• Journal of the Korean Graphic Arts Communication Society
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• v.12 no.1
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• pp.47-65
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• 1994

Synthetic photoresist have partially displaced the natural materials, but bichromated casein have remained in use until recently at etching industry such as chemical milling. The object of this paper is that the mutual relations among factors and suitable latitude in pattern formation or etching process when is to be applied the casein ammonium bichromate photoresist.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.885-886
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• 2009

• Bulletin of the Korean Chemical Society
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• v.29 no.11
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• pp.2241-2246
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• 2008

• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.245-246
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• 2006

• Korean Institute of Interior Design Journal
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• no.17
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• pp.181-186
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• 1998

Grid serves as an auxiliary instrument that explains design logically and objectively when you designing an interior. But grid is unacceptable to the space which is produced by designer who wants to express a design subjectively. Because grid makes usual and standardized space without flexibility. Changing and developing a fundamental unit with modern touch is going to be a way compensate for the weakpoint Also versatile grid unit can support the designer's subjective intention. This study focuses on the limits of Wright's house which show interior space aestheically through grid planing. In this paper Wright's uniqe interior space pattern will be examined through the selection of some of his works specifically the Prairies and Usonians whose transforming is noticable as Wright house and analysis about formation process of grid planning characteristics and spaces is continued. With all this analysis I'm, going to look over Wright's philosophy and pattern that is usually intended by his grid planning.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.2
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• pp.130-138
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• 2006

We have investigated pattern scaling down of silicon stamps through the oxidation technique, During oxidizing the silicon stamps, silicon dioxide that has 300 nm and 500 nm thickness was grown, and critical deformations were not observed in the patterns. There was positive effect to reduce size of patterns because vertical and horizontal patterns have different orientation. We achieved pattern reduction rate of $26\%$. In addition, the formation of polymer patterns had been investigated with varied temperature and pressure conditions to improve the filling characteristics of polymers during nanoimprint lithography when pattern sizes were few micrometers. In these varied conditions, polymers had been affected by free space compensation and elastic stress relaxation for filling the cavities. Based on the results, defect control which is an important issue in the nanoimprint lithography were facilitated.

• Proceedings of the IEEK Conference
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• 1998.06a
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• pp.465-468
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• 1998

For porous silicon layer to be used as active layer in various devices, it is necessary to be formed locally along with a designed pattern on the wafer. However, there is still no suitable masking layer to withstand against the high concentration of HF for a time of some minutes up to some hours during the anodic process effectively. In this work, we investigated the property of selectivity between p$^{+}$ and n layers to form localized porous silicon even without a mask by the difference of the anodic I-V characteristics on the doping level and doping type. The width of the pattern made in the sample was 2mm, and the formed porous silicon layer was observed by SEM to see the morphology on the cross section below the surface. As the results, it was found that the selectivity was reasonable for the pattern size over 100.mu.m.m.

• Proceedings of the KIEE Conference
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• 1999.07e
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• pp.2051-2053
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• 1999

In this work, PD patterns and electrical trees are observed by use of the XLPE cable insulation. and the tree initiation voltage related to the contamination are also measured in order to calculate the electric stress necessary for the design of cable insulation. Throughout these works, correlation between the PD pattern and the shape of electrical tree has been observed that there may exist three distinct pattern of PD dependence on the stage of tree propagation, Such correlation could bring a basic information in connection with the partial discharge of cable system. It was also found that the electrical stress necessary for the initiation of electrical tree was measured to the 290kV/mm for the 154kV XLPE cables manufactured in KOREA.

• Journal of Ginseng Research
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• v.16 no.3
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• pp.217-221
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• 1992

Total polysaccharide contents in Panax ginseng roots were evaluated by a spectrophotometry, utilizing the complex formation of ginseng polysaccharide with alcian blue dye in 50 mM ammonium biphosphate, pH 4.2. The total polysaccharide content in red ginseng was about three times higher than that in fresh ginseng when both were extracted with water, and was increased about two times when red ginseng was extracted with an alkaline solution. The determination of total polysaccharide in various parts of ginseng revealed that main roots contained the component more than fine roots. Fresh ginseng sections stained by the dye showed polysaccharide mainly found in cortex and cambium but not in epidermis. Pattern-analysis on total and acidic polysaccharides from fresh and red ginsengs exhibited that the chemical compositions of the polysaccharides extracted from both ginsengs quite differed from each other.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.12 no.1
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• pp.81-87
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• 1999

The surface morphology of liquid crystal alignment layer has been investigated by using Brewster angle microscope(BAM) for the first time. The samples used in this work for liquid crystal alignment layer were mechanically rubbed polyimide films. The rubbing pattern on this layer has been analyzed with the terms of microgroove and rubbing induced optical birefringence. For the mechanically rubbed surface, the geometrical factors of microgroove play the major role for the formation of rubbing pattern. We propose that the BAM can be used as a powerful tool not only for observing the rubbing pattern, but also for inspecting the surface defects.