• Applied Chemistry for Engineering
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• v.22 no.1
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• pp.31-36
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• 2011

Tetrafluoromethane ($CF_4$) has been used as the plasma etching and chemical vapor deposition (CVD) gas for semiconductor manufacturing processes. However, the gas need to be removed efficiently because of their strong absorption of infrared radiation and the long atmospheric lifetime which cause global warming effects. A waterjet gliding arc plasma system in which plasma is combined with the waterjet was developed to effectively produce OH radicals, resulting in efficient destruction of $CF_4$ gas. Design factors such as electrode shape, electrode angle, gas nozzle diameter, electrode gap, and electrode length were investigated. The highest $CF_4$ destruction of 93.4% was achieved at Arc 1 electrode shape, $20^{\circ}$ electrode angle, 3 mm gas nozzle diameter, 3 mm electrode gap and 120 mm electrode length.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.24 no.10
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• pp.1306-1311
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• 2020

In this study, we proposed an anti-reflective nano-structure to improve the photoresponsivity of AlGaN UV photodiode that can be used as a receiver in a solar blind UV optical communication system. The anti-reflective nano-structure was fabricated by forming Ni nano-clusters on SiO2 film followed by etching the underneath SiO2 film. A sample with the anti-reflective nano-structure exhibited lower surface reflection along with less dependency on the wavelength in comparison with a sample without the nano-structure. Finally, a UV photodiode was fabricated by applying an anti-reflective structure produced by heat-treating a 2 nm-thick Ni layer. The photodiode fabricated with the proposed nano-structure exhibited noticeable improvement in the photoresponsivity at the wavelength range from 240 nm to 270 nm in comparison with the same photodiode with a SiO2 film without the nano-structure.

• Journal of dental hygiene science
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• v.22 no.3
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• pp.156-163
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• 2022

Background: This study attempted to apply resin infiltrant (RI) as a method to maintain the effect of tooth bleaching treatment and compared it with fluoride varnish (FV) or artificial saliva to evaluate the effect. Methods: Sixty healthy lozenge specimens were classified into five groups. Group 1 was the negative control group, and discoloration was induced after artificial saliva treatment of the tooth specimen (G1_S+C). Group 2 was a positive control group, in which pigmentation was induced after bleaching treatment and artificial saliva treatment (G2 _B+S+C). Coloration was induced in group 3 (experimental group 1) after bleaching treatment and artificial saliva treatment, followed by application of fluorine varnish (G3_B+FV+S+C). Coloration was induced in Group 4 (experimental group 2) after applying RI after bleaching treatment and artificial saliva treatment (G4_B+RI+S+C). Pigmentation was induced in group 5 (experimental group 3) after bleaching treatment and artificial saliva treatment, followed by acid treatment (etching) and treatment with RI (G5_B+E+RI+S+C). Coffee and wine were used to induce discoloration. The lightness value (L^*) of the CIE L^*a^*b^* color system was obtained by image analysis. Kruskal-Wallis H analysis was performed for the mean difference in L^* values by group. Results: When coloration was induced with coffee, there was no significant difference in L^* value between artificial saliva (G2 _B+S+C), FV (G3_B+FV+S+C), and RI (G4_B+RI+S+C, G5_B+E+RI+S+C) groups. There was no significant difference in L^* values between the artificial saliva (G2 _B+S+C), FV (G3_B+FV+S+C), and RI (G4_B+RI+S+C, G5_B+E+RI+S+C) groups, even in the case of wine induced coloration. Conclusion: It was confirmed that artificial saliva or RI treatment had similar effects to the FV previously used to maintain the effect of tooth bleaching treatment.

• Restorative Dentistry and Endodontics
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• v.24 no.4
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• pp.647-656
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• 1999

The purpose of this study was to investigate the shear bond strength and marginal microleakage of composite to enamel and dentin according to different treatment methods when the applied bonding agent was contaminated by artificial saliva. For the shear bond strength test, the buccal and occlusal surfaces of one hundred twenty molar teeth were ground to expose enamel(n=60) and dentin surfaces(n=60). The specimens were randomly assigned into control and 5 experimental groups with 10 samples in each group. In control group, a bonding system(Scotchbond$^{TM}$ Multi-Purpose plus) and a composite resin(Z-100$^{TM}$) was bonded on the specimens according to manufacture's directions. Experimental groups were subdivided into 5 groups. After polymerization of an adhesive, they were contaminated with at artificial saliva on enamel and dentin surfaces: Experimental group 1 ; artificial saliva was dried with compressed air. Experimental group 2 ; artificial saliva was rinsed with air-water spray and dried. Experimental group 3 ; artificial saliva was rinsed, dried and applied an adhesive. Experimental group 4 ; artificial saliva was rinsed, dried, and then etched using phosphoric acid followed by an adhesive. Experimental group 5, artificial saliva was rinsed, dried, and then etched with phosphoric acid followed by consecutive application of both a primer and an adhesive. Composite resin(Z-100$^{TM}$) was bonded on saliva-treated enamel and dentin surfaces. The shear bond strengths were measured by universal testing machine(AGS-1000 4D, Shimaduzu Co. Japan) with a crosshead speed of 5mm/minute under 50kg load cell. Failure modes of fracture sites were examined under stereomicroscope. The data were analyzed by one-way ANOVA and Tukey's test. For the marginal microleakage test, Class V cavities were prepared on the buccal surfaces of sixty molars. The specimens were divided into control and experimental groups. Cavities in experimental group were contaminated with artificial saliva and those surfaces in each experimental groups received the same treatments as for the shear test. Cavities were filled with Z-100. Specimens were immersed in 0.5% basic fuchsin dye for 24 hours and embedded in transparent acrylic resin and sectioned buccolingually with diamond wheel saw. Four sections were obtained from the one specimen. Marginal microleakages of enamel and dentin were scored under streomicroscope and averaged from four sections. The data were analyzed by Kruskal-Wallis test and Fisher's LSD. The results of this study were as follows. 1. The shear bond strength to enamel showed lower value in experimental group 1(13.20${\pm}$2.94MPa) and experimental group 2(13.20${\pm}$2.94MPa) than in control(20.03${\pm}$4.47MPa), experimental group 4(20.96${\pm}$4.25MPa) and experimental group 5(21.25${\pm}$4.48MPa) (p<0.05). 2. The shear bond strength to dentin showed lower value in experimental group 1(9.35${\pm}$4.11MPa) and experimental group 2(9.83${\pm}$4.11MPa) than in control group(17.86${\pm}$4.03MPa), experimental group 4(15.04${\pm}$3.22MPa) and experimental group 5(14.33${\pm}$3.00MPa) (p<0.05). 3. Both on enamel and dentin surfaces, experimental group 1 and 2 showed many adhesive failures, but control and experimental group 3, 4 and 5 showed mixed and cohesive failures. 4. Enamel marginal microleakage was the highest in experimental group 1 and there was a significant difference in comparison with other groups (p<0.05). 5. Dentin marginal microleakages of experimental group 1 and 2 were higher than those of other groups (p<0.05). This result suggests that treatment methods, re-etching with 35% phosphoric acid followed by re-application of adhesive or repeating all adhesive procedures, will produce good effect on both shear bond strength and microleakage of composite to enamel and dentin if the polymerized bonding agent was contaminated by saliva.

• The Journal of Korean Academy of Prosthodontics
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• v.48 no.1
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• pp.8-15
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• 2010

Purpose: The purpose of this study was to evaluate the effect of various methods of dentin bonding agent application and air abrasion pretreatment on microtensile bond strength between dentin and resin, using a self-etching adhesive system. Material and methods: Thirty freshly extracted human molars were obtained and divided into 6 groups of 5 teeth. A 2-step self etching adhesive system (Clearfil SE Bond) was used for all groups. The control specimens were prepared using a direct immediate bonding technique. The delayed dentin sealing specimens were prepared using an indirect approach without dentin prebonding. The immediate dentin sealing specimens were prepared using dentin prebonding immediately following preparation. Immediate dentin sealing teeth and delayed dentin sealing teeth had provisional restorations using Fermit for two weeks. Then all specimens of each group were divided into two groups of three, depending on air abrasion pretreatment. Composite "crowns" were incrementally built on and specimens were stored in water for 24 hours. All teeth were prepared for a microtensile bond strength test. Bond strength data were analyzed with a one-way ANOVA test, and post hoc comparison was done using the Scheffe's test. Results: The mean microtensile bond strengths of all groups were not statistically different from each other. Conclusion: When preparing teeth for indirect restorations, IDS and DDS with Clearfil SE bond, have no difference on the microtensile bond strength between dentin and resin. Air abrasion pretreatment did not affect the microtensile bond strength when using IDS and DDS with Clearfil SE bond.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.34 no.2
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• pp.113-120
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• 2010

An experimental investigation was carried out to examine the evaporative heat transfer characteristics of R-134a in a micro-channel heat exchanger. The micro-channel heat exchanger used in this study was a sort of plate heat exchanger. Micro-channels were fabricated on the SUS304 plate by the photo-etching process: 13 sheets of plates were stacked and bonded by the diffusion bonding process. The effects of the evaporating temperature, mass flux of R-134a, and inlet temperature of water were examined. As the difference between the inlet temperatures of R-134a and water increased, the heat transfer rate increased. The evaporative heat transfer coefficients obtained in this study range from 0.67 to 6.23 kW/$m^2{\cdot}^{\circ}C$. The experimental correlation for the Nusselt number as a function of the Reynold number and $\Theta$ was suggested for the micro-channel heat exchanger.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.324-325
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• 2014

Quantum wells infrared photodetectors (QWIPs) have been used to detect infrared radiations through the principle based on the localized stated in quantum wells (QWs) [1]. The mature III-V compound semiconductor technology used to fabricate these devices results in much lower costs, larger array sizes, higher pixel operability, and better uniformity than those achievable with competing technologies such as HgCdTe. Especially, GaAs/AlGaAs QWIPs have been extensively used for large focal plane arrays (FPAs) of infrared imaging system. However, the research efforts for increasing sensitivity and operating temperature of the QWIPs still have pursued. The modification of heterostructures [2] and the various fabrications for preventing polarization selection rule [3] were suggested. In order to enhance optical performances of the QWIPs, double barrier quantum well (DBQW) structures will be introduced as the absorption layers for the suggested QWIPs. The DBWQ structure is an adequate solution for photodetectors working in the mid-wavelength infrared (MWIR) region and broadens the responsivity spectrum [4]. In this study, InGaAs/GaAs/AlGaAs double barrier quantum well infrared photodetectors (DB-QWIPs) are successfully fabricated and characterized. The heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIPs are grown by molecular beam epitaxy (MBE) system. Photoluminescence (PL) spectroscopy is used to examine the heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIP. The mesa-type DB-QWIPs (Area : $2mm{\times}2mm$) are fabricated by conventional optical lithography and wet etching process and Ni/Ge/Au ohmic contacts were evaporated onto the top and bottom layers. The dark current are measured at different temperatures and the temperature and applied bias dependence of the intersubband photocurrents are studied by using Fourier transform infrared spectrometer (FTIR) system equipped with cryostat. The photovoltaic behavior of the DB-QWIPs can be observed up to 120 K due to the generated built-in electric field caused from the asymmetric heterostructures of the DB-QWIPs. The fabricated DB-QWIPs exhibit spectral photoresponses at wavelengths range from 3 to $7{\mu}m$. Grating structure formed on the window surface of the DB-QWIP will induce the enhancement of optical responses.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.134-134
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• 2011

High-k dielectric materials such as $HfO_2$, $ZrO_2$ and $Al_2O_3$ increase gate capacitance and reduce gate leakage current in MOSFET structures. This behavior suggests that high-k materials will be promise candidates to substitute as a tunnel barrier. Furthermore, stack structure of low-k and high-k tunnel barrier named variable oxide thickness (VARIOT) is more efficient.[1] In this study, we fabricated the $WSi_2$ nanocrystals nonvolatile memory device with $SiO_2/HfO_2/Al_2O_3$ tunnel layer. The $WSi_2$ nano-floating gate capacitors were fabricated on p-type Si (100) wafers. After wafer cleaning, the phosphorus in-situ doped poly-Si layer with a thickness of 100 nm was deposited on isolated active region to confine source and drain. Then, on the gate region defined by using reactive ion etching, the barrier engineered multi-stack tunnel layers of $SiO_2/HfO_2/Al_2O_3$ (2 nm/1 nm/3 nm) were deposited the gate region on Si substrate by using atomic layer deposition. To fabricate $WSi_2$ nanocrystals, the ultrathin $WSi_2$ film with a thickness of 3-4 nm was deposited on the multi-stack tunnel layer by using direct current magnetron sputtering system [2]. Subsequently, the first post annealing process was carried out at $900^{\circ}C$ for 1 min by using rapid thermal annealing system in nitrogen gas ambient. The 15-nm-thick $SiO_2$ control layer was deposited by using ultra-high vacuum magnetron sputtering. For $SiO_2$ layer density, the second post annealing process was carried out at $900^{\circ}C$ for 30 seconds by using rapid thermal annealing system in nitrogen gas ambient. The aluminum gate electrodes of 200-nm thickness were formed by thermal evaporation. The electrical properties of devices were measured by using a HP 4156A precision semiconductor parameter analyzer with HP 41501A pulse generator, an Agillent 81104A 80MHz pulse/pattern generator and an Agillent E5250A low leakage switch mainframe. We will discuss the electrical properties for application next generation non-volatile memory device.

• Journal of the Korean Geotechnical Society
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• v.17 no.4
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• pp.289-299
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• 2001

본 연구는 균질 및 2개층 비균질지반에서 사질토지반 상에 놓인 정방형 기초의 극한지지력과 침하에 대하여 고찰하였다. 본 연구는 얕은기초의 거동에 대한 정방형 기초의 크기, 지반 상대밀도, 기초 폭에 대한 상부층의 두께 비(H/B), 상부층 아래 경계면의 경사($\theta$) 그리고 지반강성비의 영향을 규명하기 위하여 모형실험을 수행하였다. 동일 상대밀도에서 지지력 계수($N_{{\gamma}}$)는 일정하지 않으며 기초 폭에 직접적으로 관련되며 지지력계수는 기초 폭이 증가함에 따라 감소하였다. 기초크기의 영향과 구속압력의 영향을 고려하는 Ueno 방법에 의한 극한지지력의 예측값은 고전적인 지지력 산정식보다 더 잘 일치하며 그 값은 실험값의 65% 이상으로 나타났다. $\theta$=$0^{\circ}$인 2개층 지반의 결과에 근거하여, 극한지지력에 대한 하부층 지반의 영향을 무시할 수 있는 한계 상부층 두께는 기초 폭의 2배로 결정되었다. 그러나, 73%의 상부층 상대밀도인 경우는 침하비($\delta$B) 0.05 이하에서만 이 결과가 유효하였다. 경계면이 경사진 2개층 지반의 결과에 근거하여, 상부층의 상대밀도가 느슨할수록 그리고 상부층의 두께가 클수록 극한지지력에 대한 경계면 경사의 영향은 크지 않는 것으로 나타났다. 경계면의 경사가 증가함에 따른 극한침하량의 변화는 경계면이 수평인 경우($\theta$=$0^{\circ}$)를 기준으로 0.82~1.2(상부층 $D_{r}$=73%인 경우) 그리고 0.9~1.07(상부층 $D_{r}$=50%인 경우) 정도로 나타났다.Markup Language 문서로부터 무선 마크업 언어 문서로 자동 변환된 텍스트를 인코딩하는 경우와 같이 특정한 응용 분야에서는 일반 문자열에 대한 확장 인코딩 기법을 적용할 필요가 있을 수 있다.mical etch-stop method for the etching of Si in TMAH:IPA;pyrazine solutions provides a powerful and versatile alternative process for fabricating high-yield Si micro-membranes. the RSC circle, but also to the logistics system in the SLC circle. Thus, the RSLC model can maximize combat synergy effects by integrating the RSC and the SLC. With a similar logic, this paper develops "A Revised System of Systems with Logistics (RSSL)" which combines "A New system of Systems" and logistics. These tow models proposed here help explain several issues such as logistics environment in future warfare, MOE(Measure of Effectiveness( on logistics performance, and COA(Course of Actions) for decreasing mass and increasing velocity. In particular, velocity in logistics is emphasized.

• Journal of the korean academy of Pediatric Dentistry
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• v.28 no.4
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• pp.566-574
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• 2001

For decades it has been a clinically accepted requirement, in case of salivary contamination, to re-etch conditioned enamel and dentin to proceed with the adhesive technique. Only a few reports have been so far dealing with the potential of one-bottle adhesive system to bond even when applied after salivary contamination and without re-etching. The purpose of this study was to evaluate the influence of the salivary contamination on the shear bond strength of dentin. The results were as follows: 1. In group II, in which saliva contamination and washing occurred before applying of Prime & Bond NT showed high shear bond strength as in control group. In Group III and IV, in which the cured adhesive was contaminated with saliva, showed significantly lower mean bond strength, 2. Relating long resin tags of $70\sim120{\mu}m$ were observed in samples of all groups under SEM. We could observed hybrid layer, resin tag and many lateral branches in every group. And there were no differences between groups.