• Title/Summary/Keyword: Film Resistance

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A Study on the Wear Resistance Characteristics of Anodic Oxide Films Formed on Aluminium alloy using a Plasma Electrolytic Oxidation (플라즈마 전해산화법에 의해 형성된 알루미늄 합금의 양극산화피막 내마모 특성에 관한 연구)

  • Jung, Woo-Chul;Jin, Yun-Ho;Choi, Jin-Ju;Yang, Jae-Kyo
    • Journal of the Korean institute of surface engineering
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    • v.51 no.6
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    • pp.381-386
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    • 2018
  • In this study, plasma electrolytic oxidation (PEO) method was used to from anodic oxide films on Al alloy and their resistance and morphological characteristics were investigated as a function of film formation voltage and treatment time. Cross-sectional morphology and composition of the PEO films were analyzed by SEM (Scanning Electron Microscopy) and EDS (Energy Dispersive Spectroscopy). The PEO films showed increased surface roughness and thickness with of film formation voltage and treatment time. The wear resistance was found to be the best for the PEO film formed for 5 min at 500V which is attributed to be denser structure relatively and lower surface roughness.

Manufacturing technology of two-layer self bonding insulating tape (이중절연 자기융착테이프 제조기술)

  • 조용석;이철호;심대섭
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.890-893
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    • 2001
  • Two-layer self bonding insulating tape consists of butyl rubber(IIR ; Isobutylene-isoprene rubber) adhesive layer and polyethylene protective film. Butyl rubber have inherent characteristics such as resistance to corrosion and water, low temperature flexibility, excellent electrical insulating properties also resistance to environmental effect such as ozone and ultraviolet. Polyethylene film was used for the purpose of good insulating properties and resistance to ozone and ultraviolet. The tape was manufactured using extrusion and calender method.

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Electrical characteristics of the this film interface of amorphous chalcogenide semiconductor (비정질 칼코게나이드 반도체 박막 경계면의 전기적 특성)

  • 박창엽
    • 전기의세계
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    • v.29 no.2
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    • pp.111-117
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    • 1980
  • Contacts formed by vacuum evaporation of As-Te-Si-Ge chalcogenide glass onto Al metal (99.9999%) are studied by measuring paralle capacitance C(V), Cp(w), resistance R(V), Rp(w), and I-V characteristics. The fact that contact metal alloying produced high-resistance region is confirmed from the measurements of parallel capacitance and resistance. From the I-V characteristics in the pre-switcing region, it is found that electronic conduction and sitching occurs in the vicinity of metal-amorphous semiconductor interface. From the experimental obsevations, it is concuded that the current flow in the thin film is space-charge limited current (SCLC) due to the tunneling of electrons through the energy barriers.

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The study on electrical properties of the NiCr thin film resistor (NiCr 박막저항의 전기적 특성 연구)

  • 류제천;김동진;김용일;강전홍;김한준;유광민
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.275-278
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    • 2000
  • We were fabricated of NiCr thin film resistors(TFR) on A1$_2$O$_3$(99.5%) substrates by dc magnetic sputtering system. The characteristics of electrical resistance (Sheet resistance & Temperature-Coefficient of the resistance-value:TCR) by annealing condition and reactive gas on the resistors were studied.

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Improvement of Adhesion Strength of DLC Films on Nitrided Layer Prepared by Linear Ion Source

  • Shin, Chang-Seouk;Kim, Wang-Ryeol;Park, Min-Seok;Jung, Uoo-Chang;Chung, Won-Sub
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.177-179
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    • 2011
  • The purpose of this study is to enhance an adhesion between substrate and Diamond-like Carbon (DLC) film. DLC has many outstanding properties such as low friction, high wear resistance and corrosion resistance. However, it is difficult to achieve enough adhesion because of weak bonding between DLC film and the substrate. For improvement adhesion, a layer between DLC film and the substrate was prepared by dual post plasma. DLC film was deposited on nitrided layer by linear ion source. The composed compound layer between substrate and DLC film was investigated by Glow Discharge Spectrometer (GDS) and Scanning Electron Microscope (SEM). The synthesized bonding structure of DLC film was analyzed using a micro raman spectrometer. Mechanical properties were measured by nano-indentation. In order to clarify the mechanism for improvement in adhesive strength, it was observed by scratch test.

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Magnetite film on iron (강재의 마그네타이트 피복에 관한 연구)

  • Kim, H. G.;Kang, T.
    • Journal of the Korean institute of surface engineering
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    • v.25 no.2
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    • pp.66-72
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    • 1992
  • Magnetite film on iron surface could be coated in strongly alkaline solution (12M NaH\OH) which contained additives such as NaHCO3, KCl and NaNO2, Iron plate was immersed in boiling solution ($130^{\circ}C$) contained above mentioned additives for 1 hour. There are some microcracks and these cracks proved to be the sites for the initiation of corrosion when immersed in 3% NaCl solution. To improve corrosion resistance of the coated steel plate, chromating was done as a post treatment. Chromate film was formed on magnetite oxide film potentiostatically at-918mV/SCE for five minutes at temperature of $70^{\circ}C$ in the alkaline solution containing 5g/l Na2Cr2O7.2H2O.Cr3O4 was electrodeposited on magnetite oxide film and Cr2O3 was electrodeposited on iron surface which was assumed as surface revealed due to microcracks. Increased corrosion resistance of chromated magnetite oxide film was proved in salt spray test & immersion test.

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Preparation of a Semi-Conductive Thin Film Sensor for Measuring Occlusal Force

  • Yu, Siwon;Kim, Nari;Lee, Youngjin
    • Journal of Sensor Science and Technology
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    • v.24 no.2
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    • pp.88-92
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    • 2015
  • In order to study the semi-conductive characteristics of carbon black-filled ethylene-propylene-diene monomer (EPDM) composite film, which is used for measuring occlusal force, composite samples with volume ratios of carbon black to EPDM ranging from 30% to 70% were prepared. The process of making a composite film consists of two steps, which involve the preparation of a slurry composition and the fabrication of a thin film using solution casting and a lamination process. To prepare the slurry composition, we dispersed carbon black nanoparticles into an organic solvent before mixing with an EPDM solution in toluene. The mechanical and electrical properties of the resulting carbon black-filled EPDM film were then investigated, and the results showed that the electrical resistance of a film decreases with the increase in the carbon black content. Furthermore, improved elastic recovery was observed after cross-linking the EPDM.

Transparent ITO/Ag/i-ZnO Multilayer Thin Film enhances Lowing Sheet Resistance

  • Kim, Sungyoung;Kim, Sangbo;Heo, Jaeseok;Cho, Eou-Sik;Kwon, Sang Jik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.187-187
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    • 2015
  • The past thirty years have seen increasingly rapid advances in the field of Indium Tin Oxide (ITO) transparent thin film.[1] However, a major problem with this ITO thin film application is high cost compared with other transparent thin film materials.[2] So far, in order to overcome this disadvantage, we show a transparent ITO/Ag/i-ZnO multilayer thin film electrode can be the solution. In comparison with using amount of ITO as a transparent conducting material, intrinsic-Zinc-Oxide (i-ZnO) based on ITO/Ag/i-ZnO multilayer thin film showed cost-effective and it has not only highly transparent but also conductive properties. The aim of this research has therefore been to try and establish how ITO/Ag/i-ZnO multilayer thin film would be more effective than ITO thin film. Herein, we report ITO/Ag/i-ZnO multilayer thin film properties by using optical spectroscopic method and measuring sheet resistance. At a certain total thickness of thin film, sheet resistance of ITO/Ag/i-ZnO multilayer was drastically decreased than ITO layer approximately $40{\Omega}/{\square}$ at same visible light transmittance.(minimal point $5.2{\Omega}/{\square}$). Tendency, which shows lowly sheet resistive in a certain transmittance, has been observed, hence, it should be suitable for transparent electrode device.

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Anti-Reflective Coating with Hydrophilic/Abraion-Resistant Properties using TiO2/SiOxCy Double-Layer Thin Film (TiO2/SiOxCy 이중 박막을 이용한 투명 친수성/내마모성 반사방지 코팅)

  • Lee, Sung-jun;Lee, Min-kyo;Park, Young-chun
    • Journal of the Korean institute of surface engineering
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    • v.50 no.5
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    • pp.345-351
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    • 2017
  • A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide($TiO_2$) and silicon oxycarbide($SiO_xC_y$) thin film. $TiO_2$ and $SiO_xC_y$ thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The $TiO_2/SiO_xC_y$ double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the $TiO_2$ single-layer thin film. The contact angle of $TiO_2/SiO_xC_y$ film was $6.9^{\circ}$ right after UV exposure. After 9 days from the exposure, the contact angle was $10.2^{\circ}$, which was $33^{\circ}$ lower than that of the $TiO_2$ single-layer film. By the abrasion test, $SiO_xC_y$ film showed a superior abrasion-resistance to the $TiO_2$ film. Consequently, the $TiO_2/SiO_xC_y$ double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the $TiO_2$ or $SiO_xC_y$ single-layer film.

Metallizations and Electrical Characterizations of Low Resistivity Electrodes(Al, Ta, Cr) in the Amorphous Silicon Thin Film Transistor (비정질 실리콘 박막 트랜지스터 소자 특성 향상을 위한 저 저항 금속 박막 전극의 형성 및 전기적 저항 특성 평가)

  • Kim, Hyung-Taek
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1993.05a
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    • pp.96-99
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    • 1993
  • Electrical properties of the Thin Film Transistor(TFT) electrode metal films were investigated through the Test Elements Group(TEG) experiment. The main purpose of this investigation was to characterize the electrical resistance properties of patterned metal films with respect to the variations of film thickness and TEG metal line width. Aluminum(Al), Tantalum(Ta) and Chromium(Cr) that are currently used as TFT electrode films were selected as the probed metal films. To date, no work in the electrical characterizations of patterned electrodes of a-Si TFT was accomplished. Bulk resistance$(R_b)$, sheet resistance$(R_s)$, and resistivities($\rho$) of TEG patterned metal lines were obtained. Electrical continuity test of metal film lines was also performed in order to investigate the stability of metallization process. Almost uniform-linear variations of the electrical properties with respect to the metal line displacements was also observed.

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