• Title/Summary/Keyword: Flexible sail

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A Construction of Aerodynamic Force Measurement System for Wind Tunnel Test of Yacht Sail and Aerodynamic Forces Measurement of Model Sail (요트세일의 풍동시험을 위한 공력 계측시스템 구축과 모형세일의 공력 계측)

  • Kim, Choul-Hee;Choi, Jung-Kyu;Kim, Hyoung-Tae
    • Journal of the Society of Naval Architects of Korea
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    • v.48 no.5
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    • pp.445-450
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    • 2011
  • In order to estimate a yacht sail performance, measuring system of aerodynamic forces acting on the yacht sail is constructed and experiments of flexible model sail are carried out at the medium-size subsonic wind tunnel of Chungnam National University. Experimental results for a flexible sail are compared with experimental and numerical results of fixed shape sail. In case of a fixed shape sail, lift and drag coefficients are rarely changed at all velocity conditions. However, those of the flexible sail are decreased as the incoming velocity is increased. These are understandably resulted from shape variations due to the flexible material. Therefore aero-elastic similarity should be more carefully considered in the model test rather than other similarities.

A Study on Shape Measuring Technique of a Yacht Sail (요트세일의 형상계측 기법 연구)

  • Kim, Choul-Hee;Choi, Jung-Kyu;Kim, Hyoung-Tae
    • Journal of the Society of Naval Architects of Korea
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    • v.49 no.1
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    • pp.93-98
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    • 2012
  • In this study, we introduced image processing technic to measure shape variations of general bodies and applied it to the flexible yacht sail. Shape measurements of simple bodies sails were carried out and results showed that technic can be a reliable method to measure shape variations of the flexible yacht sail. The sail shape variation of 30ft sloop type yacht sail is measured on different sailing conditions. As velocity and direction of wind are increased, trailing edges in the upper part of the sail become more open than the lower part of the sail which are not changed. So it is confirmed that the shape measurement of a sail shape depending on a sailing condition is possible to use image processing scheme.

Roll-to-Roll Fabrication of Active-Matrix Backplanes Using Self-Aligned Imprint Lithography (SAIL)

  • Kim, Han-Jun;Almanza-Workman, Marcia;Chaiken, Alison;Jackson, Warren;Jeans, Albert;Kwon, Oh-Seung;Luo, Hao;Mei, Ping;Perlov, Craig;Taussig, Carl;Jeffrey, Frank;Braymen, Steve;Hauschildt, Jason
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1539-1543
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    • 2006
  • We have developed self-aligned imprint lithography (SAIL) technology, an innovative method for roll-to-roll (R2R) fabrication of electronic devices on flexible plastic substrates. In this paper, we present the first R2R-produced ${\alpha}$-Si TFTs built on a polyimide substrate using the SAIL process, and prove the feasibility of this technology to enable R2R fabrication of flexible display active matrix (AM) backplanes with high precision and throughput.

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5-3: [Invited] Roll-to-Roll Manufacturing of Electronics on Flexible Substrates Using Self-Aligned Imprint Lithography (SAIL)

  • Kim, Han-Jun;Almanza-Workman, Marcia;Chaiken, Alison;Elder, Richard;Garcia, Bob;Jackson, Warren;Jeans, Albert;Kwon, Oh-Seung;Luo, Hao;Mei, Ping;Perlov, Craig;Taussig, Carl;Jeffrey, Frank;Beacom, Kelly;Braymen, Steve;Hauschildt, Jason;Larson, Don
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.82-85
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    • 2008
  • We are working towards large-area arrays of thin film transistors on polymer substrates using roll-to-roll (R2R) processes exclusively. Self-aligned imprint lithography (SAIL) is an enabler to pattern and align submicron features on meter-scaled flexible substrates in the R2R environment. The progress, current status and remaining issues of this new fabrication technology are presented.

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Manufactured Flexible Active Matrix Backplanes using Self-Alighed Imprint Lithography (SAIL)

  • Kwon, Oh-Seung;Marcia-Almanza-Workman, Marcia-Almanza-Workman;Braymen, Steve;Cobene, Robert;Elder, Richard;Garcia, Robert;Gomez-Pancorbo, Fernando;Hauschildt, Jason;Jackson, Warren;Jam, Mehrban;Jeans, Albert;Jeffrey, Frank;Junge, Kelly;Kim, Han-Jun;Larson, Don;Luo, Hao;Maltabes, John;Mei, Ping;Perlov, Craig;Smith, Mark;Stieler, Dan;Taussig, Carl
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.138-141
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    • 2009
  • Progress in the development of a fully roll-to-roll selfaligned imprint process for producing active matrix backplanes with submicron aligned features on flexible substrates is reported. High performance transistors, crossovers and addressable active matrix arrays have been designed and fabricated using imprint lithography. Such a process has the potential of significantly reducing the costs of large area displays. The progress, current status and remaining issues of this new fabrication technology are reported.

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