• Proceedings of the Korean Society for Emotion and Sensibility Conference
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• 2002.11a
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• pp.187-192
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• 2002

Research has shown that many smokers experience an increase in the desire to smoke when exposed to smoking-related cues. Cue exposure treatment (CET) refers to the manualized, repeated exposure to smoking-related cues, aimed at the reducing cue reactivity by extinction. In this study, we constructed a virtual reality system for evoking a desire of nicotine, which was based on the results of a Questionnaire of Nicotine-craving. And we investigated the effectiveness of the virtual reality system as compared to classical device (pictures). As a result, we reached the conclusion that virtual reality elicits more craving symptoms than the classical devices.

• International Journal of Contents
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• v.9 no.2
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• pp.66-69
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• 2013

In the U.S., performance assessment on the Automatic Exposure Control system (AEC) is managed according to the Mammography Quality Standards Act (MQSA). However, The AEC is not available in the performance assessment conducted in Korea. Also, there is no study made on the performance of the automatic exposure control system for mammography in Korea. For this reason, this study examined the performance of the automatic exposure control system for mammography that was clinically used in the Incheon area. Result showed that the difference of the mean optical density was 0.79 ~ 2.81. This implies that some devices caused unnecessary x-ray exposure to patients. Furthermore, only 61.5% of the entire experimental device was shown to be satisfactory in terms of change in mean optical density. Moreover, in terms of the subject's thickness, change in radiographic density was shown to be severe among lower X-ray tube voltage while there was severe density change in X-ray image depending on X-ray tube voltage among the subjects with more thickness. Therefore, it is suggested to provide performance management on the AEC for mammography.

• Journal of the Korea Society of Computer and Information
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• v.21 no.10
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• pp.63-68
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• 2016

Recently, Biometrics is being magnified than ID or password about user authentication. However, unlike a PIN, password, and personal information there is no way to modify the exposure if it is exposed and used illegally. As FIDO(Fast IDentity Online) than existing server storing method, It stores a user's biometric information to the user device. And the user device authentication using the user's biometric information, the user equipment has been used a method to notify only the authentication result to the server FIDO. However, FIDO has no mutual authentication between the user device and the FIDO server. We use a Certificate Authority in order to mutually authenticate the user and the FIDO server. Thereby, we propose a more reliable method and compared this paper with existed methods about security analysis.

• Proceedings of the IEEK Conference
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• 2007.07a
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• pp.235-236
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• 2007

CCD(Charge-Coupled Device) 혹은 CMOS (Complementary Metal Oxide Semiconductor)와 같은 소자를 이용하여 빛을 전기적 신호인 Image로 재구성하는 촬상소자(Color Capture Device)는 촬영환경이 어두워지면 Dynamic Range가 작아지고, Noise가 상대적으로 심해진다[1][2]. 본 논문에서는 촬영 환경이 어두울 때, Resolution을 Preserving하는 Pixel Pitch가 큰 촬상 소자와 Motion Blur를 억제하는 Exposure Time이 긴 촬상 소자의 조합을 신호처리로 구현하여, 신호의 Power를 향상시켜 Dynamic Range를 키우고 Noise의 Boost-up을 억제하여 SNR(Signal to Noise Ratio)을 향상시키는 방식으로, 촬상 장치의 감도를 향상시켜 화질을 개선하는 방법을 제안한다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.1
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• pp.65-69
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• 2004

We synthesized photoalignment material of high thermal resistance with hydroxyl aromatic polyimide, and studied the liquid crystal (LC) aligning capabilities on the photopolymer layers. Also, electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure were investigated. A good LC alignment with UV exposure on the photopolymer surface can be obtained. However, the low pretilt angles were obtained below 1$^{\circ}$. The Voltage-transmittance (V-T) curve without backflow bounce in the photoaligned TN cell with UV exposure was observed. The response time of photoaligned TN cell was measured about 24 ms. Finally, The photoaligned TN cell has few hysteresis, and shows the residual DC voltage that is less.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.43-44
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• 2005

SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image is desired. But SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination. Based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factional design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

• Journal of information and communication convergence engineering
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• v.3 no.4
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• pp.191-194
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• 2005

SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image are desired. However SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination, based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factorial design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

• Journal of the Korean Association of Oral and Maxillofacial Surgeons
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• v.47 no.3
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• pp.233-236
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• 2021

A mandibular continuity defect can be repaired using either a prosthetic device or autogenous bone. A titanium reconstruction plate can be used with a localized or vascularized flap over the defect of the mandible. Unfortunately, the plate may fail due to plate exposure, screw loosening, fracture, or infection, and will need to be removed. Plate exposure though the skin or mucosa is one of the main reasons for failure. In the present work, the authors introduced a lingually positioned reconstruction plate fabricated via three-dimensional printed bending support. This custom reconstruction plate can avoid plate re-exposure as well as reduce surgical errors and operation time.

• Journal of Digital Convergence
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• v.11 no.6
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• pp.269-273
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• 2013

Exposure dose to the examinee was measured using glass dosimeter in the test using panorama device at the time of dental treatment. As a result of measuring expose dose to lens according to the different sizes of Pb banding of own manufacturing to reduce exposure dose to lens especially sensitive to radiation, it was verified that exposure dose to lens varied depending on the size of the Pb banding. With the size of Pb banding of $3{\times}20{\times}0.2cm$, exposure dose tended to increase higher than normal value, and with the size of or more than $5{\times}20{\times}0.2cm$, it decreased. And also, the obtained image with the size of $7{\times}20{\times}0.2cm$ was not suitable for diagnosis. Therefore, it is expected that exposure dose would be reduced by using Pb banding of the size of not less than $5{\times}20{\times}0.2cm$ and not more than $6{\times}20{\times}0.2cm$ in the test, to minimize exposure dose and conduct panorama test efficiently.

• Transactions on Electrical and Electronic Materials
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• v.3 no.1
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• pp.30-37
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.