• Title/Summary/Keyword: Etching resistance

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Advanced surface processing of NLO borate crystals for UV generation

  • Mori, Yusuke;Kamimur, Tomosumi;Yoshimura, Masashi;Sasaki, Takatomo
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.5
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    • pp.459-462
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    • 1999
  • Recent advances in NLO Borate Crystals for UV Generation are reviewed with the particular emphasis on the technique to improve the life time of UV optics. The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces were to a depth of less than 100nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. The laser-induced surface damage threshold of CLBO was improved up to 15J/$\textrm{cm}^2$(wavelength: 355 nm, pulse width: 0.85 ns)as compared with that of the as-polished surface (11 J/$\textrm{cm}^2$). The laser-induced surface damage of fused silica also increased from 7.5J/$\textrm{cm}^2$ to 15J/$\textrm{cm}^2$. For the irradiation of a 266 nm high-intensity and high-repetition laser light, the surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

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Fabrication of ZnO TFTs by micro-contact printing of silver ink electrodes

  • Shin, Hong-Sik;Yun, Ho-Jin;Nam, Dong-Ho;Choi, Kwang-Il;Baek, Kyu-Ha;Park, Kun-Sik;Do, Lee-Mi;Lee, Hi-Deok;Wang, Jin-Suk;Lee, Ga-Won
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1600-1603
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    • 2009
  • In this work, we have fabricated inverted staggered ZnO TFTs with 1-${\mu}m$ resolution channel length by micro contact printing (${\mu}$-CP) method. Patterning of micro scale source/drain electrodes without etching is successfully achieved by micro contact printing method by using silver ink and polydimethylsiloxane (PDMS) stamp. And the time dependent characteristics of the sheet resistance show that Ag inklayer could be used as source and drain electrodes for ZnO TFTs.

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The Fabrication of (Ga, Al) As/GaAs Modified Multi-Quantum Well Laser Diode by MOCVD (MOCVD법에 의한 (Ga, Al) As/GaAs 변형된 영지우물 레이저 다이오드의 제작)

  • Kim, Chung-Jin;Kang, Myung-Ku;Kim, Yong;Eom, Kyung-Sook;Min, Suk-Ki;Oh, Hwan-Sool
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.36-45
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    • 1992
  • The Modified Multi-Quantum Well(MMQWAl) structures have been grown by Mental-Organic chemical Vapor Deposition(MOCVD) method and stripe type MMQW laser diodes have been investigated. In the case of GaAs/AlGaAs superlattice and quantum well growth by MOCVD, the periodicity, interface abruptess, Al compositional uniformity and layer thickness have been confirmed though the shallow angle lapping technique, double crystal x-ray diffractometry (DCXD) and photoluminescence (PL) measurement. stripe-type MMQW laser diodes have been fabricated using the process technology of photolithography, chemical etching, ohmic contact, back side removing and cleaving. As the result of the electrical and opticalmeasurement of these laser diodes, we have achieved the series resistance of $1[\Omega}~2{\Omega}$ by current-voltage measurements, the threshold current of 200-300mA by currnt-light measurements and the lasing wavelength of 8000-8400$\AA$ by lasing spectrum measurements.

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THE FABRICATION OF A PROCESS HEAT EXCHANGER FOR A SO3 DECOMPOSER USING SURFACE-MODIFIED HASTELLOY X MATERIALS

  • Park, Jae-Won;Kim, Hyung-Jin;Kim, Yong-Wan
    • Nuclear Engineering and Technology
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    • v.40 no.3
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    • pp.233-238
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    • 2008
  • This study investigates the surface modification of a Hastelloy X plate and diffusion bonding in the assembly of surface modified plates. These types of plates are involved in the key processes in the fabrication of a process heat exchanger (PHE) for a $SO_3$ decomposer. Strong adhesion of a SiC film deposited onto Hastelloy X can be achieved by a thin SiC film deposition and a subsequent N ion beam bombardment followed by an additional deposition of a thicker film that prevents the Hastelloy X surface from becoming exposed to a corrosive environment through the pores. This process not only produces higher corrosion resistance as proved by electrolytic etching but also exhibits higher endurance against thermal stress above 9$900^{\circ}C$. A process for a good bonding between Hastelloy X sheets, which is essential for a good heat exchanger, was developed by diffusion bonding. The diffusion bonding was done by mechanically clamping the sheets under a heat treatment at $900^{\circ}C$. When the clamping jig consisted of materials with a thermal expansion coefficient that was equal to or less than that of the Hastelloy X, sound bonding was achieved.

Modeling of a Superconducting Flux Flow Sensor Inductance Radiometer (인덕턴스 복사계 측정을 위해 사용된 초전도 자속 흐름 센서기 모델링)

  • Ko, Seok-Cheol;Kang, Hyeong-Gon;Lim, Sung-Hun;Choi, Myong-Ho;Han, Byoung-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.19-22
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    • 2003
  • For use in constructing highly sensitive thermal detectors, the present authors have been studying the preparation of Superconducting Flux Flow Sensor(SFFS). In this research, SFFS with five channel ($5{\mu}m$/1channel) has been fabricated based on the flux flow using high temperature superconducting thin films by the ICP etching technique. We have designed a bolometer based on the temperature dependence of the kinetic inductance of a superconducting flux flow thin film. In this paper examines the fabrications and flux flow resistance and thermometer responses of the highly sensitive sensor constructed of a thin YBCO film. It is also suggested that they will be applicable to a new type of flux flow sensor.

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Development of High Efficiency and High Power LED Package for Applying Silicone-Reflector (실리콘 리플렉터를 적용한 고효율 고출력 LED 패키지 개발)

  • Jeong, Hee-Suk;Lee, Young-Sik;Lee, Jung-Geun;Kang, Han-Lim;Hwang, Myung-Keun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.9
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    • pp.1-5
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    • 2013
  • We developed high-efficient 6W-LED package with simple structure by applying Heat Slug and silicone-reflector. LED package was manufactured in $8.5{\times}8.5mm$ sized multi-chip structure having thickness of $500{\mu}m$ achieved by bonding silicon-reflector with prepreg on top of the plate after implementing the reflector placed on copper substrate Half Etching by thickness of $200{\mu}m$. The luminous flux, luminous efficacy, correlated color temperature, color rendering index and thermal resistance of developed LED was evaluated, and it verified the application of products by applying it to 120W-LED road luminaires through simulation. The luminous efficacy of LED package reached over 130lm/W, and it is possible to be manufactured into 120W-LED road luminaires using 18 packages. In addition, the simulation results showed average of horizontal illuminance and overall illuminance uniformity that is suitable for three-lane road.

Study of metal dopants and/or Ag nanoparticles incorporated direct-patternable ZnO film by photochemical solution deposition

  • Kim, Hyun-Cheol;Reddy, A.Sivasankar;Park, Hyung-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.368-368
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    • 2007
  • Zinc oxide (ZnO) has drawn much interest as a potential transparent conducting oxide (TCO) for applying to solar cell and front electrode of electro-luminescent devices. For the enhancement of electrical property of TCOs, dopant introduction and hybridization with conductive nanoparticles have been investigated. In this work, ZnO films were formed on glass substrate by using photochemical solution deposition of Ag nanoparticles dispersed or various metal (Ag, Cd, In, or Sn) contained photosensitive ZnO solutions. The usage of photosensitive solution permits us to obtain a micron-sized direct patterning of ZnO film without using conventional dry etching procedure. The structural, optical, and electrical characteristics of ZnO films with the introduction of metal dopants with/without Ag nanoparticles have been investigated to check whether there is a combined effect between metal dopants and Ag nanoparticles on the characteristics of ZnO film. The phase formation and crystallinity of ZnO film were monitored with X-ray diffractometer. The optical transmittance measurement was carried out using UV-VIS-NIR spectrometer and the electrical properties such as sheet resistance and conductivity were observed by using four-point probe.

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The Study of Metal CMP Using Abrasive Embedded Pad (고정입자 패드를 이용한 텅스텐 CMP에 관한 연구)

  • Park, Jae-Hong;Kim, Ho-Yun;Jeong, Hae-Do
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.12
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    • pp.192-199
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    • 2001
  • Chemical mechanical planarization (CMP) has emerged as the planarization technique of choice in both front-end and back-end integrated circuit manufacturing. Conventional CMP process utilize a polyurethane polishing pad and liquid chemical slurry containing abrasive particles. There hale been serious problems in CMP in terms of repeatability and deflects in patterned wafers. Especial1y, dishing and erosion defects increase the resistance because they decrease the interconnection section area, and ultimately reduce the lifetime of the semiconductor. Methods to reduce dishing & erosion have recently been interface hardness of the pad, optimization of the pattern structure as dummy patterns. Dishing & erosion are initially generated an uneven pressure distribution in the materials. These defects are accelerated by free abrasives and chemical etching. Therefore, it is known that dishing & erosion can be reduced by minimizing the abrasive concentration. Minimizing the abrasive concentration by using CeO$_2$is the best solution for reducing dishing & erosion and for removal rate. This paper introduce dishing & erosion generating mechanism and a method fur developing a semi-rigid abrasive pad to minimize dishing & erosion during CMP.

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Effect of $Ga^+$ Ion Beam Irradiation On the Wet Etching Characteristic of Self-Assembled Monolayer ($Ga^+$ 이온 빔 조사량에 따른 자기 조립 단분자막의 습식에칭 특성)

  • Noh Dong-Sun;Kim Dea-Eun
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.326-329
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    • 2005
  • As a flexible method to fabricate sub-micrometer patterns, Focused Ion Beam (FIB) instrument and Self-Assembled Monolayer (SAM) resist are introduced in this work. FIB instrument is known to be a very precise processing machine that is able to fabricate micro-scale structures or patterns, and SAM is known as a good etch resistance resist material. If SAM is applied as a resist in FIB processing fur fabricating nano-scale patterns, there will be much benefit. For instance, low energy ion beam is only needed for machining SAM material selectively, since ultra thin SAM is very sensitive to $Ga^+$ ion beam irradiation. Also, minimized beam spot radius (sub-tens nanometer) can be applied to FIB processing. With the ultimate goal of optimizing nano-scale pattern fabrication process, interaction between SAM coated specimen and $Ga^+$ ion dose during FIB processing was observed. From the experimental results, adequate ion dose for machining SAM material was identified.

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Effects of phosphating bath compositions on the formation and structure of zinc phosphate conversion coatings on magnesium alloy AZ31

  • Phuong, Nguyen Van;Lee, Kyuhwan;Chang, Doyon;Moon, Sungmo
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.05a
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    • pp.322-323
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    • 2012
  • This study discussed the formation of phosphate conversion coatings on AZ31 Mg alloy (AZ31) from the zinc phosphating bath with various concentrations of sodium fluoride (NaF). The effects of NaF on the formation, structure, composition and electrochemical behavior of the phosphate coatings were examined using scanning electron microscopy (SEM), X-ray diffraction (XRD) weight balances, open circuit potential (OCP) transients, potentiodynamic polarization curves and immersion test. The coatings were composed of two layers: an outer $Zn_2(PO_4)_3.4H_2O$ (hopeite) crystal layer and an inner amorphous of $MgZn_2(PO_4)_2$. NaF concentration is emphasized to be highly effective in the formation of the hopeite crystal and etching and coating rates. Potentiodynamic polarization and immersion test showed that the coatings formed in the zinc phosphating bath with addition of NaF have much higher corrosion resistance than bare AZ31.

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