• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2004년도 제22회 춘계학술대회논문집
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• pp.75-78
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• 2004

Various jet engines (Turbine engine family and RAM Jet engine) have been developed for high speed aircrafts. but their application to hypersonic flight is restricted by principle problems such as increase of total pressure loss and thermal stress. Therefore, the development of next generation propulsion system for hypersonic aircraft is a very important subject in the aerospace engineering field, SCRAM Jet engine based on a key technology, Supersonic Combustion. is supposed as the best choice for the hypersonic flight. Since Supersonic Combustion requires both rapid ignition and stable flame holding within supersonic air stream, much attention have to be given on the mixing state between air stream and fuel flow. However. the wider diffusion of fuel is expected with less total pressure loss in the supersonic air stream. So. in this study the direction of fuel injection is inclined 30 degree to downstream and the total pressure of jet is controlled for lower penetration height than thickness of boundary layer. Under these flow configuration both streams, fuel and supersonic air stream, would not mix enough. To spread fuel wider into supersonic air an aerodynamic force, baroclinic torque, is adopted. Baroclinic torque is generated by a spatial misalignment between pressure gradient (shock wave plane) and density gradient (mixing layer). A wedge is installed in downstream of injector orifice to induce an oblique shock. The schlieren optical visualization from side transparent wall and the total pressure measurement at exit cross section of combustor estimate how mixing is enhanced by the incidence of shock wave into supersonic boundary layer composed by fuel and air. In this study non-combustionable helium gas is injected with total pressure 0.66㎫ instead of flammable fuel to clarify mixing process. Mach number 1.8. total pressure O.5㎫, total temperature 288K are set up for supersonic air stream.

• 공업화학
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• 제35권1호
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• pp.16-22
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• 2024

고분자전해질막 연료전지는 작동온도가 낮아, 다른 종류의 연료전지에 비해 빠른 시동과 응답 특성을 가진다는 장점이 있다. 시뮬레이션 연구는 비용과 시간 측면에서 이점이 있어 활발하게 연구되고 있다. 본 연구에서는 기존의 수식에 단위전지의 기체확산층에 잔류하는 물의 저항을 추가하여 실제 데이터와 모델데이터를 비교했다. 실험은 25 cm² 단위 전지로 진행됐으며, 1차 임피던스 측정, 활성화, 분극곡선 데이터 획득 후 정지 시간을 0, 10, 60분으로 가지는 샘플로 나눠 실험했다. 이는 기체확산층 내부의 잔류 중인 물이 증발할 시간을 0분, 10분, 60분 부여했다고 볼 수 있다. 휴식기간을 가지지 않는 경우, 같은 전위 및 같은 유량에서 성능 향상의 폭은 큰 차이를 보이지 않았으나, 휴식기간을 가진 막전극 접합체의 경우 임피던스 측정 시 성능 향상이 확인되었다. 저항 감소크기를 과전압으로 바꿔, 연료전지모델에 잔류수가 존재할 경우와 존재하지 않을 경우의 전압 차이를 비교했으며 그 결과로 농도손실이 주를 이루는 고전류밀도 영역의 오차율이 줄어든 것을 확인하였다.

• 한국세라믹학회지
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• 제41권12호
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• pp.900-906
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• 2004

현재까지 개발되어 온 고체산화물 연료전지는 전해질로 사용되는 산소이온전도성 산화물의 저온에서의 낮은 전도도로 인해 그 사용영역이 제한되어 왔으며, 기판재료가 연료가스 확산층으로 사용되어야 한다는 점 때문에 저온작동을 위한 박막화 역시 명확한 한계를 가지고 있다. 이러한 문제점은 고도의 평활도를 갖는 균일한 나노기공성 기판재를 도입함으로써 해결될 수 있으며, 본 연구에서는 나노기공성 기판에 비정질 금속박막을 증착/산화하는 방안을 제시한다. 초박막형 성공정으로서, 산화 후 산소이온전도성 산화물을 구성하는 합금 타겟을 장착한 DC-magnetron sputter를 사용하여 $20{\sim}200nm$의 기공크기를 갖는 나노기공성 양극산화 알루미나 기판에 비정질 금속합금막을 형성하여 산화/열처리 과정을 거쳐 초박막 산화물 전해질의 제조공정을 실현하였다. 얻어진 박막의 가스투과특성, 입자/입계의 관찰, 상전이에 따른 결정구조/미세구조변화를 관찰하여 초박막 증착 및 전해질의 나노구조제어에 필요한 제반 기본물성데이터를 확보하였다.

• 멤브레인
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• 제15권2호
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• pp.105-113
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• 2005

표면 개질한 다공성 금속 지지체에 초음파 분무 열분해법을 이용하여 silica막을 합성하고, 고온 기체 선택 투과 분리 특성을 조사하였다. Tetraethyl orthosilicate (TEOS)를 전구체로 하여 지지체 세공을 통한 감압 진공을 하면서 873K에서 표면에 defect 없이 균일한 양질의 silica막이 형성되었다. 투과 온도 523 K에서 silica막의 수th/질소 및 수증기/메탄을 분리 계수가 각각 17 및 16 정도의 우수한 선택 투과 성능을 나타냈다. 다공성 금속 지지체의 불균일한 기공에 silica 분체 및 $\gamma-alumina$층을 중간층으로 도입하고, 그 위에 열분해법에 의한 silica를 합성한 결과, Knudsen 확산에 의한 투과 영역의 세공이 완전히 제거되어 높은 수소 및 수증기 선택성을 가지는 복합 막이 형성되었다.

• 한국수소및신에너지학회논문집
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• 제20권6호
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• pp.499-504
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• 2009

The effect of gas diffusion layer (GDL) compression caused by different stack clamping pressures on fuel cell performance was experimentally studied in a miniature 5-cell proton exchange membrane fuel cell (PEMFC) stack. Three stacks with different GDL compressions, 15%, 35% and 50%, were prepared using SGL 10BC carbon fiber felt GDL and Gore 57 series MEA. The PEMFC stack performance and the stack stability were enhanced with increasing stack clamping pressure resulting in the best performance and stability for the stack with higher GDL compressions up to 50%. The excellent performance of the stack with high GDL compression was mainly due to the reduced contact resistance between GDL and bipolar plate in the stack, while reduced gas permeability of the excessively compressed GDL in the stack hardly affected the stack performance. The high stack clamping pressure also resulted in excessive GDL compression under the rib areas of bipolar plate and large GDL intrusion into the channels of the plate, which reduced the by-pass flow in the channels and increase gas pressure drop in the stack. It seems that these phenomena in the highly compressed stack enhance the water management in the stack and lead to the high stack stability.

• 반도체디스플레이기술학회지
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• 제21권2호
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• pp.11-14
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• 2022

In this work, we evaluated the Al₂O₃ film, which was deposited by atomic layer deposition, degraded by exposure to harsh environments. The Al₂O₃ films deposited by atomic layer deposition have long been used as a gas diffusion barrier that satisfies barrier requirements for device reliability. To investigate the barrier and mechanical performance of the Al₂O₃ film with increasing temperature and relative humidity, the properties of the degraded Al₂O₃ film exposed to the harsh environment were evaluated using electrical calcium test and tensile test. As a result, the water vapor transmission rate of Al₂O₃ films stored in harsh environments has fallen to a level that is difficult to utilize as a barrier film. Through water vapor transmission rate measurements, it can be seen that the water vapor transmission rate changes can be significant, and the environment-induced degradation is fatal to the Al₂O₃ thin films. In addition, the surface roughness and porosity of the degraded Al₂O₃ are significantly increased as the environment becomes severer. the degradation of elongation is caused by the stress concentration at valleys of rough surface and pores generated by the harsh environment. Becaused the harsh envronment-induced degradation convert amorphous Al₂O₃ to crystalline structure, these encapsulation properties of the Al₂O₃ film was easily degraded.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.3440-3445
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• 2007

For proton exchange membrane fuel cell, it is very important to design the flow channel on separation plate optimally to maximize the current density at same electrochemical reaction surface and reduce the concentration polarization occurred at high current density. In this paper, three dimensional computation model including anode and cathode domain together was developed to examine effects of flow patterns and operation conditions such as humidity and operating temperature on performance of fuel cell. Results show that voltage at counter flow condition is higher than that at coflow condition in parallel and interdigitated flow pattern. And fuel cell with interdigitated flow pattern which has better mass transport by convection flow through gas diffusion layer has higher performance than with parallel flow pattern but its pressure drop is increased such that the trade off between performance and pressure drop should be considered for selection of flow pattern of fuel cell.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.131.1-131.1
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• 2010

고분자연료전지(PEMFC)에서 기체확산층(GDL)은 다공성의 카본 종이/천 위에 마이크로한 다공층을 가치는 구조로 촉매층을 지지하고 촉매층과 분리판 사이의 전류전도체 역할을 한다. 또한 촉매층에 연료와 공기 확산 및 생성된 물의 통로 역할을 하며 소수성인 전기전도성 물질로 이루어져 있다. 현재 연료전지에 쓰이는 가스확산층은 대부분 국외 회사에서 제조 수입 사용하는 현황이고 국내에서는 협진 I&C가 연구하고 있으나 상용화는 아직 이루어지지 않고 있다. 본 연구는 탄소섬유의 전도성을 개선하고자 탄소섬유 표면에 금속코팅 시 최적의 접촉계면유지를 위한 표면처리 방법 및 공정을 조사 분석 후 최적 개선방법(농도/온도/압력/시간)을 설정하고자 하였다. 또한 선정된 공정인자별 수준별 시험 후 샘플링 된 시료를 토대로 금속물질이 탄소섬유 표면에 코팅(도금)된 금속-탄소섬유를 대하여 평가하여 최적화시키고자 탄소섬유로부터 carbon paper GDL의 모재를 개발할 계획이다. 앞에서 설명한 바와 같이 탄소섬유를 이용하여 paper making, resin impregnation, molding, carbonization/graphitization의 제조공정을 거쳐 paper형태의 GDL을 생산 및 평가하고자 하였다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2001년도 The IMAPS-Korea Workshop 2001 Emerging Technology on packaging
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• pp.100-103
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• 2001

본 연구에서는 무전해도금으로 증착된 구리박막의 열적 및 접착특성에 관하여 고찰하였다. Si 기판에 MOCVD 방법으로 TaN 확산방지막을 증착한 후, 무전해 도금으로 구리박막을 증착하여 Cu/TaN/Si 다층구조를 제조공정하였다. 그리고, Ar 분위기에서 열처리시켰으며, 열처리온도에 따른 비저항 변화를 고찰함으로서 Cu/TaN/Si 계의 열적 특성을 분석하였다. 무전해도금 구리박막의 접착특성은 스크래치 테스트에 의해 평가하였으며, 열적 증착방법과 스퍼터 방법으로 증착된 구리 박막과 비교하였다. 스크래치 테스트 결과, 무전해도금 구리 박막의 접착력이 열적 증착과 스퍼터 방법으로 증착된 구리 박막보다 더 우수하였다.