• Title/Summary/Keyword: Film Capacitor

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Fatigue Properties of $Pb(Zr,Ti)O_3$ Thin Film Capacitor by Cleaning Process in Post-CMP (CMP 공정후 세정공정 여부에 따른 $Pb(Zr,Ti)O_3$ 박막 캐패시터의 피로 특성)

  • Jun, Young-Kil;Kim, Nam-Hoon;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.139-140
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    • 2006
  • PZT박막은 비휘발성 재료로 유전율이 높고 항전력이 작으면서 잔류 분극랑이 크기 때문에 적합한 특성을 가지고 FeRAM에 매력적인 물질이다. CMP(chemical mechanical polishing)는 기존의 회생막의 전면 식각 공정과는 달리 특정 부위의 제거 속도를 조절함으로써 평탄화 하는 기술로 wafer 전면을 회전하는 탄성 패드 사이에 액상의 Slurry를 투입하여 연마하는 기술이다. 본 논문에서는 CMP 공정으로 제조한 PZT박막 캐패시터에서 CMP 후처리공정(세척)의 유무 및 종류에 따라 피로특성에 대하여 연구하였다, PZT 박막의 캐패시터의 피로 특성을 연구한 결과 CMP 후처리공정 SC-l용액을 사용하여 세정공정을 하였을때 가장 향상된 PZT 캐패시터의 피로특성이 나타났다.

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The characteristics of MIS BST thin film capacitor

  • Park, Chi-Sun;Kim, In-Ki
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.1
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    • pp.38-42
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    • 2001
  • Electric and dielectric(Ba,Sr)$TiO_3$[BST] thin films for emtal-Insulator-Semiconductor(MIS) capacitors have been studied. BST thin films wre deposted on p-Si(100) substrates bythe RF magnetron sputtering with tempratue range of 500~$600^{\circ}C$. The dielectric properties of MIS capacitors consisting of Al/BST/$SiO_2$/Si sandwich structure were evaluated ot redcue the leakage current density. The charge state densities of the MIS capacitors were determined by high frequency (1 MHz) C-V measurement. In order to reduce the leakage current in MIS capacitor, high quality $SiO_2$ layer was deposited on bare p-Si substrate. Depending on the oxygen pressure and substrate temperature both positive and negative polarities of effective oxide charge in the MIS capacitors were evaluated. It is considered that the density of electronic states, generated at the BST/$SiO_2$/p-Si interface due to the asymmetric structure within BST/$SiO_2$/Si structure, and the oxygen vacancy content has influence on the behavior of oxide charge.

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Capacitance properties of DLPC LB films with MLS structure fabricated by moving wall type method (Moving wall형 LB법으로 제작된 MLS DLPC LB 박막의 제작과 캐패시턴스 특성)

  • Lee, Woo-Sun;Chung, Yong-Ho;Son, Kyeong-Choon
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1297-1299
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    • 1998
  • LB layers of L-$\alpha$-DLPC deposited by LB method were deposited onto n-type silicon wafer as Z-type film. Films made up of 8, 16 layers of lipid with long alkyl chain and the thickness of monolayer and multilayers was determined by ellipsometry. It was deposited Ag and Al onto LB layers and silicon wafer for electrode and small electrode exhibit high capacitance and low leakage current. The C-V curves of the MLS capacitor shows very high saturation value of capacitance. And cross-sectional SEM image of MLS capacitor indicated the presence of pore with Al electrode and we found that the Ag is good for electrode metal.

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Recent Development in Polymer Ferroelectric Field Effect Transistor Memory

  • Park, Youn-Jung;Jeong, Hee-June;Chang, Ji-Youn;Kang, Seok-Ju;Park, Cheol-Min
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.8 no.1
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    • pp.51-65
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    • 2008
  • The article presents the recent research development in polymer ferroelectric non-volatile memory. A brief overview is given of the history of ferroelectric memory and device architectures based on inorganic ferroelectric materials. Particular emphasis is made on device elements such as metal/ferroelectric/metal type capacitor, metal-ferroelectric-insulator-semiconductor (MFIS) and ferroelectric field effect transistor (FeFET) with ferroelectric poly(vinylidene fluoride) (PVDF) and its copolymers with trifluoroethylene (TrFE). In addition, various material and process issues for realization of polymer ferroelectric non-volatile memory are discussed, including the control of crystal polymorphs, film thickness, crystallization and crystal orientation and the unconventional patterning techniques.

Screen Printed ZnBO Doped BST Thick Film Planner Capacitors (스크린 프린팅 기법으로 제작된 ZnBO가 첨가 (Ba,Sr)$TiO_3$ 후막의 planner capacitor 특성분석)

  • Moon, Sang-Ho;Koh, Jung-Hyuk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.04b
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    • pp.73-76
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    • 2009
  • ZnBo이 첨가된 (Ba,Sr)$TiO_3$ 후막을 이용한 planner capacitor의 전기적 특성을 조사하였다. 후막은 알루미나 기판에 스크린 프린팅기법에 의해서 제작되었고 $1200^{\circ}C$의 온도에서 소결하였다. 출발 물질인 BST의 저온 소결을 위해서 ZnBO를 첨가하였다. ZnBO가 1, 3, 5 wt% 첨가된 경우 소결온도가 $1200^{\circ}C$의 낮은 온도에서 소결되는 것을 확인했으며 ZnBO의 첨가랑이 증가함에 따라서 유전율은 감소하고 유전손실는 증가 하는 현상이 나타났다. 1, 3, 5 wt%의 ZnBO가 첨가된 (Ba,Sr)$TiO_3$는 각각 756, 624, 554의 유전율를 보였다. 또한 ZnBO의 양이 증가함에 따라서 누설전류가 감소되는 것을 확인하였고, ZnBO의 첨가가 grain의 성장과 density가 증가되어 누설전류의 양이 감소하게 되는 것으로 분석되었다.

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The Effect of Perimeter on Characteristics of Frequency-Agile Tunable Capacitors

  • Lee, Young Chul
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2012.10a
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    • pp.561-563
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    • 2012
  • In this work, tunable capacitors using a finger-type electrode are designed and characterized for frequency-agile RF circuit applications. Their top electrodes with different area and line width are designed in types of the finger for a long conducting perimeter which results in enhanced fringing-electric fields in order to improve their tunability. The tunable varactors were fabricated on a quartz substrate employing a multi-layer dielectric of a para/ferro/para-electric thin film. Compared to the conventional capacitor, finger-type capacitors are characterized in terms of effective capacitance and tunablility. Their effective capacitance and tunability with the long perimeter increase 24~40% and 7~12%, respectively, due to enhanced fringing electric fields from 1 to 2.5 GHz, compared to the conventional ones.

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Fabrication of DLPC LB films with MIS structure and I-V characteristics (MIS 구조의 DLPC LB 막의 제작과 전압-전류 특성)

  • 이우선;정용호;정종상;손경춘;김상용;장의구;이경섭
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.155-158
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    • 1998
  • MLS capacitor with lipid ultra thin films were deposited by Langmuir-Blodgett (LB) method on the sillicon wafer. The current versus voltage and capacitance versus voltage relationships are depend on the applied voltage, electrode area and electrode materials. LB films deposited were made of L-$\alpha$-DLPC, the 1 layer's thickness of 35$\AA$ was measured by ellipsometer. And MLS capacitor with different electrode materials, the work function of these materials was investigated to increase the leakage current. The result indicated the lower leakage current and very high saturation value of capacitance was reached within 700-800 pF when the two electrode was Ag. And $\varepsilon$$_1$, $\varepsilon$$_2$ versus photon energy showed good film formation.

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Reduction of Output Voltage Ripples in Single-Phase PWM Rectifier with Active Power Decoupling Circuit

  • Nguyen, Hoang-Vu;Lee, Dong-Choon
    • Proceedings of the KIPE Conference
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    • 2015.07a
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    • pp.419-420
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    • 2015
  • In this paper, a low-cost single-phase PWM rectifier with small DC-link capacitors is proposed, where a buck-boost converter with a low power rating is added at the DC link. By controlling the auxiliary circuit so as to absorb the voltage ripple in the DC link, the second-order voltage ripple in DC-link capacitor can be reduced significantly. Therefore, a small film capacitor can be utilized to replace the bulky electrolytic capacitors. The simulation results are shown to verify the validity of the proposed method.

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Electrical characteristic of RF sputtered TaN thin films with annealing temperature (스퍼터링법으로 제조된 TaN 박막의 열처리 온도에 따른 전기적 물성에 관한 연구)

  • 김인성;송재성;김도한;조영란;허정섭
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.1014-1017
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    • 2001
  • In recent years, The tantalum nitride(TaN) thin-film has been developed for the electronic resistor and capacitor. In this papers, The effect of thermal annealing in the temperature range of 300∼700$^{\circ}C$ on the sheet resistor properties and microistructure of tantalum nitride(TaN) thin-film deposited by RF sputtering was studied. XRD(X-ray diffractometer) and AFM were used to observe electrical properties and microstructrue of the TaN film and sheet resistance. The TCR properties of the TaN films were discussed in terms of annealing temperature, ratio of nitrogen, crystallization and thin films surface morphology due to annealing temperature. The leakage current of the TaN thin film annealed 400 $^{\circ}C$ was stabilized in the study. How its was found that the sheet resistance in the polycrystalline TaN thin film decreased with increasing the annealing temperature above 600 $^{\circ}C$ after sudden peak upen 400 $^{\circ}C$.

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High-Performance and Fabrication of Graphene-based Flexible Supercapacitor

  • Ra, Eun Ju;Han, Jae Hee;Kim, Kiwoong;Lee, Sun Suk;Kim, Tae-Ho;An, Ki-Seok;Lim, Jongsun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.442-442
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    • 2014
  • Although electrochemical capacitors (ECs), also known as supercapacitors or ultracapacitors, is one of the most promising energy-storage devices because of its high power density, super-high cycle life, and safe operation. We herein report a synthesis of graphene-based flexible films by kneading method. Thus, a device can be readily made by sandwiching a polymer membrane included ionic liquid electrolytes between two identical graphene-based flexible films. Devices made with these electrodes exhibit ultrahigh energy density values while maintaining the high power density and excellent cycle stability of ECs. Moreover, these ECs maintain excellent electrochemical attributes under high mechanical stress and thus hold promise for high-energy, flexible electronics.

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