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http://dx.doi.org/10.4283/JKMS.2009.19.3.089

Annealing Effect on Magnetic and Electrical Properties of Amorphous Ge1-xMnx Thin Films  

Lee, Byeong-Cheol (Chungnam National University)
Kim, Dong-Hwi (Chungnam National University)
Anh, Tran Thi Lan (Chungnam National University)
Ihm, Young-Eon (Chungnam National University)
Kim, Do-Jin (Chungnam National University)
Kim, Hyo-Jin (Chungnam National University)
Yu, Sang-Soo (Samsung Techwin Co., Ltd)
Baek, Kui-Jong (Techno Semichem Co., Ltd)
Kim, Chang-Soo (Korea Research Institute of Standards and Science)
Abstract
Amorphous $Ge_{1-x}Mn_x$ semiconductor thin films grown by low temperature vapor deposition were annealed, and their electrical and magnetic properties have been studied. The amorphous thin films were $1,000{\sim}5,000\;{\AA}$ thick. Amorphous $Ge_{1-x}Mn_x$ thin films were annealed at $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$, $600^{\circ}C$ and $700^{\circ}C$ for 3 minutes in high vacuum chamber. X-ray diffraction analysis reveals that as-grown $Ge_{1-x}Mn_x$ semiconductor thin films are amorphous and are crystallized by annealing. Crystallization temperature of amorphous $Ge_{1-x}Mn_x$ semiconductor thin films varies with Mn concentration. Amorphous $Ge_{1-x}Mn_x$ thin films have p-type carriers and the carrier type is not changed during annealing, but the electrical resistivity increases with annealing temperature. Magnetization characteristics show that the as-grown amorphous $Ge_{1-x}Mn_x$ thin films are ferromagnetic and the Curie temperatures are around 130 K. Curie temperature and saturation magnetization of annealed $Ge_{1-x}Mn_x$ thin films increase with annealing temperature. Magnetization behavior and X-ray analysis implies that formation of ferromagnetic $Ge_3Mn_5$ phase causes the change of magnetic and electrical properties of annealed $Ge_{1-x}Mn_x$ thin films.
Keywords
magnetic semiconductor; spintronics materials; Ge-Mn intermetallic compounds;
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