• 제목/요약/키워드: Extreme ultraviolet

검색결과 78건 처리시간 0.026초

Statistical Study and Prediction of Variability of Erythemal Ultraviolet Irradiance Solar Values in Valencia, Spain

  • Gurrea, Gonzalo;Blanca-Gimenez, Vicente;Perez, Vicente;Serrano, Maria-Antonia;Moreno, Juan-Carlos
    • Asia-Pacific Journal of Atmospheric Sciences
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    • 제54권4호
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    • pp.599-610
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    • 2018
  • The goal of this study was to statistically analyse the variability of global irradiance and ultraviolet erythemal (UVER) irradiance and their interrelationships with global and UVER irradiance, global clearness indices and ozone. A prediction of short-term UVER solar irradiance values was also obtained. Extreme values of UVER irradiance were included in the data set, as well as a time series of ultraviolet irradiance variability (UIV). The study period was from 2005 to 2014 and approximately 250,000 readings were taken at 5-min intervals. The effect of the clearness indices on global irradiance variability (GIV) and UIV was also recorded and bi-dimensional distributions were used to gather information on the two measured variables. With regard to daily GIV and UIV, it is also shown that for global clearness index ($k_t$) values lower than 0.6 both global and UVER irradiance had greater variability and that UIVon cloud-free days ($k_t$ higher than 0.65) exceeds GIV. To study the dependence between UIVand GIV the ${\chi}^2$ statistical method was used. It can be concluded that there is a 95% probability of a clear dependency between the variabilities. A connection between high $k_t$ (corresponding to cloudless days) and low variabilities was found in the analysis of bidimensional distributions. Extreme values of UVER irradiance were also analyzed and it was possible to calculate the probable future values of UVER irradiance by extrapolating the values of the adjustment curve obtained from the Gumbel distribution.

반도체 공정용 리소그래피 기술의 최근 동향 (Recent Trends of Lithographic Technology)

  • 정태진;유종준
    • 전자통신동향분석
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    • 제13권5호통권53호
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    • pp.38-52
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    • 1998
  • Phase-shifting masks (PSM), optical proximity correction (OPC), off-axis illumination (OAI), annular illumination (AI)의 리소그래피 분해능 향상 기법과 deep ultraviolet photoresist의 개발 및 리소그래피의 최근 기술 동향을 요약 소개한다. DUV 리소그래피의 대안으로 관심을 끌고 있는 scattering with angular limitation projection electron-beam lithography (SCALPEL), extreme ultraviolet lithography (EUVL), X-ray lithography (XRL), ion projection lithography (IPL) 등의 새로운 리소그래피 기술들의 기본 원리와 최근 기술 동향도 소개하였다. 리소그래피는 반도체 공정에 있어서 가장 중요한 부분을 차지하기 때문에 리소그래피의 최근 기술 동향을 검토해 봄으로써 국내 리소그래피 장비 산업의 기술 개발을 위한 방향 설정에 도움이 될 것으로 생각한다.

화학양면성의 전해이온수를 이용한 극자외선 마스크의 나노세정 (Nano-cleaning of EUV Mask Using Amphoterically Electrolyzed Ion Water)

  • 유근걸;정윤원;최인식;김형원;최병선
    • 반도체디스플레이기술학회지
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    • 제20권2호
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    • pp.34-42
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    • 2021
  • Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.

ORFEUS OBSERVATIONS OF ULTRAVIOLET EXCITED HIGH-J MOLECULAR HYDROGEN

  • Lee, Dae-Hee;Dixon, W. Van Dyke;Min, Kyoung-Wook;Pak, Soo-Jong
    • 천문학회지
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    • 제42권6호
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    • pp.145-153
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    • 2009
  • We present measurements of diffuse interstellar $H_2$ absorption lines in the continuum spectra of 10 early-type stars. The data were observed with the Berkeley Extreme and Far-Ultraviolet Spectrometer (BEFS) of the ORFEUS telescope on board the ORFEUS-SPAS I and II space-shuttle missions in 1993 and 1996, respectively. The spectra extend from the interstellar cutoff at 912 $\AA$ to about 1200 $\AA$ with a resolution of ~ 3000 and statistical signal-to-noise ratios between 10 and 65. Adopting Doppler broadening velocities from high-resolution optical observations, we obtain the $H_2$ column densities of rotational levels J" = 0 through 5 for each line of sight. The kinetic temperatures derived from J" = 0 and 1 states show a small variation around the mean value of 80 K, except for the component toward HD 219188, which has a temperature of 211 K. Based on a synthetic interstellar cloud model described in our previous work, we derive the incident UV intensity IUV and the hydrogen density $n_H$ of the observed components to be -0.4 $\leq$ log $I_{UV}\leq2.2$ and $6.3{\leq}n_H2500cm^{-3}$, respectively.

A Study of Aging Effect for Train Carbody Using Accelerated Aging Tester

  • Nam, Jeong-Pyo;LI, Qingfen;LI, Hong
    • International Journal of Railway
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    • 제1권3호
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    • pp.113-116
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    • 2008
  • The long-tenn exposure of polymeric composite materials to extreme-use environments, such as pressure, temperature, moisture, and load cycles, results in changes in the original properties of the material. In this study, the effect of combined environmental factors such as ultraviolet ray, high temperature and high moisture on mechanical and thermal analysis properties of glass fabric and phenolic composites are evaluated through a 2.5 KW accelerated environmental aging tester. The environmental factors such as temperature, moisture and ultraviolet ray applied of specimens. A xenon-arc lamp is utilized for ultraviolet light and exposure time of up to 3000 hours are applied. Several types of specimens - tensile, bending, and shear specimens that are warp direction and fill direction are used to investigate the effects of environmental factors on mechanical properties of the composites. Mechanical degradations for tensile, bending and shear properties are evaluated through a Universal Testing Machine (UTM). Also, storage shear modulus, loss shear modulus and tan a are measured as a function of exposure time through a Dynamic Mechanical Analyzer (DMA). From the experimental results, changes in material properties of glass fabric and phenolic composites are shown to be slightly degraded due to combined environmental effects.

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EUV 리소그라피 광원용 레이저 생성 Xe 가스 플라즈마의 가시화 (Visualization of Laser-Produced, Xe Gas Plasma in EUV Light Sources for the Lithography)

  • Jin Yun-Sik;Jeong Sun-Sin;Kim Jong-Uk;Kim Chang-Beom;Kim Yong-Ju
    • 한국광학회:학술대회논문집
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    • 한국광학회 2002년도 하계학술발표회
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    • pp.106-107
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    • 2002
  • Extreme ultraviolet (EUV) radiation of wavelength $\lambda$~10 nm or photon energy hv~100 eV is presently a blank region in the electromagnetic spectrum where applications are concerned. This is because no powerful sources were available until when intense-laser-produced plasmas are available. Both a new laboratory-sized source of EUV radiation and its new applications in lithography of semiconductor devices have been developed. (omitted)

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Measurement of electron temperature and density using Stark broadening of the coaxial focused plasma for extreme ultraviolet (EUV) lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.475-475
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    • 2010
  • We have generated Ar plasma in dense plasma focus device with coaxial electrodes for extreme ultraviolet (EUV) lithography and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas of pressure 8 mTorr. The inner surface of the cylindrical cathode has been attatched by an acetal insulator. Also, the anode made of tin metal. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature and density of the coaxial plasma focus could be obtained by Stark broadening of optical emission spectroscopy (OES). The Lorentzian profile for emission lines of Ar I of 426.629 nm and Ar II of 487.99 nm were measured with a visible monochromator. And the electron density has been estimated by FWHM (Full Width Half Maximum) of its profile. To find the exact value of FWHM, we observed the instrument line broadening of the monochromator with a Hg-Ar reference lamp. The electron temperature has been calculated using the two relative electron density ratios of the Stark profiles. In case of electron density, it has been observed by the Stark broadening method. This experiment result shows the temporal behavior of the electron temperature and density characteristics for the focused plasma. The EUV emission signal whose wavelength is about 6 ~ 16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD). The result compared the electron temperature and density with the temporal EUV signal. The electron density and temperature were observed to be $10^{16}\;cm^{-3}$ and 20 ~ 30 eV, respectively.

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인공위성 탑재용 소형 극자외선 태양망원경 공학 모형 설계 (DESIGNING A SMALL-SIZED ENGINEERING MODEL OF SOLAR EUV TELESCOPE FOR A KOREAN SATELLITE)

  • 한정훈;장민환;김상준
    • Journal of Astronomy and Space Sciences
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    • 제18권2호
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    • pp.145-152
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    • 2001
  • 태양의 극자외선 복사를 연구하기 위한 인공위성 탑재용 소형 극자외선 태양망원경의 공학 모형을 설계하였다. 극자외선 태양망원경은 $584.3AA$(He I)과 $629.7AA$(OV)의 두 파장대역에서 태양을 관측하기 위한 목적으로 설계되었다. 광학계는 Ritchey-Chr 샤두 방식이고, 망원경의 유효구경과 유효 초점 거리는 각각 80mm, 640mm이다. 회전 필터 휠을 사용하여 He I과 OV 방출선을 관측할 수 있도록 하였다. 검출기의 MCP (Microchannel Plate)는 채널 길이 대 직경의 비가 40:1인 Z-stack 타입이고, photocathode로서 KBr이 MCP 초점면에 코팅되며, MCP와 CCD는 fiber optic taper로 연결되도록 디자인하였다. 광학계 설계에 대한 분석은 광학계산용 상용 소프트웨어를 이용하였다.

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