• 한국자기학회지
• /
• 제7권5호
• /
• pp.250-257
• /
• 1997

Ar+N$_{2}$ 가스분위기에서 반응성 스퍼터링법으로 제조된 Fe-Nb-B-N 박막의 미세구조 및 자기적 특성을 조사하였다. 질소첨가한 적정조성의 Fe-Nb-B-N 박막은 우수한 고주파 연자기 특성을 보였는데, 그 특성은 다음과 같다. 포화자화(4 .pi. M$_{s}$ )는 16.5 kG, 보자력(H$_{c}$)은 0.13 Oe, 1 MHz에서의 실효투자율은 약 5,000의 값을 나타내었다. 특히 실효투자율은 10 MHz까지 겨의 변화가 없었으며, 100 MHz에서도 약 2,000의 값을 보여 매우 우수한 고주파 특성을 가진 재료로 판단된다. 한편, 이러한 우수한 특성을 지닌 Fe-Nb-B-N 박막의 미세구조를 TEM으로 관찰한 결과, 적정 열처리온도인 590 .deg. C에서 열처리한 Fe-Nb-B-N 박막은 약 5 ~ 10 nm의 .alpha. -Fe phase, Nb-nitride의 석출물과 Nb-B rich 비정질상 등으로 이루어져 있음을 알 수 있었다. 반면에 N이 첨가되지 않은 Fe-Nb-B 박막의 경우에는 약 10 nm정도의 .alpha. -Fe결정립과 Nb-B rich 비정질상의 두가지 상으로 이루어져 있다. 따라서 N을 첨가한 경우에 더욱 미세한 .alpha. -Fe 결정립을 얻을 수 있음이 확인되었다. 이는 N 첨가로 인한 결정립의 미세화 효과 와 Nb-nitride 형성으로 인한 결정립 성장의 억제효과에 의한 것으로 생각된다. 따라서 Fe-Nb-B-N 박막의 우수한 연자기 특성은 결정립 미세화에 기인하는 것으로 판단된다.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 1993년도 춘계학술발표회
• /
• pp.58-58
• /
• 1993

• 한국자기학회지
• /
• 제14권4호
• /
• pp.120-126
• /
• 2004

DC 마그네트론 스파터링 방법으로 제작한 F $e_{84}$ N $b_{16}$ (wt.%) 박막의 온도변화에 따른 자기적 특성을 강자성 공명 흡수선의 거동을 통하여 고찰했다 모든 온도영역에서 다수의 체적 모드 스핀파와 한 개 또는 두 개의 표면 모드가 관측되었는데, 이와 같은 현상은 시편 양면의 표면 자기 이방성이 0보다 작은 경우에 나타나는 특성이다. 113-293K 온도영역에서 포화자화는 Bloch의 $T^{2}$ 3/ 법칙과 부합되는 모습을 보였으며, 분광학적 분리인자는 온도변화에 비교적 작은 변화 폭을 보였다 233-293K 온도구간에서 기판과 접하는 시편면의 표면 자기 이방성 상수 Ksl는 온도감소에 따라 그 갈이 비교적 큰 폭으로 증가하는 특성을 나타냈다. 그리고 공기와 접하는 시편면의 표면 자기 이방성 상수 $K_{sl}$ 은 상온에서 -0.322 erg/$\textrm{cm}^2$인 값을 보이다가, 온도가 253 K로 내려가면 -0.394 erg/$\textrm{cm}^2$로 감소한 후, 그 이하의 온도영역에서는 온도에 비교적 둔감한 특성을 보였다.

• 한국세라믹학회지
• /
• 제41권1호
• /
• pp.9-12
• /
• 2004

The effect of x wt% CuO-y wt% $V_2O_5$ content on the microwave properties of $(Pb_{0.45}Ca_{0.55})[(Fe_{0.5}Nb_{0.5})_{0.9}Sn_{0.1}]O_3$ (PCFNS) ceramics was investigated. In order to decrease the sintering temperature and use as a Low Temperature co-firing Ceramics (LTCC), CuO-$V_2O_5$ are added in the PCFNS. The bulk density, dielectric constant (${\varepsilon}_r$) and quality factor(Q${\cdot}f_0$) increased with increase in CuO content within a limited value. The microwave properties were degraded with increases in $V_2O_5$ content. The temperature coefficient of the resonant frequency (${\tau}_f$) of PCFNS was shifted to positive value abruptly with increasing the $V_2O_5$ content, while the ${\tau}_f$ was slightly shifted to positive value with increasing the CuO content. The optimized microwave properties, ${\varepsilon}_r$ = 88, Q${\cdot}f_0$ = 6100 (GHz), and ${\tau}_f$ = 18 ppm/$^{\circ}C$, were obtained in $(Pb_{0.45}Ca_{0.55})[(Fe_{0.5}Nb_{0.5})_{0.9}Sn_{0.1}]O_3$ with 0.2wt% CuO 0.05 wt% $V_2O_5$ and sintered at $1000^{\circ}C$ for 3 h. The relationship between the microstructure and microwave dielectric properties of ceramics was studied by X-Ray Diffraction (XRD) and Scanning Electron Microscopy (SEM)

• The Korean Journal of Ceramics
• /
• 제4권3호
• /
• pp.249-253
• /
• 1998

The influence of PbO additive on dielectric properties and sintering behavior of $(Pb_{0.46}Ca_{0.55})$ {$(Fe__1/2}Nb_{1/2}){0.9}Sn_{{0.1}$}$O_3$ ceramics has been investigated. The incorporation of a limited excess PbO ($\leq$2.0 wt. %) in the starting materials is quite beneficial for densification in the temperature range of 1150~$1175^{\circ}C$ in air. At a small doping level (0.8 wt. %) the ceramics prepared from powders calcined at $900^{\circ}C$ showed the best dielectric properties. The dielectric constants ($\varepsilon_r$) and Q.f were found to be 85.8~85.6 and 8530~8600 GHz, respectively. The temperature coefficient of resonant frequency ($\tau_f$) varied in the range of -2~4 $ppm/^{\circ}C$. Examination of the microstructure as well as analysis of the second phases in these materials revealed the presence of the pyrochlore-type phase which is detrimental to the dielectrics.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2011년도 춘계학술발표대회
• /
• pp.30.1-30.1
• /
• 2011

Multiferroic thin films with composition $0.9BiFeO_3-0.1Ba(Cu_{1/3}Nb_{2/3})O_3$ were epitaxially grown by pulsed laser deposition on $SrRuO_3(001)/SrTiO_3$ (000) substrate $0.9BiFeO_3-0.1Ba(Cu_{1/3}Nb_{2/3})O_3$, which is assumed to be morphotropic phase boundary (MPB), that showed superior dielectric, ferroelectric and magnetic properties in our study on polycrystalline films. The structures of epitaxially grown films were characterized by means of XRD. From P-E measurements, samples exhibited typical ferroelectric hysteresis loops and large remnant polarization, whose value is much larger than those of pure BFO film. The enhancement of dielectric, ferroelectric, magnetic properties was attributed to the structural distortion induced by the BCN addition and the high physical stress effect.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
• /
• pp.17-20
• /
• 1999

The retention and fatigue properties of ferroelectric LiNbO$_3$ thin films were studied. Metal-ferroelectric-semiconductor(MFS) devices by using rapid thermal annealed LiNbO$_3$/Si structures were successfully fabricated and demonstrated nonvolatile memory operations of the MFS devices. The I$_{D}$-V$_{G}$ characteristics of MFSFET\`s showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin film. The ferroelectric capacitors showed practically no polarization degradation up to about 10$^{10}$ switching cycles when subjected to symmetric bipolar voltage pulse (peak-to-peak 6V, 50% duty cycle) in the 500kHz. The retention properties of the LiNbO$_3$ thin films were quite good up to about 10$^{3}$ s . s .

• 한국세라믹학회지
• /
• 제33권6호
• /
• pp.665-671
• /
• 1996

Ferroelectric Pb(Fe1/2Nb1/2)O3 thin films were successfully fabricated on ITO/Glass substrate by sol-gel proces-sing and characterized to determine the dielectric and electric properties. Viscosity of PEN sol measured to investigate rheological properties was 3.25 cP which was proper for coating. The sol also showed Newtonian behavior. RTA(Rapid Thermal Annealing) was used for the annealing of the thin film and 1200~1700$\AA$ thick PEN thin films were fabricated by repeating the intermediate and the final annealing. After the deposition of Pt as top electrode by vacuum evaporation dielectric and electric properties were measured. Dielectric properties of FFN thin film were enhanced by increasing the perovskite phase fraction with increasing the annealing temperature. Measured dielectric constant of 1700$\AA$ PFN thin film annealed at $650^{\circ}C$ was 890 at 1kHz Capacitatnce density and dielectric loss were 47 fF/${\mu}{\textrm}{m}$2 and 0.47 respectively. As a result of measuring Curie temperature PFN thin films had Curie point with a rang of 110~12$0^{\circ}C$ and showed broad dielectric peak at that point. Leakage current of the PFN thin films were increased with increasing the annealing tempera-ture.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2001년도 하계학술대회 논문집
• /
• pp.70-73
• /
• 2001

MFIS(Metal-ferroelectric-insulator- semiconductor) structures using silicon oxynitride(SiON) buffer layers were fabricatied and demonstrated nonvolatile memory operations. Oxynitride(SiON) films have been formed on p-Si(100) by RTP(rapid thermal process) in O$_2$+N$_2$ ambient at 1100$^{\circ}C$. The gate leakage current density of Al/SiON/Si(100) capacitor was about the order of 10$\^$-8/ A/cm$^2$ at the range of ${\pm}$ 2.5 MV/cm. The C-V characteristics of Al/LiNbO$_3$/SiON/Si(100) capacitor showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin films. Typical dielectric constant value of LiNbO$_3$ film of MFIS device was about 24. The memory window width was about 1.2V at the electric field of ${\pm}$300 kV/cm ranges.

• 한국세라믹학회:학술대회논문집
• /
• 한국세라믹학회 2000년도 춘계총회,특별강연,심포지움,연구발표회
• /
• pp.35-35
• /
• 2000