• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.478-478
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• 2012

Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

• 한국포장학회지
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• 제25권1호
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• pp.1-10
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• 2019

이번 연구에서는 식품 포장재로 많이 활용하고 있는 산소 고차단성 필름 두 종류의 환경 영향을 평가하는 것이었다. Table 4의 경우 환경 영향 모델에 따라 계산된 Traditional film과 New film의 각 환경 영향 범주 별 비교 값 및 이러한 차이를 보인 가장 영향력 있는 공정을 설명하였다.

• Journal of Mechanical Science and Technology
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• 제15권7호
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• pp.951-961
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• 2001

The present article presents an extension to the computational model for spray/wall interaction and liquid film processes that has been dealt with in the earlier studies (Lee and Ryou, 2000a). The extensions incorporate film spread due to impingement forces and dynamic motion induced by film inertia to predict the dynamic characteristics of wall films effectively. The film model includes the impingement pressure of droplets, tangential momentum transfer due to the impinging droplets on the film surface and the gas shear force at the film surface. Validation of the spray/wall interaction model and the film model was carried out for non-evaporative diesel sprays against several sources of experimental data. The computational model for spray/wall interactions was in good agreement with experimental data for both spray radius and height. The film model in the present work was better than the previous static film model, indicating that the dynamic effects of film motion should be considered for wall films. On the overall the present film model was acceptable for predication of the film radius and thickness.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2279-2284
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• 2007

This study is intended to analyze the effect of thin ink-film thickness around rotating printing roll on the printing quality in the gravure printing process which is used for making electronics circuit like a RFID tag with a conductive ink. The present work numerically estimates the film thickness around rotating roller partially immersed in ink, for which the volume of fluid (VOF) method was adopted to figure out the film formation process around rotating roller. Parameter studies were performed to compare the effect of ink viscosity, surface tension, roller rotating speed, immersed angle on the film thickness. The result indicates that the film thickness has a strong dependency on the fluid viscosity, while the surface tension has negligible effect.

• 공업화학
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• 제2권3호
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• pp.193-198
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• 1991

후막 구리도체는 귀금속계 도체에 비하여 가격이 저렴하고 전기전도도, 납땜성, 땜납 침식저항, 와이어 본딩성등의 양호한 성질 때문에 매우 중요성을 갖는다. 그러나 우수한 후막 구리도체를 형성하는 것은 구리가 높은 온도에서 쉽게 산화하는 성질로 인해 상당히 복잡하다. 양호한 구리후막을 얻기 위하여 하이브리드 마이크로회로업계는 질소분위기, 반응성분위기 또는 공기분위기를 사용한다. 이 글에서는 후막 구리도체의 소성공정과 세종류의 소성분위기에 대하여 종합적으로 고찰하였다.

• 대한기계학회논문집B
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• 제31권12호
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• pp.1017-1023
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• 2007

This study is intended to analyze the effect of thin ink-film thickness around rotating printing roll on the printing quality in the gravure printing process which is used for making electronics circuit like a RFID tag with a conductive ink. The present work numerically estimates the film thickness around rotating roller partially immersed in ink for which the volume of fluid (VOF) method was adopted to figure out the film formation process around rotating roller. Parameter studies were performed to compare the effect of ink properties (viscosity, surface tension), operating condition (roller rotating speed, initial immersed angle) on the film thickness. The result indicates that the film thickness has a strong dependency on the rotating speed, while the surface tension has negligible effect.

• Transactions on Electrical and Electronic Materials
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• 제15권4호
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• pp.207-212
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• 2014

Aluminum-doped zinc oxide (AZO) films were deposited on SiOC/Si wafer by an RF-magnetron sputtering system, by varying the deposition parameters of radio frequency power from 50 to 200 W. To assess the correlation of the optical properties between the substrate and AZO thin film, photoluminescence was measured, and the origin of deep level emission of AZO thin films grown on SiOC/Si wafer was studied. AZO formed on SiOC/Si substrates exhibited ultraviolet emission due to exciton recombination, and the visible emission was associated with intrinsic and extrinsic defects. For the AZO thin film deposited on SiOC at low RF-power, the deep level emission near the UV region is attributed to an increase of the variations of defects related to the AZO and SiOC layers. The applied RF-power influenced an energy gap of localized trap state produced from the defects, and the gap increased at low RF power due to the formation of new defects across the AZO layer caused by lattice mismatch of the AZO and SiOC films. The optical properties of AZO films on amorphous SiOC compared with those of AZO film on Si were considerably improved by reducing the roughness of the surface with low surface ionization energy, and by solving the problem of structural mismatch with the AZO film and Si wafer.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2007년도 춘계종합학술대회
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• pp.517-520
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• 2007

The BSCCO thin film fabricated by using the layer by layer deposition method was compared with the BSCCO thin film fabricated by using the evaporation method. Reevaporation in the form of Bi atoms or $Bi_2O_3$molecules easily bring out the deficiency of Bi atoms in thin film due to the long sputtering time of the layer by layer deposition. On the other hand, the respective atom numbers corresponding to BSCCO phase is concurrently supplied on the film surface in the evaporation deposition process and leads to BSCCO phase formation. Also, it is cofirmed that by optimizing the deposition condition, each single phase of the Bi2201 phase and the Bi2212 phase can be fabricated, the sticking coefficient of Bi element is clearly related to the changing of substrate temperature and the formation of the Bi2212 phase.

• Tribology and Lubricants
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• 제15권4호
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• pp.343-353
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• 1999

The role of viscosity index improver's(Ⅶ) additives for modem engine lubrication is complex. Under the condition of atmosphere or low shear rate, the characteristics of Ⅶ added lubricant is verified and quoted frequently for mathematical model of lubricant behavior. However, recent research shows that added lubricant has the characteristics of shear thinning at high shear rate condition although it performs well enough over the whole range of working temperature. At high shear rate, they show significant decrease of apparent viscosity irrespective of temperature. Many experimental researches verify that Ⅶ added lubricant shows boundary film layer formation on the solid surface as well as shear thinning effect by its polymeric molecular characteristics. The intend of our research is to verify the effects of Ⅶ from the viewpoint of continuum mechanics, because conventional Reynolds'equation with only pressure-viscosity relation cannot fully predict the lubricant behavior under the Ⅶ added condition. In these aspects, Reynolds'equation of Newtonian fluid model lacks the reflection of real fluid behavior and there is no way to explain the non-linear characteristics of Ⅶ added lubricant. In this research, we mathematically modeled the Ⅶ added lubricant behaviors which are the characteristics of non-Newtonian fluid behavior at high shear rate and boundary film formation on the solid surface. The consideration of elastic deformation in the contact region is also included in our computation and finally the converged film pressure and the film thickness with elastic deformation are obtained. The results are compared with those of Newtonian fluid model.

• Bulletin of the Korean Chemical Society
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• 제24권7호
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• pp.975-980
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• 2003

The electrochemical properties and the mechanism of formation of anodic oxide films on Mg alloys containing 0-15 mass% Al, when anodized in NaOH solution, were investigated by focusing on the effects of anodizing potential, Al content, and anodizing time. The intensity ratio of Mg(OH)₂ in the XRD analysis decreased with increasing applied potential, while that of MgO increased. Mg(OH)₂ was barely detected at 80 V, while MgO was readily detected. The anti-corrosion properties of anodized specimens at each constant potential were better than those of non-anodized specimens. The specimen anodized at an applied potential of 3 V had the best anti-corrosion property. The intensity ratio of the β phase increased with aluminum content in Mg-Al alloys. During anodizing, the active dissolution reaction occurred preferentially in β phase until about 4 min, and then the current density increased gradually until 7 min. The dissolution reaction progressed in α phase, which had a lower Al content. In the anodic polarization test in 0.017 mol·$dm^{-3}$ NaCl and 0.1 mol·$dm^{-3}$ Na₂SO₄ at 298 K, the current density of Mg-15 mass% Al alloy anodized for 10 min increased, since the anodic film that forms on the α phase is a non-compacted film. The anodic film on the α phase at 30 min was a compact film as compared with that at 10 min.