Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1999.07d
- /
- Pages.1919-1921
- /
- 1999
Effect of hydrogen addition to use DC sputtering method on the electrical properties of Al/AlN/Si MIS capacitor fabrication
DC sputtering법을 이용한 Al/AlN/Si MIS capacitor 제작 및 수소첨가가 전기적 특성에 미치는 영향
- Kim, Min-Suk (Myongji University) ;
- Kwon, Jung-Yul (Myongji University) ;
- Kim, Jee-Gyun (Myongji University) ;
-
Lee, Heon-Yong
(Myongji University) ;
- Lee, Hwan-Chul (Daejin University)
- Published : 1999.07.19
Abstract
AlN thin films were fabricated by sputter for the application of MIS device with Al/AlN/Si structure. We controled that sub-temperature room-temperature. Sputtering pressure 5 mTorr, flow ratio Ar:
Keywords