• 대한전기학회논문지
• /
• 제41권3호
• /
• pp.267-273
• /
• 1992

An advanced on-resistance model of VDMOS devices in the low voltage regimes is proposed and verified by 2-D device simulations. The model considers the lateral gaussian doping profiles in the channel region and exact current spreading angles in the epitaxial layer for both linear and cellular geometries by employing the conformal mapping, It is found out that the on-resistance of low voltage VDMOS may be overestimated considerably if it is analyzed by the conventional method. The 2-D device simulation results show that the proposed model is valid for the VDMOS devices in the low voltage regimes.

• 한국초전도학회:학술대회논문집
• /
• 한국초전도학회 2009년도 Korea Superconductivity Society Meeting 2009
• /
• pp.96-96
• /
• 2009

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 1998년도 IUMRS-ICEM ABSTRACT BOOK
• /
• pp.113.3-113
• /
• 1998

• Journal of Magnetics
• /
• 제11권3호
• /
• pp.108-110
• /
• 2006

We successfully enhanced the performance of a spin valve by inserting an ultra-thin layer of partially oxidized Fe in the pinned and free layers. With the exchange bias field kept large, the spin valve reached a GMR of 12%, which corresponded to a 55% increase in GMR when we compared it with that of spin valves without any inserted layer. The layer of partially oxidized Fe was more effective for improving the properties of the spin valve than the layer of partially oxidized $Co_{90}Fe_{10}$. Considering all the results, we can contribute the significant improvement to the combined effect of the modified local electronic structures at the Fe impurities and theenhanced spin-dependent reflections at the $\alpha-Fe_{2}O_{3} phase in the magnetic layer.

• 한국자기학회지
• /
• 제10권6호
• /
• pp.274-279
• /
• 2000

본 연구에서는 D.C 마그네트론 스퍼터링을 사용하여 Mn-Ir/Ni-Fe교환결합형 다층박막의 하지층 및 적층구조에 따른 자기적 특성 및 열적 특성을 미세구조의 관점에서 연구하였다. 교환결합자계( $H_{ｅ{\chi}}$)와 Blocking Temperature( $T_{b}$)는 Mn-Ir/Ni-Fe 계면에서의 반강자성체의 결정립 크기에 의존하는 것을 알 수 있었다. 또한 Mn-Ir/Ni-Fe 교환결합형 다층박막에서 (111) 우선방위의 발생으로 인하여 $H_{e{\chi}}$가 증가됨을 알 수 있었다. $H_{e{\chi}}$가 발생하는 Mn-Ir/Ni-Fe 다층박막은 Mn-Ir 층에 전위가 생성되어 grain-to-grain epitaxy 관계가 이루어지는 것을 알 수 있었다.다.

• 한국재료학회지
• /
• 제14권2호
• /
• pp.152-156
• /
• 2004

We have studied the effective optical absorption power of Si solar cell with $SiO_2$-antireflection layer based on a mathematical modelling of AM(air mass)1 spectrum and Si refractive index in the wavelength range(0.4 $\mu\textrm{m}\leq$λ$\leq$$0.97\mu\textrm{m}$). The effective optical absorption power obtained from the theoretical calculation was 450 and 520 W/$\m^2$ for the Si solar cells with $SiO_2$-antireflection layer of 500$\AA$ and 1000$\AA$, respectively. The optimum thickness of $SiO_2$-antireflection layer showing the minimum reflection loss was about 1000$\AA$ in the computer simulation. Two kinds of Si solar cells named EBS(500$\AA$) and EBS(l000$\AA$) were fabricated to evaluate the effect of $SiO_2$-antireflection layer thickness on the optical absorption. The epitaxial base Si cell with $SiO_2$-antireflection layer of 1000$\AA$ [EBS(l000$\AA$)] showed the output power improvement of about 15% upon the EBS(500$\AA$) cell due to larger absorption of effective optical power under illumination of AM1, 1 sun.

• 한국결정학회지
• /
• 제5권2호
• /
• pp.85-92
• /
• 1994

펄스 레이저 증착법을 이용하여 강유전체 Bi4T13012 박막을 laA109(001) 위에 성장시켰다. 넓은 영역의 온도에서 증착한 박막의 상 형성과 구조적 성질을 X선 회절법을 이용하여 조사하였다. 740℃에서 증착한 박막은 박막의 c-축이 기판에 수직한 형태의 에피 성장의 경향을 보인다. 펄스 레이저 증착법을 이용하여 Bi4Ti3O12/YBa2Cu3O7-x/LaAlO3 복합구조를 in-situ 성장시켰다. Yba2Cu3O7-x의 a-, b-축이 LaAlO3와 완벽하게 평행하게 배열되어 있지 않음에도 불구하고, Bi4Ti3012 박막은 에피 성장의 경향을 보인다.

• 한국진공학회지
• /
• 제5권3호
• /
• pp.206-212
• /
• 1996

저압MOCVD 방법을 이용하여 76 Torr에서 $In_{1-x}Ga_xAs$ 에피층을 성장하였다. 성장온도에 따른 성장속도의 변화는 크지 않았으며, 격자불일치와 성장온도, $AsH_3/(TMIn+TMGa)$ 비에 따라 표면형상이 변화하는 경향성을 관찰하였다. 깨끗한 byaus을 가지는 $In_{1-x}Ga_xAs$ 에피층의 5K PL 측정을 통하여 2.8meV 반가폭을 가지는 결정성이 좋은 에피가 성장되었음을 확인하였다. 성장온도에 따른 조성의 변화는 크지 않았으며, 고체상에서의 $In_{1-x}Ga_xAs$ 조성은 기체상에서의 원료가스의 확산단계에 의해 결정되었다. 격자불일치와 성장온도가 $In_{1-x}Ga_xAs$ 에피층의 전기적 특성을 결정하는 가장 중요한 변수로 확인되었고, 최적조건에서 성장한 에피층에 대해 상온에서 $8{\times}10^{14}/cm^3$의 전자농도와 11,000$\textrm{cm}^2$/V.sec 의 전자이동도를 얻었다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
• /
• 제51권3호
• /
• pp.134-140
• /
• 2002

Deep submicron NMOSFETs with elevated source/drain can be fabricated using self-aligned selective epitaxial growth(SEG) of silicon for enhanced device characteristics with shallow junction compared to conventional MOSFETs. Shallow junctions, especially with the heartily-doped S/D residing in the elevated layer, give hotter immunity to Yt roll off, drain-induced-barrier-lowering (DIBL), subthreshold swing (SS), punch-through, and hot carrier effects. In this paper, the characteristics of both deep submicron elevated source/drain NMOSFETs and conventional NMOSFETs were investigated by using TSUPREM-4 and MEDICI simulators, and then the results were compared. It was observed from the simulation results that deep submicron elevated S/D NMOSFETs having shallower junction depth resulted in reduced short channel effects, such as DIBL, SS, and hot carrier effects than conventional NMOSFETs. The saturation current, Idsat, of the elevated S/D NMOSFETs was higher than conventional NMOSFETs with identical device dimensions due to smaller sheet resistance in source/drain regions. However, the gate-to-drain capacitance increased in the elevated S/D MOSFETs compared with the conventional NMOSFETs because of increasing overlap area. Therefore, it is concluded that elevated S/D MOSFETs may result in better device characteristics including current drivability than conventional NMOSFETs, but there exists trade-off between device characteristics and fate-to-drain capacitance.

• 한국전기전자재료학회논문지
• /
• 제31권7호
• /
• pp.502-509
• /
• 2018

Epitaxial ZnO nanowires (NWs) were synthesized on sapphire (001) substrates using a hydrothermal process. The effects of the pH value of the precursor solution on the structural and optical properties of the resulting NWs was studied. The epitaxial relationship and the domain matching configuration between the sapphire (001) substrate and the as-grown ZnO NWs were determined using synchrotron X-ray diffraction measurements. The (002) plane of $w{\ddot{u}}rtzite$ ZnO NW grows in the surface normal direction parallel to the sapphire (001) direction. However, three types of in-plane domain matching configurations were observed, such as the on-position, $30^{\circ}$-rotated position, and ${\pm}8.5^{\circ}$-rotated position relative to the on-position, which might be attributed to inheriting the in-plane domain configuration of the ZnO seed layer.