• Title/Summary/Keyword: Gate stack

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High Voltage SMPS Design based on Dual-Excitation Flyback Converter (이중 여자 플라이백 기반 고압 SMPS 설계)

  • Yang, Hee-Won;Kim, Seong-Ae;Park, Seong-Mi;Park, Sung-Jun
    • Journal of the Korean Society of Industry Convergence
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    • v.20 no.2
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    • pp.115-124
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    • 2017
  • This paper aims to develop an SMPS topology for handling a high range of input voltages based on a DC-DC flyback converter circuit. For this purpose, 2 capacitors of the same specifications were serially connected on the input terminal side, with a flyback converter of the same circuit configuration serially connected to each of them, so as to achieve high input voltage and an effect of dividing input voltage. The serially connected flyback converters have the transformer turn ratio of 1:1, so that each coil is used for the winding of a single transformer, which is a characteristic of doubly-fed configuration and enables the correction of input capacitor voltage imbalance. In addition, a pulse transformer was designed and fabricated in a way that can achieve the isolation and noise robustness of the PWM output signal of the PWM controller that applies gate voltage to individual flyback converter switches. PSIM simulation was carried out to verify such a structure and confirm its feasibility, and a 100W class stack was fabricated and used to verify the feasibility of the proposed high voltage SMPS topology.

A Novel Non-Isolated DC-DC Converter with High Efficiency and High Step-Up Voltage Gain (고효율 및 고변압비를 가진 새로운 비절연형 컨버터)

  • Amin, Saghir;Tran, Manh Tuan;Choi, Woojin
    • Proceedings of the KIPE Conference
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    • 2019.07a
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    • pp.11-13
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    • 2019
  • This paper proposes a novel high step-up non-isolated DC-DC converter, suitable for regulating dc bus in various inherent low voltage micro sources especially for photovoltaic (PV) and fuel cell sources. This novel high voltage Non-isolated Boost DC-DC converter topology is best replacement, where high voltage conversion ratio is required without the transformer and also need continuous input current. Since the proposed topology utilizes the stack-based structure, the voltage gain, and the efficiency are higher than other conventional non-isolated converters. Switches in this topology is easier to control since its control signal is grounding reference. Also, there is no need of extra gate driver and extra power supply for driver circuit, which reduces the cost and size of system. In order to show the feasibility and practicality of the proposed topology principle operation, steady state analysis and simulation result is presented and analyzed in detail. To verify the performance of proposed converter and theoretical analysis 360W laboratory prototype is implemented.

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Characteristics of Si Floating Gate Nonvolatile Memory Based on Schottky Barrier Tunneling Transistor (쇼트키 장벽 관통 트랜지스터 구조를 적용한 실리콘 나노점 부유 게이트 비휘발성 메모리 특성)

  • Son, Dae-Ho;Kim, Eun-Kyeom;Kim, Jeong-Ho;Lee, Kyung-Su;Yim, Tae-Kyung;An, Seung-Man;Won, Sung-Hwan;Sok, Jung-Hyun;Hong, Wan-Shick;Kim, Tae-You;Jang, Moon-Gyu;Park, Kyoung-Wan
    • Journal of the Korean Vacuum Society
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    • v.18 no.4
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    • pp.302-309
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    • 2009
  • We fabricated a Si nano floating gate memory with Schottky barrier tunneling transistor structure. The device was consisted of Schottky barriers of Er-silicide at source/drain and Si nanoclusters in the gate stack formed by LPCVD-digital gas feeding method. Transistor operations due to the Schottky barrier tunneling were observed under small gate bias < 2V. The nonvolatile memory properties were investigated by measuring the threshold voltage shift along the gate bias voltage and time. We obtained the 10/50 mseconds for write/erase times and the memory window of $\sim5V$ under ${\pm}20\;V$ write/erase voltages. However, the memory window decreased to 0.4V after 104seconds, which was attributed to the Er-related defects in the tunneling oxide layer. Good write/erase endurance was maintained until $10^3$ write/erase times. However, the threshold voltages moved upward, and the memory window became small after more write/erase operations. Defects in the LPCVD control oxide were discussed for the endurance results. The experimental results point to the possibility of a Si nano floating gate memory with Schottky barrier tunneling transistor structure for Si nanoscale nonvolatile memory device.

The electrical characteristics of flexible organic field effect transistors with flexible multi-stacked hybrid encapsulation

  • Seol, Yeong-Guk;Heo, Uk;Park, Ji-Su;Lee, Nae-Eung;Lee, Deok-Gyu;Kim, Yun-Je;An, Cheol-Hyeon;Jo, Hyeong-Gyun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.176-176
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    • 2010
  • One of the critical issues for applications of flexible organic thin film transistors (OTFTs) for flexible electronic systems is the electrical stabilities of the OTFT devices, including variation of the current on/off ratio (Ion/Ioff), leakage current, threshold voltage, and hysteresis under repetitive mechanical deformation. In particular, repetitive mechanical deformation accelerates the degradation of device performance at the ambient environment. In this work, electrical stability of the pentacene organic thin film transistors (OTFTs) employing multi-stack hybrid encapsulation layers was investigated under mechanical cyclic bending. Flexible bottom-gated pentacene-based OTFTs fabricated on flexible polyimide substrate with poly-4-vinyl phenol (PVP) dielectric as a gate dielectric were encapsulated by the plasma-deposited organic layer and atomic-layer-deposited inorganic layer. For cyclic bending experiment of flexible OTFTs, the devices were cyclically bent up to 105 times with 5mm bending radius. In the most of the devices after 105 times of bending cycles, the off-current of the OTFT with no encapsulation layers was quickly increased due to increases in the conductivity of the pentacene caused by doping effects from $O_2$ and $H_2O$ in the atmosphere, which leads to decrease in the Ion/Ioff and increase in the hysteresis. With encapsulation layers, however, the electrical stabilities of the OTFTs were improved significantly. In particular, the OTFTs with multi-stack hybrid encapsulation layer showed the best electrical stabilities up to the bending cycles of $10^5$ times compared to the devices with single organic encapsulation layer. Changes in electrical properties of cyclically bent OTFTs with encapsulation layers will be discussed in detail.

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Micro fluxgate magnetic sensor using multi layer PCB process (PCB 다층 적층기술을 이용한 마이크로 플럭스게이트 자기 센서)

  • Choi, Won-Youl;Hwang, Jun-Sik;Choi, Sang-On
    • Journal of Sensor Science and Technology
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    • v.12 no.2
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    • pp.72-78
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    • 2003
  • To observe the effect of excitation coil pitch on the micro fluxgate magnetic sensor, two sensors are fabricated using multi layer board process and the pitch distance of excitation coil are $260\;{\mu}m$ and $520\;{\mu}m$, respectively. The fluxgate sensor consists of five PCB stack layers including one layer of magnetic core and four layers of excitation and pick-up coils. The center layer as magnetic core is made of a Co-based amorphous magnetic ribbon with extremely high DC permeability of ${\sim}100,000$ and has a rectangular-ring shape to minimize the magnetic flux leakage. Four outer layers as excitation and pick-up coils have a planar solenoid structure and are made of copper foil. In case of the fluxgate sensor having the excitation coil pitch of $260\;{\mu}m$, excellent linear response over the range of $-100\;{\mu}T$ to $+100\;{\mu}T$ is obtained with sensitivity of 780 V/T at excitation sine wave of $3V_{p_p}$ and 360 kHz. The chip size of the fabricated sensing element is $7.3\;{\times}\;5.7\;mm^2$. The very low power consumption of ${\sim}8\;mW$ is measured. This magnetic sensor is very useful for various applications such as: portable navigation systems, telematics, VR game and so on.

Design and Fabrication of Low Loss, High Power SP6T Switch Chips for Quad-Band Applications Using pHEMT Process (pHEMT 공정을 이용한 저손실, 고전력 4중 대역용 SP6T 스위치 칩의 설계 및 제작)

  • Kwon, Tae-Min;Park, Yong-Min;Kim, Dong-Wook
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.22 no.6
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    • pp.584-597
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    • 2011
  • In this paper, low-loss and high-power RF SP6T switch chips are designed, fabricated and measured for GSM/EGSM/DCS/PCS applications using WIN Semiconductors 0.5 ${\mu}m$ pHEMT process. We utilized a combined configuration of series and series-shunt structures for optimized switch performance, and a common transistor structure on a receiver path for reducing chip area. The gate width and the number of stacked transistors are determined using ON/OFF input power level of the transceiver system. To improve the switch performance, feed-forward capacitors, shunt capacitors and parasitic FET inductance elimination due to resonance are actively used. The fabricated chip size is $1.2{\times}1.5\;mm^2$. S-parameter measurement shows an insertion loss of 0.5~1.2 dB and isolation of 28~36 dB. The fabricated SP6T switch chips can handle 4 W input power and suppress second and third harmonics by more than 75 dBc.