• Title/Summary/Keyword: Glass panel

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Barrier Rib Patterning Technology for Cost Effective High Resolution PDP

  • Park, Lee-Soon;Paek, Sin-Hye;Yun, Sang-Won;Choi, Hyung-Suk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.989-993
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    • 2002
  • Barrier ribs in the color plasma display panel(PDP) function to maintain the discharge space between to glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, mid barrier rib powder. Study on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation, both photolithographic and transparent soft molding method resulted in fine pattern of barrier ribs with high aspect ratio.

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Application of Neodymium Oxide into Transparent Dielectric Materials for PDP

  • Jung, Byung-Hae;Kim, Hyung-Sun;Lee, Ki-Sung;Sohn, Sang-Ho;Kwon, Tae-In;Lee, Sung-Wook
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.799-802
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    • 2002
  • For purer images in plasma display panel, a new dielectric compositions containing neodymium oxide were studied. In the present study, Pb-based compositions were used as mother glasses (PbO-$B_2O_3-SiO_2Nd_2O_3$) and thermal, dielectric, and optical properties were measured. As a result the new dielectric with a rare-earth oxide made selectively visible light penetrated and showed especially noticeable absorption properties at 585 nm that is surely related to the erroneous gas from Ne discharge. Thus, this light purple colored glass composition will help PDP to come true to get better imaging process.

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The Effect of the Plasma Treatment in ITO Film to reduce impurities in LCOS Imager

  • Kim, Joo-Hyung;Kim, Sang-Ha;Cho, Chul-Sik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.541-544
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    • 2002
  • The reflective liquid crystal(LC) imager in one panel Liquid Crystal on Silicon(LCoS) System must have the properties such as fast response time, high contrast ratio(C/R) and voltage holding ratio(VHR) which are more related to the lifetime of imager than the others. As the high-output light including a short wavelength from UHP lamp is exposed to LCoS imager, the indium metal impurities, which decrease the C/R and VHR, are diffused from ITO thin film on glass. To ensure the high reliable LCoS imager for HD projection TV, we have studied the effects of the plasma treatment on ITO film to reduce impurities in imager.

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Fabrication of a Dual-Gap Substrate Using the Replica-molding Technique for Transflective Liquid Crystal Displays

  • Kim, Yeun-Tae;Hong, Jong-Ho;Cho, Seong-Min;Lee, Sin-Doo
    • Journal of Information Display
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    • v.10 no.2
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    • pp.68-71
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    • 2009
  • A replica-molding method of fabricating a dual-gap substrate for transflective liquid crystal (LC) displays is demonstrated. The dual-gap substrate provides homeotropic alignment for the LC molecules without any surface treatment and embedded bilevel microstructure on one of the two surfaces to maintain different cell gaps between the transmissive and reflective subpixels. The proposed transflective LC cell shows no electro-optic disparity between two subpixels and reduces the panel thickness and weight by 30% compared to the conventional transflective LC cell, which has two glass substrates.

The Optimization of the Organic Passivation Process in the TFT-LCD Panel for LCD Televisions

  • Lee, Yeong-Beom;Jun, Sahng-Ik
    • Journal of Information Display
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    • v.10 no.2
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    • pp.54-61
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    • 2009
  • The results of the optimization of the organic passivation process for fabricating thin-film transistors (TFTs) with a high aperture ratio on a seventh-generation glass (2200${\times}$1870 mm) substrate for LCD-TV panels are reported herein. The optimization of the organic passivation process has been verified by checking various factors, including the material properties (e.g., thickness, stain, etching, thermal reflow) and the effects on the TFT operation (e.g., gate/data line delay and display-driving properties). The two main factors influencing the organic passivation process are the optimization of the final thickness of the organic passivation layer, and the gate electrode. In conclusion, the minimum possible final thickness was found to be $2.42{\um}m$ via simulation and pilot testing, using the full-factorial design. The optimization of the organic passivation layer was accomplished by improving its brightness by over 10 cd/$m^2$ (ca. 2% luminance) compared to that of the conventional organic passivation process. The results of this research also help reduce the reddish stain on display panels.

Development of the CuN/Cu/CuN type Electrode Material for the PDP (PDP용 CuN/Cu/CuN 전극재료의 개발에 관한 연구)

  • 성열문;정신수;류재하;김재성;조정수;박정후
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.55-58
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    • 1996
  • A new type CuN/Cu/CuN thin film electrode material with high adhesion to glass was developed by the dc reactive planar magnetron sputtering system for the PDP(Plasma Display Panel). The adhesive force of the CuxN thin film was in the range of 20∼40(N) under the conditions of the N$_2$ partial pressure of 15%, discharge current of 70mA, discharge voltage of 450v and substrate bias voltage of -100V. The adhesive force was depended on the N$_2$ partial Pressure, discharge current and substrate bias voltage.

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Periodic patterning using a femtosecond laser (펨토초 레이저를 이용한 미세 패터닝 기술)

  • Sohn Ik-Bu;Lee Man-Seop;Woo Jung-Sik;Lee Sang-Man;Chung Jeong-Yong
    • Laser Solutions
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    • v.8 no.1
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    • pp.39-44
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    • 2005
  • We report experimental results on the periodic patterning using a Ti:sapphire femtosecond laser (800nm, 100fs, 1kHz). Periodic structures with reproducible basic patterns are produced both on the surface and inside transparent materials. Period patterning for the application to display panel is widely investigated. Also, the submicron dot and line patterns are fabricated inside fused silica glass, which is important for the formation of diffraction grating in integrated optical circuit. finally, we demonstrate the utility of the femtosecond laser application to optical memory by fabricating the three-dimensional dot patterns.

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Laser Direct Patterning of Carbon Nanotube Film

  • Yun, Ji-Uk;Jo, Seong-Hak;Jang, Won-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.203-203
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    • 2012
  • The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

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Solid Phase Crystallization Kinetics of Amorphous Silicon at High Temperatures

  • Hong, Won-Eui;Kim, Bo-Kyung;Ro, Jae-Sang
    • Journal of the Korean institute of surface engineering
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    • v.41 no.2
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    • pp.48-50
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    • 2008
  • Solid phase crystallization (SPC) of amorphous silicon is usually conducted at around $600^{\circ}C$ since it is used in the application of flat panel display using thermally susceptible glass substrate. In this study we conducted SPC experiments at temperatures higher than $600^{\circ}C$ using silicon wafers. Crystallization rate becomes dramatically rapid at higher temperatures since SPC kinetics is controlled by nucleation with high value of activation energy. We report SPC kinetics of high temperatures compared to that of low temperatures.

Study on Correlation between flashover and smoke production rate in real scale reaction-to-fire test (실대규모 화재시험시 플래시오버와 연기발생율간의 상관성 연구)

  • Park, Kye-Won;Im, Hong-Soon;Jeong, Jae-Gun;Kim, Woon-Hyung
    • Proceedings of the Korea Institute of Fire Science and Engineering Conference
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    • 2010.04a
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    • pp.289-296
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    • 2010
  • This study is aiming at analyzing correlation between flashover's time and maximum smoke production rate's time on sandwich panel specimens. For this analysis, KS F ISO 137481-1 has been performed for 23 kinds of sandwich panels which mainly consist of EPS, PIR, PUR, Glass wool and so on. KS F ISO 13784-1 represents real scale reaction-to-fire test and focuses on measuring flashover phenomenon rather than other tests as like ISO 5660-1 and SBI.

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