• Title/Summary/Keyword: Ga-doped

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Transparent Conducting Ga-doped ZnO Thin Film for Flat-Panel Displays with a Sol-gel Spin Coating

  • Nam, Gil-Mo;Kwon, Myoung-Seok
    • Journal of Information Display
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    • v.9 no.3
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    • pp.8-11
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    • 2008
  • A novel non-alkoxide sol-gel process for synthesizing Ga-doped ZnO thin film on glass was derived for possible use as a transparent electrode in flat-panel displays, using zinc acetate dehydrate as the starting material. The structural and electrical properties of thin films have been characterized as functions of Ga addition and post-heat-treatments. Their carrier density, Hall mobility, and optical transmittance were measured and discussed herein to explain the characteristics of the sol-gel-derived Ga-doped ZnO thin film on glass.

Process Optimization Approached by Design of Experiment Method for Ga-doped ZnO Thin Films (DOE 법에 의한 Ga 첨가된 ZnO 박막의 공정조건 탐색)

  • Lee, Deuk-Hee;Kim, Sang-Sig;Lee, Sang-Yeol
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.59 no.1
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    • pp.108-112
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    • 2010
  • Design of experiment (DOE) method is employed for a systematic and highly efficient optimization of Ga-doped ZnO thin films synthesized by pulsed laser deposition (PLD) process. We sequentially adopted fractional-factorial design (FD) and central composite design (CCD) of the DOE methods. In fractional-FD stage, significant factors to make conductive electrode are found to target-substrate (T-S) distance and oxygen partial pressure. Moreover, correlation among the process factors is elucidated using surface profile modeling. Electrical properties of the GZO films grown on a glass substrate had been optimized to find that the lowest electrical resistivity of about $1.8'10^{-4}Wcm$ which was acquired with the T-S distance and the oxygen pressure of 4 cm and 7 mTorr, respectively. During the DOE-fueled optimization process, the transparency of the GZO films is ensured higher than 85 %.

Space Charge Effects at Doped Ⅲ-Ⅴ Compound Semiconductor Interfaces (Doping된 Ⅲ-Ⅴ族 化合物 半導體 界面에서 空間電荷效果)

  • Chun, Jang-Ho
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.2
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    • pp.93-97
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    • 1990
  • Interfacil charge approximations and structures at doped semiconductor interfaces were proposed. Rectifying phenomena at the III-V compound semiconductor (p-GaP, p-InP, n-GaAs)/$CsNO_3$ aqueous electrolyte interfaces were qualitatively analyzed in terms of their cyclic current-voltage characteristics. The current-voltage characteristic curves, the ion adsorption and potential barrier processes at the semiconductor interfaces were verified using continuous cyclic voltammetric methods. The pn or np junction structures and the related rectifying types at the doped semi-condudtor-electrolyte inferfaces are determined by the space charges.

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The properties of Zn doped GaN grown by HVPE (HVPE에 의해 성장된 Zn가 첨가된 GaN의 특성)

  • 정성훈;김우람;홍필영;문동찬;김선태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.44-47
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    • 1997
  • In spite of the addtion of Zn, a high quality of Zn-doped GaN film were prepared. The growth rates of Zn-doped GaN films were varied from 0.14${\mu}{\textrm}{m}$/min to 0.05${\mu}{\textrm}{m}$/min according to the amount of Zn incorporated, The smallest value of the FWHM of x-ray rocking curve was 407 arcsec. The Zn-related Photoluminescence emission peaks which occurred at 2.927 and 2.824 eV shifted toward the low energy region by increasing Zn partial pressures. It was compared between the intensities of D-A pair (3.259eV) and that of the exciton bound to acceptor band(E$_{x-A}$=3.449eV).).

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Characteristics of Al-doped, Ga-doped or In-doped zinc-oxide films as transparent conducting electrodes in OLED (Al, Ga, In 을 첨가한 ZnO 박막을 사용하여 제작된 OLED 소자 특성)

  • Park, Se-Hun;Park, Ji-Bong;Song, Pung-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.175-175
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    • 2009
  • AZO, GZO, ZIO 박막은 DC 마그네트론 법으로 각각의 소결체 타겟을 사용하여 유리 기판위에 증착되었다. 상온에서 증착된 GZO 박막의 경우 $1.61{\times}10^{-3}{\Omega}cm$ 의 가장 낮은 비저항을 나타내었다. 전기적 특성을 향상시키기 위하여 기판온도를 상승하였을 때 역시 GZO 박막이 가장 낮은 $6.413{\times}10^{-4}{\Omega}cm$ 을 나타내었다.

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Effects of Substrate Temperature on Properties of (Ga,Ge)-Codoped ZnO Thin Films Prepared by RF Magnetron Sputtering (RF 마그네트론 스퍼트링에 의한 Ga 와 Ge가 도핑된 ZnO 박막 특성의 온도효과)

  • Jung, Il-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.584-588
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    • 2011
  • The ZnO thin films doped with Ga and Ge (GZO:Ge) were prepared on glass substrate using RF sputtering system. Structural, morphological and optical properties of the films deposited in different temperatures were studied. Proportion of the element of using target was 97 wt% ZnO, 2.5 wt% Ga and 0.5 wt% Ge with 99.99% highly purity. Structural properties of the samples deposited in different temperatures with 200 w RF power were investigated by field emission scanning electron microscopy, FE-SEM images and x-ray diffraction XRD analysis. Atomic force microscopy, AFM images were able to show the grain scales and surface roughness of each film rather clearly than SEM images. it was showed that increasing temperature have better surface smoothness by FE-SEM and AFM images. Transmittance study using UV-Vis spectrometer showed that all the samples have highly transparent in visible region (300~800 nm). In addition, it can be able to calculate bandgap energy from absorbance data obtained with transmittance. The hall resistivity, mobility, and optical band gap energy are influenced by the temperature.

Electrical Properties of Silicon Implants in Cr-Doped GaAs (실리콘을 주입한 크롬이 도핑된 GaAs의 전기적 성질에 관한 연구)

  • 김용윤
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.20 no.5
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    • pp.50-55
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    • 1983
  • A comprehensive study of the electrical properties of low-dose Si implants in Cr-doped GaAs substrates has been made using the Hall-effect/sheet-resistivity measurement technique for various ion doses and annealing temperatures. The samples were implanted at room temperature and annealed with silicon nitride encapsulants in a hydrogen atmosphere for 15 minutes. H-type layers were produced at all dose levels investigated, and the optimum annealing temperature was 850$^{\circ}C$ for all doses. The highest electrical activation efficiency was 89% for Cr-doped GaAs substrates. Depth profiles of carrier concentrations and mo-bilities are highly dependent upon ion dose and annealing temperature. Significant im-plantation damage still remains after an 800$^{\circ}C$ anneal, and a 900$^{\circ}C$ anneal produces signi-ficant outdiffusion as well as indiffusion of the implanted Si ions.

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Optical Properties of Undoped and Co2+ Doped CaGa2(S,Se)4 and Caln2(S,Se)4 Single Crystals ($CaGa_{2}(S,Se)_{4}:Co^{2+}$$Caln_{2}(S,Se)_{4}:Co^{2+}$ 단결정의 광학적 특성)

  • Kim, Hyung-Gon;Kim, Nam-Oh;Kim, Duck-Tae;Hyun, Seung-Cheol;Bang, Tae-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11b
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    • pp.43-48
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    • 2004
  • Undoped and $Co^{2+}$-doped $CaGa_2S_4$, $CaGa_2Se_4$, $CaIn_2S_4$. and $CaIn_2Se_4$ single crystals were grown by using the chemical transport reaction method The temperature dependence of the optical energy gap was well fitted by the Varshni equation. In the Co2+ - doped $CaGa_2S_4$, $CaGa_2Se_4$, $CaIn_2S_4$, and $CaIn_2Se_4$ single crystals, two groups of impurity optical absorption peaks due to Co2+ sited in a Td symmetry were observed in the wavelength regions of 600 900 nm and 1350 1950 nm at 11 K.耀

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