• 제목/요약/키워드: Glow plasma

검색결과 147건 처리시간 0.037초

펄스모듈레이션 된 고주파 플라즈마의 시변특성 (Time-dependent Characteristics of Pulse Modulated rf Plasma)

  • 이선홍;박정후;이호준
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권11호
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    • pp.566-571
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    • 2004
  • Pulse modulation technique provide additional controling method for electron temperature and density in rf and microwave processing plasma. Transient characteristics of electron density and temperature have been measured in pulse modulated rf inductively coupled argon plasma using simple probe circuit. Electron temperature relaxation is clearly identified in the after glow stage. Controllability of average electron temperature and density depends on the modulation frequency and duty ratio. Numerical calculation of time-dependent electron density and temperature have been performed based on the global model. It has been shown that simple langmuir probe measurement method used for continuous plasma is also applicable to time-dependent measurement of pulse modulated plasma.

주조 스테인리스강의 해양환경 하에서 플라즈마 이온질화 공정온도에 따른 부식특성 연구 (Corrosion Characteristics of Cast Stainless Steel under Plasma Ion Nitriding Process Temperature in Marine Environment)

  • 정상옥;김성종
    • 한국표면공학회지
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    • 제50권6호
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    • pp.504-509
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    • 2017
  • In order to improve corrosion resistance for cast stainless steel in seawater, the characteristics of corrosion resistance after plasma ion nitriding was investigated. Plasma ion nitriding process was conducted in a mixture of nitrogen of 25% and hydrogen of 75% at substrate temperature ranging from 350 to $500^{\circ}C$ for 10 hours using pulsed-DC glow discharge plasma with working pressure of 250 Pa in vacuum condition. Corrosion tests were carried out for as-received and plasma ion nitrided specimens. The corrosion characteristics were investigated by measurement of weight loss and observation of surface morphology. In anodic polarization experiment, relatively less damage depth and weight loss were presented at a nitrided temperature of $400^{\circ}C$, attributing to the formation of S-phase.

Laterally Encapsulated Cathode Structure for DC Plasma Display Panels

  • Esfahani, M.Mokhlespour;Mohajerzadeh, S.;Goodarzi, A.;Rouhi, N.;Tarighat, R.S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1233-1236
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    • 2005
  • We report a novel approach for encapsulating of cathode electrodes in DC plasma pixels. Anode and cathode electrodes are laterally placed on a single substrate. The encapsulated electrode minimizes the sputtering of the cathode without significantly altering the turn-on voltage-pressure characteristics. An abnormal glow in current-voltage characteristics is also observed.

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표면 처리용 자화 Plasma 형성에 관한 연구 (A Study on The Development of Magnetoplasma For Surface Treatment)

  • 손인용;장두진;김상태;곽영순;조정수;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1992년도 하계학술대회 논문집 B
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    • pp.900-902
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    • 1992
  • In order to develope the uniform Plasma source which is able to make polymer or glass surface modification, the d.c glow discharge characteristics for the hemisphere -cylindrical electrode system with external d.c magnetic field are investigated. Single probe method has been used for detecting plasma parameters. We make uniform plasma generated to the external of electrode between hemisphere and cylindrical electrode. The surface treatment of metal and insulate has been performed by this uniform plasma.

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슈퍼박테리아 감염 치료를 위한 저전압 구동 플라즈마-온-칩 (Low Voltage Plasma-on-a-Chip for Inactivation of Superbacteria)

  • 임토우;황솔;김영민
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2015년도 제46회 하계학술대회
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    • pp.1249-1250
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    • 2015
  • We report a plasma-on-a-chip (POC) which provides a non-thermal atmospheric plasma for superbacteria infection treatment A three-electrode configuration allows an initiation carrier injection prior to a primary discharge, leading to a significant reduction in a breakdown voltage. A stable non-thermal argon plasma is generated using a pulsed glow discharge and inactivation of anti-biotic resistant bacteria, for example MRSA, is successfully demonstrated by exposing the bacteria to the argon plasma in a couple of minutes.

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저압 열전자 방전 플라즈마의 Monte Carlo 시뮬레이션 (Monte Carlo Simulation of Thermionic Low Pressure Discharge Plasma)

  • 고욱희
    • 전기학회논문지
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    • 제61권12호
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    • pp.1880-1885
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    • 2012
  • Nonlinear dynamical behaviors in thermionic low pressure discharge are investigated using a particle-in-cell(PIC) simulation. An electrostatic PIC code is developed to model the plasma discharge system including the kinetic effects. The elastic collision, excitation collision, ionization collision, and electron-ion recombination collision are considered in this code. The generated electrons and ions are traced to analyze physical characteristics of the plasma. The simulation results show that the nonlinear oscillation structures are observed for cold plasma in the system and the similar structures are observed for warm plasma with a shift in values of the bifurcation parameter. The detailed oscillation process can be subdivided into three distinct mode; anode-glow, temperature-limited, and double-layer modes.

알곤저온플라즈마처리된 고분자표면의 모폴로지에 대한 비교연구 (Comparative Studies on Morphology of Low Temperature Ar-Plasma-treated Polymer Surfaces)

  • 서은덕
    • 한국염색가공학회지
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    • 제16권5호
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    • pp.35-41
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    • 2004
  • Poly(ethylene terephthalate), polyimide(Kapton), and polypropylene surfaces were modified with argon low temperature plasma by RF glow discharge at 240m Torr, 40W to investigate the surface morphological changes due to the plasma treatment using atomic force microscopy(AFM). Analysis of the AFM images and Ra(average roughness) revealed that the plasma treatment resulted in significant ablation on the surfaces. The morphological changes and surface roughness, however, were different depending on material characteristics such as heat stability, presence of amorphous region, swelling phenomenon, and molecular structure of repeating unit. It was assumed that polypropylene due to its tertiary hydrogen was ablated easily compared to poly(ethylene terephthalate), and that polyimide was more resistant to the ablation than PET due to rigid skeleton of imide and stable phenyl ring structure.

펄스직류방전과 유도결합방전의 복합에 의한 SCM440강의 이온질화 (Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma)

  • 김윤기
    • 한국표면공학회지
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    • 제43권2호
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    • pp.91-96
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    • 2010
  • SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

Plasma Synthesis of Silicon Nanoparticles for Next Generation Photovoltaics

  • Kim, Ka-Hyun;Kim, Dong Suk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.135.1-135.1
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    • 2014
  • Silicon nanoparticles can be synthesized in a standard radio-frequency glow discharge system at low temperature (${\sim}200^{\circ}C$). Plasma synthesis of silicon nanoparticles, initially a side effect of powder formation, has become over the years an exciting field of research which has opened the way to new opportunities in the field of materials deposition and their application to optoelectronic devices. Hydrogenated polymorphous silicon (pm-Si:H) has a peculiar microstructure, namely a small volume fraction of plasma synthesized silicon nanoparticles embedded in an amorphous matrix, which originates from the unique deposition mechanism. Detailed discussion on plasma synthesis of silicon nanoparticles, growth mechanism and photovoltaic application of pm-Si:H will be presented.

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플라즈마동합법에 의한 유기피막의 성장기정에 관한 연구 (A Study on Growth Mechanism of Organic Thin Films by the Plasma Polymerization)

  • 이덕철;한상옥;박구범
    • 대한전기학회논문지
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    • 제36권1호
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    • pp.29-35
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    • 1987
  • TPolystyrene thin films are prepared by glow discharge of sytrene monomer vapor th establish the growth mechanism of organic thin films by the plasma polymerization. As the discharge parameters, discharge current(5mA-20mA), frequency (10kHz-50kHz, 13.56MHz), gaspressure (0.2torr-1.5torr), and discharge time(2min-12min)are adopted. Plasma-polymerized filmsof styrene vapor are identified as polystyrene by IR spectra. The thickness of plasma-polymerized films increases with gas pressure, frequency and discharge current in the region of the low frequency and below the allowed gas pressure where the polymerization occurs. It is suggested that the growth mechanism can be explained by ionic reaction in d.c. and low frequency region, and by radical reaction in high frequency region.