 용액 공정은 하나의 해결책이 될 수 있다. 용액 공정의 가장 큰 장점으로는 저온 공정이 가능하기 때문에 글라스나 플라스틱 기판에서 대면적으로 제작할 수 있고 진공 장비가 필요없기 때문에 제조 비용을 획기적으로 절감시킬 수 있다. 본 연구에서는 high-k 게이트 절연막과 IGZO 채널 층을 용액 공정을 이용하여 박막 트랜지스터를 제작하고 그에 따른 전기적 특성을 분석하였다. IGZO의 몰 비율은 In, Ga, Zn 순으로 각각 0.2 mol, 0.1 mol, 0.1 mol로 제작하였고, high-k 게이트 절연막으로는 Al2O3, HfO2, ZrO2을 제작하였다. 또한, 용액 공정 IGZO TFT를 제작하기 전, 용액 공정 high-k 게이트 절연막 캐패시터를 제작하여 그 특성을 분석하였다. 다양한 용액 공정 high-k 게이트 절연막 중, 용액공정 HfO2를 이용한 IGZO TFT는 228.3 [mV/dec]의 subthreshold swing, 18.5 [$cm^2/V{\cdot}s$]의 유효 전계 이동도, $4.73{\times}106$의 온/오프 비율을 보여 매우 뛰어난 전기적 특성을 확인하였다.

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TOF-MEIS System을 이용한 Ultra Thin Film 및 Composition and the Core/Shell Structure of Quantum Dot 분석

  • Jeong, Gang-Won;Kim, Jae-Yeong;Mun, Dae-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.284-284
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    • 2013
  • 중 에너지 이온 산란 분석법(Medium Energy Ion Scattering Spectrometer, MEIS)은 50~500 keV로 이온을 가속 후 시료에 입사시켜 시료의 원자와 핵간 충돌로 산란되는 일차이온의 에너지를 측정하여 시료를 분석하는 기법으로, 원자층의 깊이 분해능으로 초박막의 표면 계면의 조성과 구조를 분석 할수 있는 유용한 미세 분석기술이다. 본 실험에서 에너지 70~100 keV의 He+ 이온을 사용하여 Pulse Width 1 ns의 Pulsed ion beam을 만들어 Start 신호로 사용하고 Delay-line-detector에 검출된 신호를 End 신호를 이용한 TOF-MEIS System을 개발하였다. 활용 가능한 분석시편으로 Ultra thin film 시편으로 1, 1.5, 2, 2.5, 3, 4 nm의 HfO2, 1.8, 4nm의 SiO2 시편을 분석 하였으며 Ultra Shallow Junction 시편으로 As Doped Si, Cs Doped Si 시편 및 Composition, Core/shell 구조의 Q-dot 시편으로 CdSe, CdSe/ZnS등 다양한 분석 실험을 진행 하였다. Composition, Core/shell 구조의 Q-dot 시편은 Diamond Like Carbon(DLC)의 Substrate에 Mono-layer로 형성하여 분석하였다.

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Annealing Effects on Ultra thin MOS Capacitors

  • Ng, Alvin Chi-hai;Xu, Jun;Xu, J.B.;Cheung, W.Y.
    • Electrical & Electronic Materials
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    • v.16 no.9
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    • pp.62.1-62
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    • 2003
  • Silicon oxide with thickness lee than 9 nm is fabricated by tube furnace oxidation. Nitrogen is added to dilute the oxidation rate. Aluminum dots with radius of 0.05 cm are deposited on the oixde. High frequency capacitance-voltage(HF C-V), conductance-voltage(G-V) and current-voltage(I-V) characteristics are measured. Annealing under nitrogen atmosphere is carried out with different time and at different temperature. Densities of the interface states before and after annealing are compared. After annealing, a decrease in density of the interface states is found. Experiments show that 45$0^{\circ}C$ annealing for 30 minutes has the lowest density of the interface states.

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Effect of hydrogen addition to use DC sputtering method on the electrical properties of Al/AlN/Si MIS capacitor fabrication (DC sputtering법을 이용한 Al/AlN/Si MIS capacitor 제작 및 수소첨가가 전기적 특성에 미치는 영향)

  • Kim, Min-Suk;Kwon, Jung-Yul;Kim, Jee-Gyun;Lee, Heon-Yong;Lee, Hwan-Chul
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1919-1921
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    • 1999
  • AlN thin films were fabricated by sputter for the application of MIS device with Al/AlN/Si structure. We controled that sub-temperature room-temperature. Sputtering pressure 5 mTorr, flow ratio Ar:$N_2$=1:1(4sccm:4sccm), and appended hydrogen gas $0{\sim}5%$. AlN thin films thickness fabricated to maintain $2700{\AA}$ time control. Before the experiment remove to the contaminated material use the Ultrasonic every 10 minute use the acetone and ethanol, then use the HF remove oxide-substance at 10 second. To analyze characteristic of the $H_2$ gas addition period, C-V and I-V characteristic make and experiment $H_2$ gas at addition period progressive capability of I-V and C-V characteristic.

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전기분해법을 이용한 다이아몬드상 카본 박막 증착

  • Kim, Byung-Gyu;Kim, Eun-Mi;Kwon, Min-Chul;Kim, Yong;Lee, Jae-Yeol;Park, Hong-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.94-94
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    • 2000
  • 증류수(Distilled Water)와 메탄올(CH3OH)의 혼합용액을 전기분해하여 Si 기판위에 다이아몬드상 카본을 증찰하였다. Si 기판은 HF(16%) 용액으로 산화막을 제거하고, 전이금속 Co, Ni 박막을 증착시킨 후 전기 분해 장치의 전극 (-)단자에 연결하였다. (+)단자에는 순도 99%의 탄소 전극을 사용하였다. 기존의 에탄올, 에틸렌 글리콜(H2O-HOCH2CH2OH), 메탄올등의 전해질에 1000V 이상의 고전압을 인가하는 방법대신 메탄올과 증류수, 그리고 암모니아수(NH4OH)의 비를 달리하는 혼합액을 전해질로 사용하였다. 그결과 낮은 전압 (800V 이하)과 낮은 온도(6$0^{\circ}C$ 미만)에서도 다이아몬드상 카본을 증착할 수 있었다. 증착한 시료와 용액은 XRD, SEM, FT-IR 등을 이용하여 분석하였다.

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Synthesis, Characterization and Antimicrobial Activities of Hydrazone Ligands Derived from 2-(phenylamino)acetohydrazide and Their Metal Complexes (2-(Phenylamino)acetohydrazide로부터 유도된 Hydrzone 리간드와 그들의 착물의 합성, 특성 및 항균활성)

  • EL-Saied, F.A.;Shakdofa, M.M.E.;Al-Hakimi, A.N.
    • Journal of the Korean Chemical Society
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    • v.55 no.3
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    • pp.444-453
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    • 2011
  • VO(II), ZrO(II), Hf(IV), $UO_2$(II), Sn(II), V(V)$O_3$, Ru(III), Cd(II), Ho(III) and Yb(III) complexes of N'-(2-hydroxybenzyl)-2-(phenylamino)acetohydrazide ($H_2L^1$, 1) and N'-((3-hydroxy-naphthalen-2-yl)methylene)-2-(phenylamino)-acetohydrazide ($H_2L^2$, 13) have been synthesized and characterized by elemental analyses, $^1H$ NMR, IR, UV-Vis, conductance, thermal analyses (DTA and TG). The spectral data showed that the ligands behave as neutral bidentate, monobasic bidentate, monobasic tridentate or bibasic tridentate ligand bonded to the metal ions through the azomethine nitrogen atoms, phenolic hydroxyl group in protonated or deprotonated form and enolic or ketonic carbonyl group. The ligands and their metal complexes exhibit higher antifungal and antibacterial inhibitory effects than parent ligands and the solution of metal ions. Most of metal complexes exhibit higher antifungal activity than standard antifungal drug (amphotricene B). It is also clear that the ligands and their metal complexes have higher antifungal activity than antibacterial activity.

Geochemical Composition of Volcanic Ash from Historical Eruptions of Mt. Baekdu, Korea (역사시대에 분화한 백두산 화산재의 화학 성분)

  • Yun, Sung-Hyo;Koh, Jeon Seon;Chang, Cheolwoo
    • The Journal of the Petrological Society of Korea
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    • v.27 no.1
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    • pp.37-47
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    • 2018
  • Volcanic ash samples of historical eruptions from Mt. Baekdu were analyzed for major oxides, trace and rare earth elements by a variety of analytical techniques. The results indicate that the ashes consist of approximately 58.8~71.1 wt.% $SiO_2$, 9.6~16.8 wt.% $Al_2O_3$, 4.5~6.9 wt.% $Fe_2O_{3t}$, 0.1~1.7 wt.% MgO, 0.3~1.6 wt.% CaO, 5.2~6.3 wt.% $Na_2O$, 4.3~5.9 wt.% $K_2O$ and less than 1.2 wt.% $TiO_2$. Thirty two trace metals including Ba, Cu, Cr. Co, Ni, Sr, V, Zn, and Zr were analyzed. The ashes can be divided two groups: group A(1 ka Millennium pumice, 1668 and $190{\underline{3}}$ pumice) and group B(1702 pumice) according to the relative enrichment of HREEs. The abundances of heavy metals such as Cu, Co, Mn, and Zn were relatively low. As compared to the Sakurajima volcanic ash, Baekdusan volcanic ash has low concentrations of Y, Nb, Pb, U, Sc, V, Ni and Cu and high concentrations of Zr, Ba, Hf, Cr, Co, Zn and rare-earth (except Eu).

Fabrication of the accelerometer using the nano-gap trench etching (나노갭 트렌치 공정을 이용한 가속도센서 제작)

  • Kim, Hyeon-Cheol;Kwon, Hee-jun
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.9 no.2
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    • pp.155-161
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    • 2016
  • This paper proposes a novel fabrication method for a capacitive type micro-accelerometer with uniform nano-gap using photo-assisted electro-chemical etching. The sensitivity of the accelerometer should be improved while the electrodes between the inertial mass and the sensing comb should be narrowed. In this paper the nano-gap trench structure is fabricated using the photo-assisted electrochemical etching method. The sensor was designed and analysed using ANSYS simulator. The characteristics of the etching were observed according to the dc bias, the light intensity, the composition of the solution, the temperature of the solution, and the pattern pitch variation. The optimum etching conditions were dc bias of 2V, Blue LED of 20mA, 49wt% HF:DMF:D.I.Water=1:20:10, the pattern pitch of $20{\mu}m$. Uniform trench structure with width of 344nm and depth of $11.627{\mu}m$ are formed using the optimum condition.

A Study on the Pretreatment of BaTiOx Ceramics for the Analysis of Ba, Ti and W using Acid Digestion Bomb (가압 산분해법을 이용한 BaTiOx계 세라믹재료 중 Ba, Ti 및 W 분석을 위한 전처리 연구)

  • Park, Kyung-Su;Kim, Sun-Tae;Shim, Eui-Sup;Seo, Min-Jung;Lee, Seoung-Jae
    • Analytical Science and Technology
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    • v.15 no.1
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    • pp.15-19
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    • 2002
  • The pretreatment of tungsten added $BaTiO_x$ ceramics was performed to improve the recovery of Ba, Ti and W. $BaTiO_x$ ceramics were digested with HF : HCl ( 1 : 2 ) mixture in an acid digestion bomb at $220^{\circ}C$ for 3 hrs. The concentration of Ba, Ti and W were determined by ICP-AES. Recoveries of Ba, Ti and W were 99.6%, 99.8% and 99.2%, respectively. And their C.V. values were 1.02%, 0.73% and 1.79%. Using this method, the analytical results of Ba, Ti and W for a real sample were obainted to be 25.9% (w/w), 38.8% (w/w) and 3.31% (w/w), respectively.