• Title/Summary/Keyword: Film cutting

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Optimal Cutting Conditions for the Production of Cudriania tricuspidata Bureau (꾸지뽕나무 묘목생산을 위한 최적 꺽꽂이 조건)

  • Sung, Gyoo Byung;Kim, Ki Young;Kim, Hyun Bok;Ji, Sang Duk
    • Journal of Sericultural and Entomological Science
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    • v.50 no.2
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    • pp.166-170
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    • 2012
  • Most of Cudriania tricuspidata Bureau saplings in Korea have been produced by crown division. But the production of Cudriania tricuspidata B. saplings by this method is very low in efficiency and in uniformity. Therefore, to develop Cudriania tricuspidata B. saplings production system by cutting method which is suitable for mass production, several conditions on rooting and growth of cuttings were investigated. The rooting ability of cuttings varied according to temperature on the bed, length, thickness of the hard wood cutting and rooting agent application. Of different concentration of rooting agent, the 5,000 ppm of 1-naphthalenacetic acid(NAA) and Indole butyric acid(IBA) were found to be the highest in rooting of hardwood cuttings; other concentration were in order as follows; 2,500, 1,000 and 10,000 ppm in concentration of rooting agents. The shading ratio of polyethylene film showed the highest rooting ratio of the softwood cuttings at 55%.

Effects of Cutting Size and Planting Depth on Growth and Yield in Late-Cultivation of Sweet Potato (고구마 만기재배에서 생육 및 수량에 미치는 삽수크기 및 삽식깊이의 영향)

  • Lee, Seung-Yeob;Kim, Tae-Hwan;Lee, Na-Rha;Lee, Ear-Jin;Bae, Jong-Hyang
    • Journal of Bio-Environment Control
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    • v.19 no.3
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    • pp.153-158
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    • 2010
  • To obtain the basic information for late-cultivation of sweet potato [Ipomoea hatalas (L.) Lam. cv. 'Jinhongmi'], vine growth and storage root yield were investigated in variously cutting sizes (10, 20, and 30 cm) and planting depths (1~4 nodes in 30 cm vine) using black-film vinyl mulching cultivation ($75{\times}25\;cm$ planting density, June 20). At 30 days after planting, main vine length, number of node, and vine fresh weight were significantly affected by the cutting length, and these were significantly different 10 and 30 cm at 120 days. The vine elongation affected by planting depths showed the best growth in 2-nodes planting depth and the lowest growth in 4-nodes planting depth at 30 days, but the vine growth was not significantly different among planting depths at 120 days. Number of storage root per plant, weight of storage root per plant, mean weight of storage root and yield of storage root were increased in longer cutting length, and those in 10 cm cutting length were significantly reduced compared to the 20 and 30 cm cutting length. Number of storage root per plant in the deeper planting was much increased, but mean weight of storage root was much decreased. Yield of storage root per 10a was highest in 3-nodes planting depth. Therefore, planting methods by cutting length over 20 cm and planting depth of 2~3 nodes in late-cultivation of sweet potato will be more efficient to improve the vine growth and storage root yield.

Single-Crystal Silicon Thin-Film Transistor on Transparent Substrates

  • Wong, Man;Shi, Xuejie
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1103-1107
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    • 2005
  • Single-crystal silicon thin films on glass (SOG) and on fused-quartz (SOQ) were prepared using wafer bonding and hydrogen-induced layer transfer. Thinfilm transistors (TFTs) were subsequently fabricated. The high-temperature processed SOQ TFTs show better device performance than the low-temperature processed SOG TFTs. Tensile and compressive strain was measured respectively on SOQ and SOG. Consistent with the tensile strain, enhanced electron effective mobility was measured on the SOQ TFTs.

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Development of Blue Light Cut Films Using a Roll-to-Roll Nano Micro Coating System

  • Hwang, Joong Kook;Shina, Hoon-Kyu;Chang, Sang-Mok
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.3
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    • pp.178-181
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    • 2016
  • In this study a coating experiment was performed to fabricate blue light cut films, which represent a 390~430 nm cut off rate of more than 40% and a transmittance rate of more than 90%, using a roll-to-roll nano micro coating system. The study also analyzed the characteristics of the blue light cut films. Thus, the hardness, which is more than 3H, is ensured through fabricating films using a Sol-Gel process that will determine the proper hardness level. Also, the experiment shows excellent results by cutting blue light through a mixing blue light powder.

HCD Ion Plating of Ti(C, N) Films for Cutting Tools (절삭공구용 Ti(C, N)피막의 HCD식 이온도금시 공정변수의 영향)

  • 강형호;고경현;안재환
    • Journal of Surface Science and Engineering
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    • v.27 no.3
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    • pp.143-148
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    • 1994
  • Effects of process variables of HCD ion plating on the film composition of Ti(C, N) were analyzed. The mole ratio of carbon to nitrogen and that of non-metal to titanium in the film primarily depend on the partial pressure ratio of ($C-2H_2$/ $N_2$) and total reactive gas pressure, respectively. The amount of nonmetallic com-ponents increases in nonlinear fashion as the total gas pressure due to the different reactivity of $C-2H_2$ and $N_2$ gases with Ti. The nonmetallic components was saturated dwith nitrogen when the nitrogen gas was more than 60% of total reactive gas. These two process variables could be related systematically using the concept of effective pressure in which the difference of reactivity of each gas was normalized.

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High-temperature Oxidation of the TiAlCrSiN Film (TiAlCrSiN 박막의 고온 산화 부식)

  • Lee, Dong-Bok;Kim, Min-Jeong;Abro, M.A.;Yadav, P.;Shi, Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.107-107
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    • 2016
  • TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at $700-900^{\circ}C$, owing to the formation protective oxides of $Al_2O_3$, $Cr_2O_3$, and $SiO_2$, and semiprotective $TiO_2$. At $1000^{\circ}C$, the increased temperature led to the formation of the imperfect oxide scale that consisted primarily of the outer ($TiO_2$,$Al_2O_3$)-mixed scale and inner ($TiO_2$, $Al_2O_3$, $Cr_2O_3$)-mixed scale.

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Fixation Adsorption Control system for Film of Glass (유리기판 고정 압착 제어시스템)

  • Kim, Gwan-Hyung;Oh, Am-suk;Kwon, Oh-Hyun;Kim, Song-Hyun
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.913-914
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    • 2014
  • PE/PET 필름이 부착된 디스플레이 또는 유리기판 가공에 있어서 유리기판에 대한 고정은 필수 기술요소라 할 수 있다. 이러한 유리기판 위의 필름을 제거하기 위해서는 정밀한 절단기술이 필요하며, 평탄도가 일정하지 않는 유리기판에 대하여 균일한 압력을 가하여 일정한 평탄도를 유지하여 유리기판에 부착된 필름을 가공할 수 있다. 이러한 유리기판에 부탁된 필름을 가공할 수 있는 기술은 유리기판을 흡착시키는 공압기술과 정밀가공처리된 평탄도 $5[{\mu}m]$이상의 베이스(base)판 위에 유리기판을 고정할 수 있는 고정 압착시스템을 제안하고자 한다. 본 논문에서는 유리기판이나 표면의 부착된 필름커팅 시 유리기판위에 결함이 발생하지 않도록 유리기판을 흡착시키는 공압시스템 및 정밀가공시스템을 제안하고자 한다.

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A Study on the Surface Polishing of Diamond Thin Films by Thermal Diffusion (열확산에 의한 다이아몬드 박막의 표면연마에 관한 연구)

  • Bae, Mun Ki;Kim, Tae Gyu
    • Journal of the Korean Society for Heat Treatment
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    • v.34 no.2
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    • pp.75-80
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    • 2021
  • The crystal grains of polycrystalline diamond vary depending on deposition conditions and growth thickness. The diamond thin film deposited by the CVD method has a very rough growth surface. On average, the surface roughness of a diamond thin film deposited by CVD is in the range of 1-100 um. However, the high surface roughness of diamond is unsuitable for application in industrial applications, so the surface roughness must be lowered. As the surface roughness decreases, the scattering of incident light is reduced, the heat conduction is improved, the mechanical surface friction coefficient can be lowered, and the transmittance can also be improved. In addition, diamond-coated cutting tools have the advantage of enabling ultra-precise machining. In this study, the surface roughness of diamond was improved by thermal diffusion reaction between diamond carbon atoms and ferrous metals at high temperature for diamond thin films deposited by MPCVD.

SINTERED $Al_{2}O_{3}$-TiC SUBSTRATE FOR THIN FILM MAGNETIC HEAD

  • Nakano, Osamu;Hirayama, Takasi
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 1998.04b
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    • pp.6-6
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    • 1998
  • In 1957, the first magnetic disk drive compatible with a movable head was introduced as an external file memory device for computer system. Since then, magnetic disks have been improved by increasing the recording density, which has brought about the development of a high performance thin film magnetic head. The thin film magnetic head has a magnetic circuit on a ceramic substrate using IC technology. The physical property of the substrate material is very important because it influences the tribology of head/disk interface and also manufacturing process of the head. $Al_{2}O_{3}$-TiC ceramics, so called ALTIC, is known to be one of the best substrate materials which satisfies this property requirement. Even though the head is not in direct contact with the disk, frequent instantaneous contacts are unavoidable due to its high rotating speed and the close gap between them. This may cause damage in the magnetic recording media and, thus, it is very important that the magnetic head has a good wear resistance. $Al_{2}O_{3}$-TiC ceramics has an excellent tribological property in head/disk interface. Manufacturing process of thin film head is similar to that of IC, which requires extremely smooth and flat surface of the substrate. The substrate must be readily sliced into the heads without chipping. $Al_{2}O_{3}$-TiC ceramics has excellent machineability and mechanical properties. $Al_{2}O_{3}$-TiC ceramics was first developed at Nippon Tungsten Co. as cutting tool materials in 1968, which was further developed to be used as the substrate materials for thin film head in collaboration with Sumitomo Special Metals Co., Ltd. in 1981. Today, we supply more than 60% of the substrates for thin film head market in the world. In this paper, we would like to present the sintering process of $Al_{2}O_{3}$-TiC ceramics and its property in detail.

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