• 제목/요약/키워드: Flame hydrolysis deposition

검색결과 22건 처리시간 0.03초

화염 가수분해 증착공정에서 온도 및 OH 분포측정 (Measurements of Temperature and OH Radical Distributions in Flame Hydrolysis Deposition Process)

  • 황준영;길용석;김정익;최만수;정석호
    • 대한기계학회논문집B
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    • 제24권11호
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    • pp.1464-1469
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    • 2000
  • The effects of SiCl$_4$addition on flame structures have been studied in flame hydrolysis deposition (FHD) processes using Coherent anti-Stokes Raman spectroscopy (CARS) and planar laser induced fluorescence (PLIF) to measure temperatures and OH concentrations, respectively. The results demonstrate that even a small amount of SiCl$_4$ addition can change thermal and chemical structures of H$_2$/O$_2$ diffusion flames. When SiCl$_4$ is added to a flame temperature decreases in non-reacting zone due to the increases in both specific heat and density of the gas mixture, while flame temperature increase in particle formation zone due to the heat release through hydrolysis and oxidation reactions of SiCl$_4$. It is also found that OH concentration decreases dramatically in particle formation zone where temperatures increase. This can be attributed to consumption of oxidative species and generation of HCl during silica formation.

화염가수분해 증착 공정에서 기판온도의 변화에 따른 다성분 입자의 부착 및 소결특성에 관한 연구 (Effect of Substrate Temperature on Multi-component Particle Deposition and Consolidation in Flame Hydrolysis Deposition)

  • 신형수;백종갑;최만수
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2000년도 춘계학술대회논문집B
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    • pp.428-433
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    • 2000
  • The consolidation behavior of multicomponent particles prepared by the flame hydrolysis deposition process is examined to identify the effects of Si substrate temperature. To fabricate multi-component particles, a vapor-phase ternary mixture of $SiCl_4(100 cc/min),\;BCl_3(30cc/min)\;and\;POCl_3,(5cc/min)$ was fed into a coflow diffusion oxy-hydrogen flame burner. The doped silica soot bodies were deposited on silicon substrates under various deposition conditions. The surface temperature of the substrate was measured by an infrared thermometer. Changes in the chemical states of the doped silica soot bodies were examined by FT-IR(Fourier-transformed infrared spectroscopy). The deposited particles on the substrate were heated at $1300^{\circ}C$ for 3h in a furnace at a heating rate of 10K/min. Si-O-B bending peak has been found when surface temperature exceeds $720^{\circ}C$. Correspondingly, the case with substrate temperatures above loot produced good consolidation result.

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FHD(Flame Hydrolysis Deposition)법으로 제작된 광도파막용 실리카 soot의 분광학적 분석 (Spectroscopic Analysis of Silica Soot for Planar Waveguide by FHD(Flame Hydrolysis Deposition) Method)

  • 류형래;김재선;신동욱
    • 한국세라믹학회지
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    • 제38권1호
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    • pp.74-83
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    • 2001
  • FHD(Flame Hydrolysis Deposition) 공정은 광통신에서 사용되는 수동형 집적광학소자를 제작하는 공정으로서, SiCl$_4$를 형성하는 방법이다. 이 FHD 공정은 화염 형성에 관여하는 장비의 조건에 따른 매우 다양한 공정인자에 의하여 박막의 조성이 결정되므로, 박막의 조성을 예측하는 것이 용이하지 않았다. 본 연구에서는 FHD 공정에서 첨가가스의 유량을 제어하여 박막의 조성 및 광학적 특성을 예측할 수 있는 공정 분석의 기초자료를 제공하기 위하여 FTIR과 ICP-AES를 이용하여 실리카 soot의 조성분석에 대한 연구를 수행하였다. FTIR 흡수스펙트럼을 통해 실리카 soot에 존재하는 Si-O, B-O, OH($H_2O$) 농도의 변화를 관찰할 수 있었으며, ICP-AES를 통해 B-O의 흡수스펙트럼의 변화를 B의 농도와 정량적으로 연관지을 수 있었다.

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FHD 공정에 의한 저손실 실리카 슬랩 도파로 형성 (Fabrication of Low Loss Silica Slab Waveguide by Flame Hydrolysis Deposition)

  • 심재기;김태홍;신장욱;박상호;김덕준;성희경
    • 한국세라믹학회지
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    • 제37권6호
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    • pp.524-529
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    • 2000
  • Silica slab wavegudie was fabricated on Si substrates by FHD for planar optical passive devices. The slab waveguide consists of lower clad and core layers, where core layer index is controlled by GeO2 addition. Doping of GeO2 in silica is difficult because of the low deposition density due to nonspherical particle generation in FHD process. Silica core particles deposited at various conditions such as flame temperature and substrate scanning were analyzed by SEM and TEM. As the flame temperature increased, the surface roughness of the core layer was decreased up to 3.6 nm after consolidation. Index difference and thickness of core of slab waveguide were 0.3%, 8$\mu\textrm{m}$ respectively. Measured optical loss at TE mode was <0.04 dB/cm at 1.3$\mu\textrm{m}$ and <0.06 dB/cm at 1.55$\mu\textrm{m}$.

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FHD법에 의한 $B_2O_3-P_2O_5-SiO_2$ 실리카막의 효과적인 $P_2O_5$ 도핑 (The Effective $P_2O_5$ Doping into $B_2O_3-P_2O_5-SiO_2$ Silica Layer Fabrication by Flame Hydrolysis Deposition)

  • 심재기;이윤학;성희경;최태구
    • 한국세라믹학회지
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    • 제35권4호
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    • pp.364-370
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    • 1998
  • 광집적회로용 평면도파로를 구현하기 위한 $B_2O_3-P_2O_5-SiO_2$ 실리카 광도파막을 실리콘 기판위에 FDH(Flame Hydrolysis Depositon)법으로 제조하여 미립자의 미세구조, 실리카막의 굴절률과 조성을 고찰하였다. FHD법에서 도펀트(dopant)물질로, $B_1\;P_1\;Ge$ 등의 산화물이 사용되며, $B_1$ Ge 산화물의 경우 $SiO_2$와의 결합특성이 우수하여 비교적 도핑(doping)이 용이하지만 P의 경우 $P_2O_5$의 낮은 융점에 의한 증발 등으로 효과적인 도핑이 어렵다. 수직형 FHD 토치를 사용하고 화염온도, 기판온도, 토치와 기판간의 거리를 최적화하여 P 농도가 3.3 Wt%이상이고 고밀화 온도가 $1180^{\circ}C$ 이하인 양질의 실리카막을 얻었다. 실리카막의 굴절률은 $1.55\;\mu\textrm{m}$ 파장에서 $1.4480{\pm}1{\times}10^{-1}$로 측정되었으며, $22{\pm}1\;\mu\textrm{m}$의 두께를 보였다.

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FHD 공정으로 제조한 실리카 막의 저온 고밀화 (Low Temperature Consolidation of Silica Film by Flame Hydrolysis Deposition)

  • 김태홍;윤기현
    • 한국세라믹학회지
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    • 제39권3호
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    • pp.278-285
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    • 2002
  • 화염가수분해증착(FHD : Flame Hydrolysis Deposition)공정으로 평면형 광수동소자를 구현하기 위한 1050$^{\circ}C$의 저온에서 실리카(silica)막을 형성하였다. 본 연구는 실리카 막을 저온에서 형성하기 위하여 B, P 의 함량을 증가시키면서 고밀화 온도 변화 및 고밀화 분위기에 따른 미세구조의 변화 등 고밀화 영향과 광학적 특성을 관찰하였다. He 분위기에서 고밀화한 경우 적정 고밀화 온도를 1050$^{\circ}C$까지 낮출 수 있었고, 그 결과 표면조도(Surface Roughness)가 5.6nm인 균질한 실리카 막을 저온에서 형성할 수 있었다.

화염 가수분해 증착에 의해 형성된 $SiO_2-P_2O_5-B_2O_3$ 유리 미립자의 특성 (Characterization of $SiO_2-P_2O_5-B_2O_3$ Glass Soot fabricated by Flame Hydrolysis Deposition)

  • 최춘기;정명영;최태구
    • 한국세라믹학회지
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    • 제34권8호
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    • pp.811-816
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    • 1997
  • SiO2-P2O5-B2O3 glass soot was fabricated by flame hydrolysis deposition and their properties by SEM, XRD, TGA-DSC were investigated., The mechanism of consolidation process of a glass soot as a function of consolidation temperature was analyzed by SEM observations. In the XRD patterns, the crystalline peaks which seem to be generated from B2O3 and BPO4 were observed. When the temperature of heat treatment exceeded 105$0^{\circ}C$, the non-crystalline state of SiO2-P2O5-B2O3 glass was observed. In the TGA-DSC curves, the evaporation of water molecule by a sudden endothermic reaction was observed at 128$^{\circ}C$ and a broad endothermic peak was seen in the temperature range of 40$0^{\circ}C$-95$0^{\circ}C$, without any weight loss. Finally, this peak was began to recover its baseline at 953$^{\circ}C$. This point is equal to the temperature at which the densification begins. Furthermore, we observed that the addition of dopants such as P2O5 and B2O3 decrease the onset of consolidation temperature till 95$0^{\circ}C$.

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FHD(Flame Hydrolysis Deposition)공정으로 제작된 SiO2 광도파막의 분광학적 분석 (Spectroscopical Analysis of SiO2 Optical Film Fabricated by FHD(Flame Hydrolysis Deposition))

  • 김윤제;신동욱
    • 한국세라믹학회지
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    • 제39권9호
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    • pp.896-901
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    • 2002
  • FHD(Flame Hydrolysis Deposition)공정은 화염 형성에 관여하는 장비의 조건들과 그에 따른 다양한 공정인자에 의하여 박막의 조성이 결정되며, 증착된 막을 치밀화하는 첨가물의 증발로 인해 열처리공정에서 조성이 변화되므로 공정인자로부터 최종적인 광도파막의 조성을 예측하는 것은 매우 어렵다. 본 연구에서는 FHD 공정에서 첨가가스의 유량을 제어하여 박막의 조성 및 광학적 특성을 예측할 수 있는 공정 분석의 기초자료를 제공하기 위하여 FTIR(Fourier Transformation Infrared Spectroscopy)측정과 ICP-AES(Inductively Coupled Plasma-Atomic Emission Spectrometry)측정을 통해 실리카 막의 조성분석에 대한 연구를 수행하였다. FTIR 흡수 스펙트럼을 통해 실리카 막에 존재하는 Si-O, B-O band를 측정하고 정성적 농도변화를 관찰 하였고, ICP-AES를 통해 Boron의 농도를 정량적으로 측정하였다. 이 두 결과로부터 FTIR을 이용한 정량적 조성분석의 기초자료인 B-O band의 흡광계수를 구하였다.

광산란과 입자포집을 이용한 동축류 확산화염 내의 실리카 입자의 성장 측정(II) - 확산의 영향 - (An Experimental Study of Silica Particle Growth in a Coflow Diffusion Flame Utilizing Light Scattering and Local Sampling Technique (II) - Effects of Diffusion -)

  • 조재걸;이정훈;김현우;최만수
    • 대한기계학회논문집B
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    • 제23권9호
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    • pp.1151-1162
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    • 1999
  • The effects of radial heat and $H_2O$ diffusion on the evolution of silica particles in coflow diffusion flames have been studied experimentally. The evolution of silica aggregate particles in coflow diffusion flames has been measured experimentally using light scattering and thermophoretic sampling techniques. The measurements of scattering cross section from $90^{\circ}$ light scattering have been utilized to calculate the aggregate number density and volume fraction using with combination of measuring the particle size and morphology through the localized sampling and a TEM image analysis. Aggregate or particle number densities and volume fractions were calculated using Rayleigh-Debye-Gans and Mie theory for fractal aggregates and spherical particles, respectively. Flame temperatures and volumetric differential scattering cross sections have been measured for different flame conditions such as inert gas species, $H_2$ flow rates, and burner injection configurations to examine the relation between the formation of particles and radial $H_2O$ diffusion. The comparisons of oxidation and flame hydrolysis have also been made for various $H_2$ flow rates using $N_2$ or $O_2$ as a carrier gas. Results indicate that the role of oxidation becomes dominant as both carrier gas($O_2$) and $H_2$ flow rates increases since the radial heat diffusion precedes $H_2O$ diffusion in coflow flames used in this study. The effect of carrier gas flow rates on the evolution of silica particles have also been studied. When using $N_2$ as a carrier gas, the particle volume fraction has a maximum at a certain carrier gas flow rate and as the flow rate is further increased, the hydrolysis reaction Is delayed and the spherical particles finally evolves into fractal aggregates due to decreased flame temperature and residence time.

외부 화학증착 공정에서의 가수분해반응으로 인한 실리카 생성에 대한 버크-슈만 해석 (Burke-Schumann analysis of silica formation by hydrolysis in an external chemical vapor deposition process)

  • 송창걸;황정호
    • 대한기계학회논문집B
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    • 제20권5호
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    • pp.1671-1678
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    • 1996
  • In external chemical vapor deposition processes including VAD and OVD the distribution of flame-synthesized silica particles is determined by heat and mass transfer limitations to particle formation. Combustion gas flow velocities are such that the particle diffusion time scale is longer than that of gas flow convection in the zone of particle formation. The consequence of these effects is that the particles formed tend to remain along straight smooth flow stream lines. Silica particles are formed due to oxidation and hydrolysis. In the hydrolysis, the particles are formed in diffuse bands and particle formation thus requires the diffusion of SiCl$\_$4/ toward CH$\_$4//O$\_$2/ combustion zone to react with H$\_$2/O diffusing away from these same zones on the torch face. The conversion kinetics of hydrolysis is fast compared to diffusion and the rate of conversion is thus diffusion-limited. In the language of combustion, the hydrolysis occurs as a Burke-Schumann process. In selected conditions, reaction zone shape and temperature distributions predicted by the Burke-Schumann analysis are introduced and compared with experimental data available. The calculated centerline temperatures inside the reaction zone agree well with the data, but the calculated values outside the reaction zone are a little higher than the data since the analysis does not consider diffusion in the axial direction and mixing of the combustion products with ambient air. The temperatures along the radial direction agree with the data near the centerline, but gradually diverge from the data as the distance is away from the centerline. This is caused by the convection in the radial direction, which is not considered in the analysis. Spatial distribution of silica particles are affected by convection and diffusion, resulting in a Gaussian form in the radial direction.