• Title/Summary/Keyword: Exposure direction

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Development of Radiation Restrictor for Secondary Radiation Shielding of Mobile X-ray Generator (이동형 X선 발생장치의 2차 방사선 차폐를 위한 선속조절기 개발 연구)

  • Koo, Bon-Yeoul;Kim, Gha-Jung
    • Journal of radiological science and technology
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    • v.41 no.5
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    • pp.397-403
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    • 2018
  • Mobile X-ray generators are used not in the radiation area but in open space, which causes the exposure of secondary radiation to the healthcare professionals, patients, guardians, etc., regardless of their intentions. This study aimed to investigate the shielding effect of the developed radiation restrictor to block the secondary radiation scattered during the use of mobile X-ray generator. Upon setting the condition of mobile X-ray generator with chest AP, spatial doses were measured by the existence of human equivalent phantom and radiation restrictor, and measured by the existences of phantom and radiation restrictor at the same length of 100 cm. Measurements were taken at intervals of 10 cm every $30^{\circ}$ from $-90^{\circ}$ (head direction) to $+90^{\circ}$ (body direction). Upon the study results, spatial doses in all direction were increased by 45% on average when using phantom in the same condition, however, they were decreased by 64% on average when using the developed radiation restrictor. The dose at 100 cm from the center of X-ray was $3.0{\pm}0.08{\mu}Gy$ without phantom and was increased by 40% with $4.2{\pm}0.08{\mu}Gy$ after phantom usage. The dose when using phantom and the developed radiation restrictor was $1.4{\pm}0.08{\mu}Gy$, which was decreased by 66% compared to the case without using them. Therefore, it is considered the scattered radiation can be shielded at 100-150 cm, the regulation of the distance between beds, effectively with the developed radiation restrictor when using mobile X-ray generators, which can lower the radiation exposure to the people nearby including healthcare professionals and patients.

Measurement of the Spatial Dose Rate for Distribution Room in Department of Nuclear Medicine (핵의학과 분배실 내의 공간선량률 측정)

  • Park, Jeong-Kyu;Cho, Euy-Hyun
    • Journal of Digital Contents Society
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    • v.13 no.2
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    • pp.151-157
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    • 2012
  • Even though the protective facility is well made with the development of medicine, the spatial dose within the radiation section could increase the exposure of the workers. The spatial dose is always present in distribution room within the Department of Nuclear Medicine, so the spatial dose of the interior distribution room is measured and analyzed for the prediction of the exposure dose. The spatial dose rate was $6.78{\pm}0.083{\mu}Sv/h$ in the $^{18}F$ distribution room of department of Nuclear Medicine, $9.248{\pm}0.013{\mu}Sv/h$ in $^{99m}Tc$, and $^{131}I$ distribution room. In addition, in case of $^{18}F$ distribution room, the yearly external exposure dose was $42.5{\mu}Sv$ when the nurse does IV in 1m in distance. It also showed that the spatial dose rate on the direction of right oblique showed higher than others by the standard of distribution window of distribution room. Therefore, the staying time of the workers should be short during distributing radiopharmaceuticals in the distribution room and the design of the distribution protection is necessary to reduce the exposure in the direction of right oblique of the protection. The utmost endeavors are required to reduce the worker's individual exposure dose while doing IV.

Measurement of In- plane Displacement by Speckle Photography and Image Processing (스펙클 포토그라피와 화상처리(畵像處理)에 의(依)한 면내변위(面內變位) 계측(計測))

  • Han, Eung-Kyo;Sumi, Seinosuke;Kim, Koung-Suk
    • Journal of the Korean Society for Nondestructive Testing
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    • v.6 no.2
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    • pp.37-45
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    • 1987
  • Speckle photography is a very useful method for measuring in-plane surface displacement. In its basic form, the object to be studied is illuminated with a divergent laser beam, and a double exposure photograph of the object is recorded, on a fine-grain film or plate, before and after the object is deformed, The magnitude and the direction of the displacement can then be obtained by measuring the spacing and the direction of the Young's fringe, which is produced by probing the developed negative with an unexpaned laser beam, and consists of a pattern of parallel equi-spaced dark bands. In this paper, a hybrid optical and electronic image processing is described-Young's fringe on the viewing screen is observed by a TV-camera and the 2-D video signal is converted from analog to digital and transfered to the computer where the spacing and direction of the fringes are calculated. Several examples of application show that the displacement magnitude and direction can be determined with an accuracy of $0.1{\mu}m\;and\;0.1^{\circ}$ respectively.

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Chemically modulated polystyrene surface using various ion beam exposure time for liquid crystal alignment of high brightness mobile display (고휘도 휴대용 디스플레이를 위한 액정소자의 폴리스타일렌 배향막에 관한 연구)

  • Cho, Myung-Hyun;Lee, Ho-Young
    • Journal of Satellite, Information and Communications
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    • v.9 no.3
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    • pp.22-26
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    • 2014
  • This paper introduces homogeneous liquid crystal (LC) orientations on chemically modulated polystyrene (PS) surfaces using various ion beam (IB) exposure time. Transparent PS was replaced with conventional polyimde material. Especially, PS has higher transparent property than conventional polyimide thin film and it means PS is more suitable material for producing high brightness mobile LCD. As a non-contact process, IB bombardment process induced LC orientation in the direction parallel to the IB process. Through x-ray photoelectron spectroscopy, it was shown that the chemical compositional changes of the IB-irradiated PS surfaces were determined as a function of IB exposure time. Using this analysis, the optimal IB bombardment condition was determined at IB exposure time of up to 15 s. Moreover, thermal stability on IB-irradiated PS surfaces were carried out which showed that a relatively high IB exposure time induced a thermally stable LC alignment property. And it has a highly potential of mobile high transparent mobile LCD such as smart phone display and mobile information device.

Exposure Characteristics for Chemical Substances and Work Environmental Management in the Semiconductor Assembly Process (반도체 조립공정의 화학물질 노출특성 및 작업환경관리)

  • Park, Seung-Hyun;Park, Hae Dong;Shin, In Jae
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.24 no.3
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    • pp.272-280
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    • 2014
  • Objectives: The purpose of this study was to evaluate the characteristics of worker exposure to hazardous chemical substances and propose the direction of work environment management for protecting worker's health in the semiconductor assembly process. Methods: Four assembly lines at two semiconductor manufacturing companies were selected for this study. We investigated the types of chemicals that were used and generated during the assembly process, and evaluated the workers' exposure levels to hazardous chemicals such as benzene and formaldehyde and the current work environment management in the semiconductor assembly process. Results: Most of the chemicals used at the assembly process are complex mixtures with high molecular weight such as adhesives and epoxy molding compounds(EMCs). These complex mixtures are stable when they are used at room temperature. However workers can be exposed to volatile organic compounds(VOCs) such as benzene and formaldehyde when they are used at high temperature over $100^{\circ}C$. The concentration levels of benzene and formaldehyde in chip molding process were higher than other processes. The reason was that by-products were generated during the mold process due to thermal decomposition of EMC and machine cleaner at the process temperature($180^{\circ}C$). Conclusions: Most of the employees working at semiconductor assembly process are exposed directly or indirectly to various chemicals. Although the concentration levels are very lower than occupational exposure limits, workers can be exposed to carcinogens such as benzene and formaldehyde. Therefore, workers employed in the semiconductor assembly process should be informed of these exposure characteristics.

A Study on the Fire Resistance Design of Buildings Considering the Fire Load Energy Density (화재하중밀도를 고려한 건축물의 내화설계법에 관한 연구)

  • 이평강;이용재;최인창;김회서
    • Fire Science and Engineering
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    • v.17 no.2
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    • pp.10-16
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    • 2003
  • The main purpose of this study is to raise the point at issue and to propose reform direction about the current performance criteria of fire resistance through the examination of the fire resistance required for each use of compartment by using performance-based fire safety design method. To examine the performance criteria of fire resistance, this study compared the equivalent time of fire exposure which was calculated by using time-equivalent formulae with the required fire resistance time determined by existing prescriptive code, and surveyed factors such as the fire load energy density, ventilation factor, fire compartment materials and fire compartment geometry in order to calculate the equivalent time of fire exposure.

A Scheme to Control Laser Power and Exposure Time for Fabricating Precise Threedimensional Microstructures in Nano-stereolithography (nSL) Process (3 차원 나노 스테레오리소그래피의 정밀화를 위한 펨토초 레이저 출력-조사시간 제어방법)

  • 박상후;임태우;양동열
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1365-1368
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    • 2004
  • A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nanostereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerizing process which is induced by two-photon absorption (TPA) with a femtosecond pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so neardiffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and a scheme on the control of laser power and exposure for minimizing aspect ratio of a voxel is proposed.

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Analysis on Topography and Exposure Duration of Siheung Tidal Flat Using Remote Sensing Techniques (위성영상 분석기술을 이용한 시흥갯벌의 지형 및 노출시간 분석)

  • Koo, Bon Joo;Kim, Minkyu
    • Ocean and Polar Research
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    • v.35 no.4
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    • pp.291-298
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    • 2013
  • In order to investigate the topography and exposure duration of the Siheung tidal flat, tidal ranges and DEM constructed by remote sensing techniques were analyzed. A cross-sectional diagram of the intertidal area reveals that it is relatively flat in the upper zone and then abruptly plunges into the bottom of the main channel where elevations increase in an upstream direction. The waterline during the Highest Low Water (HLW) is drawn back to the bottom of the channel at the middle part of the tidal flat and is formed along the slant of the channel during the Lowest High Water (LHW). The intertidal zone is located between -410 cm and 510 cm in terms of elevation and its total area is $0.65km^2$. An area between the Highest High Water (HHW) and Lowest High Water (LHW), occupying about 80% of the total area, occupies $0.52km^2$ of total area and accounts for 56% of the exposure duration. The boundary of wetland protection area in the Siheung tidal flat did not exactly coincide with the intertidal regime and differs by more than 15%. This study, which precisely analyzed the tidal flat area, tidal environment, and topography, would be useful in making a conservation plan and in learning how to use a wetland protection area in a sustainable manner.

Impact of perinatal environmental tobacco smoke on the development of childhood allergic diseases

  • Yang, Hyeon-Jong
    • Clinical and Experimental Pediatrics
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    • v.59 no.8
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    • pp.319-327
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    • 2016
  • Allergic diseases such as asthma, allergic rhinitis, atopic dermatitis, and food allergy, are most common chronic, noncommunicable diseases in childhood. In the past few decades, the prevalence has increased abruptly worldwide. There are 2 possible explanations for the rising prevalence of allergic diseases worldwide, that an increased disease-awareness of physician, patient, or caregivers, and an abrupt exposure to unknown hazards. Unfortunately, the underlying mechanisms remain largely unknown. Despite the continuing efforts worldwide, the etiologies and rising prevalence remain unclear. Thus, it is important to identify and control risk factors in the susceptible individual for the best prevention and management. Genetic susceptibility or environments may be a potential background for the development of allergic disease, however they alone cannot explain the rising prevalence worldwide. There is growing evidence that epigenetic change depends on the gene, environment, and their interactions, may induce a long-lasting altered gene expression and the consequent development of allergic diseases. In epigenetic mechanisms, environmental tobacco smoke (ETS) exposure during critical period (i.e., during pregnancy and early life) are considered as a potential cause of the development of childhood allergic diseases. However, the causal relationship is still unclear. This review aimed to highlight the impact of ETS exposure during the perinatal period on the development of childhood allergic diseases and to propose a future research direction.

Cervical Pedicle Screw Insertion Using the Technique with Direct Exposure of the Pedicle by Laminoforaminotomy

  • Jo, Dae-Jean;Seo, Eun-Min;Kim, Ki-Tack;Kim, Sung-Min;Lee, Sang-Hun
    • Journal of Korean Neurosurgical Society
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    • v.52 no.5
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    • pp.459-465
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    • 2012
  • Objective : To present the accuracy and safety of cervical pedicle screw insertion using the technique with direct exposure of the pedicle by laminoforaminotomy. Methods : We retrospectively reviewed 12 consecutive patients. A total of 104 subaxial cervical pedicle screws in 12 patients had been inserted. We also assessed the clinical and radiological outcomes and analyzed the direction and grade of pedicle perforation (grade 0: no perforation, 1: <25%, 2: 20% to 50%, 3: >50% of screw diameter) on the postoperative vascular-enhanced computed tomography scans. Grade 2 and 3 were considered as incorrect position. Results : The correct position was found in 95 screws (91.3%); grade 0-75 screws, grade 1-20 screws and the incorrect position in 9 screws (8.7%); grade 2-6 screws, grade 3-3 screws. There was no neurovascular complication related with cervical pedicle screw insertion. Conclusion : This technique (technique with direct exposure of the pedicle by laminoforaminotomy) could be considered relatively safe and easy method to insert cervical pedicle screw.