• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.24 no.2
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• pp.155-160
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• 2024

The polarization-selective beam splitter grating can be widely used in numerous optical information processing systems. In this paper, to design a high-efficiency plasma polarization beam splitter (PBS), the structure composed of an Ag metal layer in Littrow mounting is implemented. To achieve high diffraction efficiency in the transmitted 0th-order TE polarization and the reflected 0th-order TM polarization, the grating depth and grating ratio of presented PBS is optimized by using rigorous Modal Transmission-Line Theory. From the optimized results, PBS has advantages of wide band properties for incident wavelength and angle, and the efficiency is higher than 95% for both TE and TM polarization. Therefore, this highly efficient PBS wideband grating with high extinction ratio can be used as an excellent optical diffraction device.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.3
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• pp.213-217
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• 2012

In this study, we have investigated the holographic grating formation on Ag-doped amorphous As-Ge-Se-S thin films. The dependence of diffraction efficiency as afunction of Ag layer thickness has been investigated in this amorphous chalcogenide films. Holographic gratings was formed using [P:P] polarized Diode Pumped Solid State laser (DPSS, 532.0 nm). The diffraction efficiency was obtained by +1st order intensity. The results were shown that the diffraction efficiency of Ag/AsGeSeS double layer thin films for the Ag thickness, the maximum grating diffraction efficiency using 60 nm Ag layer is 0.96%.

• Korean Journal of Optics and Photonics
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• v.28 no.2
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• pp.53-58
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• 2017

This paper presents the design and fabrication of a planar nano-diffraction grating for an integrated miniature spectrometer module. The proposed planar nano-diffraction grating consists of nonuniform periods, to focus the reflected beams from the grating's surface, and an asymmetrical V-shaped groove profile, to provide uniform diffraction efficiency in the wavelength range from 400 to 650 nm. Also, to fabricate the nano-diffraction grating using low-cost UV-NIL technology, we analyzed the FT-IR spectrum of a uvcurable resin and optimized the conditions for the UV curing process. Then, we precisely fabricated the polymeric nano-diffraction grating within 5 nm in dimensional accuracy. The integrated spectrometer module using the fabricated polymeric planar nano-diffraction grating provides spectral resolution of 5 nm and spectral bandwidth of 250 nm. Our integrated spectrometer module using a polymeric planar nano-diffraction grating serves as a quick and easy solution for many spectrometric applications.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.3
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• pp.18-26
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• 2010

Diffraction gratings with precise spatial periods of 2 ${\mu}m$ and 5 ${\mu}m$ have been fabricated by using a femtosecond laser which does not have limits on materials of micromachining and small thermal effects due to high peak power. Diffraction angle and diffraction efficiency of those were measured. Simulation results of diffraction angle and diffraction efficiency of the diffraction grating calculated with the parameters such as line width, depth, and spatial period of the fabricated gratings were compared with experimental results measured with a He-Ne laser. Besides these, Fresnel Zone Plates (FZPs) with focal distances of 50 mm and 25 mm were fabricated and focal distances of fabricated FZP were measured. Those experimental results for diffraction gratings and FZPs match well with experimental results.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.246-246
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• 2010

In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

• Proceedings of the KIEE Conference
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• 1987.07a
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• pp.47-50
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• 1987

There are various holographic recording materials, such as Dichromated Gelatin, Silver Halide, Thermoplastic, Photoresist. In this paper especially, we used Photoresist to make the phase holographic grating. Deep-groove diffractive grating formed in relatively thin holographic recording material is to express high diffraction efficiency. Phase holographic grating recorded In photoresist can be used very practical because it has the high diffraction efficiency, and it is possible to make a replication easily. So, it has the merit in recording the optical holographic grating than any other materials.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.133-136
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• 2001

In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of meta1(Ag) and chalcogenide( $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ ). The holographic grating in these thin flims has been formed using a linealy polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers. As the results, we found that the diffraction efficiency of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers were 1.7% and 2.5% respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.445-446
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• 2008

In this paper, we investigated the diffraction grating efficiency on Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on Ag/AsSeS thin films. As a result, for the films, the maximum grating diffraction efficiency using He-Ne laser(632nm) is 0.15%[2000sec]. And then The recording speed of DPSS laser was about 40s which of batter than He-Ne lasers.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.133-136
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• 2001

In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of metal(Ag) and chalcogenide(As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/). The holographic grating in these thin films has been formed using a lineally polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers. As the results, we found that the diffraction efficiency of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers were 1.7% and 2.5% respectively

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.490-493
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• 2003

We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}/Ag$ double-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under non-polarization state and p-polarization state and we confirm that the diffraction efficiency depend on thickness of Ag. The diffraction efficiency was obtained by first order intensity. We got the maximum diffraction efficiency that thickness of Ag was $600{\AA}$. The maximum diffraction efficiency was 13.5% in (P:P) polarization state.