• Korean Journal of Optics and Photonics
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• v.6 no.2
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• pp.93-100
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• 1995

3구면경계에서 aplanat 조건을 해석적으로 유도하고 이를 바탕으로 3종의 3차수차가 보정된 3구면 경계의 형태 및 존재영역을 조사하였다. 실상을 맺으면서 aplanat 저건을 만족하는 3구면경계는 유효초점거리가 양수인 경우 PPN, NPP, PNP 형태의 해가 존재하였으며 N은 볼록 거울, P는 오목 거울을 나타낸다. 유효초점거리가 음수인 경우 NPN, NPP, PNP, NNP형의 4종류의 형태가 존재하였다. 3종의 3차수차가 보정된 3구면경계에서 astigmatic aplanat는 실상을 맺는 해가 존재하지 않았다. Flat field aplanat는 PPN, PNP, NPP형태의 해가 존재하였고 distortion free aplanat의 경우는 PPN, PNP, NPN, NPP, NNP형의 해가 존재하였다.

• Current Optics and Photonics
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• v.1 no.4
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• pp.344-350
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• 2017

We present a new design approach and an example design for an image-space telecentric two-mirror system that has a fast f-number and a wide-field line image. The initial design of the telecentric mirror system is a conventional axially symmetric system, consisting of a flat primary mirror with fourth-order aspheric deformation and an oblate ellipsoidal secondary mirror to correct spherical aberration, coma, and field curvature. Even though in the optimized design the primary mirror is tilted, to avoid ray obstruction by the secondary mirror, the image-space telecentric two-mirror system shows quite good imaging performance, for a line imager.

• Korean Journal of Optics and Photonics
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• v.2 no.4
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• pp.186-192
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• 1991

For the micro-lithography using a excimer laser beam $(\lambda\leq0.248$\mu\textrm{m})$. a mirror system consisting of four spherical surfaces with reductlon magnification 5X is designed. Initially the aplanat, flat field and the distortion free condition of the system are analytically investigated within Seidel 3rd order aberrations. And the computer-aided optimization technique has been employed for the further improved performance of the system. The final system has N.A. of 0.15 and image field diameter 3.3 mm, and has the diffraction-limited performance for KrF eximer laser beam.

• Proceedings of the Optical Society of Korea Conference
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• 1991.06a
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• pp.88-89
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• 1991

For the micro-lithography using a KrF excimer laser beam(λ=0.248${\mu}{\textrm}{m}$) a mirror system consisting of four spherical surfaces with reduction magnification 5$\times$ is designed. Initially the aplanat condition of the mirror system is considered. And for the further improved performance of the system the distortion free condition and flat field condition within Seidel 3rd order aberrations are added to the above condition. During the process of designing the computer-aided optimization technique is extensively employed. The spherical aberration, coma, field curvature and distortion of the optimized four-spherical mirror system are removed to the diffraction limit, and residual astigmatism and off-axial vignetting are not corrected enough.

• Korean Journal of Optics and Photonics
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• v.6 no.3
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• pp.188-200
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• 1995

A design of unit magnification 2-mirror system with high resolution is presented. It is for soft X-ray(wavelength of 13 nm) projection imaging and suitable for preparation of high density semiconductor chip. In general, a holosymmetric system with unit magnification has the advantage that both coma and distortion are completely eliminated. In our holosymmetric 2-mirror system, spherical aberration is addtionally removed by using two identical paraboloidal mirror surfaces and field curvature aberration is also corrected by balancing Petzval sum and astigmatism which depends on the distance between two mirrors, so that the system is a aplanatic flat-field paraboloidal 2-mirror holosymmetric system. This 2-mirror system is small in size, and has a simple configuration with rotational symmetry about optical axis, and has also small central obscuration. Residual finite aberrations, spot diagrams, and diffraction-based MTF's are analyzed for the check of performances as soft X-ray lithography projection system. As a result, the image sizes for the resolutions of$0.25\mum$and $0.18\mum$are 4.0 mm, 2.5 mm respectively, and depths of focus for those are $2.5\mum$, $2.4\mum$respectively. This system should be useful in the fabrication of 256 Mega DRAM or 1 Giga DRAM. DRAM.

• Korean Journal of Optics and Photonics
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• v.11 no.4
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• pp.239-245
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• 2000

In this paper, the fundamental properties of diffractive optical element were investigated. Also, this work deals with theoretical approaches for achromatization in DOE's optical system based on thin lens theory. It is found that achromatization could be satisfied by one hybrid lens only, which is composed of a diffractive and a refractive element. In order to have compact optical system, we used the tele-photo type lens composed of a positive and a negative power elements instead of retro-focus lens. From the Gaussian brackets and Seidel aberration theory, the initial design was numerically obtained. The aberration properties of an initial design was aplanat and flat field. In order to correct the chromatic aberrations, refractive and diffractive elements were used on front element. This hybrid lens is also useful for correction of higher order aberrations. Compared to conventional design composed of refractive lenses only, this approach dramatically improved the compactness of the optical system. Finally, residual aberration balancing results in a lens with focal length of 3.89 mm and overall length of 5.19 mm, which has enough performance over an f-number of 4.0. Also, it is expected to fulfill all the requirements of a digital still camera lens. This optical system is superior to the current refractive lens system in the number of elements, weight, and aberration properties. rties.