• Title/Summary/Keyword: Ge-Mn intermetallic compounds

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Annealing Effect on Magneto-transport Properties of Amorphous Ge1-xMnx Semiconductor Thin Films (비정질 Ge1-xMnx 박막의 자기수송특성에 미치는 열처리 효과)

  • Kim, Dong-Hwi;Lee, Byeong-Cheol;Lan Anh, Tran Thi;Ihm, Young-Eon;Kim, Do-Jin;Kim, Hyo-Jin;Yu, Sang-Soo;Baek, Kui-Jong;Kim, Chang-Soo
    • Journal of the Korean Magnetics Society
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    • v.19 no.4
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    • pp.121-125
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    • 2009
  • Amorphous $Ge_1$_$_xMn_x$ semiconductor thin films grown by low temperature vapor deposition were annealed at various temperatures from 400 to $700^{\circ}C$ for 3 minutes in high vaccum chamber. The electrical and magnetotransport properties of as-grown and annealed samples have been studied. X-ray diffraction patterns analysis revealed that the samples still maintain amorphous state after annealling at $500^{\circ}C$ for 3 minutes and they were crystallized when annealing temperature increase to $600^{\circ}C$. Temperature dependence of resistivity measurement implied that as-grown and annealed $Ge_1$_$_xMn_x$ films have semiconductor characteristics, the increase of resistivity with annealling temperature was obseved. The $700^{\circ}C$-annealed sample exhibited negative magnetoresistance (MR) at low temperatures and the MR ratio was ${\sim}$8.5% at 10 K. The asymmetry was present in all MR curves. The anomalous Hall Effect was also observed at 250 K.

Annealing Effect on Magnetic and Electrical Properties of Amorphous Ge1-xMnx Thin Films (비정질 Ge1-xMnx 박막의 전기적, 자기적 특성에 미치는 열처리 효과)

  • Lee, Byeong-Cheol;Kim, Dong-Hwi;Anh, Tran Thi Lan;Ihm, Young-Eon;Kim, Do-Jin;Kim, Hyo-Jin;Yu, Sang-Soo;Baek, Kui-Jong;Kim, Chang-Soo
    • Journal of the Korean Magnetics Society
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    • v.19 no.3
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    • pp.89-93
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    • 2009
  • Amorphous $Ge_{1-x}Mn_x$ semiconductor thin films grown by low temperature vapor deposition were annealed, and their electrical and magnetic properties have been studied. The amorphous thin films were $1,000{\sim}5,000\;{\AA}$ thick. Amorphous $Ge_{1-x}Mn_x$ thin films were annealed at $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$, $600^{\circ}C$ and $700^{\circ}C$ for 3 minutes in high vacuum chamber. X-ray diffraction analysis reveals that as-grown $Ge_{1-x}Mn_x$ semiconductor thin films are amorphous and are crystallized by annealing. Crystallization temperature of amorphous $Ge_{1-x}Mn_x$ semiconductor thin films varies with Mn concentration. Amorphous $Ge_{1-x}Mn_x$ thin films have p-type carriers and the carrier type is not changed during annealing, but the electrical resistivity increases with annealing temperature. Magnetization characteristics show that the as-grown amorphous $Ge_{1-x}Mn_x$ thin films are ferromagnetic and the Curie temperatures are around 130 K. Curie temperature and saturation magnetization of annealed $Ge_{1-x}Mn_x$ thin films increase with annealing temperature. Magnetization behavior and X-ray analysis implies that formation of ferromagnetic $Ge_3Mn_5$ phase causes the change of magnetic and electrical properties of annealed $Ge_{1-x}Mn_x$ thin films.