• Journal of the Korean Vacuum Society
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• v.6 no.S1
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• pp.160-165
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• 1997

Yttria stabilized zirconia coating is an attractive material for several engineering applications. In order to produce coatings with consistent and reliable performance it is important to understand the influence of spraying parameters on the coating properties and optimize the spraying parameters. In this paper the low pressure plasma spray(LPPS) deposition of as-received zirconia powder has been investigated using simple one-factor-at-a-time approach. The deposition efficiency was chosen to evaluate the melting characteristics of the as-received zirconia powder. The results obtained indicated that the deposition efficiency of zirconia powder is very sensitive to the spraying parameters such as plasma gas flow rate and ranges from 24% to 57% The microstructure and the phase composition of zirconia coating deposited with the different plasma spraying parameters were also examined by SEM and XRD respectively. The relationship between deposition efficiency and the microstructure of zirconia coating was discussed.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 2000.06a
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• pp.127-142
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• 2000

The charged cluster model states that chemical vapor deposition (CVD) begins with gas phase nucleation of charged clusters followed by cluster deposition on a substrate surface to form a thin film. A two-chambered CVD system, separated by a 1-mm orifice, was used to study gold deposition by thermal evaporation in order to determine if the CCM applies in this case. At a filament temperature of 1523 and 1773 K, the presence of nano-meter sized gold clusters was found to be positive and the cluster size and size distribution increased with increasing temperature. Small clusters were found to be amorphous and they combined with clusters already deposited on a substrate surface to form larger amorphous clusters on the surface. This work revealed that gold thin films deposited on a mica surface are the result of the sticking of 4-10 nm clusters. The topography of these films was similar to those reported previously under similar conditions.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05d
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• pp.61-64
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• 2003

This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. Mg(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure$(PO_3)$ in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $O_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.05a
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• pp.615-618
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• 2003

This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(l00) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and 820 $^{\circ}C$ and the highly condensed ozone gas pressure(PO$_3$) in vacuum chamber was varied between 2.0$\times$10$^{-6}$ and 2.3$\times$10$^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and 795$^{\circ}C$ and single phase of Bi 2201 existed in the lower region than 785 $^{\circ}C$. Whereas, PO$_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with T$_{c}$(onset) of about 90 K and T$_{c}$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as CaCuO$_2$ was observed in all of the obtained films.lms.

• Bulletin of the Korean Chemical Society
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• v.31 no.8
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• pp.2416-2418
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• 2010

• Environmental Engineering Research
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• v.10 no.6
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• pp.306-315
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• 2005

Total gas phase mercury (TGM) concentrations and event wet-only precipitation for Hg were collected for nine months (from April, 2002 to Dec., 2002) at Sterling, NY on the shoreline of Lake Ontario. TGM concentrations measured in this study ($3.02{\pm}2.14\;ng/m^3$) were in somewhat high range compared to other background sites. Using simplified quantitative transport bias analysis (SQTBA) possible sources affecting high Hg concentration in Sterling was identified, and they are coal-fired power plants located in southern NY and Pennsylvania. Wet deposition measured at Mercury Deposition Network (MDN) sites including Pt. Petre and Egbert, ON were compared with data obtained at the Sterling to estimate the total mercury wet deposition flux to Lake Ontario. The wet deposition flux was calculated to be the highest at the Sterling site ($7.94\;{\mu}g/m^2$ from April, 2002 to Dec. 2002) and the lowest at the Egbert ($3.92\;{\mu}g/m^2$), due to the both the difference in precipitation depth and Hg concentration in the precipitation. The deposition measured at the Sterling site is similar to Lake Michigan deposition of $6-14\;{\mu}g/m^2$ (converted for ninth months) measured for Lake Michigan Mass Balance Study (LMMBS).

• Journal of Korean Society for Atmospheric Environment
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• v.22 no.2
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• pp.179-189
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• 2006

Ambient gas phase mercury concentrations including elemental mercury ($Hg^0$) were measured at the Potsdam, Stockton, and Sterling sites in NY from 2000 to 2003. Also, concentrations of ambient reactive gaseous mercury (RGM; $Hg^{2+}$) were measured at the Potsdam site during one year. The contribution of RGM($4.2{\pm}6.4pg/m^3$) was about $0.2{\sim}3%$ of the total gas phase mercury concentration measured (TGM: $1.84{\pm}1.24,\;1.83{\pm}0.32,\;3.02{\pm}2.14ng/m^3$ in Potsdam. Stockton, and Sterling, respectively) at the receptor sites. Potential Source Contribution Function (PSCF), a hybrid receptor modeling incorporating backward trajectories was performed to identify source areas of TGM. Using PSCF, southern New York, North Carolina, and eastern Massachusetts were identified as important source areas in the United States, while the copper smelters and waste incinerators located in eastern Quebec and Ontario were determined to be significant sources in Canada. The Atlantic Ocean was suggested to be a possible mercury source. PSCF incorporating back-dispersion and deposition was applied for RGM , as well as PSCF based on 2-days back-trajectories. Two different approaches yielded considerably different results, primarily due to the consideration of dispersion rather than deposition. Using back-trajectory based PSCF, eastern Ohio, southern New York, and southern Pennsylvania where large coal -fired power plants area located were identified as the large sources in US. Metallurgical industry located in eastern Quebec was resolved as well. From the result of back-dispersion and deposition based PSCF, Pennsylvania, mining facilities around Lake Superior, Toronto, Boston, MA, Quebec, and coal power plants in NY were identified to be the significant source areas for Potsdam site.

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.73-78
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• 2003

The InP thin films grown by metalorganic chemical vapor deposition (MOCVD) are widely used to optoelectronic devices such as laser diodes, wave-guides and optical modulators. Effects of various parameters controlling film growth rate such as gas-phase reaction rate constant, surface reaction rate constant and mass diffusivity are numerically investigated. Results show that at the upstream region where film growth rate increases with the flow direction, diffusion including thermal diffusion plays an important role. At the downstream region where the growth rate decreases with flow direction, film deposition mechanism is revealed as a mass-transport limited. Mass transport characteristics are also studied using systematic analyses.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.151-152
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• 2009

We coated $TiO_2$ thin films on particles by a rotating cylindrical plasma chemical vapor deposition (PCVD) process and investigated the effects of various process variables on the morphology and growth of thin films. The polypropylene (PP) particles were rotated with the cylindrical PCVD reactor and they were coated with $TiO_2$ thin films uniformly by the deposition of thin mm precursors in the gas phase. The $TiO_2$ thin films were coated on the PP particles uniformly and the thickness of thin films almost proportional to the deposition time. The $TiO_2$ thin films grew more quickly on the PP particles with increasing rotation speed of the reactor. This study shows that a rotating cylindrical PCVD reactor can be a good method to coat high-quality $TiO_2$ thin films uniformly on particles.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.349-349
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• 2010

$TiO_2$ thin films were prepared on C fibers, and photocatalytic activity of these films for removing gas-phase toluene was studied. $TiO_2$ films were deposited on C fiber with 0.5 A-per-cycle growth rate by Atomic Layer Deposition (ALD) using TTIP (titanium tetra-isopropoxide) and $H_2O$ as precursors. The catalysts were characterized by Brunauer-Emmett-Teller (BET) for surface area and Scanning Electron Microscope (SEM) for morphology, respectively. Moreover, the samples were further characterized by X-ray Photoelectron Spectroscopy (XPS). As a function of $TiO_2$ thickness, no significant change in the photocatalytic activity could be identified. Interestingly, the bare-carbon fiber showed an even higher photocatalytic activity than the $TiO_2$ thin films for removing toluene. Origin of the high photocatalytic activity of the bare C fiber is discussed.