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검색결과 168건 처리시간 0.029초

Hot Wall Epitaxy(HWE)법에 의한 Cdln2S4 단결정 박막 성장과 열처리 효과 (The Effect of Thermal Annealing and Growth of Cdln2S4 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 홍광준;이관교
    • 한국전기전자재료학회논문지
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    • 제15권11호
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    • pp.923-932
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    • 2002
  • A stoichiometric mixture of evaporating materials for CdIn$\_$2/S$\_$4/ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, CdIn$\_$2/S$\_$4/ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by hot wall epitaxy(HWE) system. The source and substrate temperatures were 630 $\^{C}$ and 420 $\^{C}$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of CdIn$\_$2/S$\_$4/ single crystal thin films measured from Hall effect by van der Pauw method are 9.01$\times$10$\^$16/ cm$\^$-3/ and 219 ㎠/V$.$s at 293 K, respectively. From the optical absorption measurement, the temperature dependence of energy band gap on CdIn$\_$2/S$\_$4/ single crystal thin films was found to be Eg(T) = 2.7116 eV - (7.74 $\times$ 10$\^$-4/ eV) T$\^$2//(T+434). After the as-grown CdIn$\_$2/S$\_$4/ single crystal thin films was annealed in Cd-, S-, and In-atmospheres, the origin of point defects of CdIn$\_$2/S$\_$4/ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of V$\_$cd/, V$\_$s/, Cd$\_$int/ and S$\_$int/ obtained by PL measurements were classified as donors or accepters type. And we concluded that the heat-treatment in the S-atmosphere converted CdIn$\_$2/S$\_$4/ single crystal thin films to an optical p-type. Also, we confirmed that In in CdIn$\_$2/S$\_$4/GaAs did not from the native defects because In in CdIn$\_$2/S$\_$4/ single crystal thin films existed in the form of stable bonds.

Hot Wall Epitaxy (HWE)에 의한 성장된 $ZnIn_2S_4/GaAs$ 에피레이어의 광학적 특성 (Optical Properties of $ZnIn_2S_4/GaAs$ Epilayer Grown by Hot Wall Epitaxy method)

  • 홍광준;이관교
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.175-178
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    • 2004
  • The stochiometric mixture of evaporating materials for the $ZnIn_2S_4$ single crystal thin film was prepared from horizontal furnace. To obtain the $ZnIn_2S_4$ single crystal thin film, $ZnIn_2S_4$ mixed crystal was deposited on throughly etched semi-insulating GaAs(100) in the Hot Wall Epitaxy(HWE) system. The source and substrate temperature were $610^{\circ}C$ and $450^{\circ}C$, respectively and the growth rate of the $ZnIn_2S_4$ sing1e crystal thin film was about $0.5\;{\mu}m/hr$. The crystalline structure of $ZnIn_2S_4$ single crystal thin film was investigated by photoluminescence and double crystal X-ray diffraction(DCXD) measurement. The carrier density and mobility of $ZnIn_2S_4$ single crystal thin film measured from Hall effect by van der Pauw method are $8.51{\times}10^{17}\;cm^{-3}$, $291\;cm^2/V{\cdot}s$ at $293_{\circ}\;K$, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the $ZnIn_2S_4$ single crystal thin film, we have found that the values of spin orbit splitting ${\Delta}S_O$ and the crystal field splitting ${\Delta}Cr$ were 0.0148 eV and 0.1678 eV at $10_{\circ}\; K$, respectively. From the photoluminescence measurement of $ZnIn_2S_4$ single crystal thin film, we observed free excition $(E_X)$ typically observed only in high quality crystal and neutral donor bound exciton $(D^{o},X)$ having very strong peak intensity The full width at half maximum and binding energy of neutral donor bound excition were 9 meV and 26 meV, respectively, The activation energy of impurity measured by Haynes rule was 130 meV.

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Hot Wall Epitaxy(HWE)법에 의한 $AgInS_2$단결성 박막의 성장과 가전자대 갈라짐에대한 광전류 연구 (Photocurrent Study on the Splitting of the Valence Band and Growth of $AgInS_2$GaAs Single Crystal Thin Film by Hot Wall Epitaxy)

  • 홍광준
    • 한국결정학회지
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    • 제12권4호
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    • pp.197-206
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    • 2001
  • 수평 전기로에서 AgInS₂ 다결정을 합성하여 HWE(Hot Wall Epitaxy)방법으로 AgInS₂ 단결정 박막을 반절연성 GaAs(100)기판에 성장시켰다. AgInS₂ 단결정 박막의 성장 조건은 증발원의 온도 680℃, 기판의 온도 410℃였고 성장 속도는 0.5㎛/hr였다. AgInS₂ 단결정 박막의 결정성의 조사에서 10 K에서 광발광(photoluminescence)스펙트럼이 597.8 nm(2.0741 eV)에서 exciton emission스펙트럼이 가장 강하게 나타났으며, 또한 이중결정 X-선 요동곡선(DCRC)의 박폭치(FWHM)도 121 arcsec로 가장 작아 최적 성장 조건임을 알수 있었다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293K에서 각각 9.35×10/sup 16/㎤, 294㎠/V·s 였다. AgInS₂ /SI(SEmi-Insulated) GaAs(100) 단결정 박막의 광흡수와 광전류 spectra를 293K에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap E/sub g/(T)는 Varshni 공식에 따라 계산한 결과 2.1365eV-(9.89×10/sup-3/eV/K/)T²(T+2930K)이었으며 광전류 스펙트럼으로부터 Hamiltopn matrix(Hopfield quasicubic mode)법으로 계산한 결과 crystal field splitting Δcr값이 0.1541eV이며 spin-orbit Δso 값은 0.0129eV임을 확인하였다. 10K일때 광전류 봉우리들은 n=1 일때 A₁-, B-₁와 C₁-exction 봉우림을 알았다.

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Hot Wall Epitaxy(HWE)에 의한 $ZnGa_2Se_4$단결정 박막 성장과 특성에 관한 연구 (Growth and Characterization of $ZnGa_2Se_4$ Single Crystal Thin Films by Hot Wall Epitaxy)

  • 장차익;홍광준;정준우;백형원;정경아;방진주;박창선
    • 한국결정학회지
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    • 제12권3호
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    • pp.127-136
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    • 2001
  • ZnGa₂Se₄단결정 박막은 수평 전기로에서 함성한 ZnGa₂Se₄다결정을 증발원으로하여, hot wall epitaxy(HWE) 방법으로 증발원과 기판(반절연성-GaAs(100))의 온도를 각각 610℃, 450℃로 고정하여 단결정 박막을 성장하였다. 10 K에서 측정한 광발광 exciton 스펙트럼과 이중결정 X-선 요동곡선(DCRC)의 반치폭(FWHM)을 분석하여 단결정 박막의 최적 성장 조건을 얻었다. Hall효과는 van der Pauw방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293 K에서 각각 9.63×10/sup 17/㎤, 296 ㎠/V·s였다. 광전류 봉우리의 10 K에서 단파장대의 가전자대 갈라짐(splitting)에의해서 측정된 Δcr (crystal field splitting)은 183.2meV, △so (spin orbit splitting)는 251.9meV였다. 10K의 광발광 측정으로부터 고품질의 결정에서 볼 수 있는 free exciton 과 매우 강한 세기의 중성 받개 bound exciton등의 피크가 관찰되었다. 이때 중성 받개 bound exciton등의 피크가 관찰되었다. 이때 중성 반개 bound excition의 반치폭과 결합에너지는 각각 11meV와 24.4meV였다. 또한 Hanes rule에 의해 구한 불순물의 활성화 에너지는 122meV였다.

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Hot Wall Epitaxy(HWE)법에 의한 CuAlSe2 단결정 박막의 성장과 가전자대 갈라짐에 대한 광전류 연구 (Photocurrent Study on the Splitting of the Valence Band and Growth of CuAlSe2 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 박창선;홍광준;박진성;이봉주;정준우;방진주;김현
    • 센서학회지
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    • 제13권2호
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    • pp.157-167
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    • 2004
  • A stoichiometric mixture of evaporating materials for $CuAlSe_{2}$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $CuAlSe_{2}$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $680^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuAlSe_{2}$ single crystal thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}cm^{-3}$ and $295cm^{2}/V{\codt}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_{2}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$ = 2.8382 eV - ($8.68{\circ}10^{-4}$ eV/K)$T^{2}$/(T + 155 K). The crystal field and the spin-orbit splitting energies for the valence band of the $CuAlSe_{2}$ have been estimated to be 0.2026 eV and 0.2165 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_{5}$ states of the valence band of the $CuAlSe_{2}$. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1-}$, $B_{1-}$, and $C_{1-}$ exciton peaks for n = 1.

Hot Wall Epitaxy(HWE)법으로 성장된 CuGaSe$_2$ 단결정 박막 성장의 열처리 효과 (The Effect of Thermal Annealing for CuGaSe$_2$ Single Crystal Thin Film Grown by Hot Wall Epitaxy)

  • 박창선;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.352-356
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    • 2003
  • A stoichiometric mixture of evaporating materials for $CuGaSe_2$ single crystal am films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuGaSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.615\;{\AA}\;and\;11.025\;{\AA}$, respectively. To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively, The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuGaSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}\;cm^{-3}$ and $295\;cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;:\;1.7998\;eV\;-\;(8.7489\;{\times}\;10^{-4}\;eV/K)T^2(T\;+\;335\;K)$. After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU}$, $V_{Se}$, $CU_{int}$, and $Se_{int}$, obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2/GaAs$ did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

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연료 및 공기 노즐 위치와 공기 유량 변화에 따른 MILD 연소 특성에 관한 해석적 연구 (A Numerical Study of the Combustion Characteristics in a MILD Combustor with the Change of the Fuel and Air Nozzle Position and Air Mass Flow Rate)

  • 김태권;심성훈;장혁상;하지수
    • 대한환경공학회지
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    • 제33권5호
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    • pp.325-331
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    • 2011
  • 연소과정 중에 발생하는 질소산화물을 저감하는 기술인 MILD 연소에 대하여 연료노즐과 공기노즐의 위치와 공기유량을 변화하면서 나타나는 연소특성을 수치해석을 통하여 연구하였다. 본 연구의 MILD 연소로는 연료노즐과 공기 노즐 사이에 연소배기가스의 배출구가 있는 연소로를 이용하였다. 공기노즐은 8개, 연료노즐은 4개를 사용하였다. 연료노즐이 연소로 중앙 부근에 위치한 연소로의 경우에 공기유량이 적을 때는 연소반응대가 연료노즐에서부터 연소로 벽면으로 치우치게 되지만 공기유량이 커지면 연소반응대가 연료노즐 측에서 시작하여 연료노즐 상부로 형성된다. 공기노즐이 연소로 중앙부분에 위치한 경우에 공기유량이 적을 때는 연소반응대가 공기노즐 부근에서 시작하여 연소로 벽면으로 치우치지만 공기유량이 증가하면 연소반응대가 연료노즐 측으로 옮겨가게 된다. 두 가지 경우 모두 공기유량이 증가하면 연소반응대에서 최대온도가 증가하고 따라서 배기가스에서의 NOx 농도가 증가한다. 두 가지 노즐 위치에서의 NOx 생성을 비교해 보면 공기노즐이 연소로 중앙에 위치한 경우가 연료노즐이 연소로 중앙에 위치한 경우보다 NOx 농도가 현저히 적음을 알 수 있었다. 본 연구의 결과로부터 NOx 저감과 연료의 미연가스 배출을 감안할 때 공기노즐이 연소로 중앙에 위치하고 이론공기량에 해당하는 공기량을 분출할 때 NOx 생성에 가장 효과적임을 알 수 있었다.

3차 재결정에 의한 극박 방향성 규소강판의 결정립 크기와 자벽수와의 관계 (Relation of Grain Size with Magnetic Domain Wall for Tertiary Recrystallized 3% Si-Fe Strip)

  • 김영학
    • 한국자기학회지
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    • 제6권3호
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    • pp.165-169
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    • 1996
  • 극박 방향성 규소강판의 철손을 저감시킬 목적으로 열처리방법을 이용하여 결정 크기의 제어에 의해 자구폭을 변화시켰으며 결정립의 크기와 직류 자기특성, 철손, 자구폭과의 관계에 대해 검토하였다. 결정립 크기가 1 mm 이하로 작게되어도, $B_{8}$는 1.96 T 이상의 높은 값을 나타내었고 항자력 $H_{c}$는 결정립 크기의 감소에 따라 증가하였다. 결정립 크기가 1 mm 이하의 범위에서 결정립 크기를 감소시킴에 의해 자벽수가 증가하였으며 여자주파수가 높게 됨에 따라 증가하는 자벽수도 결정립 크기가 작을수록 많아지고 자구 세분화에 효과적이었다. 결정립 크기의 감소는 자구 세분화에 의해 와전류 손실을 저감시키지만 히스테리시스 손실이 지배적으로 낮은 여자주파수의 철손은 결정립 크기가 작은 시료일수록 높은 값을 나타내었다. 그러나 높은 주파수 영역의 철손은 와전류손실이 지배적이기 때문에 결정립 크기가 작은 시료일수록 낮은 값을 나타내었다. 이 결과로부터 결정립크기를 제어함에 의해 자구폭을 변화시킬수 있으며 극박방향성 규소강판의 저 손실화에 매우 유리한 수법인 것을 알았다.

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다구찌 실험계획법을 이용한 소구경화기 총열 내부용 Cr-Mo-V강의 질화공정 최적화 (Optimization of Inner Nitriding Process for Cr-Mo-V Steel of Small Arms Barrel by using Taguchi Experimental Design Method)

  • 권혁린;김동은;손형동;신재원;박재하;강명창
    • 한국기계가공학회지
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    • 제17권3호
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    • pp.148-154
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    • 2018
  • When shooting small arms, the inner surface temperature is heated up to about $700{\sim}1,000^{\circ}C$ by the friction of the bullet and the inner wall of the barrel and the combustion of propellant. High-temperature propellant gas and high-speed movement of the bullet cause corrosion of the inner wall, which is noticeable immediately in front of the chamber. In this study, the mechanical properties of Cr-Mo-V steel, which is the base material, were tested using Taguchi experimental design to find the best nitriding treatment conditions. For the nitriding process, the working time, salt bath temperature, and salt concentration were combined as three conditions and placed in the $L_9(3^4)$, orthogonal array table. The thicknesses of the white layer and the nitrogen diffusion layer were measured after nitriding under each condition in a salt bath furnace. Durability was evaluated by measuring the degree of dispersion through actual shooting because it was difficult to evaluate the mechanical properties of the cylinder inner structure. As a result, it was confirmed that the durability was optimal at $565^{\circ}C$, 1 hour, 0.5%. These optimal conditions were selected by the statistical analysis of the Minitab program(ver.17).

Hot Wall Epitaxy(HWE) 방법에 의한 $CuInTe_2$ 단결정 박막 성장과 특성에 관한 연구 (Growth and Characterization of $CuInTe_2$ Single Crystal thin Films by Hot Wall Epitaxy)

  • 홍광준;이관교;이상열;유상하;정준우;정경아;백형원;방진주;신영진
    • 한국결정학회지
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    • 제11권4호
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    • pp.212-223
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    • 2000
  • A stochiometric mix of CuInTe₂ polycrystal was prepared in a honizonatal furnace. To obtain the single crystal thin films, CuInTe₂ mixed crystal was deposited on throughly etched GaAs(100) by the HWE system. The source and substrate temperatures were 610℃ and 450℃ respectively, and the thickness of the deposited single crystal thin film was 2.4㎛. CuInTe₂ single crystal thin film was proved to be the optimal growth condition when the excition emission spectrum was the strongest at 1085.3 nm(1.1424 eV) of photoluminescence spectrum at 10 K, and also FWHM of Double Crystal X-ray Rocking Curve (DCRC) was the smallest, 129 arcsec. The Hall effect on this sample was measured by the method of Van der Pauw, and the carrier density and mobility dependent on temperature were 9.57x10/sup 22/ electron/㎥, 1.31x10/sup -2/㎡/V·s at 293 K, respectively. The ΔCr(Crystal field splitting) and the ΔSo (spin orbit coupling splitting( measured at f10K from the photocurrent peaks in the short wavelength of the CuInTe₂ single crystal thin film were about 0.1200 eV, 0.2833 eV respectively. From the PL spectra of CuInTe₂ single crystal thin film at 10 K, the free exciton (E/sub x/) was determined to be 1064.5 nm(1.1647 eV) and the donor-bound exciton(D/sup 0/, X) and acceptor-bound exciton (A/sup 0/, X) were determined to be 1085.3 nm(1.1424 eV) and 1096.8 nm(1.1304 eV0 respectively. And also, the donor-acciptor pair (DAP)P/sub 0/, DAP-replica P₁, DAP-replica P₂ and self-activated (SA) were determined to be 1131 nm (1.0962 eV), 1164 nm(1.0651 eV), 1191.1 nm(1.0340 eV) and 1618.1 nm (0.7662 eV), respectively.

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