• Title/Summary/Keyword: GeO

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$Bi_4Ge_3O_{12}$ Crystal Growth by Czochralski Method and the Effect of Composition on Optical Properties (쵸크랄스키법에 의한 $Bi_4Ge_3O_{12}$ 단결정 육성 및 화학조성이 광학적 성질에 미치는 영향)

  • 배인국;황진명
    • Korean Journal of Crystallography
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    • v.10 no.1
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    • pp.39-44
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    • 1999
  • 주파수 무선센서에 의한 자동직경제어방식으로 쵸크랄스키법에 의해 Bi4Ge3O12 단결정을 육성하였다. Bi4Ge3O12의 화학양론적 조성으로부터 Bi2O3와 GeO2의 조성비를 변화시키면서 단결정을 육성하였다. 광학적인 투과도 조사결과, 화학양론적 조성에서 가장 우수한 투과도를 나타내었고 과잉의 Bi2O3에서는 투과도가 현저히 낮아졌다. 또한 육성된 단결정의 결함밀도는 ∼1×103/cm2이었다.

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Structural Dependence of Nonlinear Optical Properties in $TeO_2-PbO-GeO_2$ ($TeO_2-PbO-GeO_2$계 유리 내 비선셩 광학 특성의 구조 의존성)

  • Kim, Weon-Hyo;Heo, Jong;Kim, You-Song;Ryou, Sun-Youn
    • Journal of the Korean Ceramic Society
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    • v.33 no.5
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    • pp.507-513
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    • 1996
  • Nonlinear optical properties of TeO2-PbO-GeO2 glasses were investigated and their correlation with struc-tural modification was investigated. Third-order nonlinear susceptibility $\chi$, ranged between 5.0$\times$10-13 esu and 10.7$\times$10-13 esu which are approximately 20-40 times larger than that of silica glass. The glass with a composition of 85(80TeO2-20PbO)-15GeO2(mol%) seemed to provide an optimum compromise between $\chi$and the stability against crystallization. Analyses of the Raman spectra suggested that these glasses are mainly composed of [TeO4] tbp, [TeO3]tp and [GeO4] tetrahedral structural units. It was concluded that the positive contribution of Pb2+ with high polarizability to $\chi$ in TeO2-PbO glasses overwhelmed the negative influence due to the structural modification of [TeO4]tbplongrightarrow[TeO3]tp. On the other hand addition of GeO2 in TeO2-PbO-GeO2 glasses resulted in the decrease of $\chi$ values. This behavior was attributed to the formation of [GeO4] polyhedra at the expense of [TeOn] polyhedra and Pb2+ ions which normally sowed a higher contribu-tion to $\chi$ than [GeO4] polyhedra.

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Electrochemical Performance of M2GeO4 (M = Co, Fe and Ni) as Anode Materials with High Capacity for Lithium-Ion Batteries

  • Yuvaraj, Subramanian;Park, Myung-Soo;Kumar, Veerasubramani Ganesh;Lee, Yun Sung;Kim, Dong-Won
    • Journal of Electrochemical Science and Technology
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    • v.8 no.4
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    • pp.323-330
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    • 2017
  • $M_2GeO_4$ (M = Co, Fe and Ni) was synthesized as an anode material for lithium-ion batteries and its electrochemical characteristics were investigated. The $Fe_2GeO_4$ electrode exhibited an initial discharge capacity of $1127.8mAh\;g^{-1}$ and better capacity retention than $Co_2GeO_4$ and $Ni_2GeO_4$. A diffusion coefficient of lithium ion in the $Fe_2GeO_4$ electrode was measured to be $12.7{\times}10^{-8}cm^2s^{-1}$, which was higher than those of the other two electrodes. The electrochemical performance of the $Fe_2GeO_4$ electrode was improved by coating carbon onto the surface of $Fe_2GeO_4$ particles. The carbon-coated $Fe_2GeO_4$ electrode delivered a high initial discharge capacity of $1144.9mAh\;g^{-1}$ with good capacity retention. The enhanced cycling performance was mainly attributed to the carbon-coated layer that accommodates the volume change of the active materials and improves the electronic conductivity. Our results demonstrate that the carbon-coated $Fe_2GeO_4$ can be a promising anode material for achieving high energy density lithium-ion batteries.

Epitaxial Growth of MgO and CoFe/MgO on Ge(001) Substrates by Molecular Beam Epitaxy

  • Jeon, Kun-Rok;Park, Chang-Yup;Shin, Sung-Chul
    • Proceedings of the Korean Magnestics Society Conference
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    • 2009.12a
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    • pp.190-190
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    • 2009
  • We report the epitaxial growth of MgO and CoFe/MgO on Ge (001) substrates using molecular beam epitaxy. It was found that the epitaxial growth of a MgO film on Ge could be realized at a low growth temperature of $125{\pm}5^{\circ}C$ and the MgO matches the Ge with a cell ratio of $\sqrt{2}$:1 which renders MgO rotated by $45^{\circ}$ relative to Ge. In-situ and ex-situ structural characterizations reveal the epitaxial crystal growth of bcc CoFe/MgO on Ge with the in-plane crystallographic relationship of CoFe(001)[100] || MgO(001)[110] || Ge(001)[100], exhibiting sharp interfaces in the (001) matching planes. The saturation magnetization of the sample is $1430{\pm}20$ emu/cc, which is comparable to the value of bulk CoFe.

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Effect of GeO2 on embryo development and photosynthesis in Fucus vesiculosus (Phaeophyceae)

  • Tarakhovskaya, Elena R.;Kang, Eun-Ju;Kim, Kwang-Young;Garbary, David J.
    • ALGAE
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    • v.27 no.2
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    • pp.125-134
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    • 2012
  • Germanium dioxide ($GeO_2$) has been used for many years in the cultivation of red and green algae as a means of controlling the growth of diatoms. Brown algae are sensitive to $GeO_2$, however, the basis of this sensitivity has not been characterized. Here we use embryos of $Fucus$ $vesiculosus$ to investigate morphological and physiological impacts of $GeO_2$ toxicity. Morphometric features of embryos were measured microscopically, and physiological features were determined using pulse amplitude modulated (PAM) fluorometry. At 5 mg $L^{-1}$ $GeO_2$, embryos grew slower than controls and developed growth abnormalities. After 24 h, initial zygote divisions were often oblique rather than transverse. Rhizoids had inflated tips in $GeO_2$ and were less branched, and apical hairs were deformed, with irregularly aligned, spheroidal cells. Minimum fluorescence ($F_0$) showed minor differences over the 10 days experiment, and pigment levels (chlorophylls $a$, $c$ and total carotenoids) showed no difference after 10 days. Optimum quantum yield increased from ca. 0.52 at 24 h to 0.67 at 5 days, and $GeO_2$-treated embryos had higher mean values (significant at 3 and 5 days). Optimum quantum yield of photosystem II (${\Phi}_{PSII}$) was stable in control thalli after 5 days, but declined significantly in $GeO_2$. Addition of silica (as $SiO_2$) did not reverse the effects of $GeO_2$. These results suggest that $GeO_2$ toxicity in brown algae is associated with negative impacts at the cytological level rather than metabolic impacts associated with photosynthesis.

Capacitance-Voltage Characterization of Ge-Nanocrystal-Embedded MOS Capacitors (Ge 나노입자가 형성된 MOS 캐패시터의 캐패시턴스와 전압 특성)

  • Park, Byoung-Jun;Choi, Sam-Jong;Cho, Kyoung-Ah;Kim, Sang-Sig
    • Journal of IKEEE
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    • v.10 no.2 s.19
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    • pp.156-160
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    • 2006
  • Capacitance versus voltage (C-V) curves of Ge-nanocrystal (NC)-embedded MOS capacitors with and without a single capping Al2O3 layer are characterized in this work. C-V curves of the Ge-NC-embedded MOS capacitor with the A12O3 layer are counterclockwise in the voltage sweeps, which indicates tile presence of charge storages in the Ge NCs by the tunnelling of charge carriers between the Si substrate and the Ge NCs. In the Ge-NC-embedded MOS capacitor without Al2O3 layer, clockwise hysteresis of the C-V curves and leftward shifts of the flat band voltages are observed for the embedded MOS capacitor without the Al2O3 layer. It is suggested that the characteristics of the C-V curves are due to the charge trapping at oxygen vacancies within a SiO2 layer. In addition, the illumination of the white light enhances the lower capacitance part of the C-V hysteresis. The origin for the enhancement is discussed in this paper.

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Electrical and Optical Properties of Bi12(Si,Ge)O20 Single Crystals (Bi12(Si,Ge)O20 단결정의 전기 및 광학적 특성)

  • Kim, Douk Hoon;Mun, Jung Hak;Lee, Chanku;Lee, Sudae
    • Journal of Korean Ophthalmic Optics Society
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    • v.1 no.2
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    • pp.37-42
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    • 1996
  • The $Bi_{12}(Si,Ge)O_{20}$ single crystals were prepared by Czochralski method and the study of electrical and optical properties were carried out. The activation energy of the electrical conductivity was $E_g$=1.12 eV. The optical energy gap measured in the room temperature is found to be 2.3 eV. A.c. conductivity of crystal $Bi_{12}(Si,Ge)O_{20}$ was measured at temperatures from 290 K to 570 K in the frequency range from 50 kHz to 30 MHz. The a.c. conductivity is proportional to ${\omega}^s$. In view of this it should be hopping conduction mechanisms. At high frequencies, the power exponent was s=2. The low frequency dielectric constants were 54 for $Bi_{12}(Si,Ge)O_{20}$ and 41 for $Bi_{12}(Si,Ge)O_{20}$ single crystals.

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Low-Temperature Sinterbility of Semiconducting $BaTiO_3$ Ceramics with $Pb_5Ge_3O_11$ Additives ($Pb_5Ge_3O_11$에 의한 반도성 $BaTiO_3$ 세라믹스의 저온소결성)

  • 윤상옥;정형진;윤기현
    • Journal of the Korean Ceramic Society
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    • v.28 no.5
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    • pp.359-364
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    • 1991
  • The effects of Pb5Ge3O11 on the sinterbility and lattice variation of the semiconducting 0.15 mol% Y2O3 doped BaTiO3 have been investigated as functions of additive contents (from 0.25 mol% to 2.5 mol%) and sintering temperatures (from 110$0^{\circ}C$ to 130$0^{\circ}C$). As the amount of Pb5Ge3O11 increases, the sinterbility of BaTiO3 increases abruptly at around 115$0^{\circ}C$. During the sintering, the most of Pb+2 ions in additives penetrate into BaTiO3 lattices and Ge+4 ions present at grain boundaries. Therefore the c lattice of the BaTiO3 increases largely and then the tetragonality increases due to the diffusion of the Pb+2 ions.

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The effects of pile dup Ge-rich layer on the oxide growth of $Si_{1-x}Ge_{x}$/Si epitaxial layer (축적된 Ge층이 $Si_{1-x}Ge_{x}$/Si의 산화막 성장에 미치는 영향)

  • 신창호;강대석;박재우;송성해
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.449-452
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    • 1998
  • We have studied the oxidatio nrte of $Si_{1-x}Ge_{x}$ epitaxial layer grown by MBE(molecular beam epitaxy). Oxidation were performed at 700.deg. C, 800.deg. C, 900.deg. C, and 1000.deg. C. After the oxidation, the results of AES(auger electron spectroscopy) showed that Ge was completely rejected out of the oxide and pile up at $SiO_{2}/$Si_{1-x}Ge_{x}$ interface. It is shown that the presence of Ge at the $SiO_{2}$/$Si_{1-x}Ge_{x}$ interface changes the dry oxidation rate. The dry oxidation rate was equal to that of pure Si regardless of Ge mole fraction at 700.deg. C and 800.deg.C, while it was decreased at both 900.deg. C and 1000.deg.C as the Ge mole fraction was increased. The ry oxidation rates were reduced for heavy Ge concentration, and large oxidation time. In the parabolic growth region of $Si_{1-x}Ge_{x}$ oxidation, The parabolic rate constant are decreased due to the presence of Ge-rich layer. After the longer oxidation at the 1000.deg.C, AES showed that Ge peak distribution at the $SiO_{2}$/$Si_{1-x}Ge_{x}$ interface reduced by interdiffusion of silicon and germanium.

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Dry oxidation of Germanium through a capping layer

  • Jeong, Mun-Hwa;Kim, Dong-Jun;Yeo, In-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.143.1-143.1
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    • 2016
  • Ge is a promising candidate to replace Si in MOSFET because of its superior carrier mobility, particular that of the hole. However Ge oxide is thermodynamically unstable. At elevated temperature, GeO is formed at the interface of Ge and GeO2, and its formation increases the interface defect density, degrading its device performance. In search for a method to surmount the problem, we investigated Ge oxidation through an inert capped oxide layer. For this work, we prepared low doped n-type Ge(100) wafer by removing native oxide and depositing a capping layer, and show that GeO2 interface can be successfully grown through the capping layer by thermal oxidation in a furnace. The thickness and quality of thus grown GeO2 interface was examined by ellipsometry, XPS, and AFM, along with I-V and C-V measurements performed at 100K to 300K. We will present the result of our investigation, and provide the discussion on the oxide growth rate, interface state density and electrical characteristics in comparison with other studies using the direct oxidation method.

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