• Title/Summary/Keyword: Gas diffusion layer

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The interaction between helium flow within supersonic boundary layer and oblique shock waves

  • Kwak, Sang-Hyun;Iwahori, Yoshiki;Igarashi, Sakie;Obata, Sigeo
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2004.03a
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    • pp.75-78
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    • 2004
  • Various jet engines (Turbine engine family and RAM Jet engine) have been developed for high speed aircrafts. but their application to hypersonic flight is restricted by principle problems such as increase of total pressure loss and thermal stress. Therefore, the development of next generation propulsion system for hypersonic aircraft is a very important subject in the aerospace engineering field, SCRAM Jet engine based on a key technology, Supersonic Combustion. is supposed as the best choice for the hypersonic flight. Since Supersonic Combustion requires both rapid ignition and stable flame holding within supersonic air stream, much attention have to be given on the mixing state between air stream and fuel flow. However. the wider diffusion of fuel is expected with less total pressure loss in the supersonic air stream. So. in this study the direction of fuel injection is inclined 30 degree to downstream and the total pressure of jet is controlled for lower penetration height than thickness of boundary layer. Under these flow configuration both streams, fuel and supersonic air stream, would not mix enough. To spread fuel wider into supersonic air an aerodynamic force, baroclinic torque, is adopted. Baroclinic torque is generated by a spatial misalignment between pressure gradient (shock wave plane) and density gradient (mixing layer). A wedge is installed in downstream of injector orifice to induce an oblique shock. The schlieren optical visualization from side transparent wall and the total pressure measurement at exit cross section of combustor estimate how mixing is enhanced by the incidence of shock wave into supersonic boundary layer composed by fuel and air. In this study non-combustionable helium gas is injected with total pressure 0.66㎫ instead of flammable fuel to clarify mixing process. Mach number 1.8. total pressure O.5㎫, total temperature 288K are set up for supersonic air stream.

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Modeling Residual Water in the Gas Diffusion Layer of a Polymer Electrolyte Membrane Fuel Cell and Analyzing Performance Changes (고분자 전해질막 연료전지의 기체확산층 내부 잔류수 모델링 및 성능변화해석)

  • Jiwon Jang;Junbom Kim
    • Applied Chemistry for Engineering
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    • v.35 no.1
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    • pp.16-22
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    • 2024
  • Polymer electrolyte membrane fuel cells have the advantage of low operating temperatures and fast startup and response characteristics compared to others. Simulation studies are actively researched because their cost and time benefits. In this study, the resistance of water residual in the gas diffusion layer (GDL) of the unit cell was added to the existing equation to compare the actual data with the model data. The experiments were conducted with a 25 cm2 unit cell, and the samples were separated into stopping times of 0, 10, and 60 minutes following primary impedance measurement, activation, and polarization curve data acquisition. This gives 0, 10, and 60 minutes for the residual water in the GDL to evaporate. Without the rest period, the magnitude of the performance improvement was not significantly different at the same potential and flow rate, but the rest period did improve the performance of the membrane electrode assembly when measuring impedance. By changing the magnitude of the resistance reduction to an overvoltage, the voltage difference between the fuel cell model with and without residual water was compared, and the error rate in the high current density region, which is dominated by concentration losses, was reduced.

Fabrication of Oxide Thin Films Using Nanoporous Substrates (나노기공성 기판을 사용한 산화물박막의 제조)

  • Park, Yong-Il;Prinz, Fritz B.
    • Journal of the Korean Ceramic Society
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    • v.41 no.12 s.271
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    • pp.900-906
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    • 2004
  • Solid oxide fuel cells have a limitation in their low-temperature application due to the low ionic conductivity of electrolyte materials and difficulties in thin film formation on porous gas diffusion layer. These problems can be solved by improvement of ionic conductivity through controlled nanostructure of electrolyte and adopting nanoporous electrodes as substrates which have homogeneous submicron pore size and highly flattened surface. In this study, ultra-thin oxide films having submicron thickness without gas leakage are deposited on nanoporous substrates. By oxidation of metal thin films deposited onto nanoporous anodic alumina substrates with pore size of $20nm{\sim}200nm$ using dc-magnetron sputtering at room temperature, ultra-thin and dense ionic conducting oxide films with submicron thickness are realized. The specific material properties of the thin films including gas permeation, grain/gran boundaries formation, change of crystalline structure/microstructure by phase transition are investigated for optimization of ultra thin film deposition process.

Gas Permeation Characteristics of Silica Membrane Prepared by Ultrasonic Spray Pyrolysis (초음파 분무 열분해법에 의해 합성한 실리카 막의 기체 투과 특성)

  • Lee Kew-Ho;Youn Min-Young;Park Sang-Jin;Lee Dong-Wook;Sea Bongkuk
    • Membrane Journal
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    • v.15 no.2
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    • pp.105-113
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    • 2005
  • Silica membranes were prepared on a porous metal sheet by ultrasonic spray pyrolysis method for gas separation at high temperatures. In order to improve the permselectivity, silica was deposited in the sol-gel derived $silica/\gamma-alumina$ intermediate layer by pyrolysis of tetraethyl orthosilicate (TEOS) at 873 K. The pyrolysis with forced cross flow through the porous wall of the support was very effective in plugging mesopores, Knudsen diffusion regime, that were left unplugged in the membranes. At permeation temperature of 523 K, the silica/alumina composite membrane showed $H_2/N_2$ and water/methanol selectivity as high as 17 and 16, respectively, by molecular sieve effect.

The Effect of Stack Clamping Pressure on the Performance of a Miniature PEMFC Stack (소형 고분자 연료전지 스택의 체결압력에 따른 성능 특성)

  • Kim, Byung-Ju;Yim, Sung-Dae;Sohn, Young-Jun;Kim, Chang-Soo;Yang, Tae-Hyun;Kim, Young-Chai
    • Transactions of the Korean hydrogen and new energy society
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    • v.20 no.6
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    • pp.499-504
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    • 2009
  • The effect of gas diffusion layer (GDL) compression caused by different stack clamping pressures on fuel cell performance was experimentally studied in a miniature 5-cell proton exchange membrane fuel cell (PEMFC) stack. Three stacks with different GDL compressions, 15%, 35% and 50%, were prepared using SGL 10BC carbon fiber felt GDL and Gore 57 series MEA. The PEMFC stack performance and the stack stability were enhanced with increasing stack clamping pressure resulting in the best performance and stability for the stack with higher GDL compressions up to 50%. The excellent performance of the stack with high GDL compression was mainly due to the reduced contact resistance between GDL and bipolar plate in the stack, while reduced gas permeability of the excessively compressed GDL in the stack hardly affected the stack performance. The high stack clamping pressure also resulted in excessive GDL compression under the rib areas of bipolar plate and large GDL intrusion into the channels of the plate, which reduced the by-pass flow in the channels and increase gas pressure drop in the stack. It seems that these phenomena in the highly compressed stack enhance the water management in the stack and lead to the high stack stability.

Characteristics Evaluation of Al2O3 ALD Thin Film Exposed to Constant Temperature and Humidity Environment (항온항습 환경에 노출된 Al2O3 ALD 박막의 특성 평가)

  • Kim, Hyeun Woo;Song, Tae Min;Lee, Hyeong Jun;Jeon, Yongmin;Kwon, Jeong Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.2
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    • pp.11-14
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    • 2022
  • In this work, we evaluated the Al2O3 film, which was deposited by atomic layer deposition, degraded by exposure to harsh environments. The Al2O3 films deposited by atomic layer deposition have long been used as a gas diffusion barrier that satisfies barrier requirements for device reliability. To investigate the barrier and mechanical performance of the Al2O3 film with increasing temperature and relative humidity, the properties of the degraded Al2O3 film exposed to the harsh environment were evaluated using electrical calcium test and tensile test. As a result, the water vapor transmission rate of Al2O3 films stored in harsh environments has fallen to a level that is difficult to utilize as a barrier film. Through water vapor transmission rate measurements, it can be seen that the water vapor transmission rate changes can be significant, and the environment-induced degradation is fatal to the Al2O3 thin films. In addition, the surface roughness and porosity of the degraded Al2O3 are significantly increased as the environment becomes severer. the degradation of elongation is caused by the stress concentration at valleys of rough surface and pores generated by the harsh environment. Becaused the harsh envronment-induced degradation convert amorphous Al2O3 to crystalline structure, these encapsulation properties of the Al2O3 film was easily degraded.

New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.100-101
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    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

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Performance Characteristics of PEMFC by flow Configurations and Operating Condition (유로형상 및 운전조건에 따른 고분자 전해질 연료전지의 성능 특성)

  • Lee, Pil-Hyong;Cho, Son-Ah;Han, Sang-Seok;Hwang, Sang-Soon
    • Proceedings of the KSME Conference
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    • 2007.05b
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    • pp.3440-3445
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    • 2007
  • For proton exchange membrane fuel cell, it is very important to design the flow channel on separation plate optimally to maximize the current density at same electrochemical reaction surface and reduce the concentration polarization occurred at high current density. In this paper, three dimensional computation model including anode and cathode domain together was developed to examine effects of flow patterns and operation conditions such as humidity and operating temperature on performance of fuel cell. Results show that voltage at counter flow condition is higher than that at coflow condition in parallel and interdigitated flow pattern. And fuel cell with interdigitated flow pattern which has better mass transport by convection flow through gas diffusion layer has higher performance than with parallel flow pattern but its pressure drop is increased such that the trade off between performance and pressure drop should be considered for selection of flow pattern of fuel cell.

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Fuelcell GDL used in the high conductance of the carbon fiber surface treatment (연료전지 기체확산층용 고전도성 탄소섬유 표면처리 연구)

  • Baek, Sunghwan;Kim, Taejin;Kim, Jingu;Lee, Yohan
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.131.1-131.1
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    • 2010
  • 고분자연료전지(PEMFC)에서 기체확산층(GDL)은 다공성의 카본 종이/천 위에 마이크로한 다공층을 가치는 구조로 촉매층을 지지하고 촉매층과 분리판 사이의 전류전도체 역할을 한다. 또한 촉매층에 연료와 공기 확산 및 생성된 물의 통로 역할을 하며 소수성인 전기전도성 물질로 이루어져 있다. 현재 연료전지에 쓰이는 가스확산층은 대부분 국외 회사에서 제조 수입 사용하는 현황이고 국내에서는 협진 I&C가 연구하고 있으나 상용화는 아직 이루어지지 않고 있다. 본 연구는 탄소섬유의 전도성을 개선하고자 탄소섬유 표면에 금속코팅 시 최적의 접촉계면유지를 위한 표면처리 방법 및 공정을 조사 분석 후 최적 개선방법(농도/온도/압력/시간)을 설정하고자 하였다. 또한 선정된 공정인자별 수준별 시험 후 샘플링 된 시료를 토대로 금속물질이 탄소섬유 표면에 코팅(도금)된 금속-탄소섬유를 대하여 평가하여 최적화시키고자 탄소섬유로부터 carbon paper GDL의 모재를 개발할 계획이다. 앞에서 설명한 바와 같이 탄소섬유를 이용하여 paper making, resin impregnation, molding, carbonization/graphitization의 제조공정을 거쳐 paper형태의 GDL을 생산 및 평가하고자 하였다.

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Thermal and Adhesive Properties of Cu Interconnect Deposited by Electroless Plating (무전해도금 구리배선재료의 열적 및 접착 특성)

  • 김정식;허은광
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2001.07a
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    • pp.100-103
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    • 2001
  • In this study, the adhesion and thermal property of the electroless-deposited Cu thin film were investigated. The multilayered structure of Cu/TaN/Si was fabricated by electroless-depositing the Cu thin layer on the TaN diffusion barrier which was deposited by MOCVD on the Si substrate. The thermal stability was investigated by measuring the resistivity as post-annealing temperature far the multilayered Cu/TaN/Si specimen which was annealed at Ar gas. The adhesion property of Cu 171ms was evaluated by the scratch test. The adhesion of the electroless-deposited Cu film was compared with other deposition methods of thermal evaporation and sputtering. The scratch test showed that the adhesion of electroless plated Cu film on TaN was better than those of sputtered Cu film and evaporated Cu film.

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