• Title/Summary/Keyword: Field emission cathode

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Evaluation of Transparent Amorphous $V_2O_5$ Thin Film Prepared by Thermal Evaporation (진공증착법으로 제조한 투명 비정질 $V_2O_5$박막의 특성평가)

  • Hwang, Kyu-Seog;Jeong, Seol-Hee;Jeong, Ju-Hyun
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.1
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    • pp.27-30
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    • 2008
  • Purpose: This research is that $V_2O_5$ cathode's composition is possible in low temperature. Methods: Transparent in visible spectra range and crystallographically amorphous $V_2O_5$ thin films were prepared by simple vacuum thermal evaporation on soda-lime-silica slide glass substrate. After annealing at 100$^{\circ}C$, 150$^{\circ}C$ and 200$^{\circ}C$ for 10 minutes in air, the surface morphology and the fracture-cross section of the films were investigated by field emission - scanning electron microscope. Transmittance in visible spectra range and surface roughness of the films were analyzed by ultra violet - visible spectrophotometer and scanning probe microscope, respectively. Results: As the increase of annealing temperature from 100$^{\circ}C$ to 150$^{\circ}C$ and 200$^{\circ}C$, transmittance of the $V_2O_5$ films decreased. Optical properties will be fully discussed on the basis of the surface morphological results. Conclusions: Optical transmissivity was superior in case of 100$^{\circ}C$, and could make amorphous $V_2O_5$ thin film that surface quality of thin film did homogeneity.

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Luminescent Properties of $SrTiO_3:Pr^{3+}$ Phosphor Coated with $SiO_2$ and $Al_2O_3$ by Sol-Gel Method (졸-겔법에 의한 $SrTiO_3:Pr^{3+}$ 형광체의 $SiO_2$$Al_2O_3$ 코팅에 따른 발광특성)

  • Lee, Dong-Kyu;Lim, Mun-Hyuk;Lee, Jin-Hwa;Kim, Tae-Young
    • Journal of the Korean Applied Science and Technology
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    • v.23 no.3
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    • pp.243-251
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    • 2006
  • Field emission display(FED) is actively investigated in view of the development of full color flat-panel display, which can replace some cathode-ray tube(CRT). Thus, the development of new phosphors appropriate for FED is urgently needed and has been actively investigated. In this work, $SrTiO_3:Pr^{3+}$ phosphor was prepared by sol-gel method and the coating was applied by sol-gel method combined with sonication on these phosphor's surface into diluted precursor solution. It was found that very fine particles of coating material were formed on phosphor's surface. The luminescent intensity of $SrTiO_3:Pr^{3+}$ phosphor coated with $SiO_2$ and $Al_2O_3$ was considerably increased without any noticeable change in color chromaticity. The optimum concentration of coating material was found to be 1wt% and the optimum pH value of the solution was 10.

Observation of Plasma Shape by Continuous dc and Pulsed dc (직류 방전과 펄스 직류 방전에 의한 플라즈마 형상 관찰)

  • Yang, Won-Kyun;Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.42 no.3
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    • pp.133-138
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    • 2009
  • Effects of bipolar pulse driving frequency between 50 kHz and 250 kHz on the discharge shapes were analyzed by measuring plasma characteristics by OES (Optical Emission Spectroscopy) and Langmuir probe. Plasma characteristics were modeled by a simple electric field analysis and fluid plasma modeling. Discharge shapes by a continuous dc and bipolar pulsed dc were different as a dome-type and a vertical column-type at the cathode. From OES, the intensity of 811.5 nm wavelength, the one of the main peaks of Ar, decreased to about 43% from a continuous dc to 100 kHz. For increasing from 100 kHz to 250 kHz, the intensity of 811.5 nm wavelength also decreased by 46%. The electron density decreased by 74% and the electron temperature increased by 36% at the specific position due to the smaller and denser discharge shape for increasing pulse frequency. Through the numerical analysis, the negative glow shape of a continuous dc were similar to the electric potential distribution by FEM (Finite Element Method). For the bipolar pulsed dc, we found that the electron temperature increased to maximum 10 eV due to the voltage spikes by the fast electron acceleration generated in pre-sheath. This may induce the electrons and ions from plasma to increase the energetic substrate bombardment for the dense thin film growth.

Effect of Carbon Fiber Layer on Electrochemical Properties of Activated Carbon Electrode

  • Jong kyu Back;Jihyeon Ryu;Yong-Ho Park;Ick-Jun Kim;Sunhye Yang
    • Journal of Electrochemical Science and Technology
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    • v.14 no.2
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    • pp.184-193
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    • 2023
  • This study investigates the effects of a carbon fiber layer formed on the surface of an etched aluminum current collector on the electrochemical properties of the activated carbon electrodes for an electric double layer capacitor. A particle size analyzer, field-emission SEM, and nitrogen adsorption/desorption isotherm analyzer are employed to analyze the structure of the carbon fiber layer. The electric and electrochemical properties of the activated carbon electrodes using a carbon fiber layer are evaluated using an electrode resistance meter and a charge-discharge tester, respectively. To uniformly coat the surface with carbon fiber, we applied a planetary mill process, adjusted the particle size, and prepared the carbon paste by dispersing in a binder. Subsequently, the carbon paste was coated on the surface of the etched aluminum current collector to form the carbon under layer, after which an activated carbon slurry was coated to form the electrodes. Based on the results, the interface resistance of the EDLC cell made of the current collector with the carbon fiber layer was reduced compared to the cell using the pristine current collector. The interfacial resistance decreased from 0.0143 Ω·cm2 to a maximum of 0.0077 Ω·cm2. And degradation reactions of the activated carbon electrodes are suppressed in the 3.3 V floating test. We infer that it is because the improved electric network of the carbon fiber layer coated on the current collector surface enhanced the electron collection and interfacial diffusion while protecting the surface of the cathode etched aluminum; thereby suppressing the formation of Al-F compounds.

Study of carbon nanotube cathode fabricated by screen printing on field emission properties (스크린 인쇄법으로 제작한 탄소나노튜브 캐소드의 전계방출 특성에 관한 연구)

  • 조영래
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.27-27
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    • 2003
  • 최근 탄소나노튜브를 전계방출 표시소자(FED, field omission display)용 에미터 재료로 사용한 캐소드 개발에 대한 연구가 활발히 진행되고 있다. 캐소드전극으로는 투명전도성 반도체 박막인 ITO를 사용하고, 에미터용 재료로는 탄소나노튜브를 사용해서 스크린 인쇄법으로 2극(diode type)형 전계방출 소자용 캐소드를 제작하였다. 본딩재(bonding materials)의 종류와 공정변수를 달리해서 에미터용 탄소나노튜브와 ITO 캐소드 전극 사이의 전기적 접촉방법을 변화시켰을때 탄소나노튜브 캐소드의 전계방출 특성을 체계적으로 연구하였다. 첫째로, 본딩재의 전기전도성 (electrical conductivity)을 변수로 해서 탄소나노튜브 에미터의 전계강화(fold enhancement) 효과를 연구한 결과 본딩재의 구성 성분중 부도체(insulator)의 분율이 높을수록 전계강화 효과가 크게 나타남을 확인하였다. 두 번째로, ITO박막 캐소드전극과 탄소나노튜브 잉크 사이에 중간층(inter layer)을 형성시켜서 중간층이 전계방출 특성에 미치는 영향을 연구하여, 중간층의 존재가 탄소나노튜브의 전계방출 전류의 균일성과 전류밀도의 증가에 기여하는 것을 확인하였다. 본 연구의 결과 전계방출 전류가 안정적이면서 동시에 전계방출 효율이 크게 개선된 탄소나노튜브 캐소드를 제작하는 공정기술이 개발되었다. 개발된 기술은 기존의 방법에 비해서 탄소나노튜브 캐소드의 진공패키징시 아웃개싱(outgassing)의 양도 현격하게 작았으며, 에미터와 캐소드 전극 사이의 본딩력(adhesion)도 우수해서 항후 탄소나노튜브 전계방출 표시소자의 개발에 크게 기여할 것으로 판단된다.luminum 첨가량이 증가함에 따라 세라믹 수율도 증가하였음을 확인하였다. 합성된 aluminum-contained polycarbosilane은 20$0^{\circ}C$에서 1시간 동안 불융화과정을 거쳐 환원 및 진공 분위기에서 고온 열처리하였으며 이로부터 얻어진 시료에 대해 XRD분석을 수행하였다. SEM과 TEM을 이용하여 미세구조를 관찰하였다./100 duty로 구동하였으며, duty비 증가에 따라 pulse의 on-time을 고정하고 frequency를 변화시켰다. dc까지 duty비가 증가됨에 따라 방출전류의 양이 선형적으로 증가하였다. 전압을 일정하게 고정시키고 각 duty비에서 시간에 따라 방출전류를 측정한 결과 duty비가 높을수록 방출전류가 시간에 따라 급격히 감소하였다. 각 duty비에서 방출전류의 양이 1/2로 감소하는 시점을 에미터의 수명으로 볼 때 duty비 대 에미터 수명관계를 구해 높은 duty비에서 전계방출을 시킴으로써 실제의 구동조건인 낮은 duty비에서의 수명을 단시간에 예측할 수 있었다. 단속적으로 일어난 것으로 생각된다.리 폐 관류는 정맥주입 방법에 비해 고농도의 cisplatin 투여로 인한 다른 장기에서의 농도 증가 없이 폐 조직에 약 50배 정도의 고농도 cisplatin을 투여할 수 있었으며, 또한 분리 폐 관류 시 cisplatin에 의한 직접적 폐 독성은 발견되지 않았다이 낮았으나 통계학적 의의는 없었다[10.0%(4/40) : 8.2%(20/244), p>0.05]. 결론: 비디오흉강경술에서 재발을 낮추기 위해 수술시 폐야 전체를 관찰하여 존재하는 폐기포를 놓치지 않는 것이 중요하며, 폐기포를 확인하지 못한

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Study on Ti-doped LiNi0.6Co0.2Mn0.2O2 Cathode Materials for High Stability Lithium Ion Batteries (고안정성 리튬이온전지 양극활물질용 Ti 치환형 LiNi0.6Co0.2Mn0.2O2 연구)

  • Jeon, Young Hee;Lim, Soo A
    • Journal of the Korean Electrochemical Society
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    • v.24 no.4
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    • pp.120-132
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    • 2021
  • Although the development of high-Nickel is being actively carried out to solve the capacity limitation and the high price of raw cobalt due to the limitation of high voltage use of the existing LiCoO2, the deterioration of the battery characteristics due to the decrease in structural stability and increase of the Ni content. It is an important cause of delaying commercialization. Therefore, in order to increase the high stability of the Ni-rich ternary cathod material LiNi0.6Co0.2Mn0.2O2, precursor Ni0.6Co0.2Mn0.2-x(OH)2/xTiO2 was prepared using a nanosized TiO2 suspension type source for uniform Ti substitution in the precursor. It was mixed with Li2CO3, and after heating, the cathode active material LiNi0.6Co0.2Mn0.2-xTixO2 was synthesized, and the physical properties according to the Ti content were compared. Through FE-SEM and EDS mapping analysis, it was confirmed that a positive electrode active material having a uniform particle size was prepared through Ti-substituted spherical precursor and Particle Size Analyzer and internal density and strength were increased, XRD structure analysis and ICP-MS quantitative analysis confirmed that the capacity was effectively maintained even when the Ti-substituted positive electrode active material was manufactured and charging and discharging were continued at high temperature and high voltage.

TiO2 Nanotubular Formation on Grade II Pure Titanium by Short Anodization Processing (Grade II 순수 타이타늄의 단시간 양극산화에 의한 TiO2 나노튜브 형성)

  • Lee, Kwangmin;Kim, Yongjae;Kang, Kyungho;Yoon, Duhyeon;Rho, Sanghyun;Kang, Seokil;Yoo, Daeheung;Lim, Hyunpil;Yun, Kwiduk;Park, Sangwon;Kim, Hyun Seung
    • Korean Journal of Materials Research
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    • v.23 no.4
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    • pp.240-245
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    • 2013
  • Electrochemical surface treatment is commonly used to form a thin, rough, and porous oxidation layer on the surface of titanium. The purpose of this study was to investigate the formation of nanotubular titanium oxide arrays during short anodization processing. The specimen used in this study was 99.9% pure cp-Ti (ASTM Grade II) in the form of a disc with diameter of 15 mm and a thickness of 1 mm. A DC power supplier was used with the anodizing apparatus, and the titanium specimen and the platinum plate ($3mm{\times}4mm{\times}0.1mm$) were connected to an anode and cathode, respectively. The progressive formation of $TiO_2$ nanotubes was observed with FE-SEM (Field Emission Scanning Electron Microscopy). Highly ordered $TiO_2$ nanotubes were formed at a potential of 20 V in a solution of 1M $H_3PO_4$ + 1.5 wt.% HF for 10 minutes, corresponding with steady state processing. The diameters and the closed ends of $TiO_2$ nanotubes measured at a value of 50 cumulative percent were 100 nm and 120 nm, respectively. The $TiO_2$ nanotubes had lengths of 500 nm. As the anodization processing reached 10 minutes, the frequency distribution for the diameters and the closed ends of the $TiO_2$ nanotubes was gradually reduced. Short anodization processing for $TiO_2$ nanotubes of within 10 minutes was established.

PREPARATION OF AMORPHOUS CARBON NITRIDE FILMS AND DLC FILMS BY SHIELDED ARC ION PLATING AND THEIR TRIBOLOGICAL PROPERTIES

  • Takai, Osamu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2000.11a
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    • pp.3-4
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    • 2000
  • Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.

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