• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2005년도 춘계학술대회 논문집
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• pp.47-53
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• 2005

본 연구에서는 최적화기법과 전산유체역학의 기술을 이용하여 저항의 관점에서 최적의 형상을 가지는 선형을 개발하는 알고리즘을 개발하였다. 최적화기법으로는 SQP(sequential quadratic programming)을 사용하였으며, 목적함수인 저항을 구하기 위하여 먼저 조파저항은 비선형자유수면경계조건을 고려한 선체주위 포텐셜유동을 계산할 수 있는 수치해석기법인 상방향패널이동법을 사용하였고, 선체에 미치는 전저항을 구하기 위하여 ITTC 1957년 모형선-실선상관곡선을 이용하였다. 선형최적화 과정 중의 선체의 변경이나 계산 격자의 생성은 NURBS(Non-Uniform Rational B-Spline)기법을 사용하여 구현하였다. 이와 같은 방법을 사용하여 개발된 선형최적화 기법의 타당성을 검증하기 위하여 선형이 비교적 잘 알려진 선형인 Wigley선형과 Series 60(C${_B}$=0.6)hull 선형에 대하여 설계속도 Fn=0.316에서 선형최적화를 위한 수치해석을 수행하고 그 결과를 초기선형과 서로 비교하였다.

• 한국표면공학회지
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• 제34권5호
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• pp.384-390
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• 2001

The hollow cathode discharge is a kind of plasma formation scheme in which plasma is formed inside a hollow structure, the cathode, with current to a nearby anode of arbitrary shape. In this scheme, electrons reflex radially within the hollow cathode, establishing an efficient ionization mechanism for gas within the cavity. An existence condition for the hollow cathode effect is that the electron mean-free-path for ionization is of the order of the cavity radius. Thus the size of this kind of plasma source must decrease as the gas pressure is increased. In fact, the hollow cathode effect can occur even at atmospheric pressure for cathode diameters of order 10-100 $\mu\textrm{m}$. That is, the "natural" operating pressure regime for a "micro hollow cathode discharge" is atmospheric pressure. This kind of plasma source has been the subject of increasing research activity in recent years. A number of geometric variants have been explored, and operational requirements and typical plasma parameters have been determined. Large arrays of individual tiny sources can be used to form large-area, atmospheric-pressure plasma sources. The simplicity of the method and the capability of operation without the need for the usual vacuum system and its associated limitations, provide a highly attractive option for new approaches to many different kinds of plasma applications, including plasma surface modification technologies. Here we review the background work that has been carried out in this new research field.

• 한국정밀공학회지
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• 제18권6호
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• pp.43-49
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• 2001

A reduced machining time and increased accuracy for the sculptured surface are very important when producing complicated parts. The step-size and tool-path interval are essential components in high speed and high resolution machining. If they are small, the machining time will increase, whereas if they are large, rough surfaces will be caused. In particular, the machining time, which is key in high speed machining, is affected by the tool-path interval more than the step-size. The conventional method for calculating the tool=path interval is to select a small parametric increment of a small increment based on the curvature of the surface. However, this approach also has limitations. The first is that the tool-path interval can not be calculated precisely. The second is that a separate tool-path interval needs to be calculated in each of the three cases. The third is that the conversion from Cartesian domain to parametric domain or vice versa must be necessary. Accordingly, the current study proposes a new tool-path interval algorithm that do not involve a curvature and that is not necessary for any conversion and a variable step-size algorithm for NURBS.

• International Journal of Fluid Machinery and Systems
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• 제1권1호
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• pp.10-23
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• 2008

The development of pre-set wavelength G$\ddot{o}$rtler vortices are studied in the boundary-layer flows on concave surfaces of 1.0 and 2.0 m radius of curvature. The wavelengths of the vortices were pre-set by thin wires of 0.2 mm diameter placed 10 mm upstream and perpendicular to the concave surface leading edge. Velocity contours were obtained from velocity measurements using a single hot-wire anemometer probe. The most amplified or dominant wavelength is found to be 15 mm for free-stream velocity of 2.1 m/s and 3.0 m/s on the concave surface of R = 1 m and 2 m, respectively. The velocity contours in the cross-sectional planes at several streamwise locations show the growth and breakdown of the vortices. Three different regions can be identified based on the growth rate of the vortices. The occurrence of a secondary instability mode is also shown in the form of mushroom-like structures as a consequence of the non-linear growth of the G$\ddot{o}$rtler vortices. By pre-setting the vortex wavelength to be much larger and much smaller than the most amplified one, the splitting and merging of G$\ddot{o}$rtler vortices can be respectively observed.

• Smart Structures and Systems
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• 제23권1호
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• pp.31-44
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• 2019

The present study investigate the compressive stress, shear stress, tensile stress, vertical electrical displacement and horizontal electrical displacement induced due to a load moving with uniform velocity on the free rough surface of an irregular transversely isotropic functionally graded piezoelectric material (FGPM) substrate. The closed form expressions ofsaid induced stresses and electrical displacements for both electrically open condition and electrically short condition have been deduced. The influence of various affecting parameters viz. maximum depth of irregularity, irregularity factor, parameter of functionally gradedness, frictional coefficient of the rough upper surface, piezoelectricity/dielectricity on said induced stresses and electrical displacements have been examined through numerical computation and graphical illustration for both electrically open and short conditions. The comparative analysis on the influence of electrically open and short conditions as well as presence and absence of piezoelectricity on the induced stresses and induced electrical displacements due to a moving load serve as the salient features of the present study. Moreover, some important peculiarities have also been traced out by means of graphs.

• 해양환경안전학회지
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• 제22권2호
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• pp.246-252
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• 2016

본 연구에서는 연안의 해저면에 누적된 퇴적오염물을 효율적으로 수거할 수 있는 저속 쌍동형 정화선에 대한 선수선형의 개념설계에 대해 수행하였다. 선형설계는 선체건조가 용이하도록 단순화하였으며, 쌍동선 선형의 선수 Water line, 선수각 등의 변화에 따른 저항성능의 영향을 검토하였다. Ansys CFX를 이용한 수치시뮬레이션과 회류수조에서의 모형시험결과와의 비교/분석 등을 통하여 선수부 선형변화에 따른 저항성능과 자유표면 유동특성 사이의 관계를 고찰하였으며, 그 결과 선수재 위치와 어깨부 체적의 선수부 이동에 따른 파형개선으로 조파저항이 감소하는 등 저항성능의 향상을 확인하였다.

• Journal of Microbiology and Biotechnology
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• 제9권1호
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• pp.70-77
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• 1999

An extremely cadmium-tolerant budding yeast, Hansenula anomala B-7 underwent a morphological switch in response to either heat shock treatment or cadmium stress, respectively. It exhibited a morphological transition from a unicellular yeast form to a pseudohyphae-like coagulation when subjected to prolonged heat shock treatment. In contrast, the yeast cells showed an irregularity in surface morphology when given thermal stress for a short time. Patterns of proteins expressed in the pseudohyphae-like cells demonstrated that several proteins were overexpressed while others were underexpressed in comparison with those prepared from the cells in the yeast form. It was a striking feature, however, that nearly 40％ of the proteins extracted from the cells in the pseudohyphae form appeared to be composed of a single polypeptide. This polypeptide was apparently overexpressed during the pseudohyphae phase and its molecular weight was estimated to be 58 kDa according to SDS-PAGE analysis. However, a significant level of the protein was not observed in the cells before transition to pseudohyphae. The architecture of the cell shape was also damaged when incubated in a medium containing more than 1,000 ppm (8.9mM) of cadmium ions, although able to proliferate at a slow rate. However, the irregularity in the cell morphology exerted either by the brief heat shock treatment or by the cadmium stress with the high concentrations of the metal ions was not repaired, even though the damaged cells were allowed to grow for sufficient time in fresh, cadmium-free medium.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.1869-1872
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• 2003

As SLA(Sterealithography), SLS(Selective Laser Sintering), LOM(Laminated Object Manufacturing), FDM(Fused Deposition Modeling) etc. The FDM system the heart of a study and is developed by Stratasys co. ltd, in US., is small and cheap R.P. The material filament is heated until the material reaches a near-liquid state, it is pumped through a nozzle and become hand with a shape required, and this nozzle move pumping on the previously deposited material. Such FDM system that choice deposition type with X-Y plouter obtain in the thin continue layer by decreasing amount of extrusion or to central the injection amount when the head slow down at the corner, but in the process that fusion wax or resin become hand, deformation occur and it will affect the shape accuracy and the surface roughness. Such effect will depreciate quality and reliability of the product. Therefore, when the product made in actuality, the fundamental study on the basis geometry(surface, volume, line, angle) must be preceded and it have been research by many Free Form Fabrication. So, this basic object study purpose to obtain the fundamental geometry data and to enhance the surface roughness of the shape. And an operant can use the data for the progress of the surface roughness. This study research the estimation and application of the prototype surface roughness by adjustment the injection amount. And basie of this research, describe the pattern of prototype surface roughness and also used the result to estimate the surface of prototype.

• 한국표면공학회지
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• 제50권2호
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• pp.98-107
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• 2017

Pd-based membranes have been widely used in hydrogen purification and separation due to their high hydrogen diffusivity and infinite selectivity. However, it has been difficult to fabricate thin and dense Pd-based membranes on a porous stainless steel(PSS) support. In case of a conventional PSS support having the large size of surface pores, it was required to use complex surface treatment and thick Pd coating more than $6{\mu}m$ on the PSS was required in order to form pore free surface. In this study, we could fabricate thin and dense Pd membrane with only $3{\mu}m$ Pd layer on a new PSS support manufactured by metal injection molding(MIM). The PSS support had low surface roughness and mean pore size of $5{\mu}m$. Pd membrane were prepared by advanced Pd sputter deposition on the modified PSS support using fine polishing and YSZ vacuum filling surface treatment. At temperature $400^{\circ}C$ and transmembrane pressure difference of 1 bar, hydrogen flux and selectivity of $H_2/N_2$ were $11.22ml\;cm^{-2}min^{-1}$ and infinity, respectively. Comparing with $6{\mu}m$ Pd membrane, $3{\mu}m$ Pd membrane showed 2.5 times higher hydrogen flux which could be due to the decreased Pd layer thickness from $6{\mu}m$ to $3{\mu}m$ and an increased porosity. It was also found that pressure exponent was changed from 0.5 on $6{\mu}m$ Pd membrane to 0.8 on $3{\mu}m$ Pd membrane.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.